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At least 739 records · Page 41

Electromagnetic wave attenuation measurements in a ring-shaped inductively coupled air plasma

An aerocraft with the surface, inlet and radome covered large-area inductive coupled plasma (ICP) can attenuate its radar echo effectively. The shape, thickness, and electron density (N{sub e}) distribution of ICP are critical to electromagnetic wave attenuation. In the paper, an air all-quartz ICP generator in size of 20 × 20 × 7 cm{sup 3} without magnetic confinement is designed. The discharge results show that the ICP is amorphous in E-mode and ring-shaped in H-mode. The structure of ICP stratifies into core region and edge halo in H-mode, and its width and thickness changes from power and pressure. Such phenomena are explained by the distribution of RF magnetic field, the diffusion of negative ions plasma and the variation of skin depth. In addition, the theoretical analysis shows that the N{sub e} achieves nearly uniform within the electronegative core and sharply steepens in the edge. The N{sub e} of core region is diagnosed by microwave interferometer under varied conditions (pressure in range of 10–50 Pa, power in 300–700 W). Furthermore, the electromagnetic wave attenuation measurements were carried out with the air ICP in the frequencies of 4–5 GHz. The results show that the interspaced ICP is still effective to wave attenuation, and the wave attenuation increases with the power and pressure. The measured attenuation is approximately in accordance with the calculation data of finite-different time-domain simulations.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Modulations of the plasma uniformity by low frequency sources in a large-area dual frequency inductively coupled plasma based on fluid simulations

As the wafer size increases, dual frequency (DF) inductively coupled plasma (ICP) sources have been proposed as an effective method to achieve large-area uniform plasma processing. A two-dimensional (2D) self-consistent fluid model, combined with an electromagnetic module, has been employed to investigate the influence of the low frequency (LF) source on the plasma radial uniformity in an argon DF discharge. When the DF antenna current is fixed at 10 A, the bulk plasma density decreases significantly with the LF due to the less efficient heating, and the best radial uniformity is obtained at 3.39 MHz. As the LF decreases to 2.26 MHz, the plasma density is characterized by an edge-high profile, and meanwhile the maximum of the electron temperature appears below the outer two-turn coil. Moreover, the axial ion flux at 3.39 MHz is rather uniform in the center region except at the radial edge of the substrate, where a higher ion flux is observed. When the inner five-turn coil frequency is fixed at 2.26 MHz, the plasma density profiles shift from edge-high over uniform to center-high as the LF coil current increases from 6 A to 18 A, and the best plasma uniformity is obtained at 14 A. In addition, the maximum of the electron temperature becomes lower with a second peak appears at the radial position of r = 9 cm at 18 A.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Characteristics of anomalous skin effect and evolution of power absorption regions in a cylindrical radio frequency inductively coupled plasma

In a low-pressure radio-frequency (13.56 MHz), inductively coupled argon plasma generated by a normal cylindrical rf coil, electric field, current density, and absorbed power density is calculated from magnetic field measured with a phase-resolved magnetic probe. The anomalous skin effect (ASE) for the cylindrical rf coil is compared to those previously reported for the planar and re-entrant cylindrical rf coils. Physical reasons for our observed characteristics of ASE are presented. With the increasing discharge power, the size and the number of negative and positive power absorption regions evolve into several distinct patterns. For the low discharge power (at 156.9 W), there is one area of positive and one area of negative power absorption in the radial direction. For the medium discharge power (279 W–683.5 W), there are two areas of negative and two areas of positive power absorption. For the even higher discharge power (above 803.5 W), the number of areas is the same as that of the medium discharge power, but the size of the inner positive and negative power absorption areas is approximately doubled and halved, respectively, while the outer positive and negative power absorption areas slightly shrinks. The evolution of positive and negative power absorption regions is explained as a result of electron thermal diffusion and the energy conversion between rf current and electric field. The spatial decays of electric field and current density are also elucidated by linking them with the positive and negative power absorption pattern.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Experimental investigation on plasma parameter profiles on a wafer level with reactor gap lengths in an inductively coupled plasma

The gap length effect on plasma parameters is investigated in a planar type inductively coupled plasma at various conditions. The spatial profiles of ion densities and the electron temperatures on the wafer level are measured with a 2D probe array based on the floating harmonic method. At low pressures, the spatial profiles of the plasma parameters rarely changed by various gap lengths, which indicates that nonlocal kinetics are dominant at low pressures. However, at relatively high pressures, the spatial profiles of the plasma parameter changed dramatically. These plasma distribution profile characteristics should be considered for plasma reactor design and processing setup, and can be explained by the diffusion of charged particles and the local kinetics.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Effects of feedstock availability on the negative ion behavior in a C{sub 4}F{sub 8} inductively coupled plasma

In this paper, the negative ion behavior in a C{sub 4}F{sub 8} inductively coupled plasma (ICP) is investigated using a hybrid model. The model predicts a non-monotonic variation of the total negative ion density with power at low pressure (10–30 mTorr), and this trend agrees well with experiments that were carried out in many fluorocarbon (fc) ICP sources, like C{sub 2}F{sub 6}, CHF{sub 3}, and C{sub 4}F{sub 8}. This behavior is explained by the availability of feedstock C{sub 4}F{sub 8} gas as a source of the negative ions, as well as by the presence of low energy electrons due to vibrational excitation at low power. The maximum of the negative ion density shifts to low power values upon decreasing pressure, because of the more pronounced depletion of C{sub 4}F{sub 8} molecules, and at high pressure (∼50 mTorr), the anion density continuously increases with power, which is similar to fc CCP sources. Furthermore, the negative ion composition is identified in this paper. Our work demonstrates that for a clear understanding of the negative ion behavior in radio frequency C{sub 4}F{sub 8} plasma sources, one needs to take into account many factors, like the attachment characteristics, the anion composition, the spatial profiles, and the reactor configuration. Finally, a detailed comparison of our simulation results with experiments is conducted.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗

Correlation between vibrational temperature of N{sub 2} and plasma parameters in inductively coupled Ar/N{sub 2} plasmas

Vibrational temperature (T{sub vib}) of N{sub 2} gas and electron energy distribution function (EEDF) were measured in Ar/N{sub 2} mixture inductively coupled plasma (ICP). At a low gas pressure of 5 mTorr where the EEDF is bi-Maxwellian distribution, plasma density n{sub p} and T{sub vib} (from 7000 K to 5600 K) slightly decrease. However, remarkable decrease in n{sub p} and T{sub vib} is found with the dilution of N{sub 2} gas at a high gas pressure of 50 mTorr, where the EEDF is depleted Maxwellian distribution at a fixed ICP power of 150 W. When the ICP power increases from 150 W to 300 W at the gas pressure of 50 mTorr, the depleted tail on the EEDF is replenished, while n{sub p} is little changed with the dilution of N{sub 2} gas. In this case, T{sub vib} slightly decreases from 9500 K to 7600 K. These results indicate that the variation of T{sub vib} is strongly correlated to the plasma parameters, such as the plasma density and EEDF.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Effect of low-damage inductively coupled plasma on shallow nitrogen-vacancy centers in diamond

Near-surface nitrogen-vacancy (NV) centers in diamond have been successfully employed as atomic-sized magnetic field sensors for external spins over the last years. A key challenge is still to develop a method to bring NV centers at nanometer proximity to the diamond surface while preserving their optical and spin properties. To that aim we present a method of controlled diamond etching with nanometric precision using an oxygen inductively coupled plasma process. Importantly, no traces of plasma-induced damages to the etched surface could be detected by X-ray photoelectron spectroscopy and confocal photoluminescence microscopy techniques. In addition, by profiling the depth of NV centers created by 5.0 keV of nitrogen implantation energy, no plasma-induced quenching in their fluorescence could be observed. Moreover, the developed etching process allowed even the channeling tail in their depth distribution to be resolved. Furthermore, treating a {sup 12}C isotopically purified diamond revealed a threefold increase in T{sub 2} times for NV centers with <4 nm of depth (measured by nuclear magnetic resonance signal from protons at the diamond surface) in comparison to the initial oxygen-terminated surface.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

A tightly coupled non-equilibrium model for inductively coupled radio-frequency plasmas

The objective of the present work is the development of a tightly coupled magneto-hydrodynamic model for inductively coupled radio-frequency plasmas. Non Local Thermodynamic Equilibrium (NLTE) effects are described based on a hybrid State-to-State approach. A multi-temperature formulation is used to account for thermal non-equilibrium between translation of heavy-particles and vibration of molecules. Excited electronic states of atoms are instead treated as separate pseudo-species, allowing for non-Boltzmann distributions of their populations. Free-electrons are assumed Maxwellian at their own temperature. The governing equations for the electro-magnetic field and the gas properties (e.g., chemical composition and temperatures) are written as a coupled system of time-dependent conservation laws. Steady-state solutions are obtained by means of an implicit Finite Volume method. The results obtained in both LTE and NLTE conditions over a broad spectrum of operating conditions demonstrate the robustness of the proposed coupled numerical method. The analysis of chemical composition and temperature distributions along the torch radius shows that: (i) the use of the LTE assumption may lead to an inaccurate prediction of the thermo-chemical state of the gas, and (ii) non-equilibrium phenomena play a significant role close the walls, due to the combined effects of Ohmic heating and macroscopic gradients.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗

An inductively heated hot cavity catcher laser ion source

An inductively heated hot cavity catcher has been constructed for the production of low-energy ion beams of exotic, neutron-deficient Ag isotopes. A proof-of-principle experiment has been realized by implanting primary {sup 107}Ag{sup 21+} ions from a heavy-ion cyclotron into a graphite catcher. A variable-thickness nickel foil was used to degrade the energy of the primary beam in order to mimic the implantation depth expected from the heavy-ion fusion-evaporation recoils of N = Z {sup 94}Ag. Following implantation, the silver atoms diffused out of the graphite and effused into the catcher cavity and transfer tube, where they were resonantly laser ionized using a three-step excitation and ionization scheme. Following mass separation, the ions were identified by scanning the frequency of the first resonant excitation step while recording the ion count rate. Ion release time profiles were measured for different implantation depths and cavity temperatures with the mean delay time varying from 10 to 600 ms. In addition, the diffusion coefficients for silver in graphite were measured for temperatures of 1470 K, 1630 K, and 1720 K, from which an activation energy of 3.2 ± 0.3 eV could be determined.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

Design of spherical electron gun for ultra high frequency, CW power inductive output tube

Inductive Output Tube (IOT) is an amplifier that usually operates in UHF range. It is an electron tube whose basic structure is similar to conventional vacuum devices. This device is widely used in broadcast applications but is now being explored for scientific applications also specifically, particle accelerators and fusion plasma heating purposes. The paper describes the design approach of a spherical gridded electron gun of a 500 MHz, 100 kW CW power IOT. The electron gun structure has been simulated and optimized for operating voltage and current of 40kV and 3.5 A respectively. The electromagnetic analysis of this spherical electron gun has been carried out in CST and TRAK codes.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗

Transducer selection and application in magnetoacoustic tomography with magnetic induction

As an acoustic receiver, transducer plays a vital role in signal acquisition and image reconstruction for magnetoacoustic tomography with magnetic induction (MAT-MI). In order to optimize signal acquisition, the expressions of acoustic pressure detection and waveform collection are theoretically studied based on the radiation theory of acoustic dipole and the reception pattern of transducer. Pressure distributions are simulated for a cylindrical phantom model using a planar piston transducer with different radii and bandwidths. The proposed theory is also verified by the experimental measurements of acoustic waveform detection for an aluminum foil cylinder. It is proved that acoustic pressure with sharp and clear boundary peaks can be detected by the large-radius transducer with wide bandwidth, reflecting the differential of the induced Lorentz force accurately, which is helpful for precise conductivity reconstruction. To detect acoustic pressure with acceptable pressure amplitude, peak pressure ratio, amplitude ratio, and improved signal to noise ratio, the scanning radius of 5–10 times the radius of the object should be selected to improve the accuracy of image reconstruction. This study provides a theoretical and experimental basis for transducer selection and application in MAT-MI to obtain reconstructed images with improved resolution and definition.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗

Measuring ion velocity distribution functions through high-aspect ratio holes in inductively coupled plasmas

Several issues associated with plasma etching of high aspect ratio structures originate from the ions' bombardment of the sidewalls of the feature. The off normal angle incident ions are primarily due to their temperature at the sheath edge and possibly to charging effects. We have measured the ion velocity distribution function (IVDF) at the wafer surface in an industrial inductively coupled plasma reactor by using multigrid retarding field analyzers (RFA) in front of which we place 400 μm thick capillary plates with holes of 25, 50, and 100 μm diameters. The RFA then probes IVDF at the exit of the holes with Aspect Ratios (AR) of 16, 8, and 4, respectively. The results show that the ion flux dramatically drops with the increase in AR. By comparing the measured IVDF with an analytical model, we concluded that the ion temperature is 0.27 eV in our plasma conditions. The charging effects are also observed and are shown to significantly reduce the ion energy at the bottom of the feature but only with a “minor” effect on the ion flux and the shape of the IVDF.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗

Optimization of time on CF{sub 4}/O{sub 2} etchant for inductive couple plasma reactive ion etching of TiO{sub 2} thin film

In this work, we investigate the optimum etching of titanium dioxide (TiO{sub 2}) using inductive couple plasma reactive ion etching (ICP-RIE) on our fabricated devices. By using a combination of CF{sub 4}/O{sub 2} gases as plasma etchant with ratio of 3:1, three samples of TiO{sub 2} thin film were etched with different time duration of 10 s, 15 s and 20 s. The ion bombardment of CF{sub 4} gases with plasma enhancement by O{sub 2} gas able to break the oxide bond of TiO{sub 2} and allow anisotropic etch profile with maximum etch rate of 18.6 nm/s. The sample was characterized by using optical profilometer to determine the depth of etched area and scanning electron microscopy (SEM) for etch profile characterization.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

Kinetic modeling of E-to-H mode transition in inductively coupled hydrogen plasmas

Radio Frequency (RF) Inductively Coupled Plasmas (ICPs) are widely known for their two discharge modes, i.e., H-mode and E-mode, where the dynamics of the plasmas are completely different from each other. We have performed a kinetic simulation of a hydrogen plasma discharge in order to clarify the discharge mechanism and the E-to-H transition of the RF ICPs. The numerical simulation results, such as the time variations of spatial distribution of electron density and the power dissipated in the plasma, show the characteristic changes of the plasma dynamics due to E-to-H mode transition. Especially, the drastic change during the mode transition has been observed in the time evolution of the electron energy distribution function (EEDF). The EEDF deviates from a Maxwellian distribution before/after the transition and the deviation is more significant in the E-mode phase. These results indicate the importance of kinetic modeling for the physical understanding of E-to-H transition.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

A 5 kA pulsed power supply for inductive and plasma loads in large volume plasma device

This paper describes 5 kA, 12 ms pulsed power supply for inductive load of Electron Energy Filter (EEF) in large volume plasma device. The power supply is based upon the principle of rapid sourcing of energy from the capacitor bank (2.8 F/200 V) by using a static switch, comprising of ten Insulated Gate Bipolar Transistors (IGBTs). A suitable mechanism is developed to ensure equal sharing of current and uniform power distribution during the operation of these IGBTs. Safe commutation of power to the EEF is ensured by the proper optimization of its components and by the introduction of over voltage protection (>6 kV) using an indigenously designed snubber circuit. Various time sequences relevant to different actions of power supply, viz., pulse width control and repetition rate, are realized through optically isolated computer controlled interface.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

Transient plasma potential in pulsed dual frequency inductively coupled plasmas and effect of substrate biasing

An electron emitting probe in saturated floating potential mode has been used to investigate the temporal evolution of plasma potential and the effect of substrate RF biasing on it for pulsed dual frequency (2 MHz/13.56 MHz) inductively coupled plasma (ICP) source. The low frequency power (P{sub 2MHz}) has been pulsed at 1 KHz and a duty ratio of 50%, while high frequency power (P{sub 13.56MHz}) has been used in continuous mode. The substrate has been biased with a separate bias power at (P{sub 12.56MHz}) Argon has been used as a discharge gas. During the ICP power pulsing, three distinct regions in a typical plasma potential profile, have been identified as ‘initial overshoot’, pulse ‘on-phase’ and pulse ‘off-phase’. It has been found out that the RF biasing of the substrate significantly modulates the temporal evolution of the plasma potential. During the initial overshoot, plasma potential decreases with increasing RF biasing of the substrate, however it increases with increasing substrate biasing for pulse ‘on-phase’ and ‘off-phase’. An interesting structure in plasma potential profile has also been observed when the substrate bias is applied and its evolution depends upon the magnitude of bias power. The reason of the evolution of this structure may be the ambipolar diffusion of electron and its dependence on bias power.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

High quality factor manganese-doped aluminum lumped-element kinetic inductance detectors sensitive to frequencies below 100 GHz

Aluminum lumped-element kinetic inductance detectors (LEKIDs) sensitive to millimeter-wave photons have been shown to exhibit high quality factors, making them highly sensitive and multiplexable. The superconducting gap of aluminum limits aluminum LEKIDs to photon frequencies above 100 GHz. Manganese-doped aluminum (Al-Mn) has a tunable critical temperature and could therefore be an attractive material for LEKIDs sensitive to frequencies below 100 GHz if the internal quality factor remains sufficiently high when manganese is added to the film. To investigate, we measured some of the key properties of Al-Mn LEKIDs. A prototype eight-element LEKID array was fabricated using a 40 nm thick film of Al-Mn deposited on a 500 μm thick high-resistivity, float-zone silicon substrate. The manganese content was 900 ppm, the measured T c = 694 ± 1mK, and the resonance frequencies were near 150 MHz. Using measurements of the forward scattering parameter S 21 at various bath temperatures between 65 and 250 mK, we determined that the Al-Mn LEKIDs we fabricated have internal quality factors greater than 2 × 10 5 , which is high enough for millimeter-wave astrophysical observations. In the dark conditions under which these devices were measured, the fractional frequency noise spectrum shows a shallow slope that depends on bath temperature and probe tone amplitude, which could be two-level system noise. In conclusion, the anticipated white photon noise should dominate this level of low-frequency noise when the detectors are illuminated with millimeter-waves in future measurements. The LEKIDs responded to light pulses from a 1550 nm light-emitting diode, and we used these light pulses to determine that the quasiparticle lifetime is 60 μs.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

Effects of a chirped bias voltage on ion energy distributions in inductively coupled plasma reactors

The metrics for controlling reactive fluxes to wafers for microelectronics processing are becoming more stringent as feature sizes continue to shrink. Recent strategies for controlling ion energy distributions to the wafer involve using several different frequencies and/or pulsed powers. Although effective, these strategies are often costly or present challenges in impedance matching. With the advent of matching schemes for wide band amplifiers, other strategies to customize ion energy distributions become available. In this study, we discuss results from a computational investigation of biasing substrates using chirped frequencies in high density, electronegative inductively coupled plasmas. Depending on the frequency range and chirp duration, the resulting ion energy distributions exhibit components sampled from the entire frequency range. However, the chirping process also produces transient shifts in the self-generated dc bias due to the reapportionment of displacement and conduction with frequency to balance the current in the system. Finally, the dynamics of the dc bias can also be leveraged towards customizing ion energy distributions.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗