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At least 1,225 records · Page 68

Hall Mobility in SrTio (sub 3)

Conductivity and Hall coefficient measurements for electron mobilities in strontium titanate, discussing electron-phonon coupling and cryogenic experiments

ELECTRON MOBILITY↗

Electrical properties of tellurium thin films

Evaporated tellurium thin films electric properties, discussing fabrication techniques, temperature dependence, field effect and Hall mobilities, threshold voltage and stability

Dutton, R. W.↗

Ru(sub 2)Ge(sub 3): Crystal Growth and Come Properties

Large samples of Ru(sub 2)Ge(sub 3) were grown from Ge-rich off-stoichiometric melts at a temperature close to 1460 C by a vertical gradient freeze method in graphite and glassy carbon crucibles.

off-stoichiometric melt twinning crack formation h↗

A Facility Effect Characterization Test of the BHT-6000 Hall Thruster

During the development of the BHT-6000 Hall thruster for flight on NASA’s Power and Propulsion Element, a facility effect test campaign was performed on an engineering unit of the thruster. Testing occurred in Vacuum Facility 5 at NASA Glenn Research Center. The goal of the test campaign was to characterize the behavior of the BHT-6000 Hall thruster as functions of facility effects such that the thruster’s in-flight behavior can be reasonably bounded. In particular, the behavior of the thruster with regard to the background pressure and electrical environment was tested. The background pressure was controlled by injecting supplemental propellant flow into the environment, while the electrical environment was controlled by biasing the facility beam dump. Thrust was found to remain constant over the tested range of pressures while specific impulse was found to increase slightly (1 to 1.5% over a range of up to 20 μTorr, depending on operating point). Plasma plume properties, particularly of ions exiting the side of the thruster, were found to be highly sensitive to pressure and may require pressures of less than a few μTorr for accurate measurements. The thruster was found to operate identically with changing beam dump bias voltage to within measurement uncertainties.

Electric propulsion↗

Floquet band engineering and topological phase transitions in 1T’ transition metal dichalcogenides

Using ab initio tight-binding approaches, we investigate Floquet band engineering of the 1T' phase of transition metal dichalcogenides (MX 2 , M = W, Mo and X = Te, Se, S) monolayers under the irradiation with circularly polarized light. Furthermore, our first principles calculations demonstrate that light can induce important transitions in the topological phases of this emerging materials family. For example, upon irradiation, Te-based MX2 undergoes a phase transition from quantum spin Hall (QSH) semimetal to time-reversal symmetry broken QSH insulator with a nontrivial band gap of up to 92.5 meV. On the other hand, Se- and S-based MX 2 undergoes the topological phase transition from the QSH effect to the quantum anomalous Hall effect and into trivial phases with increasing light intensity. From a general perspective, this theoretical work brings further insight into non-equilibrium topological systems.

36 MATERIALS SCIENCE↗

Effect of surface disorder on the chiral surface states of a three-dimensional quantum Hall system

We investigate the effect of surface disorder on the chiral surface states of a three-dimensional quantum Hall system. Utilizing a transfer-matrix method, we find that the localization length of the surface state along the magnetic field decreases with the surface disorder strength in the weak disorder regime but increases anomalously in the strong disorder regime. In the strong disorder regime, the surface states mainly locate at the first inward layer to avoid the strong disorder in the outmost layer. The anomalous increase of the localization length can be explained by an effective model, which maps the strong disorder on the surface layer to the weak disorder on the first inward layer. Our work demonstrates that surface disorder can be an effective way to control the transport behavior of the surface states along the magnetic field. We also investigate the effect of surface disorder on the full distribution of conductances P(g) of the surface states in the quasi-one-dimensional (1D) regime for various surface disorder strengths. In particular, we find that P(g) is Gaussian in the quasi-1D metal regime and log-normal in the quasi-1D insulator regime. In the crossover regime, P(g) exhibits highly nontrivial forms, whose shapes coincide with the results obtained from the Dorokhov-Mello-Pereyra-Kumar equation of a weakly disordered quasi-1D wire in the absence of time-reversal symmetry. Our results suggest that P(g) is fully determined by the average conductance, independent of the details of the system, in agreement with the single-parameter scaling hypothesis.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

Quantitative study of the effect of grain boundary parameters on the slip system level Hall-Petch slope for basal slip system in Mg-4Al

Several theoretical studies have reported that the geometry and structure of grain boundaries in polycrystalline materials could impose a significant effect on the Hall-Petch slope. However, experimental observations are primarily limited by the ability of the techniques to accurately quantify the grain boundary strength and validate these theoretical models. Using high-resolution electron backscatter diffraction (HR-EBSD), the local stress tensor ahead of a slip band blocked by a grain boundary was quantified and coupled with a continuum dislocation pile-up model to assess the barrier strength of specific grain boundaries to specific slip systems, referred to as micro-Hall-Petch coefficient. For basal slip system in a deformed Mg-4Al alloy, the micro-Hall-Petch coefficient ($k^{basal}_{μ}$) varied significantly, from 0.054 to 0.184 MPa - m 1/2 for nine different grain boundaries. These results were correlated with geometric descriptors of the respective grain boundaries, with three-dimensional GB profile additionally measured via focused ion beam milling. It was found that the angle between the two slip plane traces on the grain boundary plane was the most sensitive parameter affecting $k^{basal}_{μ}$, followed by the angle between the slip directions. A functional form for calculation of $k^{basal}_{μ}$ depending on these two angles is proposed to augment crystal plasticity constitutive models with slip resistance dependent on some measure of the grain size. The method allows a new pathway to calibrate grain size strengthening parameters in crystal plasticity models, allowing further computational investigations of the interrelationship between texture, grain morphology, and the Hall Petch effect.

36 MATERIALS SCIENCE↗