Exploring Fabrication of Ultra-low Absorption, Multilayer, Hafnium High Reflectors
Ultra-low absorption, high damage threshold coatings are critical for the advancement of the high power CW laser technologies, and in most cases, are a limiting factor for the output power. Since high power CW laser systems enable extremely high power irradiances, when the light is incident on an HR mirror, part of the energy is absorbed and converted into heat, which can have many detrimental side effects. The worst-case scenarios are optical distortion and laser-induced damage. These optics must operate reliably with irradiances of 100's kW/cm 2 to MW/cm 2 . The highest pulsed laser damage threshold high reflectors are consistently fabricated with hafnia material. However, hafnia is not the material of choice for high power CW laser systems because of very high absorption and scatter properties, factors of >100x higher than tantala-silica, due to its poly crystalline nature. This study focuses on CW laser use applications, where the coatings’ laser damage resistance is largely limited by the inherent absorption of the coating materials. The goal is to study the feasibility of utilizing a “composite” hafnium-silica and a “doped” hafnia-silica target materials to prohibit crystallization. The results from the study were extremely successful. Hafnia high reflectors coatings generated from this study exhibited one micron absorption values of approximately 1 ppm, which are the lowest reported values to date.