Effect of HfO{sub 2} on the dielectric, optoelectronic and energy harvesting properties of PVDF
In this article, energy recovery based on PVDF doped with HfO{sub 2} is proposed. The free energy of CH{sub 2}=CF{sub 2} is determined in different base with the B3LPY functional. The basis set LanL2DZ was chosen because it takes into account the atom of hafnium of atomic number Z=72 which exceeds the extension of some basis sets. In addition, LanL2DZ gives an accurate result and a reasonable computing time. The geometries of the molecules were optimized with B3LPY/LanL2DZ. The motivation of this study is the improvement of the optoelectronic, dielectric and piezoelectric properties of PVDF by introducing HfO{sub 2} into its matrix. We determined the parameters of (−CH{sub 2}−CF{sub 2}−){sub 3}⋅xHfO{sub 2} and identified the effect of HfO{sub 2} on the PVDF. It appears that the permittivity of the modified PVDF increases. When the PVDF is doped once or twice, a fluorine atom is captured by the hafnium. The migration of fluorine towards HfO{sub 2} considerably favors the electric polarization of the molecule. It then results in an important dipole moment with a polar phase undoubtedly favored. Our results show that the molecule (−CH{sub 2}−CF{sub 2}−){sub 3}⋅HfO{sub 2} is a good dielectric material (E{sub g}=5.90 eV) and can be a good piezoelectric material. The electronic affinity of the modified PVDF is significantly higher than that of virgin PVDF. This demonstrates that HfO{sub 2}-doped PVDF is more stable than virgin PVDF. The piezoelectric properties are significantly improved. The piezoelectric coefficient varies between 13.111 and 25.635 pC N{sup −1} for the modified PVDF compared to 11.979 pC N {sup −1} for the virgin PVDF. In conclusion, HfO{sub 2} improves the dielectric, optoelectronic and piezoelectric properties of PVDF.