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Robust perpendicular magnetic anisotropy in off-axis sputtered europium iron garnet (EuIG) thin films
In this study, the rare earth iron garnet (REIG), Eu 3 Fe 5 O 12 (EuIG) has emerged as a promising material for ferrimagnetic insulator based spintronics. Earlier studies have shown that perpendicular magnetic anisotropy (PMA) in EuIG and other REIGs can be achieved by magnetostriction and misfit strain at the film-substrate interface. Typically, the strain relaxes significantly with thickness, limiting the thickness of films that can be grown using this strategy. Here we show PMA that does not reduce substantially with thickness in epitaxial EuIG films grown by off-axis sputtering; The PMA remains robust in films > 100 nm thick. Epitaxially induced strain with minimal relaxation is confirmed using high resolution symmetric and asymmetric x-ray diffraction reciprocal space maps.
On the elastic problem of representative volume element for multiphase thin films
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Atomic layer deposition and other thin film deposition techniques: from principles to film properties
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Microstructural analysis of novel Gd2Ti2O7 thin films processed via sputter deposition
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Investigation of CrMnV and CrMnTiV multi principal element alloys thin films for use as exit windows of electron beam accelerators
Here, this study explores CrMnV and CrMnTiV multi principal element alloy (MPEA) films as candidates for electron beam exit windows in industrial, high-power accelerators. Films were deposited via magnetron sputtering on various substrates and exposed to 66 kGy of 10 MeV e-beam irradiation. Structural and mechanical properties were analyzed using FESEM, XRD, and nanoindentation. CrMnTiV films exhibited superior grain uniformity and hardness, regardless of the substrate type. Compared to bulk materials, both MPEA films demonstrated higher hardness and excellent radiation resistance. These results highlight the potential of MPEA films as durable, radiation-tolerant materials for high-performance accelerator exit window applications.
Frequency-dependent suppression of field-induced polarization rotation in relaxor ferroelectric thin films
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Sorption-enhanced thin film composites with metal-organic polyhedral nanocages for CO2 separation
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Comparing methods for measuring thickness, refractive index, and porosity of mesoporous thin films
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Engineering shallow and deep level defects in $\kappa$-Ga 2 O 3 thin films: comparing metal-organic vapour phase epitaxy to molecular beam epitaxy and the effect of annealing treatments
Orthorhombic gallium oxide (κ-Ga 2 O 3 ) is an ultra-wide bandgap semiconductor with great potential in new generation electronics. Its application is hindered at present by the limited physical understanding of the relationship between synthesis and functional properties. This work discusses the effects of growth method (metal-organic vapour phase epitaxy and molecular beam epitaxy) as well as annealing treatments in different atmospheres (O 2 , H 2 ) on point defects in κ-Ga 2 O 3 layers epitaxially grown on c-plane sapphire. Comprehensive experimental characterization by X-ray diffraction, photo current-as well as photoluminescence excitation spectroscopy, and X-ray photo electron spectroscopy is combined with first principles calculations of the point defects’ formation and complex-dissociation energies. We demonstrate that for κ-Ga 2 O 3 the concentration of shallow and deep level defects can be sensitively controlled through annealing treatments at temperatures (T = 500 °C) well below the thermal stability threshold of this polymorph. In particular, our results suggest that hydrogen-related defects (e.g., H-interstitials, Ga-vacancies—H complexes) play a key role in this process. While we provide direct exemplary implications of our results for the performances of κ-Ga 2 O 3 based photodetectors, these findings are predicted to impact further application fields of κ-Ga 2 O 3 , such as high electron mobility transistors or memory devices.
Au nanopillar array prepared by selective etching of Au-Sr3Al2O6 vertically aligned nanocomposite thin films
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Asymmetrical [1]Benzothieno[3,2-b][1]benzothiophene (BTBT) derivatives for organic thin-film and single-crystal transistors
Abstract not provided