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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 109 records · Page 6
All sourcesNASA NTRSDOE OSTI
NASA NTRS1979

Automated Plasma Spray (APS) process feasibility study: Plasma spray process development and evaluation

An automated plasma spray (APS) process was developed to apply two layer (NiCrAlY and ZrO2-12Y2O3) thermal-barrier coatings to aircraft gas turbine engine blade airfoils. The APS process hardware consists of four subsystems: a mechanical blade positioner incorporating two interlaced six-degree-of-freedom assemblies; a noncoherent optical metrology subsystem; a microprocessor-based adaptive system controller; and commercial plasma spray equipment. Over fifty JT9D first stage turbine blades specimens were coated with the APS process in preliminary checkout and evaluation studies. The best of the preliminary specimens achieved an overall coating thickness uniformity of + or - 53 micrometers, much better than is achievable manually. Factors limiting this performance were identified and process modifications were initiated accordingly. Comparative evaluations of coating thickness uniformity for manually sprayed and APS coated specimens were initiated. One of the preliminary evaluation specimens was subjected to a torch test and metallographic evaluation.

Fetheroff, C. W.↗
NASA NTRS2006

Rapid Fabrication of Lightweight SiC Optics using Reactive Atom Plasma (RAP) Processing

Reactive Atom Plasma (RAP) processing is a non-contact, plasma-based processing technology that can be used to generate damage-free optical surfaces. We have developed tools and processes using RAP that allow us to shape extremely lightweight mirror Surfaces made from extremely hard-to-machine materials (e.g. SiC). We will describe our latest results using RAP in combination with other technologies to produce finished lightweight SiC mirrors and also discuss applications for RAP in the rapid fabrication of mirror segments for reflective and grazing incidence telescopes.

Fiske, Peter S.↗
NASA NTRS1989

Plasma flow processes within magnetic nozzle configurations

An attempt is made to separate the interactive processes occurring in electromagnetic devices and to examine the acceleration of ionized gas within magnetic fields which can guide it through an expansion process. The plasma was generated in a single turn coil 50 cm long with a radius of 5.25 cm which surrounded a quartz tube with an internal radius of 3.81 cm and a length of 100 cm. Choking was found to occur at both sonic and cusp velocities which were coincident in the present experiment.

York, Thomas M.↗
NASA NTRS1987

An experimental investigation of the plasma contacting process

Measurements including plasma potential profile measurements made on a simple hollow cathode plasma contactor operating in the electron collection and emission modes are described. The ignited electron collection mode of contactor operation is identified, shown to improve contactor performance and found to be facilitated by increasing the size of the contactor anode. Potential profile data are compared to the predictions of a simple theoretical model that describes space-charge-current limitations imposed by the formation of a double sheath and found to agree with each other to within about + or - 25 percent. Because electrons, which are the dominant charge carriers, tend to be emitted from the hollow cathode in the emission mode and collected by the anode in the collection mode it is suggested that operation at high electrodynamic tether currents will probably require switching the point of tether connection to the contactor between its cathode and anode when the direction of tether current is reversed.

Wilbur, Paul J.↗
NASA NTRS1988

Experimental validation of a phenomenological model of the plasma contacting process

A preliminary model of the plasma coupling process is presented which describes the phenomena observed in ground-based experiments using a hollow cathode plasma contactor to collect electrons from a dilute ambient plasma under conditions where magnetic field effects can be neglected. The locations of the double-sheath region boundaries are estimated and correlated with experimental results. Ion production mechanisms in the plasma plume caused by discharge electrons from the contactor cathode and by electrons streaming into the plasma plume through the double-sheath from the ambient plasma are also discussed.

Williams, John D.↗
NASA NTRS2004

Sensor for Monitoring Nanodevice-Fabrication Plasmas

The term plasma process diagnostics (PPD) refers to a spectroscopic technique and sensing hardware that have been proposed for monitoring plasma processes used to fabricate electronic devices that feature sizes as small as several nanometers. Nanometer dimensions are characteristic of the quantum level of miniaturization, where single impurity atoms or molecules can drastically change the local properties of the nanostructures. Such changes may be purposely used in nanoscale design but may also be extremely damaging or cause improper operation of the fabricated devices. Determination of temperature and densities of reactants near the developing features is important, since the structural synthesis is affected by characteristics of the local microenvironment. Consequently, sensors capable of nonintrusive monitoring with high sensitivity and high resolution are essential for real-time atomistic control of reaction kinetics and minimizing trace contamination in plasma processes used to fabricate electronic nanodevices. Such process-monitoring sensors are required to be compact, multiparametric, and immune to the harsh environments of processing plasmas. PPD is intended to satisfy these requirements. The specific technique used to implement plasma diagnostics with a PPD sensor would be an advanced version of continuous-wave cavity-ringdown spectroscopy (CW-CRDS) capable of profiling spectral line broadenings in order to derive both Doppler and Stark components. CRDS is based on measurements of the rate of absorption of laser light in an optical resonator. The ultimate sensitivity results from a very long absorption path length within the cavity and immunity to variations in incident laser intensity. The proposed version of this technique would involve the use of multiplexing tunable laser diodes and an actively modulated high-reflectivity optical resonator, thus offering a synergistic combination of simplicity, compactness, high sensitivity, and high resolution. The multiplexing capabilities of diode lasers could be utilized to make the PPD sensor a single, simple, compact, and inexpensive tool for the acquisition of multiparametric data. A PPD sensor would be capable of continuous measurement of such physical parameters as gas temperature, gas velocity, electron number density, and absolute densities of reacting chemical species. A laser beam can be easily adjusted to analyze the immediate vicinity of the growing nanostructures (or features etched down) in real time. The absorption enhancement in an optical cavity would afford the sensitivity needed for measurement of the temperature and densities of species at concentrations significantly lower than measurable by other nonintrusive techniques. It is anticipated that fully developed PPD sensors would enable simultaneous measurement of local temperature and determination of plasma species responsible for the synthesis and functionalization of nanodevices. These sensors would also enable tracking the pathways and origins of damaging contaminants, thereby providing feedback for adjustment of processes to optimize them and reduce contamination. The PPD sensors should also be useful for optimization of conventional microelectronics manufacturing plasma processes. Going beyond plasma processes for fabrication of electronic devices, PPD sensors could be used for monitoring of atoms, molecules, ions, radicals, clusters, and particles in a variety of other settings, including outer space. Because of their high sensitivity, such sensors could also prove useful for detecting traces of illegal drugs and explosives.

Bolshakov, Alexander↗
NASA NTRS2002

Self-Consistent Magnetosphere-Ionosphere Coupling and Associated Plasma Energization Processes

Magnetosphere-Ionosphere (MI) coupling and associated with this process electron and ion energization processes have interested scientists for decades and, in spite of experimental and theoretical research efforts, are still ones of the least well known dynamic processes in space plasma physics. The reason for this is that the numerous physical processes associated with MI coupling occur over multiple spatial lengths and temporal scales. One typical example of MI coupling is large scale ring current (RC) electrodynamic coupling that includes calculation of the magnetospheric electric field that is consistent with the ring current (RC) distribution. A general scheme for numerical simulation of such large-scale magnetosphere-ionosphere coupling processes has been presented earlier in many works. The mathematical formulation of these models are based on "modified frozen-in flux theorem" for an ensemble of adiabatically drifting particles in the magnetosphere. By tracking the flow of particles through the inner magnetosphere, the bounce-averaged phase space density of the hot ions and electrons can be reconstructed and the magnetospheric electric field can be calculated such that it is consistent with the particle distribution in the magnetosphere. The new a self-consistent ring current model has been developed that couples electron and ion magnetospheric dynamics with calculation of electric field. Two new features were taken into account in addition to the RC ions, we solve an electron kinetic equation in our model, self-consistently including these results in the solution. Second, using different analytical relationships, we calculate the height integrated ionospheric conductances as the function of precipitated high energy magnetospheric electrons and ions as produced by our model. This results in fundamental changes to the electric potential pattern in the inner magnetosphere, with a smaller Alfven boundary than previous potential formulations would predict but one consistent with recent satellite observations. This leads to deeper penetration of the plasma sheet ions and electrons into the inner magnetosphere and more effective ring current ions and electron energization.

Khazanov, G. V.↗
DOE OSTI2023

A confocal laser-induced fluorescence diagnostic with an annular laser beam

Here, in this work, we report an annular beam confocal laser-induced fluorescence (LIF) configuration, which allows for high spatial resolution measurements of plasma properties in plasma setups and sources with limited optical access. The proposed LIF configuration utilizes the annular laser beam generated by a pair of diffractive axicons. The LIF signal is collected along the main optical axis within the ring region. It is shown experimentally that at a focal distance of 300 mm, a spatial resolution of ~5.3 mm can be achieved. Using geometric optics estimations, we showed that ~1 mm resolution at the same focal distance could potentially be achieved by modifying laser beam parameters. This approaches the localization accuracy of conventional LIF collection methods (with crossing laser beam injection and fluorescence collection optical paths). Measurements of the ion velocity distribution function in an argon plasma using both the confocal LIF with an annular laser beam and conventional LIF demonstrate a satisfactory agreement. The proposed LIF setup has potential applications for diagnostics in various plasma processing equipment and plasma sources, such as hollow cathodes, microplasmas, electric propulsion, etc.

47 OTHER INSTRUMENTATION↗
NASA NTRS1994

Auroral plasma transport processes in the presence of kV potential structures

We have simulated plasma transport processes in the presence of a quasi-two-dimensional current filament, that generated kV potential structure in the auroral region. The simulation consists of a set of one-dimensional flux tube simulations with different imposed time-dependent, field-aligned currents. The model uses the 16 moment system of equations and simultaneously solves coupled continuity and momentum equations and equations describing the transport along the magnetic field lines of parallel and perpendicular thermal energy and heat flows for each species. The lower end of the simulation is at an altitude of 800 km, in the collisional topside ionosphere, while the upper end is at 10 R(sub E) in the magnetosphere. The plasma consists of hot electrons and protons of magnetospheric origin and low-energy electrons, protons, and oxygen ions of ionospheric origin. The dynamical interaction of the individual current filaments with ionospheric and magnetospheric plasma generates a potential structure in the horizontal direction and kilovolt field-aligned potential drops along the field lines. The side-by-side display exhibits the evolution of the implied potential structure in the horizontial direction. In the presence of this potential structure and parallel electric field ionospheric plasma density is depleted and velocity is reduced, while density enhancement and increased velocity is observed in magnetospheric plasma. The ionospheric and magnetospheric electron temperatures increase below 2 R(sub E) due to magnetic mirror force on converging geomagnetic field lines. The primary cross-field motion produced by the horizontal E field (E x B drift) is perpendicular to both of the significant spatial directions and is thus ignorable in this geometry. The effects of other cross-field drift processes are discussed. The simulation thus provides insight into the dynamical evolution of two-dimensional potential structures driven by an imposed finite width, field-aligned current profile.

Ganguli, Supriya B.↗
NASA NTRS1966

Multilayer refractory nozzles produced by plasma-spray process

Multilayer rocket nozzles formed by plasma spraying have good thermal shock resistance and can be reheated in an oxidizing environment without loss of coating adherence. Suggested application of this process are for the production of refractory components, which can be formed as surfaces of revolution.

Bliton, J. L.↗
NASA NTRS2012

Observations and Simulations of Formation of Broad Plasma Depletions Through Merging Process

Broad plasma depletions in the equatorial ionosphere near dawn are region in which the plasma density is reduced by 1-3 orders of magnitude over thousands of kilometers in longitude. This phenomenon is observed repeatedly by the Communication/Navigation Outage Forecasting System (C/NOFS) satellite during deep solar minimum. The plasma flow inside the depletion region can be strongly upward. The possible causal mechanism for the formation of broad plasma depletions is that the broad depletions result from merging of multiple equatorial plasma bubbles. The purpose of this study is to demonstrate the feasibility of the merging mechanism with new observations and simulations. We present C/NOFS observations for two cases. A series of plasma bubbles is first detected by C/NOFS over a longitudinal range of 3300-3800 km around midnight. Each of the individual bubbles has a typical width of approx 100 km in longitude, and the upward ion drift velocity inside the bubbles is 200-400 m/s. The plasma bubbles rotate with the Earth to the dawn sector and become broad plasma depletions. The observations clearly show the evolution from multiple plasma bubbles to broad depletions. Large upward plasma flow occurs inside the depletion region over 3800 km in longitude and exists for approx 5 h. We also present the numerical simulations of bubble merging with the physics-based low-latitude ionospheric model. It is found that two separate plasma bubbles join together and form a single, wider bubble. The simulations show that the merging process of plasma bubbles can indeed occur in incompressible ionospheric plasma. The simulation results support the merging mechanism for the formation of broad plasma depletions.

plasma bubbles↗
DOE OSTI2020

Non-Equilibrium Processes, Stability, Design and Control of Pulsed Plasmas for Materials Processing

The energy and angle of impact of ions, interspersed with fluxes of neutral radicals, on the surface of wafers during plasma materials processing are critical parameters for the fabrication of microelectronic devices, nanostructure materials and biocompatible materials. This sensitivity extends to nearly all applications of plasmas to materials processing and surface modification. Low temperature plasmas for plasma materials processing have traditionally used continuously excited plasmas. However, pulsed plasma processing is an enabling technology for achieving finer resolution of microelectronics fabrication and for producing unique surface properties in a wide range of applications. This research project is addressing fundamental plasma physics issues in materials processing – the control of pulsed plasmas and the means for optimizing plasma produced reactant fluxes.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
NASA NTRS1981

Formation of auroral arcs by plasma sheet processes

It is noted that, in the distant plasma sheet, it is likely that curvature drift is the most important source of drift parallel to the electric field, leading to what is commonly called Fermi acceleration of the particles. The energization mechanism here is proportional to the neutral sheet current density. It is a form of field-aligned acceleration, with rapid lowering of mirror points, caused by the transverse electric field in the plasma sheet. It is noted that the process will work for both negative and positive particles. A filamentation of the neutral current sheet is postulated. Here, the maximum energization by curvature drift and the accompanying intense precipitation will form an auroral band or arc along the sheet of magnetic field lines that maps out to the local enhancement of the crosstail current, explaining inverted V events.

Heikkila, W. J.↗
DOE OSTI2023

Unintended gas breakdowns in narrow gaps of advanced plasma sources for semiconductor fabrication industry

Occurrence of unintended gas breakdown in the narrow gaps of plasma processing chambers is one of the critical challenges in developing advanced plasma sources. Here, we present a combined experimental and theoretical study of unintended discharges in the narrow gaps of plasma processing chambers and report significant drop of the gas breakdown voltage in the presence of a background plasma facing the gap. Experimentally measured breakdown voltages decrease in subsequent breakdown events due to wall erosion caused by the discharge. Therefore, preventing and mitigating the first discharge is of paramount importance. An analysis of kinetic simulation results indicates that the charged particle influx from the background plasma in the processing chamber into the gap is responsible for the onset of early breakdown: higher charged particle density within the gap modifies the electric field profile, allowing unintended breakdowns to occur at a significantly reduced threshold voltage.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗