Engineering Papers⌕ Search

SEARCH · Engineering Papers

Results for “INDUCTION”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

Quote a phrase for an exact phrase match. Source license links do not imply unrestricted reuse.

At least 775 records · Page 43

Impulsive Magnetic Anomaly Detection At the 100-m Scale With an Array of Induction Coil Magnetometers

We demonstrate magnetic anomaly detection (MAD) using an array of 24 commercial induction coil magnetometers with stand-off distances from a pulsed 99.8(3) kA·m 2 magnetic dipole source of 260–1200 m. The sparse array is used to estimate the magnetic dipole location, magnitude, and orientation. We demonstrate how independent component analysis (ICA) improves the accuracy and precision of the magnetometer array when estimating the dipole parameters. Using sensor responses recorded from individual source pulses, we estimate the dipole location to within 29 ± 2 m, the magnitude to within 3 ± 3 kA·m 2 , and dipole orientation error to within 19 ± 0.6°.

47 OTHER INSTRUMENTATION↗

Comparison of Doubly-Fed Induction Generator Machine Models for Real-Time Simulations

This work presents a detailed comparison among three implementations of the Doubly-Fed Induction Generator (DFIG) machine model. The alpha-beta-gamma, synchronous (dqo), and natural frame dynamic machine models were deployed on a Field-Programmable Gate Array (FPGA) and compared in terms of execution time and resource utilization. These machine models were also validated against a physical DFIG machine during balanced and unbalanced grid conditions. A benchmark is presented with the objective of selecting the machine model, orientation and state-space representation that is best suited for real-time simulations. The selected machine model is used to develop a real-time emulator of a Type-3 wind system. This emulator enables the study of wind turbine system in realtime using a validated platform while allowing controller testing without relying on expensive third-party solutions.

Ferrari Maglia, Max↗

Planning Optimization for Inductively Charged On-demand Automated Electric Shuttles Project at Greenville, South Carolina

Wireless charging technology presents an ideal fit for autonomous electric vehicles for realizing a fully automated system (vehicle and charger). This paper presents a planning optimization analysis for a pilot project of in-route wireless charging infrastructure serving fixed-route on-demand shared automated electric shuttles (SAESs) at Greenville, South Carolina, USA. A single-objective non-linear mixed integer system planning optimization problem is formulated. A comprehensive cost model representing the overall inductively charged SAESs system is developed, considering road construction, power electronics and materials, traction battery, and installation costs. The optimization problem is solved to determine the best combination of the system key design parameters (number and allocations of wireless chargers, charging power level, track length and on-board battery capacity) that show the most cost-effective solution and allow the SAESs to achieve charge-sustaining operation. The planning platform incorporates representative simulated traffic data (driving speed and routes) for four SAESs in the Greenville using the Simulation of Urban Mobility tool. These data are fed to a vehicle powertrain model and a wireless charger power model to predict the battery power, energy and state-of-charge profiles, which are provided to the search algorithm to assess the design objectives under specific constraints. Finally, the results indicate that implementing high-power (100 kW) wireless charger at a few designated stops for fixed-route SAESs with the proper track length allows the vehicles to realize charge-sustaining operation, infinite range, and zero recharge downtime, with a significant reduction in the on-board battery (36%) and road coverage (69%), at minimum cost.

33 ADVANCED PROPULSION SYSTEMS↗

Beam Envelope Stability in an Advanced Linear Induction Accelerator

A new linear induction accelerator (LIA) is under development for multipulse flash radiography. Because it has substantially more cells than present LIAs, higher magnetic focusing fields are needed to suppress beam breakup (BBU). It is, therefore, more susceptible to the parametric beam envelope instability (PEI), which has an instability threshold that has usually been typified by the vacuum phase advance per cell exceeding some large fraction of π . Here we derive a threshold criterion for PEI that depends not only on the magnetic field, but also on the beam space charge and emittance. A tune designed to suppress BBU in Scorpius is shown to be stable to the PEI according to this criterion, and also by the lack of emittance growth in particle-in-cell (PIC) code simulations.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Electron-Beam Corkscrew Motion in an Advanced Linear Induction Accelerator

Scorpius is a multipulse linear induction accelerator (LIA) under development for flash radiography. Because it has substantially more cells than present LIAs, higher magnetic focusing fields are needed to suppress beam breakup (BBU). Therefore, it is more susceptible to corkscrew motion of the beam, which also depends on beam energy spread and focusing magnet misalignments. For energy spread and alignment tolerances expected for Scorpius, a magnetic tune designed to suppress BBU is shown to produce corkscrew motion within the range that can be controlled through the use of steering dipoles on existing LIAs. Finally, a gap-voltage modulation scheme is shown to almost completely eliminate chromatic effects such as corkscrew.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Frequency Control Support of a Doubly-Fed Induction Generator Based on the Torque Limit

This paper proposes a torque limit-based inertial control scheme of a doubly-fed induction generator (DFIG) that supports the frequency control of a power system. If a frequency deviation occurs, the proposed scheme aims to release a large amount of kinetic energy (KE) stored in the rotating masses of a DFIG to raise the frequency nadir (FN). Upon detecting the event, the scheme instantly increases its output to the torque limit and then reduces the output with the rotor speed so that it converges to the stable operating range. To restore the rotor speed while causing a small second frequency dip (SFD), after the rotor speed converges the power reference is reduced by a small amount and maintained until it meets the reference for maximum power point tracking control. The test results demonstrate that the scheme can improve the FN and maximum rate of change of frequency while causing a small SFD in any wind conditions and in a power system that has a high penetration of wind power, and thus the scheme helps maintain the required level of system reliability. The scheme releases the KE from 2.9 times to 3.7 times the Hydro-Quebec requirement depending on the power reference.

24 POWER TRANSMISSION AND DISTRIBUTION↗

Stable Adaptive Inertial Control of a Doubly-Fed Induction Generator

This paper proposes a stable adaptive inertial control scheme of a doubly-fed induction generator. The proposed power reference is defined in two sections: the deceleration period and the acceleration period. The power reference in the deceleration period consists of a constant and the reference for maximum power point tracking (MPPT) operation. The latter contributes to preventing a second frequency dip (SFD) in this period because its reduction rate is large at the early stage of an event but quickly decreases with time. To improve the frequency nadir (FN), the constant value is set to be proportional to the rotor speed prior to an event. The reference ensures that the rotor speed converges to a stable operating region. To accelerate the rotor speed while causing a small SFD, when the rotor speed converges, the power reference is reduced by a small amount and maintained until it meets the MPPT reference. The results show that the scheme causes a small SFD while improving the FN and the rate of change of frequency in any wind conditions, even in a grid that has a high penetration of wind power.

24 POWER TRANSMISSION AND DISTRIBUTION↗

Dynamic Droop–Based Inertial Control of a Doubly-Fed Induction Generator

If a large disturbance occurs in a power grid, two auxiliary loops for the inertial control of a wind turbine generator have been used: droop loop and rate of change of frequency (ROCOF) loop. Because their gains are fixed, difficulties arise in determining them suitable for all grid and wind conditions. This paper proposes a dynamic droop-based inertial control scheme of a doubly-fed induction generator (DFIG). The scheme aims to improve the frequency nadir (FN) and ensure stable operation of a DFIG. To achieve the first goal, the scheme uses a droop loop, but it dynamically changes its gain based on the ROCOF to release a large amount of kinetic energy during the initial stage of a disturbance. To do this, a shaping function that relates the droop to the ROCOF is used. To achieve the second goal, different shaping functions, which depend on rotor speeds, are used to give a large contribution in high wind conditions and prevent over-deceleration in low wind conditions during inertial control. The performance of the proposed scheme was investigated under various wind conditions using an EMTP-RV simulator. The results indicate that the scheme improves the FN and ensures stable operation of a DFIG.

17 WIND ENERGY↗

Self-Resonant Coil Design for High-frequency High-Power Inductive Wireless Power Transfer

In this paper, the design methodology of a high-frequency, high-power, long-distance inductive wireless power transfer (WPT) is presented. The airgap (d) of a traditional high-power (>1 kW) WPT is limited to a few hundred millimeters, which is almost 1/4th of the coil diameter, D; d ≤ D/4. In this paper, the power transfer distance is significantly increased (d ≥ 1.5D) by adopting a high-frequency magnetic design and GaN-based power electronics. The material and design of the coil and shield are investigated using FEA and tested experimentally. A high frequency 6.78 MHz wireless charging system was built to transfer 1 kW power over 3 m airgap.

Mohammad, Mostak↗

Cold acclimation threshold induction temperatures of switchgrass ecotypes grown under a long and short photoperiod

Abstract Plants can cold acclimate to enhance their freezing tolerance by sensing declining temperature and photoperiod cues. However, the factors influencing genotypic variation in the induction of cold acclimation are poorly understood among perennial grasses. We hypothesized that the more northern upland switchgrass ( Panicum virgatum L.) ecotype develops a higher degree of freezing tolerance by initiating cold acclimation at higher temperatures as compared with the coastal and southern lowland ecotypes. First, we determined the optimal method for assessing freezing tolerance and the length of exposure to 8/4°C required to induce the maximum level of freezing tolerance in the most northern upland and most southern lowland genotypes. We characterized the maximum freezing tolerance of eight uplands, three coastal and five lowland genotypes grown for 21 days at 8/4°C and a 10 or 16 h photoperiod. Next, we identified the temperature required to induce cold acclimation by exposing the 16 genotypes for 7 days at 20–6°C constant temperatures under a 10 or 16 h photoperiod. Cold acclimation initiated at temperatures 5 and 7°C higher in upland than in coastal and lowland genotypes. Among upland genotypes the shorter photoperiod induced cold acclimation at a 1°C higher temperature. Genotypes originating from a more northern latitude initiate cold acclimation at higher temperatures and develop higher maximum freezing tolerances. An earlier response to declining temperatures may provide the upland ecotype with additional time to prepare for winter and provide an advantage when plants are subjected to the rapid changes in fall temperature associated with injurious frosts.

60 APPLIED LIFE SCIENCES↗

Investigation of processing advanced waste forms in Cold Crucible Induction Melter systems

The Cold Crucible Induction Melter (CCIM) technology has been identified in several independent reviews and studies as a potential alternative or supplemental vitrification technology for specific U.S. Department of Energy (DOE) high level radioactive waste (HLW) streams. These inventories have unique chemistries, such as high alumina, high iron, high chromium, etc., that are not amenable to efficient immobilization in conventional borosilicate glass (BSG) matrices. Advanced waste forms, such as iron phosphate glass (FePG), high crystalline BSG (HC-BSG), and alumino-silicate glass-ceramic (GC) have been shown to provide significantly improved immobilization matrices for these challenging waste streams, including dramatically improved waste loadings; however, they are difficult to efficiently process in the baseline joule-heated ceramic melters (JHCMs). The CCIM technology can effectively process these advanced waste forms at the desired high waste loadings. This paper describes the most recent collaborative activities between the DOE Office of Environmental Management (DOE EM) and various Russian institutions in modeling, development and testing of advanced waste forms in CCIMs, including FePG and HC-BSG formulations. Additionally, past interactions with other international partners, including France and Korea, are described. Finally, recent enhancements to CCIM processing related to modeling, draining techniques and automated control, which were collaboratively developed, will be discussed. (authors)

12 MANAGEMENT OF RADIOACTIVE AND NON-RADIOACTIVE W↗

Ultra-trace determination of Strontium-90 in environmental soil samples from Qatar by collision/reaction cell-inductively coupled plasma mass spectrometry (CRC-ICP-MS/MS)

Because of the very low level of {sup 90}Sr in the environmental soil samples and its determination by beta counting may take several weeks, we developed a procedure for ultra-trace determination of {sup 90}Sr using collision reaction cell-inductively coupled plasma tandem mass spectrometry (CRC-ICP-MS/MS, Agilent 8800). Soil samples were dried at 105 deg. C and then heated in a furnace at 550 deg. C to remove any organics present. 500 g of each soil samples were aliquoted into 2000 ml glass beakers. Each Soils samples were soaked in 2 ppm Sr solution carrier to allow determination of chemical yield. The solid to liquid ratio was 1:1. Finally the soil samples were dried at 105 deg. C. Five hundred milliliters concentrated nitric acid and 250 ml hydrochloric acid volumes were added on 500 g soil samples. The samples were digested on hot plate at 80 deg. C to prevent spraying with continuous manual mixing. The leachate solution was separated. The solids were rinsed with 500 ml deionized water, warmed on a hot plate and the leachate plus previous leachate were filtered and the total volume was reduced to 500 ml by evaporation. Final leachate volume was transferred to a centrifuge tubes. The centrifuge tubes were centrifuged at 3,500 rpm for 10 min. The leachate was transferred to a 1 L beaker and heated on a hot plate to evaporate the leachate to dryness. The reside was re-dissolved in 100 ml of 2% HNO{sub 3} and reduced by evaporation to 10 mL. The solution was measured directly by CRC-ICP-MS/MS by setting the first quadruple analyzer to m/z 90 and introducing oxygen gas into the reaction cell for elimination isobar interference from zirconium-90. The method was validated by measurements of standard reference materials and applied on environmental soil samples. The overall time requirement for the measurement of strontium-90 by CRC-ICP-MS/MS is 2 days, significantly shorter than any radioanalytical protocol currently available. (authors)

12 MANAGEMENT OF RADIOACTIVE AND NON-RADIOACTIVE W↗

Effect of Cl{sub 2}- and HBr-based inductively coupled plasma etching on InP surface composition analyzed using in situ x-ray photoelectron spectroscopy

A Cl{sub 2}-HBr-O{sub 2}/Ar inductively coupled plasma (ICP) etching process has been adapted for the processing of InP-based heterostructures in a 300-mm diameter CMOS etching tool. Smooth and anisotropic InP etching is obtained at moderate etch rate ({approx}600 nm/min). Ex situ x-ray energy dispersive analysis of the etched sidewalls shows that the etching anisotropy is obtained through a SiO{sub x} passivation mechanism. The stoichiometry of the etched surface is analyzed in situ using angle-resolved x-ray photoelectron spectroscopy. It is observed that Cl{sub 2}-based ICP etching results in a significantly P-rich surface. The phosphorous layer identified on the top surface is estimated to be {approx}1-1.3-nm thick. On the other hand InP etching in HBr/Ar plasma results in a more stoichiometric surface. In contrast to the etched sidewalls, the etched surface is free from oxides with negligible traces of silicon. Exposure to ambient air of the samples submitted to Cl{sub 2}-based chemistry results in the complete oxidation of the P-rich top layer. It is concluded that a post-etch treatment or a pure HBr plasma step may be necessary after Cl{sub 2}-based ICP etching for the recovery of the InP material.

36 MATERIALS SCIENCE↗

Effect of O{sub 2} gas partial pressure on mechanical properties of Al{sub 2}O{sub 3} films deposited by inductively coupled plasma-assisted radio frequency magnetron sputtering

The effect of O{sub 2} partial pressure on the mechanical properties of Al{sub 2}O{sub 3} films is studied. Using films prepared by inductively coupled plasma-assisted radio frequency magnetron sputtering, the deposition rate of Al{sub 2}O{sub 3} decreases rapidly when oxygen is added to the argon sputtering gas. The internal stresses in the films are compressive, with magnitude decreasing steeply from 1.6 GPa for films sputtered in pure argon gas to 0.5 GPa for films sputtered in argon gas at an O{sub 2} partial pressure of 0.89 Multiplication-Sign 10{sup -2} Pa. Stress increases gradually with increasing O{sub 2} partial pressure. Using a nanoindentation tester with a Berkovich indenter, film hardness was measured to be about 14 GPa for films sputtered in pure argon gas. Hardness decreases rapidly on the addition of O{sub 2} gas, but increases when the O{sub 2} partial pressure is increased. Adhesion, measured using a Vickers microhardness tester, increases with increasing O{sub 2} partial pressure. Electron probe microanalyzer measurements reveal that the argon content of films decreases with increasing O{sub 2} partial pressure, whereas the O to Al composition ratio increases from 1.15 for films sputtered in pure argon gas to 1.5 for films sputtered in argon gas at O{sub 2} partial pressures over 2.4 Multiplication-Sign 10{sup -2} Pa. X-ray diffraction measurements reveal that films sputtered in pure argon gas have an amorphous crystal structure, whereas {gamma}-Al{sub 2}O{sub 3} is produced for films sputtered in argon gas with added O{sub 2} gas. Atomic force microscopy observations reveal that the surface topography of sputtered Al{sub 2}O{sub 3} films changes from spherical to needlelike as O{sub 2} partial pressure is increased. Fracture cross sections of the films observed by scanning electron microscopy reveal that the film morphology exhibits no discernible features at all O{sub 2} partial pressures.

36 MATERIALS SCIENCE↗

Effect of bias application to plasma density in weakly magnetized inductively coupled plasma

Independent control of the ion flux and energy can be achieved in a dual frequency inductively coupled plasma (ICP) system. Typically, the plasma density is controlled by the high-frequency antenna radio-frequency (RF) power and the ion energy is controlled by the low-frequency bias RF power. Increasing the bias power has been known to cause a decrease in the plasma density in capacitively coupled discharge systems as well as in ICP systems. However, an applied axial magnetic field was found to sustain or increase the plasma density as bias power is increased. Measurements show higher electron temperatures but lower plasma densities are obtained in ordinary ICP systems than in magnetized ICP systems under the same neutral gas pressure and RF power levels. Explanations for the difference in the behavior of plasma density with increasing bias power are given in terms of the difference in the heating mechanism in ordinary unmagnetized and magnetized ICP systems.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗

Inductively coupled plasma–reactive ion etching of c- and a-plane AlGaN over the entire Al composition range: Effect of BCl{sub 3} pretreatment in Cl{sub 2}/Ar plasma chemistry

Inductively coupled plasma (ICP)–reactive ion etching (RIE) patterning is a standard processing step for UV and optical photonic devices based on III-nitride materials. There is little research on ICP-RIE of high Al-content AlGaN alloys and for nonpolar nitride orientations. The authors present a comprehensive study of the ICP-RIE of c- and a-plane AlGaN in Cl{sub 2}/Ar plasma over the entire Al composition range. The authors find that the etch rate decreases in general with increasing Al content, with different behavior for c- and a-plane AlGaN. They also study the effect of BCl{sub 3} deoxidizing plasma pretreatment. An ICP deoxidizing BCl{sub 3} plasma with the addition of argon is more efficient in removal of surface oxides from Al{sub x}Ga{sub 1−x}N than RIE alone. These experiments show that Al{sub x}Ga{sub 1−x}N etching is affected by the higher binding energy of AlN and the higher affinity of oxygen to aluminum compared to gallium, with oxides on a-plane AlGaN more difficult to etch as compared to oxides on c-plane AlGaN, specifically for high Al composition materials. The authors achieve reasonably high etch rate (∼350 nm/min) for high Al-content materials with a smooth surface morphology at a low DC bias of ∼−45 VDC.

36 MATERIALS SCIENCE↗

Effects of magnetic flux density and substrate bias voltage on Ni films prepared on a flexible substrate material using unbalanced magnetron sputtering assisted by inductively coupled plasma

The authors fabricated Ni films on a flexible substrate material using unbalanced magnetron sputtering assisted by inductively coupled plasma. The effects of magnetic flux density B{sub C} and substrate DC bias voltage V{sub S} on the Ni film structures were investigated. For V{sub S} = −40 V, the average surface grain size D{sub G} measured by atomic force microscopy for B{sub C} = 0, 3, and 5 mT was 88.2, 95.4, and 104.4 nm, respectively. In addition, D{sub G} increased with V{sub S}. From x-ray diffraction measurements, the (111) and (200) peaks were clearly visible for the fabricated Ni films. The ratio of the integrated intensities of I(111)/I(200) increased with V{sub S}. For V{sub S} = −40 V and B{sub C} = 3 mT, a film resistivity ρ of 8.96 × 10{sup −6} Ω cm was observed, which is close to the Ni bulk value of 6.84 × 10{sup −6} Ω cm. From these results, the authors determined that the structure of the fabricated Ni films on the flexible substrate material was affected by the values of B{sub C} and V{sub S}.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

Modeling of inductively coupled plasma SF{sub 6}/O{sub 2}/Ar plasma discharge: Effect of O{sub 2} on the plasma kinetic properties

A global model has been developed for low-pressure, inductively coupled plasma (ICP) SF{sub 6}/O{sub 2}/Ar mixtures. This model is based on a set of mass balance equations for all the considered species, coupled with the discharge power balance equation and the charge neutrality condition. The present study is an extension of the kinetic global model previously developed for SF{sub 6}/Ar ICP plasma discharges [Lallement et al., Plasma Sources Sci. Technol. 18, 025001 (2009)]. It is focused on the study of the impact of the O{sub 2} addition to the SF{sub 6}/Ar gas mixture on the plasma kinetic properties. The simulation results show that the electron density increases with the %O{sub 2}, which is due to the decrease of the plasma electronegativity, while the electron temperature is almost constant in our pressure range. The density evolutions of atomic fluorine and oxygen versus %O{sub 2} have been analyzed. Those atomic radicals play an important role in the silicon etching process. The atomic fluorine density increases from 0 up to 40% O{sub 2} where it reaches a maximum. This is due to the enhancement of the SF{sub 6} dissociation processes and the production of fluorine through the reactions between SF{sub x} and O. This trend is experimentally confirmed. On the other hand, the simulation results show that O(3p) is the preponderant atomic oxygen. Its density increases with %O{sub 2} until reaching a maximum at almost 40% O{sub 2}. Over this value, its diminution with O{sub 2}% can be justified by the high increase in the loss frequency of O(3p) by electronic impact in comparison to its production frequency by electronic impact with O{sub 2}.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗