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At least 1,081 records · Page 60

A passive measurement of dissociated atom densities in atmospheric pressure air discharge plasmas using vacuum ultraviolet self-absorption spectroscopy

We demonstrate a method for determining the dissociation degree of atmospheric pressure air discharges by measuring the self-absorption characteristics of vacuum ultraviolet radiation from O and N atoms in the plasma. The atom densities are determined by modeling the amount of radiation trapping present in the discharge, without the use of typical optical absorption diagnostic techniques which require external sources of probing radiation into the experiment. For an 8.0 mm spark discharge between needle electrodes at atmospheric pressure, typical peak O atom densities of 8.5 × 10{sup 17} cm{sup −3} and peak N atom densities of 9.9 × 10{sup 17} cm{sup −3} are observed within the first ∼1.0 mm of plasma near the anode tip by analyzing the OI and NI transitions in the 130.0–132.0 nm band of the vacuum ultraviolet spectrum.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Design Considerations for the Implementation of a High-Field-Side Transient CHI System on QUEST

Transient coaxial helicity injection (T-CHI), a method first developed on the small helicity injected torus (HIT-II) experiment and then validated on the much larger National Spherical Torus Experiment (NSTX) device, is a method to initiate an inductive-like tokamak plasma discharge without reliance on the central solenoid. A CHI discharge is initiated by driving current along magnetic flux that connects the inner and outer divertor plates on one end of the tokamak. To permit this, on both HIT-II and NSTX, toroidal ceramic insulators were used to electrically separate the inner and outer vessel components. The use of such large toroidal vacuum insulators may not be easy to implement in reactors. To address this issue, the Q-shu University experiments with steady-state spherical tokamak (ST) (QUEST) is developing a reactor-relevant CHI configuration in which one of the divertor plates is electrically insulated from the rest of the vessel. The first application of T-CHI on QUEST biased the CHI electrode to the outer vessel. While the CHI discharges could be easily generated, it was found that as the discharge filled the vessel, the separation distance between the injector magnetic flux footprints widened, a condition that is not favorable for the generation of closed flux surfaces. Biasing the electrode to the inner wall is a configuration similar to that used on NSTX and HIT-II, but initial testing in this configuration has proved to be challenging. The design described here overcomes the present limitation by locating the CHI electrode much closer to the CHI injector flux coil and using an NSTX-like gas injection manifold to enable high-field-side T-CHI startup on QUEST. Finally, the concepts described in this article should also benefit the future implementation of T-CHI systems in other tokamaks and spherical tokamaks.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Wall current probe: A non-invasive in situ plasma diagnostic for space and time resolved current density distribution measurement

In the context of low temperature plasma research, we propose a wall current probe to determine the local charged particle fluxes flowing to the chamber walls. This non-intrusive planar probe consists of an array of electrode elements which can be individually biased and for which the current can be measured separately. We detail the probe properties and present the ability of the diagnostic to be used as a space and time resolved measurement of the ion and electron current density at the chamber walls. This diagnostic will be relevant to study the electron transport in magnetized low-pressure plasmas.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

Flash (Ultra-Rapid) Spark-Plasma Sintering of Silicon Carbide

A new ultra-rapid process of flash spark plasma sintering is developed. The idea of flash spark plasma sintering (or flash hot pressing - FHP) stems from the conducted theoretical analysis of the role of thermal runaway phenomena for material processing by flash sintering. The major purpose of the present study is to theoretically analyze the thermal runaway nature of flash sintering and to experimentally address the challenge of uncontrollable thermal conditions by the stabilization of the flash sintering process through the application of the external pressure. The effectiveness of the developed FHP technique is demonstrated by the few seconds–long consolidation of SiC powder in an industrial spark plasma sintering device. Specially designed sacrificial dies heat the pre-compacted SiC powder specimens to a critical temperature before applying any voltage to the powder volume and allowing the electrode-punches of the SPS device setup to contact the specimens and pass electric current through them under elevated temperatures. The experimental results demonstrate that flash sintering phenomena can be realized using conventional SPS devices. The usage of hybrid heating SPS devices is pointed out as the mainstream direction for the future studies and utilization of the new flash hot pressing (ultra-rapid spark plasma sintering) technique.

36 MATERIALS SCIENCE↗

Spatial separation and motion of electric charges arising due to the interaction of high-power IR laser radiation with water

We have studied temporal and amplitude characteristics of the electrical signal arising under irradiation of the free water surface by a 2.94-{mu}m high-power laser. The investigations have been conducted using a specially designed electrode system, which makes it possible to record the motion of the electric charge after the end of the laser pulse. We have measured the dependences of the signal parameters on the radiation energy density at the water surface. (interaction of laser radiation with matter)

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Design for megavolt inverse-pinch plasma switch

To meet the requirements for the output switch of an ultra-high-power (greater than 30 GW) pulser, an upgrading design for an inverse-pinch plasma switch (INPIS) is considered. The hold-off voltage of 1 MV is met by adopting multistage rim-fire electrodes and using SF6 as the dielectric gas of the switch. The inductance and capacitance of the switch, which are restricted by the short rise-time (less than 0.1 microsec) requirement, were met by adjusting the dimensions of the coaxial electrodes of the switch. The input/output transmission lines attached to the switch will be immersed in oil to meet the high voltage insulation and impedance-matching requirements. Since the forwarding current is relatively low with respect to the switch capability, the lifetime of the switch is expected to exceed the requirement of 10,000 shots.

Lee, Ja H.↗

Improved plasma torch for ignition and flame holding in supersonic combustion

A plasma torch system designed for ignition and flame-holding in supersonic combustion studies has been modified, in order to decrease electrode wear and increase stability, through the incorporation of a flow swirler in the gas inlet that adds vortex-stabilization to the arc. The torch body was redesigned in order to achieve superior alignment of the electrodes; the electrode gap was made continuously adjustable, thereby allowing fine tuning during torch operation. Table operation of the improved torch has been demonstrated in pure nitrogen, eliminating the requirement of argon gas for arc stabilization.

O'Brien, W. F.↗

Patterning of Indium Tin Oxide Films

A relatively rapid, economical process has been devised for patterning a thin film of indium tin oxide (ITO) that has been deposited on a polyester film. ITO is a transparent, electrically conductive substance made from a mixture of indium oxide and tin oxide that is commonly used in touch panels, liquid-crystal and plasma display devices, gas sensors, and solar photovoltaic panels. In a typical application, the ITO film must be patterned to form electrodes, current collectors, and the like. Heretofore it has been common practice to pattern an ITO film by means of either a laser ablation process or a photolithography/etching process. The laser ablation process includes the use of expensive equipment to precisely position and focus a laser. The photolithography/etching process is time-consuming. The present process is a variant of the direct toner process an inexpensive but often highly effective process for patterning conductors for printed circuits. Relative to a conventional photolithography/ etching process, this process is simpler, takes less time, and is less expensive. This process involves equipment that costs less than $500 (at 2005 prices) and enables patterning of an ITO film in a process time of less than about a half hour.

Immer, Christopher↗

Low-Temperature Production of Cosmic Grains Analogs From Gas-Phase Molecular Precursors with the NASA Ames' COSmIC Facility

Complex carbon molecules and ions are ubiquitous in space and form the building blocks of carbonaceous cosmic dust grains, ultimately contributing to the formation of planets. Here, we report the first experimental investigations of the low temperature chemical pathways leading to the production of cosmic grain analogs from gas phase molecular precursors in order to better understand the evolution of cosmic carbon. The experiments were performed using the COsmic SImulation Chamber (COSmIC) to generate and characterize grains formed from gas phase precursors under controlled conditions representative of astrophysical environments [1]. Using COSmIC, it is possible to investigate the evolution of cosmic carbon from the formation of neutral and ionized gas phase hydrocarbons and PAHs [2], to carbon grains [3, 4]. This is achieved by using a discharge nozzle to (1) produce an adiabatic jet expansion and cool down Ar-hydrocarbon/PAH gas mixtures to astrophysically relevant temperature (150 K) before inducing chemistry by generating a plasma discharge in the stream of the expansion. This plasma-induced chemistry results in the formation of complex molecules and solid particles, analogs of cosmic grains. Solid grains are produced in-situ in the plasma expansion, carried by the accelerated gas in the expansion, and collected on substrates placed a few centimeters downstream of the electrodes. The results of a preliminary solid phase ex-situ analysis of cosmic grain analogs produced at low temperature in COSmIC from gas mixtures including molecular precursors of cosmic carbon grains, i.e., such as CH4 and C2H2 found in circumstellar ejecta of late C stars [3] as well as PAHs ubiquitously detected in IR emission bands seen in galactic and extragalactic environments [4] will be discussed. Scanning Electron Microscopy imaging was used to provide insight on the morphology and growth structure of the grains produced in COSmIC, and to investigate how the precursors used to produce the grains affect these parameters [3]. Laser desorption mass spectrometry was used to identify the molecules making up the main structures within the condensed grains [4]. NIR to FIR optical properties are characterized to provide critical information (functional groups, optical constants) to the scientific community, for use in radiative transfer models in particular, and to help decipher and enhance the return data from space observations.

F. Salama↗

GaN vertical-channel junction field-effect transistors with regrown p-GaN by metal organic chemical vapor deposition (MOCVD)

Fabricating a vertical-channel junction field-effect transistor includes forming an unintentionally doped GaN layer on a bulk GaN layer by metalorganic chemical vapor deposition, forming a Cr/SiO 2 hard mask on the unintentionally doped GaN layer, patterning a fin by electron beam lithography, defining the Cr and SiO 2 hard masks by reactive ion etching, improving a regrowth surface with inductively coupled plasma etching, removing hard mask residuals, regrowing a p-GaN layer, selectively etching the p-GaN layer, forming gate electrodes by electron beam evaporation, and forming source and drain electrodes by electron beam evaporation. The resulting vertical-channel junction field-effect transistor includes a doped GaN layer, an unintentionally doped GaN layer on the doped GaN layer, and a p-GaN regrowth layer on the unintentionally doped GaN layer. Portions of the p-GaN regrowth layer are separated by a vertical channel of the unintentionally doped GaN layer.

Zhao, Yuji↗

The effect of a direct current field on the microparticle charge in the plasma afterglow

Residual charges of individual microparticles forming dense clouds were measured in a RF discharge afterglow. Experiments were performed under microgravity conditions on board the International Space Station, which ensured particle levitation inside the gas volume after the plasma switch-off. The distribution of residual charges as well as the spatial distribution of charged particles across the cloud were analyzed by applying a low-frequency voltage to the electrodes and measuring amplitudes of the resulting particle oscillations. Upon “free decharging” conditions, the charge distribution had a sharp peak at zero and was rather symmetric (with charges concentrated between −10e and +10e), yet positively and negatively charged particles were homogeneously distributed over the cloud. However, when decharging evolved in the presence of an external DC field (applied shortly before the plasma switch-off) practically all residual charges were positive. In this case, the overall charge distribution had a sharp peak at about +15e and was highly asymmetric, while the spatial distribution exhibited a significant charge gradient along the direction of the applied DC field.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Generation of uniform large-area very high frequency plasmas by launching two specific standing waves simultaneously

With the characteristics of higher electron density and lower ion bombardment energy, large-area VHF (very high frequency) plasma enhanced chemical vapor deposition has become an essential manufacturing equipment to improve the production throughput and efficiency of thin film silicon solar cell. However, the combination of high frequency and large electrodes leads to the so-called standing wave effect causing a serious problem for the deposition uniformity of silicon thin film. In order to address this issue, a technique based on the idea of simultaneously launching two standing waves that possess similar amplitudes and are out of phase by 90° in time and space is proposed in this study. A linear plasma reactor with discharge length of 54 cm is tested with two different frequencies including 60 and 80 MHz. The experimental results show that the proposed technique could effectively improve the non-uniformity of VHF plasmas from >±60% when only one standing wave is applied to <±10% once two specific standing waves are launched at the same time. Moreover, in terms of the reactor configuration adopted in this study, in which the standing wave effect along the much shorter dimension can be ignored, the proposed technique is applicable to different frequencies without the need to alter the number and arrangement of power feeding points.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

Plasma-induced flow instabilities in atmospheric pressure plasma jets

Pulsed plasma excitation of rare gases flowing into air has been shown to impact the stability of the flow in non-equilibrium atmospheric pressure plasma jets (APPJs). In this paper, the results from a numerical modeling investigation of the stability of a round He APPJ with a powered electrode exposed to the gas flow are discussed. Localized gas heating at the powered electrode occurs on the time scale of the voltage pulse, tens to 100 ns, which is short compared to the fluid timescales. An acoustic wave propagates from this heated, expanding gas and exits the jet. The wave disturbs the shear layer between the He and surrounding humid air, exciting a shear instability which grows downstream with the flow and increases the mixing of the humid air into the He. The effects of the eddy-dominated flow on ionization wave (IW) propagation in an APPJ were investigated. The IW followed the regions of the highest helium concentration, resulting in an increased production of NO, HO 2 , and NO 2 .

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Mass spectrometer for measurements of relative ion concentrations in plasmas

A mass spectrometer which can be used to measure relative ion concentrations in a multiion component plasma has been designed for use in a strong (1-4-kG) uniform magnetic field. The spectrometer features an acceleration region which accelerates thermal ions through a series of three tantalum electrodes at a 30 deg angle to the B field, and a collection region in which ions are selectively collected, depending on the size of their gyroradii, by a cylindrical collector. Relative ion concentrations are determined from measurements of the collector current as a function of accelerating voltage. Results obtained using this instrument in a Q-machine device operated with a two-ion (Cs+/K+) component plasma are presented.

Suszcynsky, David M.↗

Study of the homogeneity of the current distribution in a dielectric barrier discharge in air by means of a segmented electrode

The current distribution in a dielectric barrier discharge in atmospheric-pressure air at a natural humidity of 40–60% was studied experimentally with a time resolution of 200 ps. The experimental results are interpreted by means of numerically simulating the discharge electric circuit. The obtained results indicate that the discharge operating in the volumetric mode develops simultaneously over the entire transverse cross section of the discharge gap.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Non-ideal operating conditions of the ion source prototype for the ITER neutral beam injector due to thermal deformation of the support structure

The beam formation and acceleration of the ITER neutral beam injector will be studied in the full-scale ion source, Source for Production of Ions of Deuterium Extracted from a RF plasma (SPIDER). It will be able to sustain 40 A deuterium ion beam during 1-h pulses. The operating conditions of its multi-aperture electrodes will diverge from ideality, as a consequence of inhomogeneous heating and thermally induced deformations in the support structure of the extraction and acceleration grids, which operate at different temperatures. Meeting the requirements on the aperture alignment and distance between the grids with such a large number of apertures (1280) and the huge support structures constitute a challenge. Examination of the structure thermal deformation in transient and steady conditions has been carried out, evaluating their effect on the beam performance: the paper describes the analyses and the solutions proposed to mitigate detrimental effects.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗