Hybrid model of atmospheric pressure Ar/O{sub 2}/TiCl{sub 4} radio-frequency capacitive discharge for TiO{sub 2} deposition
A hybrid global-analytical model of an atmospheric pressure radio-frequency driven capacitive discharge is applied to determine the plasma conditions for TiO{sub 2} film deposition. The feed gas is mainly argon with a small fraction of O{sub 2} and a smaller fraction of TiCl{sub 4}. Variations of the discharge parameters and species densities with O{sub 2} concentration, discharge power, and flow rate are determined. A simplified chemistry model is developed and compared with the simulation results, showing good agreement. For a base case with Ar/O{sub 2}/TiCl{sub 4} flow rates of 203/30/0.17 sccm, the results indicate that a minimum O{sub 2} fraction of 7.3 × 10{sup −4} is required for pure (un-chlorinated) TiO{sub 2} film deposition that the active precursor species is TiO{sub 2}Cl{sub 3}, with subsequent abstraction of Cl atoms by dissociative electron attachment and that the deposition rates are around 1 nm/s.