Sticking probabilities for the adsorption of hydrogen on clean Ni/111/, Ni/100/, Ni sheet and evaporated Ni films
Determination of the sticking probability for hydrogen adsorption on clean Ni(111), Ni(100), polycrystalline nickel sheet, and polycrystalline evaporated nickel films, using a modification of the reflection detector technique of Horgan and King (1970) for metal films. The initial sticking probability for hydrogen adsorption on a nickel film at 300 K by the proposed method is found to be 0.25 in comparison to 0.35 for hydrogen adsorption on a nickel film using the reflection detector technique. Also, the sticking probabilities on smooth single-crystal (111) and (100) planes and polycrystalline sheets are found to be lower than those on the rougher polycrystalline nickel films.