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At least 1,333 records · Page 74
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DOE OSTI2012

Growth and photoluminescence of self-catalyzed GaP/GaNP core/shell nanowires on Si(111) by gas source molecular beam epitaxy

We report a study on self-catalyzed GaP/GaNP core/shell nanowires (NWs) grown on Si(111) by gas-source molecular beam epitaxy. Scanning electron microscopy images show that vertical and uniform GaP NWs and GaP/GaNP core/shell NWs are grown on Si(111). The density ranges from {approx}1 x 10{sup 7} to {approx}5 x 10{sup 8} cm{sup -2} across the substrate. Typical diameters are {approx}110 nm for GaP NWs and {approx}220 nm for GaP/GaNP NWs. Room temperature photoluminescence (PL) signal from the GaP/GaNP core/shell NWs confirms that N is incorporated in the shell and the average N content is {approx}0.9%. The PL low-energy tail is significantly reduced, compared to bulk GaNP.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Cation stoichiometry optimization of SrTiO{sub 3} (110) thin films with atomic precision in homogeneous molecular beam epitaxy

We study the evolution of surface reconstructions on SrTiO{sub 3} (110) determined by cation concentration ratio and find it detectable by high energy electron diffraction (RHEED) even at high temperature up to 800 deg. C. The evaporation rate of Sr and Ti sources can be calibrated precisely by monitoring RHEED patterns in situ and in real time during the extended homogeneous oxide molecule beam epitaxy growth of SrTiO{sub 3} (110) film. High quality film is obtained with deviation of cation stoichiometry less than 0.5%.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Deep traps in nonpolar m-plane GaN grown by ammonia-based molecular beam epitaxy

Deep level defects in nonpolar m-plane GaN grown by ammonia-based molecular beam epitaxy were characterized using deep level transient spectroscopy (DLTS) and deep level optical spectroscopy (DLOS) and compared with polar c-plane GaN that was grown simultaneously in the same growth run. Significant differences in both the levels present and their concentrations were observed upon comparison of both growth orientations. DLTS revealed electron traps with activation energies of 0.14 eV, 0.20 eV, and 0.66 eV in the m-plane material, with concentrations that were {approx}10-50 x higher than traps of similar activation energies in the c-plane material. Likewise, DLOS measurements showed {approx}20 x higher concentrations of both a C{sub N} acceptor-like state at E{sub C} - 3.26 eV, which correlates with a high background carbon concentration observed by secondary ion mass spectroscopy for the m-plane material [A. Armstrong, A. R. Arehart, B. Moran, S. P. DenBaars, U. K. Mishra, J. S. Speck, and S. A. Ringel, Appl. Phys. Lett. 84, 374 (2004)], and the V{sub Ga}-related state level at E{sub C} - 2.49 eV, which is consistent with an enhanced yellow luminescence observed by photoluminescence. The findings suggest a strong impact of growth dynamics on the incorporation of impurities and electrically active native point defects as a function of GaN growth plane polarity.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Molecular beam epitaxy of InAlN lattice-matched to GaN with homogeneous composition using ammonia as nitrogen source

InAlN lattice-matched to GaN was grown by molecular beam epitaxy (MBE) using ammonia as the nitrogen source. The alloy composition, growth conditions, and strain coherence of the InAlN were verified by high resolution x-ray diffraction {omega}-2{theta} scans and reciprocal space maps. Scanning transmission electron microscopy and energy-dispersive x-ray spectroscopy of the InAlN revealed the absence of lateral composition modulation that was observed in the films grown by plasma-assisted MBE. InAlN/AlN/GaN high electron mobility transistors with smooth surfaces were fabricated with electron mobilities exceeding 1600 cm{sup 2}/Vs and sheet resistances below 244 {Omega}/sq.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Atom probe tomography characterisation of a laser diode structure grown by molecular beam epitaxy

Atom probe tomography (APT) has been used to achieve three-dimensional characterization of a III-nitride laser diode (LD) structure grown by molecular beam epitaxy (MBE). Four APT data sets have been obtained, with fields of view up to 400 nm in depth and 120 nm in diameter. These data sets contain material from the InGaN quantum well (QW) active region, as well as the surrounding p- and n-doped waveguide and cladding layers, enabling comprehensive study of the structure and composition of the LD structure. Two regions of the same sample, with different average indium contents (18% and 16%) in the QW region, were studied. The APT data are shown to provide easy access to the p-type dopant levels, and the composition of a thin AlGaN barrier layer. Next, the distribution of indium within the InGaN QW was analyzed, to assess any possible inhomogeneity of the distribution of indium (''indium clustering''). No evidence for a statistically significant deviation from a random distribution was found, indicating that these MBE-grown InGaN QWs do not require indium clusters for carrier localization. However, the APT data show steps in the QW interfaces, leading to well-width fluctuations, which may act to localize carriers. Additionally, the unexpected presence of a small amount (x = 0.005) of indium in a layer grown intentionally as GaN was revealed. Finally, the same statistical method applied to the QW was used to show that the indium distribution within a thick InGaN waveguide layer in the n-doped region did not show any deviation from randomness.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Raman scattering by the E{sub 2h} and A{sub 1}(LO) phonons of In{sub x}Ga{sub 1-x}N epilayers (0.25 < x < 0.75) grown by molecular beam epitaxy

We use Raman scattering to investigate the composition behavior of the E{sub 2h} and A{sub 1}(LO) phonons of In{sub x}Ga{sub 1-x}N and to evaluate the role of lateral compositional fluctuations and in-depth strain/composition gradients on the frequency of the A{sub 1}(LO) bands. For this purpose, we have performed visible and ultraviolet Raman measurements on a set of high-quality epilayers grown by molecular beam epitaxy with In contents over a wide composition range (0.25 < x < 0.75). While the as-measured A{sub 1}(LO) frequency values strongly deviate from the linear dispersion predicted by the modified random-element isodisplacement (MREI) model, we show that the strain-corrected A{sub 1}(LO) frequencies are qualitatively in good agreement with the expected linear dependence. In contrast, we find that the strain-corrected E{sub 2h} frequencies exhibit a bowing in relation to the linear behavior predicted by the MREI model. Such bowing should be taken into account to evaluate the composition or the strain state of InGaN material from the E{sub 2h} peak frequencies. We show that in-depth strain/composition gradients and selective resonance excitation effects have a strong impact on the frequency of the A{sub 1}(LO) mode, making very difficult the use of this mode to evaluate the strain state or the composition of InGaN material.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Effects of molecular beam epitaxy growth conditions on composition and optical properties of In{sub x}Ga{sub 1-x}Bi{sub y}As{sub 1-y}

We describe the growth conditions of In{sub x}Ga{sub 1-x}Bi{sub y}As{sub 1-y} (lattice-mismatched and matched) on InP substrates by molecular beam epitaxy and the resulting properties. Due to their anomalously narrow bandgaps and the presence of bismuth, these materials are promising for optoelectronics and thermoelectrics. Low growth temperature and moderate As/Bi beam equivalent pressure ratios are beneficial for Bi incorporation, in good qualitative agreement with GaBi{sub y}As{sub 1-y} on GaAs. Up to 6.75% bismuth is incorporated. High resolution x-ray diffraction and reciprocal space mapping show that In{sub x}Ga{sub 1-x}Bi{sub y}As{sub 1-y} samples exhibit good crystalline quality and zero relaxation. The band gap is reduced in agreement with theoretical predictions. Lattice-matched samples have been produced with lattice mismatch {<=}0.21%.

36 MATERIALS SCIENCE↗
DOE OSTI2012

CdSe/CdTe type-II superlattices grown on GaSb (001) substrates by molecular beam epitaxy

CdSe/CdTe superlattices are grown on GaSb substrates using molecular beam epitaxy. X-ray diffraction measurements and cross-sectional transmission electron microscopy images indicate high crystalline quality. Photoluminescence (PL) measurements show the effective bandgap varies with the superlattice layer thicknesses and confirm the CdSe/CdTe heterostructure has a type-II band edge alignment. The valence band offset between unstrained CdTe and CdSe is determined as 0.63 {+-} 0.06 eV by fitting the measured PL peak positions using the envelope function approximation and the Kronig-Penney model. These results suggest that CdSe/CdTe superlattices are promising candidates for multi-junction solar cells and other optoelectronic devices based on GaSb substrates.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Effect of in-situ oxygen on the electronic properties of graphene grown by carbon molecular beam epitaxy grown

We report that graphene grown by molecular beam epitaxy from solid carbon (CMBE) on (0001) SiC in the presence of unintentional oxygen exhibits a small bandgap on the order of tens of meV. The presence of bandgaps is confirmed by temperature dependent Hall effect and resistivity measurements. X-ray photoelectron spectroscopy (XPS) measurements suggest that oxygen incorporates into the SiC substrate in the form of O-Si-C and not into the graphene as graphene oxide or some other species. The effect is independent of the carrier type of the graphene. Temperature dependent transport measurements show the presence of hopping conduction in the resistivity and a concurrent disappearance of the Hall voltage. Interactions between the graphene layers and the oxidized substrate are believed to be responsible for the bandgap.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Ferromagnetic phase transition in zinc blende (Mn,Cr)S-layers grown by molecular beam epitaxy

We studied the magnetization of zinc blende Mn{sub 1-x}Cr{sub x}S films embedded between diamagnetic ZnSe layers grown by molecular beam epitaxy with chromium mole fractions x {<=} 0.7. These ternary semiconductors exhibit an increasing ferromagnetic contribution with increasing x caused by competing antiferromagnetic and ferromagnetic coupling. As a result, whereas MnS in the zinc blende phase is a pure antiferromagnet, it was found that with increasing x zinc blende Mn{sub 1-x}Cr{sub x}S became a ferromagnet. The ferromagnetic phase transition dominates in case of x greater than about 0.5. Hence, we conclude that metastable zinc blende CrS will be a ferromagnetic material with half-metallic character in contrast to the analogous stable NiAs-structure which exhibits an antiferromagnetic phase transition.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Structural and optical characterization of Si{sub x}Ge{sub 1-x-y}Sn{sub y} alloys grown by molecular beam epitaxy

Si{sub x}Ge{sub 1-x-y}Sn{sub y} alloys were grown by molecular beam epitaxy at low temperature, followed by ex-situ annealing. The crystal quality of Si{sub x}Ge{sub 1-x-y}Sn{sub y} layers was characterized by atomic force microscopy and transmission electron microscopy. The compositions and lattice constants of the alloys were studied by x-ray photoelectron spectroscopy and x-ray diffraction. The results show that Vegard's law is a good approximation for Si{sub x}Ge{sub 1-x-y}Sn{sub y} alloys. Photoreflectance spectroscopy at room temperature was used to determine the direct bandgap energy of Si{sub x}Ge{sub 1-x-y}Sn{sub y} layers. Analyzing the relationship between composition and direct bandgap energy reveals a negative energy bowing parameter for SiSn.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Molecular beam epitaxial growth and characterization of InSb{sub 1-x}N{sub x} on GaAs for long wavelength infrared applications

Recent research progress and findings in InSbN have attracted great attention due to its use in long wavelength infrared applications. A large bandgap reduction in InSb resulting from high N incorporation with minimal crystal defects is challenging due to relatively small atomic size of N. Hence optimization of growth conditions plays an important role in the growth of high-quality InSbN epilayers for device purposes. In this paper, we report on the correlation of structural, vibrational, electrical, and optical properties of molecular beam epitaxially grown InSbN epilayers grown on GaAs substrates, as a function of varying growth temperatures. Two dimensional growths of InSb and InSbN were confirmed from dynamic reflection high energy electron diffraction patterns and growth parameters were optimized. High crystalline quality of the epilayers is attested to by a low full width at half maximum of 200 arcsec from high resolution x-ray diffraction (HRXRD) scans and by the high intensity and well-resolved InSb longitudinal optical (LO) and 2{sup nd} order InSb LO mode observed from micro-Raman spectroscopy. The N incorporation in these InSbN epilayers is estimated to be 1.4% based on HRXRD simulation. X-ray photoelectron spectroscopy (XPS) studies reveal that most of the N present in the layers are in the form of In-N bonding. Variation of the lattice disorder with growth temperature is correlated with the types of N bonding present, the carrier concentration and mobility, observed in the corresponding XPS spectra and Hall measurements, respectively. XPS analysis, HRXRD scans, and Raman spectral analysis indicate that lower growth temperature favors In-N bonding which dictates N incorporation in the substitutional sites and lattice disorder, whereas, high growth temperature promotes the formation of In-N-Sb bonding. The best room temperature and 77 K electrical transport parameters and maximum redshift in the absorption edge have been achieved in the InSbN epilayer grown in the 290 deg. C {approx} 330 deg. C temperature range.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Structural properties of InN films grown on O-face ZnO(0001) by plasma-assisted molecular beam epitaxy

We study the impact of substrate temperature and layer thickness on the morphological and structural properties of InN films directly grown on O-face ZnO(0001) substrates by plasma-assisted molecular beam epitaxy. With increasing substrate temperature, an interfacial reaction between InN and ZnO takes place that eventually results in the formation of cubic In{sub 2}O{sub 3} and voids. The properties of the InN films, however, are found to be unaffected by this reaction for substrate temperatures less than 550 deg. C. In fact, both the morphological and the structural quality of InN improve with increasing substrate temperature in the range from 350 to 500 deg. C. High quality films with low threading dislocation densities are demonstrated.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Electrical properties of the amorphous interfacial layer between Al electrodes and epitaxial NiO films

The amorphous interfacial layer (a-IL) between Al electrode and epitaxial NiO films were studied using electron energy-loss spectroscopy (EELS) and energy-dispersive x-ray spectroscopy. Two distinct properties were found in the a-IL, i.e., a lower metallic and an upper insulating layer. EELS results revealed that the metallic Ni atoms were responsible for the conducting nature of the lower oxide amorphous layer. The resistance behavior of Al/a-IL/epi-NiO was changed from a high to a low resistance state after forming process. The resistance change could be explained by the formation of a nanocrystalline metal alloy in the insulating amorphous layer.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Effect of substrate temperature on microstructure of epitaxial ZnO films grown on sapphire by sputtering

The microstructure of epitaxial ZnO films on (0001) sapphire substrates deposited by reactive sputtering in substrate temperature (T{sub s}) range of 100 - 500 deg. C were investigated by High-resolution X-ray diffraction. The studies show the presence of a strained 2D layer along with 3D crystallites at low T{sub s}, whereas 3D growth is dominant at higher T{sub s}, resulting in formation of mosaic structure with lesser point and line defects.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Thermoelectric properties of epitaxial TbAs:InGaAs nanocomposites

InGaAs lattice-matched to InP was grown by molecular beam epitaxy with randomly distributed TbAs nanoparticles for thermoelectric power generation applications. TbAs:InGaAs is expected to have a large thermoelectric figure of merit, ZT, particularly at high temperatures, owing to energy band alignment between the nanoparticles and their surrounding matrix. Here, the room temperature thermoelectric properties were measured as a function of TbAs concentration, revealing a maximum thermoelectric power factor of 2.38 W/mK{sup 2} and ZT of 0.19 with 0.2% TbAs. Trends in the thermoelectric properties closely resemble those found in comparable ErAs:InGaAs nanocomposite materials. However, nanoparticles were not observed by scanning transmission electron microscopy in the highest ZT TbAs:InGaAs sample, unlike the highest ZT ErAs:InGaAs sample (0.2% ErAs) and two higher concentration TbAs:InGaAs samples examined. Consistent with expectations concerning the positioning of the Fermi level in these materials, ZT was enhanced by TbAs incorporation largely due to a high Seebeck coefficient, whereas ErAs provided InGaAs with higher conductivity but a lower Seebeck coefficient than that of TbAs:InGaAs. Thermal conductivity was reduced significantly from that of intrinsic thin-film InGaAs only with TbAs concentrations greater than {approx}1.7%.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Growth of sputter-deposited metamagnetic epitaxial Ni-Co-Mn-In films

Metamagnetic thin films represent a promising geometry for more efficient magnetocaloric cooling applications due to a fast heat transfer. Here, we identify suitable growth conditions to obtain epitaxial Ni-Mn-In-Co films with a metamagnetic transition in vicinity of room temperature. We show that both increased substrate temperature and target aging result in loss of indium. This can be attributed to evaporation and preferential sputtering, respectively. We present a model that treats the effect of target aging and temperature dependence of evaporation on the film composition independently and enables predictions of the film composition as a function of initial target composition, target age, and deposition temperature. Furthermore, our analysis reveals that a sufficient degree of chemical B2 order is required for a transformation, in addition to an appropriate film composition.

36 MATERIALS SCIENCE↗
DOE OSTI2012

Electron scattering mechanisms in GZO films grown on a-sapphire substrates by plasma-enhanced molecular beam epitaxy

We report on the mechanisms governing electron transport using a comprehensive set of ZnO layers heavily doped with Ga (GZO) grown by plasma-enhanced molecular-beam epitaxy on a-plane sapphire substrates with varying oxygen-to-metal ratios and Ga fluxes. The analyses were conducted by temperature dependent Hall measurements which were supported by microstructural investigations as well. Highly degenerate GZO layers with n > 5 x 10{sup 20} cm{sup -3} grown under metal-rich conditions (reactive oxygen-to-metal ratio <1) show relatively larger grains ({approx}20-25 nm by x-ray diffraction) with low-angle boundaries parallel to the polar c-direction. For highly conductive GZO layers, ionized-impurity scattering with almost no compensation is the dominant mechanism limiting the mobility in the temperature range from 15 to 330 K and the grain-boundary scattering governed by quantum-mechanical tunnelling is negligible. However, due to the polar nature of ZnO having high crystalline quality, polar optical phonon scattering cannot be neglected for temperatures above 150 K, because it further reduces mobility although its effect is still substantially weaker than the ionized impurity scattering even at room temperature (RT). Analysis of transport measurements and sample microstructures by x-ray diffraction and transmission electron microscopy led to a correlation between the grain sizes in these layers and mobility even for samples with a carrier concentration in the upper 10{sup 20} cm{sup -3} range. In contrast, electron transport in GZO layers grown under oxygen-rich conditions (reactive oxygen-to-metal ratio >1), which have inclined grain boundaries and relatively smaller grain sizes of 10-20 nm by x-ray diffraction, is mainly limited by compensation caused by acceptor-type point-defect complexes, presumably (Ga{sub Zn}-V{sub Zn}), and scattering on grain boundaries. The GZO layers with n <10{sup 20} cm{sup -3} grown under metal-rich conditions with reduced Ga fluxes show a clear signature of grain-boundary scattering governed by the thermionic effect in the temperature-dependent mobility but with much higher RT mobility values compared to the samples grown under oxygen-rich conditions [34 vs. 7.5 cm{sup 2}/V{center_dot}s]. Properties of GZO layers grown under different conditions clearly indicate that to achieve highly conductive GZO, metal-rich conditions instead of oxygen-rich conditions have to be used.

36 MATERIALS SCIENCE↗