Flow field velocity measurements for non-isothermal systems
Experimental techniques which can be potentially utilized to measure the gas velocity fields in nonisothermal CVD systems both in ground-based and space-based investigations are considered. The advantages and disadvantages of a three-component laser velocimetry (LV) system that was adapted specifically for quantitative determination of the mixed convective flows in a chamber for crystal growth and film formation by CVD are discussed. Data from a horizontal research CVD reactor indicate that current models for the effects of thermophoretic force are not adequate to predict the thermophoretic bias in arbitrary flow configurations. It is concluded that LV techniques are capable of characterizing the fluid dynamics of a CVD reactor at typical growth temperatures. Thermal effects are shown to dominate and stabilize the fluid dynamics of the reactor. Heating of the susceptor increases the gas velocities parallel to the face of a slanted susceptor by up to a factor of five.