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At least 883 records · Page 49

A surface mechanism for O 3 production with N 2 addition in dielectric barrier discharges

Ozone, O 3 , is a strong oxidizing agent often used for water purification. O 3 is typically produced in dielectric barrier discharges (DBDs) by electron-impact dissociation of O 2 , followed by three-body association reactions between O and O 2 . Previous studies on O 3 formation in low-temperature plasma DBDs have shown that O 3 concentrations can drop to nearly zero after continued operation, termed the ozone-zero phenomenon (OZP). Including small (<4%) admixtures of N 2 can suppress this phenomenon and increase the O 3 production relative to using pure O 2 in spite of power deposition being diverted from O 2 to N 2 and the production of nitrogen oxides, N x O y . The OZP is hypothesized to occur because O 3 is destroyed on the surfaces in contact with the plasma. Including N 2 in the gas mixture enables N atoms to occupy surface sites that would otherwise participate in O 3 destruction. The effect of N 2 in ozone-producing DBDs was computationally investigated using a global plasma chemistry model. A general surface reaction mechanism is proposed to explain the increase in O 3 production with N 2 admixtures. The mechanism includes O 3 formation and destruction on the surfaces, adsorption and recombination of O and N, desorption of O 2 and N 2 , and NO x reactions. Without these reactions on the surface, the density of O 3 monotonically decreases with increasing N 2 admixture due to power absorption by N 2 leading to the formation of nitrogen oxides. With N-based surface chemistry, the concentrations of O 3 are maximum with a few tenths of percent of N 2 depending on the O 3 destruction probability on the surface. The consequences of the surface chemistry on ozone production are less than the effect of gas temperature without surface processes. An increase in the O 3 density with N-based surface chemistry occurs when the surface destruction probability of O 3 or the surface roughness was decreased.

54 ENVIRONMENTAL SCIENCES↗

Alkali Cation Inhibition of Imidazolium-Mediated Electrochemical CO 2 Reduction on Silver

Imidazolium-based ionic liquids have led to enhanced CO 2 electroreduction activity due to cation effects at the cathode surface, stabilizing the reaction intermediates and decreasing the activation energy. In aqueous media, alkali cations are also known to improve CO 2 reduction activity on metals such as Ag, with the enhancement attributed to electrical double layer effects and trending with the size of the alkali cation. However, the effect of a mixed catholyte solution of alkali cations in the presence of an imidazolium-based ionic liquid has not been well-explored. Herein, 1-ethyl-3-methylimidazolium tetrafluoroborate, [EMIM][BF 4 ], in water was investigated with alkali salts to unravel the interaction effects for CO 2 electroreduction on Ag. Although both [EMIM] + and alkali cations have individually improved CO 2 to CO conversion on Ag in water, electrochemical results showed that alkali cations hindered imidazolium-mediated CO 2 electroreduction in most conditions. Li + , in particular, was sharply inhibitory compared to other alkali cations and strongly redirected the selectivity to hydrogen evolution. The nature of the alkali cation inhibition was investigated with spectroscopic techniques, including in situ surface-enhanced Raman spectroscopy (SERS) and dynamic electrochemical impedance spectroscopy (DEIS). Along with computational insights from density functional theory (DFT), the electrochemical and spectroscopic data suggest that alkali cations inhibit [EMIM]-mediated CO 2 reduction by competing for surface adsorption sites, preventing the potential-dependent structural reorientation of imidazolium, and promoting hydrogen evolution by bringing solvated water to the cathode surface.

cations↗

Electrochemical Corrosion of SIMFUEL: Effects of dissolved H2 and noble metal particles

This report describes the results from electrochemical corrosion tests that were conducted using simulated spent fuel (SIMFUEL) materials comprised of UO2 and surrogate fission products. Two SIMFUEL compositions were tested to quantify the effect of noble metal inclusions and dissolved H2 on the UO2 dissolution rate. One material consisted of UO2 with added lanthanide oxides (UO2 N) and the other consisted of UO2 with added lanthanide oxides and noble metals (UO2-H) at concentrations to simulate high burnup fuel. The electrochemical corrosion tests on the SIMFUEL materials were conducted in aqueous electrolyte solutions (pH 10) that were either saturated with air or purged with a H2/Ar gas mixture to maintain a constant dissolved H2 concentration. The results from electrochemical corrosion tests on SIMFUEL can be applied to qualitatively understand and also quantify the separate effects of water chemistry and fuel composition on the degradation behavior of the UO2 matrix. Open circuit potential (OCP) measurements on a SIMFUEL material of known composition (i.e., known fraction of NMPs at the fuel surface) immersed in a known solution chemistry (i.e., pH, Eh, [O2], [H2]) at known temperature provide qualitative insight into the degradation behavior of the UO2 matrix. If the OCP is above the threshold potential at which the oxidative dissolution of U(IV) to U(VI) occurs, the SNF is expected to degrade by oxidative processes under the experimental conditions. The net currents that are measured during potentiostatic tests, during which the surface potential of the SIMFUEL material is fixed by a potentiostat, can be used to quantify the UO2 degradation rate and optimize the rate constant values used in the Fuel Matrix Degradation Model (FMDM) for half reactions that occur on the SNF surface. Specifically, electrochemical measurements enable the estimation of the total anodic current at ECORR–which is the surface potential at which the total anodic and total cathodic currents are equal–so that the rate constant values for key reactions can be calculated. The open circuit potential measurements, potentiostatic tests, surface property measurements (scanning electron microscopy images and electrochemical impedence spectroscopy plots), and solution elemental composition analyses are being performed to update and optimize the FMDM. A case study is presented herein to show how electrochemical corrosion test results and accompanying characterization results for the UO2 N material in air-saturated solution can be used to validate the SNF surface reaction module of the FMDM. Future electrochemical tests will be conducted to provide quantitative information on the effects of NM content (burnup), H2 concentration, water chemistry, temperature, and galvanic couples with cladding and EBS alloys on UO2 degradation that can be used to improve the accuracy and functionality of the FMDM.

Thomas, Sara↗

Tracking the prelude of the electroreduction of carbon monoxide via its interaction with Cu(100): Studies by operando scanning tunneling microscopy and infrared spectroscopy

The first isolable intermediate in the electrochemical reduction of carbon dioxide is carbon monoxide. This species, or its hydrated form, formic acid, is also the primary end product from all but a handful of metallic electrodes; with the latter, hydrogen gas is generated, but it emanates from the reduction of water and not from CO 2 . Only one electrode material, zerovalent copper, can spawn, in greater-than-trace quantities, a variety of species that are more highly reduced than CO. Hence, if the aim is to pursue a reaction trail of the reduction of CO 2 to products other than CO, it would be both logical and expedient to track the electrocatalytic reaction of CO itself. Heterogeneous electrocatalysis is a surface phenomenon; it transpires only when the reactant, CO in this case, chemisorbs on, or chemically interacts with, the Cu electrode surface. There is no electrocatalytic reaction if there is no CO adsorption. In ultrahigh vacuum, no CO resides on the Cu(100) surface at temperatures higher than 200 K. However, under electrochemical conditions, CO is chemisorbed on Cu at ambient temperatures at a given potential. Here, we thus paired, in seriatim fashion, scanning tunneling microscopy (STM) and polarization-modulation IR reflection-absorption spectroscopy (PMIRS) to document the influence of applied potential on the coverage, the molecular orientation, and the adlattice structure of CO adsorbed on Cu(100) in alkaline solutions; the results are described in this paper.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Activation of methane by U + studied by guided ion beam tandem mass spectrometry and quantum chemistry

Reaction pathways of all products formed in the U + + CH 4 (CD 4 ) reaction were explored as a function of kinetic energy using guided ion beam tandem mass spectrometry and quantum chemical calculations. UH + , UC + , UCH + , UCH 2 + , and UCH 3 + (and their perdeuterated analogues) are formed in endothermic reactions. In both systems, the UCH 2 + (UCD 2 + ) dehydrogenated product was the dominant product in the low-energy region, whereas the UH + (UD + ) hydride product became predominant at high energies. The kinetic energy behavior of the various products is consistent with a common intermediate of H–U + –CH 3 (D–U + –CD 3 ). Here, the kinetic energy dependence of all product cross sections was modeled to obtain experimental bond dissociation energies at 0 K (in eV): D 0 (U + –H) = 2.42 ± 0.10, D 0 (U + –C) = 3.95 ± 0.12, D 0 (U + –CH) = 4.91 ± 0.09, D 0 (U + –CH 2 ) = 4.11 ± 0.04, and D 0 (U + –CH 3 ) = 2.41 ± 0.09. Quantum chemical calculations using the UCCSD(T) and UB3LYP approaches with the cc-pwCVXZ-PP basis set with MDF-60 pseudopotential for U + and the aug-cc-pCVXZ and aug-cc-pVXZ (X = T, Q) basis set for carbon and hydrogen, respectively, validate the experimental bond dissociation energies and outline the potential energy surface for all reactions observed. In addition, spin–orbit corrections of the bond energies for all products were calculated at a CASSCF-CASPT2-RASSI level.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Tuning the hydrogenation of CO 2 to CH 4 over mechano-chemically prepared palladium supported on ceria

CO 2 methanation reactivity, reaction mechanism, and surface structure were investigated on a mechanochemically prepared Pd/CeO 2 catalyst (PdAcCeO 2 -M), where an oxidative pretreatment (-o) increased methane yield by a factor of two compared to a reductive pretreatment (-h). Methanation rates were maintained for over 48 h and further increased upon oxidative regeneration treatments. The surface species of both PdAcCeO 2 -M-o and PdAcCeO 2 -M-h were explored via in situ CO 2 and CO hydrogenation DRIFTS, where CO hydrogenation effectively models the dissociative CO 2 mechanism (CO 2 → CO → CH 4 ). PdAcCeO 2 -M-o yielded distinct Pd-CO adsorption and the absence of monodentate carbonate at ~ 1400 cm -1 , while AP-XPS showed that PdAcCeO 2 -M-o yielded a unique Pd δ+ contribution at 335.9 eV. By gaining insights from various in situ spectroscopic techniques, and by breaking the CO 2 hydrogenation mechanism into piecewise steps, a deeper understanding of the direct CO 2 reduction towards methane and CO over mechanochemically prepared Pd/CeO 2 catalysts was obtained.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Atomistic mechanisms of water vapor–induced surface passivation

The microscopic mechanisms underpinning the spontaneous surface passivation of metals from ubiquitous water have remained largely elusive. Here, using in situ environmental electron microscopy to atomically monitor the reaction dynamics between aluminum surfaces and water vapor, we provide direct experimental evidence that the surface passivation results in a bilayer oxide film consisting of a crystalline-like Al(OH) 3 top layer and an inner layer of amorphous Al 2 O 3 . The Al(OH) 3 layer maintains a constant thickness of ~5.0 Å, while the inner Al 2 O 3 layer grows at the Al 2 O 3 /Al interface to a limiting thickness. On the basis of experimental data and atomistic modeling, we show the tunability of the dissociation pathways of H 2 O molecules with the Al, Al 2 O 3 , and Al(OH) 3 surface terminations. The fundamental insights may have practical significance for the design of materials and reactions for two seemingly disparate but fundamentally related disciplines of surface passivation and catalytic H 2 production from water.

36 MATERIALS SCIENCE↗

Atomic Layer Deposition of Pt on the Surface Deactivated by Fluorocarbon Implantation: Investigation of the Growth Mechanism

Selective atomic layer deposition (ALD) using surface-controlled reactivity is attracting a great deal of attention as a simple bottom-up patterning process that can provide both continued dimensional scaling and accurate pattern placement for next-generation nanoelectronics. Previously, we reported topographically selective deposition through Pt ALD using a MeCpPtMe 3 precursor and an O 2 counter reactant on fluorocarbon (CF x )-modified surfaces; however, gradual loss of selectivity in the CF x -modified regions was observed during the Pt ALD process. This work develops a fundamental understanding of the microscopic growth mechanisms of Pt ALD on the CF x -modified surface using a combination of experimental analyses and theoretical methods. The Pt growth characteristics on the CF x surface are investigated within a temperature window from 225 to 350 °C, and the results show a sharp sensitivity to growth temperature, with significant Pt growth occurring at temperatures above 300 °C. Through density functional theory (DFT) calculations, the reaction energies for adsorption of oxygen and the MeCpPtMe 3 precursor as well as formation of reaction products of CF x degradation are determined. Based on experimental results in conjunction with the DFT calculations, we show that while lower temperature Pt ALD (<300 °C) on CF x -modified surfaces can be significantly retarded because of a lack of MeCpPtMe 3 chemisorption, the surface reaction pathways for Pt ALD on CF x -modified surfaces at temperatures above 300 °C can proceed through oxygen adsorption and CF 4 desorption followed by Pt nucleation in CF x -degraded regions.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Pathways of CdS Quantum Dot Degradation during Photocatalysis: Implications for Enhancing Stability and Efficiency for Organic Synthesis

CdS quantum dots (QDs) are widely employed as photocatalysts for reactions such as hydrogen evolution, and their degradation under aerobic aqueous conditions is well understood. However, despite evidence of aggregation and precipitation of CdS QD photocatalysts under anaerobic conditions, catalyst speciation and degradation under such conditions are underexplored. In this work, we demonstrate that during a reductive dehalogenation reaction, CdS QDs undergo surface ligand etching, which leads to a loss of colloidal stability and the formation of microcrystalline cadmium metal deposits. We hypothesize that this results from the accumulation of electrons on the QD surface. In addition, we demonstrate mild surface sulfur oxidation and the formation of an ammonium salt byproduct of a commonly used hole quencher. Furthermore, this work adds to our atomic-level understanding of the reactions occurring at the QD surface during photocatalysis, so that we can design more stable and efficient photocatalysts for organic synthesis.

cadmium sulfide↗

Reaction of Hydrazine with Solution- and Vacuum-Prepared Selectively Terminated Si(100) Surfaces: Pathways to the Formation of Direct Si–N Bonds

Here, the reactivity of liquid hydrazine (N 2 H 4 ) with respect to H-, Cl-, and Br-terminated Si(100) surfaces was investigated to uncover the principles of nitrogen incorporation into the interface. This process has important implications in a wide variety of applications, including semiconductor surface passivation and functionalization, nitride growth, and many others. The use of hydrazine as a precursor allows for reactions that exclude carbon and oxygen, the primary sources of contamination in processing. In this work, the reactivity of N 2 H 4 with H- and Cl-terminated surfaces prepared by traditional solvent-based methods and with a Br-terminated Si(100) prepared in ultrahigh vacuum was compared. The reactions were studied with X-ray photoelectron spectroscopy, atomic force microscopy, and scanning tunneling microscopy, and the observations were supported by computational investigations. The H-terminated surface led to the highest level of nitrogen incorporation; however, the process proceeds with increasing surface roughness, suggesting possible etching or replacement reactions. In the case of Cl-terminated (predominantly dichloride) and Br-terminated (monobromide) surfaces, the amount of nitrogen incorporation on both surfaces after the reaction with hydrazine was very similar despite the differences in preparation, initial structure, and chemical composition. Density functional theory was used to propose the possible surface structures and to analyze surface reactivity.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Tritium Transport Modeling at the Pore Scale in Ceramic Breeder Materials Using TMAP8

Fusion reactors depend on the blanket material to breed and release tritium at the same rate or faster than it is consumed by the fusion reaction. Cellular ceramic breeders (CCBs) are dense materials that can maintain a high tritium breeding ratio while promoting tritium release because of highly connected pores. Assessing the tritium breeding capabilities of these materials requires a combination of extensive experimental and modeling efforts. In this work, we develop and calibrate a multiphysics model of tritium transport. This novel model accounts for ceramic and pore diffusion, trapping and detrapping, and several surface reactions at the pore surface. We perform a sensitivity analysis and calibrate the model by comparing its predictions against experimental measurements of deuterium absorption. The calibrated model is then used to model tritium absorption in samples with different pore microstructures to investigate the effect of pore interconnectivity on tritium absorption. The model is part of the development of the multiscale, multiphysics framework for tritium transport [i.e., the Tritium Migration Analysis Program (TMAP8)], which is itself built on top of the finite-element multiphysics framework multiphysics object-oriented simulation environment (MOOSE). This study demonstrates some of TMAP8’s capabilities and is the first step toward assessing the tritium breeding capabilities of ceramic breeder material designs.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Alloying of Mn with Bi‐Rich Surfaces of Bi 2 Te 3 by Topotactic Reaction

Interfacing topological insulators (TI) with magnetic materials enables accessing quantum effects for advanced devices. The synthesis of such heterostructures faces challenges due to interlaying mixing and the often-complex multicomponent materials required to combine the desired properties. An alternative synthesis to direct growth is the modification of 2D materials by topotactic reactions to introduce new functionalities into pre-formed single or few-component 2D sheets. Here, the self-formation of bismuthene (a bilayer of Bi; Bi 2 ) is utilized by thermal decomposition of Bi 2 Te 3 as a platform to create novel 2D overlayers on the TI- substrate. Specifically, the Bi 2 layer is modified by reacting it with vapor deposited Mn in an attempt to induce magnetic properties. Scanning tunneling microscopy indicates that the Mn modified surface remains in a planar 2D layer, indicating the formation of an ordered Mn-rich surface layer. Density functional theory (DFT) is used to develop models of both the Bi-rich Bi 2 Te 3 surface as well as their subsequent Mn-modified structure. The DFT models indicate the possibility of magnetic ordering of the high spin Mn 2+ ions. The successful synthesis of planar MnBi alloys on a van der Waals material illustrates topotactic reactions as an alternative for creating novel layered heterostructures.

2D materials↗

Does H 2 Temperature‐Programmed Reduction Always Probe Solid‐State Redox Chemistry? The Case of Pt/CeO 2

Abstract Redox reactions on the surface of transition metal oxides are of broad interest in thermo, photo, and electrocatalysis. H 2 temperature‐programmed reduction (H 2 ‐TPR) is commonly used to probe oxide reducibility by measuring the rate of H 2 consumption during temperature ramps, assuming that this rate is controlled by oxide reduction. However, oxide reduction involves several elementary steps, such as H 2 dissociation and H‐spillover, before surface reduction and H 2 O formation occur. In this study, we evaluated the kinetics of H 2 consumption over CeO 2 and Pt/CeO 2 with varying Pt loadings and structures to identify the elementary steps probed by H 2 ‐TPR. Literature often attributes changes in H 2 ‐TPR characteristics with Pt addition to increased CeO 2 reducibility. However, our analysis revealed that the H 2 consumption rate is measurement of the rate of H‐spillover at Pt‐CeO 2 interfaces and is determined by the concentration of Pt species on Pt nanoclusters that dissociate H 2 . Therefore, lower temperature H 2 consumption observed with Pt addition does not indicate higher CeO 2 reducibility. Measurements on samples with mixtures of Pt single‐atoms and nanoclusters demonstrated that H 2 ‐TPR can effectively quantify dilute Pt nanocluster concentrations, suggesting caution in directly linking H 2 ‐TPR characteristics to oxide reducibility while highlighting alternative material insights that can be gleaned.

Lee, Jaeha↗

Does H 2 Temperature–Programmed Reduction Always Probe Solid–State Redox Chemistry? The Case of Pt/CeO 2

Redox reactions on the surface of transition metal oxides are of broad interest in thermo, photo, and electrocatalysis. H 2 temperature-programmed reduction (H 2 -TPR) is commonly used to probe oxide reducibility by measuring the rate of H 2 consumption during temperature ramps, assuming that this rate is controlled by oxide reduction. However, oxide reduction involves several elementary steps, such as H 2 dissociation and H-spillover, before surface reduction and H 2 O formation occur. In this study, we evaluated the kinetics of H 2 consumption over CeO 2 and Pt/CeO 2 with varying Pt loadings and structures to identify the elementary steps probed by H 2 -TPR. Literature often attributes changes in H 2 -TPR characteristics with Pt addition to increased CeO 2 reducibility. However, our analysis revealed that the H 2 consumption rate is measurement of the rate of H-spillover at Pt-CeO 2 interfaces and is determined by the concentration of Pt species on Pt nanoclusters that dissociate H 2 . Furthermore, lower temperature H 2 consumption observed with Pt addition does not indicate higher CeO 2 reducibility. Measurements on samples with mixtures of Pt single-atoms and nanoclusters demonstrated that H 2 -TPR can effectively quantify dilute Pt nanocluster concentrations, suggesting caution in directly linking H 2 -TPR characteristics to oxide reducibility while highlighting alternative material insights that can be gleaned.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Influence of Protection Layers on Thermal Stability of Nitride Thin Films

Nitrides are commonly studied for their properties relevant to numerous coating applications, and have been recently used to synthesize newly predicted materials in thin film form. However, thermodynamic stability of such nitride materials is difficult to experimentally evaluate, due to limited thermal budget of thin films. Here we show that thermal stability of nitride films can be extended using protection layers. Specifically, we find that zirconium nitride (ZrN) thin films are stable up to at least 1200°C annealing temperature in N2 atmosphere, if aluminum nitride (AlN) diffusion barriers and capping layers are used. X-ray diffraction (XRD) measurements show the expected thermodynamically stable rocksalt structure of ZrN, and scanning electron microscopy (SEM) confirms compact microstructure of these ZrN films. Without such protection layers, transient bixbyite Zr2ON2 phase and high-temperature ZrSi2 phase are observed after annealing by XRD, SEM, and auger electron spectroscopy (AES), due to side reaction with native surface oxide (ZrOx) and substrate (Si) respectively. These results demonstrate that protection layers are beneficial to increase the thermal budget of nitride thin films, for evaluating thermodynamic stability of new nitride materials, for capturing transient metastable phases during crystallization, and for using functional nitride coatings in extreme environments.

36 MATERIALS SCIENCE↗

Atomic- and Molecular-Scale Interphase Engineering for High-Performance Solid-State Batteries

Solid-state batteries (SSBs) promise a decisive advance beyond conventional Li-ion systems, yet their development remains constrained by persistent solid–solid interfacial instabilities that degrade performance and durability. Interfaces between solid electrolytes and both cathodes and Li metal often exhibit poor wettability, limited physical contact, and high charge–transfer resistance, leading to chemical decomposition, mechanical failure, and impedance growth. Overcoming these limitations requires interphase engineering with atomic-scale precision—capabilities that conventional coating methods cannot reliably deliver. Atomic layer deposition (ALD) and molecular layer deposition (MLD) uniquely meet this need by enabling ultrathin, conformal, and composition-tunable films that stabilize reactive surfaces, suppress parasitic reactions, and regulate Li-metal morphology. Importantly, this Perspective highlights ALD/MLD systems that have already demonstrated effectiveness in liquid-electrolyte cells and discusses how these validated strategies can be deliberately translated to solid-state architectures. By grounding future directions in experimentally proven concepts rather than speculative hypotheses, we outline how atomic- and molecular-scale design principles can accelerate the development of robust, high-performance SSB technologies.

atomic and molecular layer deposition↗

Development, characterization, and modeling of a high-performance Ru/B2CA catalyst for ammonia synthesis

This paper documents the development and performance of a nano-phase Ru catalyst on a (BaO) x (CaO) y (Al 2 O 3 ) support. Extensive screening of the support’s ternary composition shows the best stoichiometry is (BaO) 2 (CaO)(Al 2 O 3 ), denoted B2CA. The paper first describes catalyst preparation and characterization. The paper reports a detailed 12-step reaction mechanism that represents ammonia synthesis over wide ranges of temperature, pressure, space velocity, and feed composition. Additionally, the mechanism is developed and validated using results of packed-bed experiments. The elementary reaction pathways consider surface adsorbates, including catalyst-poisoning behaviors. The rate expressions include important coverage-dependent activation barriers. Machine learning models assist interpretation of the catalyst-support interactions. The detailed chemistry is much more predictive than is possible with global representations (N 2 + 3H 2 ⇌ 2NH 3 ). The validated models can be applied to assist optimizing reactor design and operating conditions.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

GPR_calculator: An on-the-fly surrogate model to accelerate massive nudged elastic band calculations

We present GPR_calculator, a package based on Python and C++ programming languages to build an on-the-fly surrogate model using Gaussian Process Regression (GPR) to approximate computationally expensive electronic structure calculations. The key idea is to dynamically train a GPR model during the simulation that can accurately predict energies and forces with uncertainty quantification. When the uncertainty is high, the costly electronic structure calculation is performed to obtain the ground truth data, which is then used to update the GPR model. To illustrate the effectiveness of GPR_calculator, we demonstrate its application in Nudged Elastic Band (NEB) simulations of surface diffusion and reactions, achieving 3-10 times acceleration compared to pure ab initio calculations. The source code is available at https://github.com/MaterSim/GPR_calculator.

Gaussian process regression↗