In-plane and out-of-plane defectivity in thin films of lamellar block copolymers
We investigate the ordering of poly(styrene-b-methyl methacrylate) (PS-PMMA) lamellar copolymers (periodicity L 0 = 46 nm) confined between a free surface and brushed poly(styrene-r-methyl methacrylate) silicon substrate. The processing temperature was selected to eliminate wetting layers at the top and bottom interfaces, producing approximately neutral boundaries that stabilize perpendicular domain orientations. The PS-PMMA film thickness (t = 0.5L 0 –2.5L 0 ) and brush grafting density (Σ = 0.2–0.6 nm –2 ) were systematically varied to examine their impacts on in-plane and out-of-plane ordering. Samples were characterized with a combination of high-resolution microscopy, X-ray reflectivity, and grazing-incidence small-angle X-ray scattering. In-plane order at the top of the film (quantified through calculation of orientational correlation lengths) improved with t n , where the exponent n increased from 0.75 to 1 as Σ decreased from 0.6 to 0.2 nm –2 . Out-of-plane defects such as tilted domains were detected in all films, and the distribution of domain tilt angles was nearly independent of t and Σ. These studies demonstrate that defectivity in perpendicular lamellar phases is three-dimensional, comprised of in-plane topological defects and out-of-plane domain tilt, with little or no correlation between these two types of disorder. As a result, strong interactions between the block copolymer and underlying substrate may trap both kinds of thermally generated defects.