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At least 145 records · Page 8

Modeling and Observations of Phase-Mask Trapezoidal Profiles with Grating-Fiber Image Reproduction

We report on an investigation of the trapezoidal design and fabrication defects in phase masks used to produce Bragg reflection gratings in optical fibers. We used a direct visualization technique to examine the nonuniformity of the interference patterns generated by several phase masks. Fringe patterns from the phase masks are compared with the analogous patterns resulting from two-beam interference. Atomic force microscope imaging of the actual phase gratings that give rise to anomalous fringe patterns is used to determine input parameters for a general theoretical model. Phase masks with pitches of 0.566 and 1.059 microns are modeled and investigated.

Lyons, Donald R.↗

Utilizing Hierarchical Segmentation to Generate Water and Snow Masks to Facilitate Monitoring Change with Remotely Sensed Image Data

The hierarchical segmentation (HSEG) algorithm is a hybrid of hierarchical step-wise optimization and constrained spectral clustering that produces a hierarchical set of image segmentations. This segmentation hierarchy organizes image data in a manner that makes the image's information content more accessible for analysis by enabling region-based analysis. This paper discusses data analysis with HSEG and describes several measures of region characteristics that may be useful analyzing segmentation hierarchies for various applications. Segmentation hierarchy analysis for generating landwater and snow/ice masks from MODIS (Moderate Resolution Imaging Spectroradiometer) data was demonstrated and compared with the corresponding MODIS standard products. The masks based on HSEG segmentation hierarchies compare very favorably to the MODIS standard products. Further, the HSEG based landwater mask was specifically tailored to the MODIS data and the HSEG snow/ice mask did not require the setting of a critical threshold as required in the production of the corresponding MODIS standard product.

Tilton, James C.↗

Error response test system and method using test mask variable

An error response test system and method with increased functionality and improved performance is provided. The error response test system provides the ability to inject errors into the application under test to test the error response of the application under test in an automated and efficient manner. The error response system injects errors into the application through a test mask variable. The test mask variable is added to the application under test. During normal operation, the test mask variable is set to allow the application under test to operate normally. During testing, the error response test system can change the test mask variable to introduce an error into the application under test. The error response system can then monitor the application under test to determine whether the application has the correct response to the error.

Gender, Thomas K.↗

An Automatic Cloud Mask Algorithm Based on Time Series of MODIS Measurements

Quality of aerosol retrievals and atmospheric correction depends strongly on accuracy of the cloud mask (CM) algorithm. The heritage CM algorithms developed for AVHRR and MODIS use the latest sensor measurements of spectral reflectance and brightness temperature and perform processing at the pixel level. The algorithms are threshold-based and empirically tuned. They don't explicitly address the classical problem of cloud search, wherein the baseline clear-skies scene is defined for comparison. Here, we report on a new CM algorithm which explicitly builds and maintains a reference clear-skies image of the surface (refcm) using a time series of MODIS measurements. The new algorithm, developed as part of the Multi-Angle Implementation of Atmospheric Correction (MAIAC) algorithm for MODIS, relies on fact that clear-skies images of the same surface area have a common textural pattern, defined by the surface topography, boundaries of rivers and lakes, distribution of soils and vegetation etc. This pattern changes slowly given the daily rate of global Earth observations, whereas clouds introduce high-frequency random disturbances. Under clear skies, consecutive gridded images of the same surface area have a high covariance, whereas in presence of clouds covariance is usually low. This idea is central to initialization of refcm which is used to derive cloud mask in combination with spectral and brightness temperature tests. The refcm is continuously updated with the latest clear-skies MODIS measurements, thus adapting to seasonal and rapid surface changes. The algorithm is enhanced by an internal dynamic land-water-snow classification coupled with a surface change mask. An initial comparison shows that the new algorithm offers the potential to perform better than the MODIS MOD35 cloud mask in situations where the land surface is changing rapidly, and over Earth regions covered by snow and ice.

Lyapustin, Alexei↗

Photodetectors on Coronagraph Mask for Pointing Control

It has been proposed to install a symmetrical array of photodetectors about the center of the mask of a coronagraph of the type used to search for planets orbiting remote stars. The purpose of this installation is to utilize the light from a star under observation as a guide in pointing the telescope. Simple arithmetic processing of the outputs of the photodetectors would provide indications of the lateral position of the center of the mask relative to the center of the image of the star. These indications could serve as pointing-control feedback signals for adjusting the telescope aim to center the image of the star on the mask. The widths of central mask areas available for placement of photodetectors differ among coronagraph designs, typically ranging upward from about 100 m. Arrays of photodetectors can readily be placed within areas in this size range. The number of detectors in an array could be as small as 4 or as large as 64. The upper limit on the number of detectors would be determined according to the extent of the occulting pattern and the number of functionalities, in addition to pointing control, to be served by the array.

Balasubramanian, Kunjithapatham↗

Germanium Lift-Off Masks for Thin Metal Film Patterning

A technique has been developed for patterning thin metallic films that are, in turn, used to fabricate microelectronics circuitry and thin-film sensors. The technique uses germanium thin films as lift-off masks. This requires development of a technique to strip or undercut the germanium chemically without affecting the deposited metal. Unlike in the case of conventional polymeric lift-off masks, the substrate can be exposed to very high temperatures during processing (sputter deposition). The reason why polymeric liftoff masks cannot be exposed to very high temperatures (greater than 100 C) is because (a) they can become cross linked, making lift-off very difficult if not impossible, and (b) they can outgas nitrogen and oxygen, which then can react with the metal being deposited. Consequently, this innovation is expected to find use in the fabrication of transition edge sensors and microwave kinetic inductance detectors, which use thin superconducting films deposited at high temperature as their sensing elements. Transition edge sensors, microwave kinetic inductance detectors, and their circuitry are comprised of superconducting thin films, for example Nb and TiN. Reactive ion etching can be used to pattern these films; however, reactive ion etching also damages the underlying substrate, which is unwanted in many instances. Polymeric lift-off techniques permit thin-film patterning without any substrate damage, but they are difficult to remove and the polymer can outgas during thin-film deposition. The outgassed material can then react with the film with the consequence of altered and non-reproducible materials properties, which, in turn, is deleterious for sensors and their circuitry. The purpose of this innovation was to fabricate a germanium lift-off mask to be used for patterning thin metal films.

Brown, Ari↗

Dust Model Sensitivity to Dust Source Mask, Sandblasting Efficiency, Air Density, and Land Use: Implications for Model Improvement

This study compares dust storm simulations using two commonly adopted methods for representing four important dust emission parameters. Compared to a dynamic dust source mask based on land use and vegetation cover, a static mask based solely on land use overestimates dust concentration and optical depth by a factor of 2, besides generating spurious emissions. The results reinforce that seasonal variations in vegetation cover can significantly affect dust emissions. For sandblasting efficiency, a clay-dependent semiempirical expression produces 10 times more dust than a physics-based expression. Simulations using model-predicted versus a fixed constant for air density differ by only 8%. However, this difference could range between 12 and 22% for annual simulations over global dust source regions. Simulations with updated versus old land use data, using the same dust source mask, differ twofold, indicating the significant impact of land use change on regional dust emission in central Arizona. The differences in the pairs of these simulations are generally larger than the uncertainty due to meteorology. The simulations align better with observation when using the dynamic dust source mask, the physics-based sandblasting efficiency, and the up-to-date land use data. Given the high sensitivity of dust to surface conditions, the results discussed have implications for improving the dust cycle in weather and climate models and for interpreting model intercomparisons.

Dust-emission source↗

Optical synchrotron radiation beam imaging with a digital mask

The 3GeV SPEAR3 synchrotron light source operates in top-up injection mode with up to 500mA circulating in the storage ring (equivalently 392nC). Each injection pulse contains only 40-80 pC producing a contrast ratio between total stored charge and injected charge of about 6500:1. In order to study transient injected beam dynamics during User operations, it is desirable to optically image the injected pulse in the presence of the bright stored beam. In the present work this is done by re-imaging visible synchrotron radiation onto a digital micro-mirror-array device (DMD), which is then used as an optical mask to block out light from the bright central core of the stored beam. The physical masking, together with an asynchronously-gated, ICCD imaging camera makes it is possible to observe the weak injected beam component on a turn-by-turn basis. The DMD optical masking system works similar to a classical solar coronagraph but has some distinct practical advantages: i.e. rapid adaption to changes in the shape of the stored beam, high extinction ratio for unwanted light and minimum scattering from the primary beam into the secondary optics. In this paper we describe the DMD masking method, features of the high dynamic range point spread function for the SPEAR3 optical beam line and measurements of the injected beam in the presence of the stored beam.

43 PARTICLE ACCELERATORS↗

APPLICATION OF VORONOI DIAGRAM TO MASK-BASED INTERCEPTING PHASE-SPACE MEASUREMENTS

Intercepting multi-aperture masks (e.g. pepper pot or multislit mask) combined with a downstream transversedensity diagnostics (e.g. based on optical transition radiation or employing scintillating media) are commonly used for characterizing the phase space of charged particle beams and the associated emittances. The required data analysis relies on precise calculation of the RMS sizes and positions of the beamlets originated from the mask which drifted up to the analyzing diagnostics. Voronoi diagram is an efficient method for splitting a plane into subsets according to the distances between given vortices. The application of the method to analyze data from pepper pot and multislit mask based measurement is validated via numerical simulation and applied to experimental data acquired at the Argonne Wakefield Accelerator (AWA) facility. We also discuss the application of the Voronoi diagrams to quantify transverselymodulated beams distortion.

43 PARTICLE ACCELERATORS↗

Sound-masking device for a roll-up door

A portable sound-masking device for placing on a roll-up door having a number of horizontally-extending elements. The sound-masking device has a fixture, a magnet, and a transducer. The fixture has an inner face, an outer face, and a pair of spaced-apart tabs protruding from the inner face, the tabs being configured to engage one of the horizontally-extending elements of the roll-up door. The magnet is fastened to the inner face of the fixture and provides a force that tethers the sound-masking device to the roll-up door. The transducer is fastened to the outer face and is configured to emit sound-masking noise.

45 MILITARY TECHNOLOGY, WEAPONRY, AND NATIONAL DEF↗

Masking of photovoltaic system performance problems by inverter clipping and other design and operational practices

We describe how performance problems can be “masked,” or not readily evident by several causes: by photovoltaic (PV) system configuration (such as the size of the PV array capacity relative to the size of the inverter and the resultant clipped operating mode); by instrumentation design, installation, and maintenance (such as a misaligned or dirty pyranometer); by contract clauses (when operational availability is transformed to contractual availability, which excludes many factors); and by identified management and operational practices (such as reporting on a portfolio of plants rather than individually). A simple method based on a duration curve is introduced to overcome shortcomings of Performance Ratio based on nameplate capacity and Performance Index based on hourly simulation when quantifying masking effects, and inverter clipping and pyranometer soiling are presented as two examples of the new method. With a better understanding of the non-transparency of masking issues, stakeholders can better interpret performance data and deliver improved AC and DC plant conditions through PV system operation and maintenance (O&M) for improved performance, reduced O&M costs, and a more consistently delivered, and reduced, levelized cost of energy (LCOE).

14 SOLAR ENERGY↗

Evaluating WRF-Solar EPS cloud mask forecast using the NSRDB

Improving the accuracy of day-ahead solar forecasts using numerical weather prediction models requires improving the forecasting of cloud occurrence and properties. Validating cloud forecasts is challenging because this requires evaluating different types of clouds over a wide variety of regions. This study analyzes the cloud occurrence (or cloud mask) over the contiguous United States (CONUS), predicted by the Weather Research and Forecasting-Solar Ensemble Prediction System (WRF-Solar EPS), to identify the strengths and limitations of the model in reproducing cloud fields. To enable the in-depth analysis of cloud mask forecasts covering CONUS, we use satellite observations from the National Solar Radiation Database (NSRDB). Two evaluation methods are implemented to consider all clouds and partially removed clouds from the 2-km NSRDB in evaluating the 9-km WRF-Solar EPS cloud mask. Cloud detection metrics as well as the frequency of cloud occurrence are used to quantify the monthly performance of WRF-Solar EPS. Mismatched cloud frequency (MCF) is used to assess the model's capability to predict different types of clouds, which are classified using three levels of cloud optical depth (COD) and cloud top height (CTH). The day-ahead forecasts covering the full year of 2018 demonstrate that WRF-Solar EPS produces MCFs ranging from 27%-46%, 13%-34%, and 8%-19% for thin, mid-thickness, and thick clouds, respectively. For three CTH levels, the model shows MCFs ranging from 19%-46%, 16%-33%, and 8%-27% for low-level, middle-level, and high-level clouds, respectively. This comprehensive characterization of model performance helps identify model weakness and will eventually lead to improvements in cloud and solar radiation forecasting.

14 SOLAR ENERGY↗

Modeling and Simulating Multiple Failure Masking enabled by Local Recovery for Stencil-based Applications at Extreme Scales

By obtaining multi-process hard failure resilience at the application level is a key challenge that must be overcome before the promise of exascale can be fully realized. Some previous work has shown that online global recovery can dramatically reduce the overhead of failures when compared to the more traditional approach of terminating the job and restarting it from the last stored checkpoint. If online recovery is performed in a local manner further scalability is enabled, not only due to the intrinsic lower costs of recovering locally, but also due to derived effects when using some application types. In this paper we model one such effect, namely multiple failure masking, that manifests when running Stencil parallel computations on an environment when failures are recovered locally. First, the delay propagation shape of one or multiple failures recovered locally is modeled to enable several analyses of the probability of different levels of failure masking under certain Stencil application behaviors. These results indicate that failure masking is an extremely desirable effect at scale which manifestation is more evident and beneficial as the machine size or the failure rate increase.

97 MATHEMATICS AND COMPUTING↗

Complex Pupil Masks for Aberrated Imaging of Closely Spaced Objects

Current approach demonstrates the suppression of optical side-lobes and the contraction of the main lobe in the composite image of two object points of the optical system under the influence of defocusing effect when an asymmetric phase edges are imposed over the apodized circular aperture. The resolution of two point sources having different intensity ratio is discussed in terms of the modified Sparrow criterion, functions of the degree of coherence of the illumination, the intensity difference and the degree of asymmetric phase masking. Here we have introduced and explored the effects of focus aberration (defect-of-focus) on the two-point resolution of the optical systems. Results on the aberrated composite image of closely spaced objects with amplitude mask and asymmetric phase masks forms a significant contribution in astronomical and microscopic observations.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗

Fast prototyping of high-aspect ratio, high-resolution x-ray masks by gas-assisted focused ion beam

The capacity of chemically-assisted focused ion beam (fib) etching systems to undertake direct and highly anisotropic erosion of thin and thick gold (or other high atomic number [Z])coatings on x-ray mask membranes/substrates provides new levels of precision, flexibility, simplification and rapidity in the manufacture of mask absorber patterns, allowing the fast prototyping of high aspect ratio, high-resolution masks for deep x-ray lithography.

fast prototyping of high-aspect ratio high-resolut↗

HEBS and Binary 1-sinc masks simulations, HCIT experiments and results

Based on preliminary experiments and results with a binary 1-sinc mask in the HCIT early in August 2004, we planned for a detailed experiment to compare the performance of HEBS and Binary masks under nearly identical conditions in the HCIT. This report details the design and fabrication of the masks, simulated predictions, and experimental results.

HCIT↗

Occulting focal plane masks for Terrestrial Planet Finder Coronagraph: design, fabrication, simulations and test results

Occulting focal plane masks for the Terrestrial Planet Finder Coronagraph (TPF-C) could be designed with continuous gray scale profile of the occulting pattern such as 1-sinc2 on a suitable material or with micron-scale binary transparent and opaque structures of metallic pattern on glass. We have designed, fabricated and tested both kinds of masks. The fundamental characteristics of such masks and initial test results from the High Contrast Imaging Test bed (HCIT) at JPL are presented.

adaptive optics↗

Fabrication and Characteristics of Free Standing Shaped Pupil Masks for TPF-Coronagraph

Direct imaging and characterization of exo-solar terrestrial planets require coronagraphic instruments capable of suppressing star light to 10-10. Pupil shaping masks have been proposed and designed1 at Princeton University to accomplish such a goal. Based on Princeton designs, free standing (without a substrate) silicon masks have been fabricated with lithographic and deep etching techniques. In this paper, we discuss the fabrication of such masks and present their physical and optical characteristics in relevance to their performance over the visible to near IR bandwidth.

terrestrial planet finder↗