Electron-beam welder alinement
Parts are easily and quickly positioned in welding vacuum chamber with use of inexpensive thin metal-foil plate.
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Parts are easily and quickly positioned in welding vacuum chamber with use of inexpensive thin metal-foil plate.
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Probe uses differentially-pumped drift tube to connect high and low pressure regions thereby allowing higher gas densities to be studied. System uses higher beam voltages (50 kV) and currents (1 mA delivered to gas), and extends boundary layer penetration up to 15.2 cm, and test duration to one hour.
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Ultrasonic equipment and x-y recorder indicate where back side of joint is properly welded. Wire waveguide placed in groove at root of joint to be welded is fused when joint is adequately penetrated. Ultransonic signal moving down waveguide is reflected where guide is melted. Change in reflected-signal arrival time with change in weld-head position is nearly constant unless joint is incompletely penetrated. Method permits determination of penetration depth in preweld samples without opening vacuum chamber and sectioning weld. Technique is particularly valuable when back side of joint is inaccessible.
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A theoretical analysis of the problem of beam steering is presented. The required modifications of the dielectric constant profile of the laser structure were derived. A practical method for implementing the needed modifications is outlined.
Transient emission studies following pulse radiolysis of solid poly(1-vinyl naphthalene) show existence of excited monomers and two excimers. Quenching experiments indicate that excimers are not formed directly by recombination of ions but probably by trapping of migrating monomeric excitation in preformed traps whose density is approximately one in 1000.
Detector using two whirling wires measures focus of beam in electronbeam welder. Multiple-wire beam-sampling method provides for simple nullmeter focus indication easily controlled by operator. Detector not only operates at high beam currents but eliminates need for oscilloscope.
(Previously announced in STAR as N82-25097)
Previously cited in issue 06, p. 906, Accession no. A82-17804
Previously cited in issue 06, p. 945, Accession no. A82-17806
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The limb flare of November 18, 1980, 14:51 UT, was investigated on the basis of X-ray images taken by the Hard X-ray Imaging Spectrometer (HXIS) and of X-ray spectra from the Hard X-Ray Burst Spectrometer (HXRBS) aboard the Solar Maximum Mission (SMM). The impulsive burst was also recorded at microwave frequencies between 2 and 20 GHz whereas no optical flare and no radio event at frequencies below 1 GHz were reported. The flare occurred directly at the SW limb of the solar disk. Taking advantage of the spatial resolution of HXIS images, the time evolution of the X-radiation originating from relatively small source regions can be studied. Using Monte Carlo computations of the energy distribution of energetic electrons traversing the solar plasma, the bremsstrahlung spectra produced by the electrons were derived.
During active beam experiments, the presence of high neutral densities at low altitudes and/or during thruster firings has been observed to modify the spacecraft charging and the properties of the beam. Two-dimensional (three-velocity) electromagnetic particle simulations with ionizing collisions incorporated are used to investigate the modification of the beam-plasma interaction as the neutral density is increased. It is shown that when the spacecraft is uniformly immersed in a neutral cloud, most of the ionization is produced by direct ionization by the beam and its secondaries, rather than via vehicle-induced or wave-induced ionization for the neutral densities considered.
State-of-the-art diffractive optics are fabricated using e-beam lithography and dry etching techniques to achieve multilevel phase elements with very high diffraction efficiencies. One of the major challenges encountered in fabricating diffractive optics is the small feature size (e.g. for diffractive lenses with small f-number). It is not only the e-beam system which dictates the feature size limitations, but also the alignment systems (mask aligner) and the materials (e-beam and photo resists). In order to allow diffractive optics to be used in new optoelectronic systems, it is necessary not only to fabricate elements with small feature sizes but also to do so in an economical fashion. Since price of a multilevel diffractive optical element is closely related to the e-beam writing time and the number of etching steps, we need to decrease the writing time and etching steps without affecting the quality of the element. To do this one has to utilize the full potentials of the e-beam writing system. In this paper, we will present three diffractive optics fabrication techniques which will reduce the number of process steps, the writing time, and the overall fabrication time for multilevel phase diffractive optics.