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At least 793 records · Page 44
All sourcesNASA NTRSDOE OSTI
NASA NTRS1994

(abstract) Transmission Electron Microscopy of Al(sub x)Ga(sub 1-x)N/SiC Multilayer Structures Grown on Sapphire Substrates

The potential of wide-band-gap III-V nitrides as ultraviolet sensors and light emitters has prompted an increasing amount of work recently, including the fabrication of the first UV sensors from as-deposited single crystal GaN. We have used high resolution transmission electron microscopy (TEM) to study the microstructure of two novel developments of wide-band-gap III-V nitrides: the growth of ultra-short period GaN/AlN superlattices; and the incorporation of SiC layers into Al(sub x)Ga(sub 1-x)N structures. By varying the relative periods in a GaN/AlN superlattice, the band gap of the composite can be tailored to lie between the elemental values of 365 nm for GaN and 200 nm for AlN. The group IV semiconductor, SiC, has a wide band-gap and has a close lattice match (less than 3 %) to Al(sub x)Ga(sub 1-x)N for growth on the basal plane. Demonstration of epitaxial growth for Al(sub x)Ga(sub 1-x)N/SiC multilayers would introduce a wide band-gap analog to the already existing family of III-V and Si(sub 1-x)Ge(sub x) heteroepitaxial growth systems. Although good quality growth of GaN on SiC substrates has been demonstrated, Al(sub x)Ga(sub 1-x)N/SiC multilayer structures have never been grown and the interfacial structure is unknown.

GaN AlN GaN/AlN↗
NASA NTRS1994

(abstract) Transmission Electron Microscopy of Al(sub x)Ga(sub 1-x)N/SiC Multilayer Structures

The potential of wide-band-gap III-V nitrides as solar-blind ultraviolet sensors and light emitters has prompted an increasing amount of work recently, including the fabrication of the first UV sensors from as-deposited single crystal GaN. We have used high resolution transmission electron microscopy (TEM) to study the microstructure of two novel developments of wide-band-gap III-V nitrides: the growth of ultra-short period GaN/AlN super lattices (digital alloys); and the incorporation of SiC layers into Al(sub x)Ga(sub 1-x)N structures. By varying the relative periods in a GaN/AlN superlattice, it should be possible to tailor the band gap of the composite to lie between the elemental values of 365 nm for GaN and 200 nm for AlN. The group IV semiconductor, SiC, has a close lattice match (< 3%) to Al(sub x)Ga(sub 1-x)N for growth on the basal plane. Demonstration of epitaxial growth for Al(sub x)Ga(sub 1-x)N/SiC multilayers could enable an extension of direct band-gap material towards the visible.

microscopy GaN AlN semiconductor SiC↗
NASA NTRS1994

Very Long-Wavelength GaAs/AlxGa1-xAs Infrared Hot Electron Transistor

We have demonstrated a bound to continuum state GaAs/AlxGa1-xAs infrared hot electron transistor which has a peak response at (sub =16.3). This device utilizes a bound-to-continuum quantum well infrared photodetector as a photosensitive emitter and a wide AlxGa1-xAs barrier between the base and the collector as an energy discriminating filter.

infrared hot electron transistor photosensitive em↗
NASA NTRS1961

Absorption and Emission Characteristics of Diffuse Spherical Enclosures

The thermal radiation characteristics of spherical cavities are of practical interest in connection with the absorption of radiant energy for both space-vehicle and terrestrial applications. Also, spherical cavities are of potential use as sources of black-body energy. The purpose of this brief paper is to determine both the absorption and emission characteristics of spherical cavities which are diffuse reflectors and emitters.

EMISSION↗
NASA NTRS1962

Pitfalls in thermal emission studies

Attention is called to several pitfalls that often beset investigators who make thermal emittance studies. The pitfalls mentioned include the following: (1) conflicting meanings of several frequently used terms as found in the literature, each meaning having authoritative sponsorship; (2) incomplete and hence potentially misleading descriptions of specimens on which reported data arc based; (3) reference to emissivity or remittance as a property of a surface rather than a volume property (influenced by the surface); (4) occasional omission of diffuse reflection from analyses of the optical properties of inhomogeneous bodies; (5) failure to observe the restrictions upon conditions that are required for validity of basic equations; (6)uncertainties as to the effective temperature, peculiar to specimens having low absorption indices; and (7) lack of suitable physical standards. Several suggestions are made for avoid­ing or minimizing the consequences of the pitfalls discussed.

THERMAL RADIATION↗