Engineering Papers⌕ Search

SEARCH · Engineering Papers

Results for “ALD”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

Quote a phrase for an exact phrase match. Source license links do not imply unrestricted reuse.

At least 829 records · Page 46

The role of Li doping in layered/layered Na x Li y Ni 0.4 Fe 0.2 Mn 0.4 O 2 intergrowth electrodes for sodium ion batteries

Here, the layered NaTMO 2 (TM = Ni, Fe, Mn) materials with the O3-type structure are attractive as positive electrodes for sodium ion batteries because of their high theoretical capacity. Additionally, Li doping in these materials has been shown to offer substantial enhancements to their electrochemical properties by promoting the formation of intergrowth structures, which are combinations of specific phases. However, the mechanism by which the intergrowth modifies the electrochemical properties is often unclear. Systematic variation of Li content in Na x Li y Ni 0.4 Fe 0.2 Mn 0.4 O 2 (NFM-Li y ) was conducted to identify its role in structural modification and electrochemical performance. Li contents of 0.15 and greater generate a layered/layered Na-O3/Li-O’3 intergrowth structure. 7 Li and 23 Na nuclear magnetic resonance and x-ray absorption spectroscopy identify that when the total solubility for alkali ions in the layered structure is exceeded, Li continues to form the Li-O’3 phase while the excess Na forms residual sodium compounds such as Na 2 O. Higher Li content is associated with improved capacity retention in the initial cycles from the superior stability of the mechanically linked NaO3/Li-O’3 structure that suppresses the P3 to OP2 phase transition during charge. However, high Li contents are associated with increased rates of parasitic side reactions that reduce long-term cycling stability. These side reactions are associated with the instability of the cathode-electrolyte interphase, which can be partially mitigated by atomic layer deposition (ALD) coating with alumina, which significantly enhances the capacity retention and Coulombic efficiency over many cycles. Overall, we find that the layered/layered Na-O3/Li-O’3 intergrowth structure is able to provide structural stability and suppress undesired phase transformations but is overwhelmed by the increased reactivity of the surface if not protected by surface coating.

25 ENERGY STORAGE↗

Pilot production & commercialization of LAPPD ™

We present a progress update on plans to establish pilot production and commercialization of Large Area (400 cm2) Picosecond Photodetector (LAPPD™). Steps being taken to commercialize this MCP and LAPPD™ technology and begin tile pilot production are presented including (1) the manufacture of 203 mm×203 mm borosilicate glass capillary arrays (GCAs), (2) optimization of MCP performance and creation of an ALD coating facility to manufacture MCPs and (3) design, construction and commissioning of UHV tile integration and sealing facility to produce LAPPDs. Taken together these plans provide a “pathway toward commercialization”.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

Large area transparent refractory aerogels with high solar thermal performance

Application of transparent silica aerogels in low-temperature solar thermal systems has led to major improvements in performance. In high temperature concentrating solar thermal (CST) systems, aerogels have yet to demonstrate the necessary scalability, durability, and performance to support their widespread deployment. Here, large-area transparent refractory aerogel tiles are synthesized and shown to achieve a record-high receiver figure-of-merit (FOM) at high temperatures. The work leverages a scaled-up process for sol–gel synthesis to control the density of the aerogels for improved solar transmittance and adapts a previous atomic layer deposition (ALD) technique with the aid of predictive reaction-transport modeling. After aging for 10 days at 700 °C, the large-area tiles exhibit a solar-weighted transmittance of 95.6 % and a thermal emittance of 0.31, corresponding to a FOM of 80 % at 100 suns and 700 °C. The observed sintering rates at 700 °C are comparably low to earlier one-inch aerogels, suggesting long-term stability under relevant operating conditions. Furthermore, the study indicates that refractory aerogels are scalable materials for efficient photothermal conversion at high temperatures.

Aerogels↗

Design Principles for Efficient and Stable Water Splitting Photoelectrocatalysts

Photoelectrochemical water splitting is a promising avenue for sustainable production of hydrogen used in the chemical industry and hydrogen fuel cells. The basic components of most photoelectrochemical water splitting systems are semiconductor light absorbers coupled to electrocatalysts, which perform the desired chemical reactions. A critical challenge for the design of these systems is the lack of stability for the majority of desired semiconductors under operating water splitting conditions. One strategy to address this issue is to protect the semiconductor by covering it with a stabilizing insulator layer, creating a metal–insulator–semiconductor (MIS) architecture, which has demonstrated improved stability. In addition to enhanced stability, the insulator layer may significantly affect the electron and hole transfer, which governs the recombination rates. Furthermore, the insertion of an insulator layer leads to the introduction of additional insulator/electrocatalyst and insulator/semiconductor interfaces. These interfaces can impact the system’s performance significantly, and they need to be carefully engineered to optimize the efficiencies of MIS systems. In this Account, we describe our recent progress in shedding light on the critical role of the insulator and the interfaces on the performance of MIS systems. We discuss our findings by focusing on the concrete example of planar n-type Si protected by a HfO 2 insulator layer and coupled to a Ni or Ir electrocatalyst that performs the oxygen evolution reaction, one of the water splitting half-reactions. To improve our fundamental understanding of the insulator layer, we precisely control the HfO 2 insulator thickness using atomic layer deposition (ALD), and we perform a series of rigorous electrochemical experiments coupled with theory and modeling. We demonstrate that by tuning the insulator thickness, we can control the flux and recombination of photogenerated electrons and holes to optimize the generated photovoltage. Despite optimizing the thickness, we find that the maximum generated photovoltage in MIS systems is often significantly lower than the upper performance limit, i.e., there are additional losses in the system that could not be addressed by optimizing the insulator thickness. We identify the sources of these losses and describe strategies to minimize them by a combination of improving the semiconductor light absorption, removing nonidealities associated with interfacial defects, and finding alternative insulators with improved charge carrier selectivity. Finally, we quantify the improvements that can be obtained by implementing these specific strategies. Our collective work outlines strategies to analyze MIS systems, identify the sources of efficiency losses, and optimize the design to approach the fundamental performance limits. Furthermore, these general approaches are broadly applicable to photoelectrochemical materials that utilize sunlight to produce value-added chemicals.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Investigation of Electron Extraction and Protection Layers on Cu 2 O Photocathodes

Many semiconductor photoelectrodes used for solar fuel production require the addition of buffer and protection layers to enhance their solar-to-fuel conversion efficiency and long-term stability. For example, Cu 2 O, which is the most efficient oxide-based photocathode but suffers from photocorrosion, has been assembled with various buffer and protection layers to suppress photocorrosion and use more photoexcited electrons for useful reactions such as water reduction to H 2 . However, the abilities of various buffer and protection layers to extract electrons from Cu 2 O have never been directly evaluated. Instead, their abilities were estimated based on the photocurrent for water reduction after adding a hydrogen evolution catalyst on top of them. In these evaluations, as the photocurrent is affected not only by the buffer or protection layer but also by the catalyst, the ability of the buffer or protection layer to extract electrons from Cu 2 O could not be accurately determined or compared. Here, in this study, we demonstrate that 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl (TEMPOL), whose reduction rate is faster than the photocorrosion rate of Cu 2 O, can be used as an effective electron scavenger to directly evaluate any change caused by a buffer or protection layer in electron-hole separation in Cu 2 O. In particular, we compared the performances of ZnO and TiO 2 layers on Cu 2 O for extracting electrons and suppressing photocorrosion. We also compared the performances of TiO 2 layers prepared by electrodeposition and atomic layer deposition (ALD) to show that the deposition method can make a striking impact on the performance of the same TiO 2 because it can affect the critical characteristics of the layer (e.g., defect levels, conductivity, interfacial atomic arrangements) that govern interfacial charge transfer in multilayer photoelectrodes.

36 MATERIALS SCIENCE↗

Local Electric Field Effects on Water Dissociation in Bipolar Membranes Studied Using Core–Shell Catalysts

The local electric field strength is thought to affect the rate of water dissociation (WD) in bipolar membranes (BPMs) at the catalyst–nanoparticle surfaces. Here, we study core–shell nanoparticles, where the core is metallic, semiconducting, or insulating, to understand this effect. The nanoparticle cores were coated with a WD catalyst layer (TiO2 or HfO2) via atomic layer deposition (ALD), and the morphology was imaged with transmission electron microscopy. Irrespective of the core material, these core–shell catalysts displayed comparable WD overpotentials at optimal mass loading, despite the hypothesized differences in the electric field strength across the catalyst particle suggested by continuum electrostatic simulations. Substantial atomic interdiffusion between the core and shell was ruled out by X-ray absorption spectroscopy, X-ray photoelectron spectroscopy, and diffuse reflectance optical measurements. However, the optimal mass loading of catalyst was roughly 1 order of magnitude higher for the conductive and high dielectric core materials than for the low dielectric insulating cores. These findings are consistent with the hypothesis that electric field screening within the core material focuses the electric field drop between particles such that larger film thicknesses can be tolerated. Collectively, these data support the idea that it is the local electric field at the molecular level that controls proton-transfer rates and that the metal core/dielectric-shell constructs introduced here modulate that field. Further materials and synthetic design may enable optimization of the electric field strength across the proton-transfer trajectory at the material surface.

Sarma, Prasad V↗

Direct Synthesis of Six-Monolayer (1.9 nm) Thick Zinc-Blende CdSe Nanoplatelets Emitting at 585 nm

Here, quasi-two-dimensional semiconductor nanoplatelets (NPLs) have garnered widespread interest because of their uniquely narrow emission spectra and favorable characteristics for optical gain and lasing.(1–5) Strongly quantum confined along thickness, NPLs exhibit the electronic structure of quantum wells determined by their thickness, which can be controlled with atomic precision.(6–10) Among all semiconductor NPLs, CdSe NPLs are probably the most studied. So far, four kinds of CdSe NPLs, emitting at around 396 nm, 463 nm, 513m, and 553 nm, have been intensely investigated for almost a decade.(11–18) Despite some early confusions in identifying actual thicknesses of those NPLs, they have been successfully assigned to be 2-monolayer (2 ML) to 5-monolayer (5 ML) thickness by high-resolution TEM.(19) Here, nML thickness corresponds to n chalcogen layers sandwiched between n + 1 metal layers. Another kind of NPLs with 6MLs of CdSe, once briefly mentioned in 2013,(20) however, was not explored, likely because its synthesis proved hard to reproduce. The 6 ML CdSe NPLs can be prepared by the colloidal atomic layer deposition (c-ALD) method,(21) but there have been no reports on direct synthesis of 6 ML CdSe NPLs, and their direct synthesis has been in doubt as being difficult by traditional approaches.(22,23)

36 MATERIALS SCIENCE↗

Sequential Infiltration Synthesis of Electronic Materials: Group 13 Oxides via Metal Alkyl Precursors

The sequential infiltration synthesis (SIS) of group 13 indium and gallium oxides (In 2 O 3 and Ga 2 O 3 ) into poly(methyl methacrylate) (PMMA) thin films is demonstrated using trimethylindium (TMIn) and trimethylgallium (TMGa), respectively, with water. In situ Fourier transform infrared (FTIR) spectroscopy reveals that these metal alkyl precursors reversibly associate with the carbonyl groups of PMMA in analogy to trimethylaluminum (TMAl), however, with significantly lower affinity. This is demonstrated to have important kinetic consequences that dramatically alter the synthetic parameters required to achieve material growth. Ab initio density functional theory simulations of the methyl methacrylate monomer with group 13 metal alkyls corroborate association energy that is 3X greater for TMAl than for either TMIn or TMGa. As a consequence, the kinetics of activated diffusion within the film is observed to be far more rapid for TMIn and TMGa than for TMAI. Spectroscopic ellipsometry and scanning electron microscopy, in combination with Hall effect measurements of SIS-derived In 2 O 3 films, demonstrate that SIS enables rapid growth of thin films with continuous electrically conductive pathways after postannealing. Notably, SIS with TMIn and water enables the growth of In 2 O 3 at 80°C, well below the onset temperature of atomic layer deposition (ALD) using these precursors.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Molecular Layer Etching of Metalcone Films Using Lithium Organic Salts and Trimethylaluminum

Advances in semiconductor device manufacturing are limited by our ability to precisely add and remove thin layers of material in multistep fabrication processes. Recent reports on atomic layer etching (ALE) have provided the means for the precise removal of inorganic thin films deposited by atomic layer deposition (ALD), opening new avenues for nanoscale device design. Here, we report on a new technique for the precise removal of metal organic thin films deposited by molecular layer deposition (MLD), which we term molecular layer etching. This etching process employs sequential exposures of lithium organic salt (LOS) and trimethylaluminum (TMA) precursors to produce self-limiting etching behavior. We employ quartz crystal microbalance experiments to demonstrate (i) etching of alucone films preloaded with LOS upon TMA exposures and (ii) layer-by-layer etching of alucone films using alternating exposures of LOS and TMA. We also identify the selectivity of these etching mechanisms. We probe the mechanism for the layer-by-layer etching of alucone using a quartz crystal microbalance and Fourier transform infrared spectroscopy and identify that the etching proceeds via heterolytic cleaving of Al-O bonds in alucone upon LOS exposure followed by methylation to produce volatile species upon TMA exposure. The etching process results in the removal of 0.4 nm/cycle of alucone at 160 °C and up to 3.6 nm/cycle of alucone at 266 °C in ex situ etching experiments on silicon wafers. This halogen-free etching process enables etching of MLD films and provides new fabrication pathways for the control of material geometries at the nanoscale.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

High-Performance Catalytic Four-Channel Hollow Fibers with Highly Dispersed Nickel Nanoparticles Prepared by Atomic Layer Deposition for Dry Reforming of Methane

In this study, highly dispersed nickel (Ni) nanoparticles (NPs) with an average particle size of 4.3 nm were uniformly deposited on the outer surface, the inner channel surface, and inside the pores of 20-cm long 4-channel α-Al 2 O 3 hollow fibers (HFs) by atomic layer deposition (ALD) for dry reforming of methane (DRM). Cerium oxide (CeO 2 ) was added to promote the catalytic performance of Ni/Al 2 O 3 -HF catalysts. Rationally designed filling methods, by tuning the reactor size and inert fillings, can reduce the catalyst bed voidage in a fixed bed reactor for better reactant gas distribution, effectively utilize the Ni reactive sites, and achieve excellent catalytic performance. It was found that the CeO 2 -promoted Ni/Al 2 O 3 -HF catalyst was highly active and highly stable without deactivation during an overall 400-hr DRM test at 850 ºC. CeO 2 with reversible valence states could participate in surface reactions; especially, the formation of CeAlO 3 provided sufficient surface Ce 3+ for CO 2 activation and enhanced the stability and reusability of the HF catalysts.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Strong O 2p–Fe 3d Hybridization Observed in Solution-Grown Hematite Films by Soft X-ray Spectroscopies

Photoelectrochemical (PEC) water splitting holds the potential as a direct route for solar energy conversation and storage. The performance of a PEC device is strongly influenced by the electronic properties of the photonanode surface. It has been shown that the synthesis methods can have a profound impact on the electronic properties and PEC performance of various photoelectrode materials such as hematite. Soft X-ray spectroscopic techniques, including O K-edge XAS and Fe L-edge XAS/XES, have been employed to investigate how the synthesis methods impact the electronic structure of resulting hematite materials. It is found that the hematite samples via solution regrowth methods show dramatically increased 3d-4sp band ratios in O K-edge XAS spectra and decreased relative elastic peak intensities in Fe L-edge RIXS spectra compared with samples synthesized via ALD or solution grown. The difference observed in O-K and Fe-L spectra indicated that solution regrowth strategy alters the O 2p-Fe 3d hybridization and hence the electronic structure of the hematite films, which proves to be beneficial for PEC performance of the hematite photoanode. Our findings provided new insights and potentially useful strategies for enhancing the PEC performance of photoanode materials.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

A Study of How LaFeO 3 and CaTiO 3 Supports Affect the Oxidation, Hydrogenation, and Methane Steam Reforming Activity of Pt and Ni Catalysts

The structure and catalytic properties of Pt and Ni supported on thin films of LaFeO 3 and CaTiO 3 , prepared by Atomic Layer Deposition (ALD), were investigated. X-Ray diffraction (XRD) and scanning transmission electron microscopy (STEM) show that reduction at 1073 K causes Pt-Fe intermetallic compound formation for Pt/LaFeO 3 . For Pt/CaTiO 3 , 1073-K reduction induces local decomposition of the CaTiO 3 with migration of Ti to the Pt. Reduced Pt/LaFeO 3 and Pt/CaTiO 3 exhibited CO-oxidation activity similar to that for Pt supported on MgAl 2 O 4 but were much less active for propane oxidation and hydrogenation of 1-hexene and toluene. In contrast, Ni/CaTiO 3 behaved similarly to a conventional supported Ni catalyst for the methane-steam-reforming (MSR) and 1-hexene hydrogenation. There was also no evidence for local decomposition of the perovskite in the vicinity of the Ni particles. Furthermore, the results obtained in this study demonstrate that metal-perovskite interactions that affect reactivity are specific to each component.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Visible Photoelectrochemical Water Splitting Based on a Ru(II) Polypyridyl Chromophore and Iridium Oxide Nanoparticle Catalyst

Preparation of Ru(II) polypyridyl-iridium oxide nanoparticle (IrO X NP) chromophore-catalyst assemblies on an FTO$|nano$ITO$|$TiO2 core/shell by a layer-bylayer procedure is described for application in dye-sensitized photoelectrosynthesis cells (DSPEC). Significantly enhanced, bias-dependent photocurrents with Lumencor 455 nm 14.5 mW/cm 2 irradiation are observed for core/shell structures compared to TiO 2 after derivatization with [Ru(4,4$'$-PO 3 H 2 bpy) 2 (bpy)] 2+ (RuP 2 ) and uncapped IrO X NPs at pH 5.8 in NaSiF6 buffer with a Pt cathode. Photocurrents arising from photolysis of the resulting photoanodes, FTO$|nano$ITO$|$TiO 2 |-RuP 2 ,IrO 2 , are dependent on TiO2 shell thickness and applied bias, reaching 0.2 mA/cm2 at 0.5 V vs AgCl/Ag with a shell thickness of 6.6 nm. Long-term photolysis in the NaSiF6 buffer results in a marked decrease in photocurrent over time due to surface hydrolysis and loss of the chromophore from the surface. Long-term stability, with sustained photocurrents, has been obtained by atomic layer deposition (ALD) of overlayers of TiO 2 to stabilize surface binding of -RuP 2 prior to the addition of the IrO X NPs.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Coadsorption of Formic Acid and Hydrazine on Cu(110) Single-Crystal Surfaces

The chemistry of coadsorbed formic acid and hydrazine on Cu(110) surfaces was characterized both experimentally, by temperature programmed desorption (TPD) and X-ray photoelectron spectroscopy (XPS), and theoretically, via density functional theory (DFT) calculations. It was found that the two reactants interact with each other via hydrogen bonds, and that this modifies their individual thermal chemistry on the surface in two main ways: by stabilizing a HCOOH:N 2 H 4 adduct, which desorbs molecularly at around 240 K, and by slightly delaying the decomposition of the hydrazine to higher temperatures and shifting the selectivity of that step from dehydrogenation and formation of N 2 H x (ads) species to scission of the N–N bond and ammonia production. The coadsorbed formic acid was determined to react at higher temperatures than hydrazine, in chemistry not affected by the latter, which is no longer present on the surface at that stage. One interesting aspect of this chemistry revealed by the DFT calculations is that formic acid may preferentially H-bond on top of adsorbed hydrazine rather than directly attach to the copper surface. The implications of these results to atomic layer deposition (ALD) processes are discussed.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Photoexcited Carrier Dynamics of In 2 S 3 Thin Films

Indium sulfide (In2S3) is a promising absorber base for substitutionally-doped intermediate band photovoltaics (IBPV). However, the dynamics of charge carriers traversing the electronic density of states that determine the optical and electronic response of thin films under stimuli have yet to be explored. In this letter, the kinetics of photophysical processes in In2S3 grown by oxygen-free atomic layer deposition (ALD) are deduced from photoconductivity, photoluminescence (PL), and transient absorption (TA) spectroscopy. We develop a map of excited state dynamics for polycrystalline thin films including a secondary conduction band ~2.1 eV above the first, plus sulfur vacancy and indium interstitial defect levels resulting in long-lived (~100 ns) transients. Band edge recombination produces PL and stimulated emission, which both intensify and red-shift as deposition temperature and grain size increase. The effect of rapid conduction band electron relaxation (< 30 ps) and deep defect levels on IBPV employing In2S3-based absorbers is finally considered.

atomic layer deposition↗

Silicon Photoelectrode Thermodynamics and Hydrogen Evolution Kinetics Measured by Intensity-Modulated High-Frequency Resistivity Impedance Spectroscopy

Here, we present an impedance technique based on light intensity-modulated high-frequency resistivity (IMHFR) that provides a new way to elucidate both the thermodynamics and kinetics in complex semiconductor photoelectrodes. We apply IMHFR to probe electrode interfacial energetics on oxide-modified semiconductor surfaces frequently used to improve the stability and efficiency of photoelectrochemical water splitting systems. Combined with current density-voltage measurements, the technique quantifies the overpotential for proton reduction relative to its thermodynamic potential in Si photocathodes coated with three oxides (SiO x , TiO 2 , and Al 2 O 3 ) and a Pt catalyst. In pH 7 electrolyte, the flatband potentials of TiO 2 - and Al 2 O 3 -coated Si electrodes are negative relative to samples with native SiO x , indicating that SiO x is a better protective layer against oxidative electrochemical corrosion than ALD-deposited crystalline TiO 2 or Al 2 O 3 . Adding a Pt catalyst to SiO x /Si minimizes proton reduction overpotential losses but at the expense of a reduction in available energy characterized by a more negative flatband potential relative to catalyst-free SiO x /Si.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗