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At least 73 records · Page 4
All sourcesNASA NTRSDOE OSTI
NASA NTRS1995

Cleaning without chlorinated solvents

Because of health and environmental concerns, many regulations have been passed in recent years regarding the use of chlorinated solvents. The Oak Ridge Y-12 Plant has had an active program to find alternatives for these solvents used in cleaning applications for the past 7 years. During this time frame, the quantity of solvents purchased has been reduced by 92 percent. The program has been a twofold effort. Vapor degreasers used in batch cleaning operations have been replaced by ultrasonic cleaning with aqueous detergent, and other organic solvents have been identified for use in hand-wiping or specialty operations. In order to qualify these alternatives for use, experimentation was conducted on cleaning ability as well as effects on subsequent operations such as welding, painting, and bonding. Cleaning ability was determined using techniques such as x-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FTIR) which are capable of examining monolayer levels of contamination on a surface. Solvents have been identified for removal of rust preventative oils, lapping oils, machining coolants, lubricants, greases, and mold releases. Solvents have also been evaluated for cleaning urethane foam spray guns, swelling of urethanes, and swelling of epoxies.

Thompson, L. M.↗
NASA NTRS1995

Environmentally compatible hand wipe cleaning solvents

Several solvents of environmental concern have previously been used for hand wipe cleaning of SRB surfaces, including 1,1,1-trichloroethane, perchloroethylene, toluene, xylene, and MEK. USBI determined the major types of surfaces involved, and qualification requirements of replacement cleaning agents. Nineteen environmentally compatible candidates were tested on 33 material substrates with 26 types of potential surface contaminants, involving over 7,000 individual evaluations. In addition to the cleaning performance evaluation, bonding, compatibility, and corrosion tests were conducted. Results showed that one cleaner was not optimum for all surfaces. In most instances, some of the candidates cleaned better than the 1,1,1-trichloroethane baseline control. Aqueous cleaners generally cleaned better, and were more compatible with nonmetallic materials, such as paints, plastics, and elastomers. Organic base cleaners were better on metal surfaces. Five cleaners have been qualified and are now being implemented in SRB hand wipe cleaning operations.

Clayton, Catherine P.↗
NASA NTRS1997

Surfactant/Supercritical Fluid Cleaning of Contaminated Substrates

CFC's and halogenated hydrocarbon solvents have been the solvents of choice to degrease and otherwise clean precision metal parts to allow proper function. Recent regulations have, however, rendered most of these solvents unacceptable for these purposes. New processes which are being used or which have been proposed to replace these solvents usually either fail to remove water soluble contaminants or produce significant aqueous wastes which must then be disposed of. In this work, a new method for cleaning surfaces will be investigated. Solubility of typical contaminants such as lubricating greases and phosphatizing bath residues will be studied in several surfactant/supercritical fluid solutions. The effect of temperature, pressure, and the composition of the cleaning mixture on the solubility of oily, polar, and ionic contaminants will be investigated. A reverse micellar solution in a supercritical light hydrocarbon solvent will be used to clean samples of industrial wastes. A reverse micellar solution is one where water is dissolved into a non-polar solvent with the aid of a surfactant. The solution will be capable of dissolving both water-soluble contaminants and oil soluble contaminants. Once the contaminants have been dissolved into the solution they will be separated from the light hydrocarbon and precipitated by a relatively small pressure drop and the supercritical solvent will be available for recycle for reuse. The process will be compared to the efficacy of supercritical CO2 cleaning by attempting to clean the same types of substrates and machining wastes with the same contaminants using supercritical CO2. It is anticipated that the supercritical CO2 process will not be capable of removing ionic residues.

White, Gary L.↗
NASA NTRS1997

Replacement Technologies for Precision Cleaning of Aerospace Hardware for Propellant Service

The NASA White Sands Test Facility (WSTF) is developing cleaning and verification processes to replace currently used chlorofluorocarbon-l13- (CFC-113-) based processes. The processes being evaluated include both aqueous- and solvent-based techniques. Replacement technologies are being investigated for aerospace hardware and for gauges and instrumentation. This paper includes the findings of investigations of aqueous cleaning and verification of aerospace hardware using known contaminants, such as hydraulic fluid and commonly used oils. The results correlate nonvolatile residue with CFC 113. The studies also include enhancements to aqueous sampling for organic and particulate contamination. Although aqueous alternatives have been identified for several processes, a need still exists for nonaqueous solvent cleaning, such as the cleaning and cleanliness verification of gauges used for oxygen service. The cleaning effectiveness of tetrachloroethylene (PCE), trichloroethylene (TCE), ethanol, hydrochlorofluorocarbon 225 (HCFC 225), HCFC 141b, HFE 7100(R), and Vertrel MCA(R) was evaluated using aerospace gauges and precision instruments and then compared to the cleaning effectiveness of CFC 113. Solvents considered for use in oxygen systems were also tested for oxygen compatibility using high-pressure oxygen autogenous ignition and liquid oxygen mechanical impact testing.

Harold Beeson↗
NASA NTRS1998

Evaluation of HCFC AK 225 Alternatives for Precision Cleaning and Verification

Maintaining qualified cleaning and verification processes are essential in an production environment. Environmental regulations have and are continuing to impact cleaning and verification processing in component and large structures, both at the Michoud Assembly Facility and component suppliers. The goal of the effort was to assure that the cleaning and verification proceeds unimpeded and that qualified, environmentally compliant material and process replacements are implemented and perform to specifications. The approach consisted of (1) selection of a Supersonic Gas-Liquid Cleaning System; (2) selection and evaluation of three cleaning and verification solvents as candidate alternatives to HCFC 225 (Vertrel 423 (HCFC), Vertrel MCA (HFC/1,2-Dichloroethylene), and HFE 7100DE (HFE/1,2 Dichloroethylene)); and evaluation of an analytical instrumental post cleaning verification technique. This document is presented in viewgraph format.

Melton, D. M.↗
NASA NTRS2000

Cleaning at the Edge of Science: NASA's Genesis Mission

As part of NASA's continuing exploration of the origins of our solar system, the California Institute of Technology, Jet Propulsion Laboratory, Lockheed Martin Astronautics, Los Alamos National Laboratory, and the Johnson Space Center are working together to develop the Genesis mission to return solar matter for analysis in terrestrial laboratories. These samples will be used to define a baseline for the chemical and isotopic composition of the solar nebula. Deviations from the baseline resulted as the solar system evolved; thus, providing a tracer for materials incorporated into meteorites, comets and planetary bodies. These differences represent "fossil residues" that provide invaluable insight into how the solar nebula evolved to form the planets. We cannot collect a sample of the Sun as we would for a planet; fortunately, solar material comes to us in the form of the solar wind. Ultrapure materials will be exposed at the Earth-Sun L1, outside the Earth's magnetic influence, where solar wind nuclei will be captured for 2 years before returning to Earth in January 2001. The key challenge to obtaining a good sample of solar wind, uncontaminated by terrestrial atoms, is a clean collection surface in a clean sample canister and clean facilities with which to handle the samples for allocation and future reference. The Johnson Space Center QSQ is responsible for contamination control for the mission, for ensuring the cleanliness of collection surfaces and providing a clean environment for their subsequent handling. The level of cleanliness required is high; at the time of analysis (after sample return), the surface contamination by C, N, O must each be less than 10(exp 15) atoms per centimeter squared and for elements other than C, N, O, the number of atoms per centimeter squared of each surface contaminant shall not exceed the estimated solar wind fluence of the species (varies by element between U at approx. 10 (exp 4) atoms per centimeter squared to Fe, Si, Mg, and Ne at approx. 10(exp 12), atoms per centimeter squared). Typical spacecraft assembly is done in class 10,000 cleanrooms. The final cleaning and reintegration of the Genesis payload canister as well as all sample material handling will be done within a class 10 cleanroom using Dryden suits to protect the collector materials from any human debris. Each component is unique, no standard size, shape, material, or precleaning history. We are developing new final cleaning techniques utilizing ultra-pure water to minimize molecular residues on the hardware components.

Stansbery, Eileen K.↗
NASA NTRS2001

Nonflammable, Nonaqueous, Low Atmospheric Impact, High Performance Cleaning Solvents

For many years, chlorofluorocarbon (CFC) and chlorocarbon solvents have played an important part in aerospace operations. These solvents found extensive use as cleaning and analysis (EPA) solvents in precision and critical cleaning. However, CFCs and chlorocarbon solvents have deleterious effects on the ozone layer, are relatively strong greenhouse gases, and some are suspect or known carcinogens. Because of their ozone-depletion potential (ODP), the Montreal Protocol and its amendments, as well as other environmental regulations, have resulted in the phaseout of CFC-113 and 1,1,1-trichloroethane (TCA). Although alternatives have been recommended, they do not perform as well as the original solvents. In addition, some analyses, such as the infrared analysis of extracted hydrocarbons, cannot be performed with the substitute solvents that contain C-H bonds. CFC-113 solvent has been used for many critical aerospace applications. CFC-113, also known as Freon (registered) TF, has been used extensively in NASA's cleaning facilities for precision and critical cleaning, in particular the final rinsing in Class 100 areas, with gas chromatography analysis of rinse residue. While some cleaning can be accomplished by other processes, there are certain critical applications where CFC-113 or a similar solvent is highly cost-effective and ensures safety. Oxygen system components are one example where a solvent compatible with oxygen and capable of removing fluorocarbon grease is needed. Electronic components and precision mechanical components can also be damaged by aggressive cleaning solvents.

Dhooge, P. M.↗
NASA NTRS2007

Decontamination of Genesis Array Materials by UV Ozone Cleaning

Shortly after the NASA Genesis Mission sample return capsule returned to earth on September 8, 2004, the science team discovered that all nine ultra-pure semiconductor materials were contaminated with a thin molecular organic film approximately 0 to 100 angstroms thick. The organic contaminate layer, possibly a silicone, situated on the surface of the materials is speculated to have formed by condensation of organic matter from spacecraft off-gassing at the Lagrange 1 halo orbit during times of solar exposure. While the valuable solar wind atoms are safely secured directly below this organic contamination and/or native oxide layer in approximately the first 1000 angstroms of the ultra-pure material substrate, some analytical techniques that precisely measure solar wind elemental abundances require the removal of this organic contaminate. In 2005, Genesis science team laboratories began to develop various methods for removing the organic thin film without removing the precious material substrate that contained the solar wind atoms. Stephen Sestak and colleagues at Open University first experimented with ultraviolet radiation ozone (UV/O3) cleaning of several non-flight and flown Genesis silicon wafer fragments under a pure flowing oxygen environment. The UV/O3 technique was able to successfully remove organic contamination without etching into the bulk material substrate. At NASA Johnson Space Center Genesis Curation Laboratory, we have installed an UV/O3 cleaning devise in an ambient air environment to further experimentally test the removal of the organic contamination on Genesis wafer materials. Preliminary results from XPS analysis show that the UV/O3 cleaning instrument is a good non-destructive method for removing carbon contamination from flown Genesis array samples. However, spectroscopic ellipsometry results show little change in the thickness of the surface film. All experiments to date have shown UV/O3 cleaning method to be the best non-destructive method for removing organic contamination from the surface of the Genesis materials. The UV/O3 cleaning process can also clean carbon contamination to levels below non-flight standards. This can be seen by comparing sample 60260's carbon 10667 cps with non-flight Si carbon 21675 cps. Therefore, surface carbon contamination should not hinder the analysis of solar wind.

Calaway, Michael J.↗
NASA NTRS2015

Genesis Solar Wind Collector Cleaning Assessment: Update on 60336 Sample Case Study

To maximize the scientific return of Genesis Solar Wind return mission it is necessary to characterize and remove a crash-derived particle and thin film surface contamination. A small subset of Genesis mission collector fragments are being subjected to extensive study via various techniques. Here we present an update on the sample 60336, a Czochralski silicon (Si-CZ) based wafer from the bulk array (B/C). This sample has undergone multiple cleaning steps (see the table below): UPW spin wash, aggressive chemical cleanings (including aqua regia, hot xylene and RCA1), as well as optical and chemical (EDS, ToF-SIMS) imaging. Contamination appeared on the surface of 60336 after the initial 2007 UPW cleaning. Aqua regia and hot xylene treatment (8/13/2013) did little to remove contaminants. The sample was UPW cleaned for the third time and imaged (9/16/13). The UPW removed the dark stains that were visible on the sample. However, some features, like "the Flounder" (a large, 100 micron feature in Fig. 1b) appeared largely intact, resisting all previous cleaning efforts. These features were likely from mobilized adhesive, derived from the Post-It notes used to stabilize samples for transport from Utah after the hard landing. To remove this contamination, an RCA step 1 organic cleaning (RCA1) was employed. Although we are still uncertain on the nature of the Flounder and why it is resistant to UPW and aqua regia/hot xylene treatment, we have found RCA1 to be suitable for its removal. It is likely that the glue from sticky pads used during collector recovery may have been a source for resistant organic contamination [9]; however [8] shows that UPW reaction with crash-derived organic contamination does not make particle removal more difficult.

Goreva, Y. S.↗
NASA NTRS2015

Replacement of Hydrochlorofluorocarbon (HCFC) -225 Solvent for Cleaning and Verification Sampling of NASA Propulsion Oxygen Systems Hardware, Ground Support Equipment, and Associated Test Systems

Since the 1990's, when the Class I Ozone Depleting Substance (ODS) chlorofluorocarbon-113 (CFC-113) was banned, NASA's rocket propulsion test facilities at Marshall Space Flight Center (MSFC) and Stennis Space Center (SSC) have relied upon hydrochlorofluorocarbon-225 (HCFC-225) to safely clean and verify the cleanliness of large scale propulsion oxygen systems. Effective January 1, 2015, the production, import, export, and new use of HCFC-225, a Class II ODS, was prohibited by the Clean Air Act. In 2012 through 2014, leveraging resources from both the NASA Rocket Propulsion Test Program and the Defense Logistics Agency - Aviation Hazardous Minimization and Green Products Branch, test labs at MSFC, SSC, and Johnson Space Center's White Sands Test Facility (WSTF) collaborated to seek out, test, and qualify a replacement for HCFC-225 that is both an effective cleaner and safe for use with oxygen systems. Candidate solvents were selected and a test plan was developed following the guidelines of ASTM G127, Standard Guide for the Selection of Cleaning Agents for Oxygen Systems. Solvents were evaluated for materials compatibility, oxygen compatibility, cleaning effectiveness, and suitability for use in cleanliness verification and field cleaning operations. Two solvents were determined to be acceptable for cleaning oxygen systems and one was chosen for implementation at NASA's rocket propulsion test facilities. The test program and results are summarized. This project also demonstrated the benefits of cross-agency collaboration in a time of limited resources.

Mitchell, Mark A.↗
NASA NTRS2015

Replacement of HCFC-225 Solvent for Cleaning NASA Propulsion Oxygen Systems

Since the 1990's, when the Class I Ozone Depleting Substance (ODS) chlorofluorocarbon‐113 (CFC‐113) was banned, NASA's rocket propulsion test facilities at Marshall Space Flight Center (MSFC) and Stennis Space Center (SSC) have relied upon hydrochlorofluorocarbon‐225 (HCFC‐225) to safely clean and verify the cleanliness of large scale propulsion oxygen systems. Effective January 1, 2015, the production, import, export, and new use of HCFC‐225, a Class II ODS, was prohibited by the Clean Air Act. In 2012 through 2014, leveraging resources from both the NASA Rocket Propulsion Test Program and the Defense Logistics Agency ‐ Aviation Hazardous Minimization and Green Products Branch, test labs at MSFC, SSC, and Johnson Space Center's White Sands Test Facility (WSTF) collaborated to seek out, test, and qualify a replacement for HCFC‐225 that is both an effective cleaner and safe for use with oxygen systems. Candidate solvents were selected and a test plan was developed following the guidelines of ASTM G127, Standard Guide for the Selection of Cleaning Agents for Oxygen Systems. Solvents were evaluated for materials compatibility, oxygen compatibility, cleaning effectiveness, and suitability for use in cleanliness verification and field cleaning operations. Two solvents were determined to be acceptable for cleaning oxygen systems and one was chosen for implementation at NASA's rocket propulsion test facilities. The test program and results are summarized. This project also demonstrated the benefits of cross‐agency collaboration in a time of limited resources.

Mitchell, Mark A.↗
NASA NTRS2017

One Step Plasma Passivation and Precision Cleaning

Over the past several years, Kennedy Space Center (KSC) researchers developed two solvent-free techniques for precision cleaning of ground support equipment (GSE) that possess low commodity requirements and produce small or no waste streams. During testing of low-pressure air plasma as one of these cleaning techniques, physical changes in the surface of stainless steel test pieces were observed; cursory testing revealed that the test part had developed a thick oxide layer on the surface compared to untreated parts. This result indicated that the plasma process might not only serve as a green technology for precision cleaning of parts, but it may also passivate the surface at the same time. Current methodology in use at KSC’s Components Refurbishment & Chemical Analysis (CRCA) Facility for passivation of corrosion-resistant steels for aerospace applications follows an SAE International Standard, AMS2700, where parts are submerged in either a nitric acid or nitric acid/sodium dichromate bath at predetermined temperatures and contact times. These baths require constant testing to ensure effective treatment, use corrosive and carcinogenic chemicals, and produce hazardous waste. The passivation bath is one of the multiple steps employed at the facility, while cleaning with multiple environmentally-unfriendly solvents comprise several more steps before parts are recertified to a specific cleanliness level in their clean room. Based on the behavior of the stainless steel surface during cleaning optimization studies, it was believed that the plasma technology could be extended to passivation, combining what is currently many steps into a single, solvent- and waste-free system.

Paul Hintze↗
NASA NTRS2014

Alternative Solvents and Technologies for Precision Cleaning of Aerospace Components

Precision cleaning solvents for aerospace components and oxygen fuel systems, including currently used Vertrel-MCA, have a negative environmental legacy, high global warming potential, and have polluted cleaning sites. Thus, alternative solvents and technologies are being investigated with the aim of achieving precision contamination levels of less than 1 mg/sq ft. The technologies being evaluated are ultrasonic bath cleaning, plasma cleaning and supercritical carbon dioxide cleaning.

Green solvents↗
NASA NTRS2018

James Webb Space Telescope Primary and Secondary Mirror Segment Assemblies Cleaning: a Quantitative Assessment

The James Webb Space Telescope Primary Mirror Segment Assemblies (PMSAs) and Secondary Mirror Assembly (SMA) were cleaned at the Johnson Space Center (JSC) in January 2018. In order to quantify the effectiveness of the cleaning, the same cleaning process was performed on the PMSA and SMA traveling witness wafers. These wafers have accompanied their respective mirror segments from their arrival at the Goddard Space Flight Center, through transport to JSC, and ultimately their exposure in Chamber A for cryogenic testing. The traveling wafers were analyzed using an Image Analysis automated microscope both prior to and after the cleaning. The resulting data showed that the PMSA wafers' Percent Area Coverage (PAC) reduced by 83.5% on average, from 0.1524 PAC to 0.0251 PAC. The SMA wafer's PAC decreased by 97.2%, from 0.1194 PAC to 0.0034 PAC. Further analysis of the particle size bins was completed in order to calculate their particle distribution slopes. The slope of the PMSA wafers increased by 0.025 on average, and the SMA wafer slope increased by 0.066. This indicates that the ratio of large to small particles slightly increased after the cleaning across all mirror segments. Visual inspections of the wafers and the flight PMSAs and SMA showed considerable and comparable particulate coverage improvements, thus leading to the conclusion that the average PAC on the PMSAs and SMA improved by the same factor as their respective wafers.

mirror↗
NASA NTRSDate not supplied

Ultrapure Water System at JSC for High Purity Cleaning of Flight Hardware, Astromaterial Handling Tools and Solar Wind Samples

Use of Ultrapure Water (UPW) for cleaning of astromaterial sample handling tools and containers was driven by the discontinuation of Freon 113 as a cleaning solvent, due to environmental concerns. Freon 113, recycled using distillation, was very effective at removing organic residues from sample handling hardware. The initial switch to high purity water for astromaterial tool cleaning was modeled after efforts at White Sands Test Facility (WSTF) and current semiconductor UPW production practices in the early 1990s. JSC curation’s first system was comprised of ion exchange polishing cylinders, 55 gallon PVDF-lined storage tank, a few tens of feet of PVDF piping, UV and particle filtration, and this system supported cleaning for lunar, meteorite and Cosmic Dust collectors lab operations. By 2000 a major expansion and upgrade was providing UPW of quality E-1 (ASTM D5127-90) or better at 10 gpm for cleaning of the Genesis solar wind payload for flight, in addition to sample handling tools for other astromaterials. This expansion included a 1000 gallon storage tank and several hundred feet of PVDF piping located in B. 31 and 31N. An extra reverse osmosis process unit was added to incoming water in 2005. Subsequently several major components were replaced, and in anticipation of adding new labs, an enlarged UPW system was designed in 2018 and completed in 2019. This system produces grade E1.1 UPW at 15 gpm in a continuous 1100 ft. loop with 5000 gal. storage tank, supplying 8 laboratories.

Ultrapure water↗
NASA NTRS2026

Hydrofluoroether (HFE) Cleaning Fluid Replacement and Qualification

This NASA Engineering and Safety Center (NESC) Technical Assessment Report addresses the urgent need to identify, test, and qualify replacement cleaning solvents and technologies following 3M’s decision to discontinue production of hydrofluoroether (HFE) products, including Novec HFE-7100, by the end of 2025. HFE-7100 is widely used across NASA for precision cleaning of ground and flight hardware, especially in oxygen system components, and as a heat transfer fluid in high-power-density thermal control systems. The assessment evaluates commercially available replacement solvents, alternative cleaning technologies, and their compatibility with NASA’s operational requirements. Key findings include the identification of viable solvent replacements, their performance in contaminant removal, materials compatibility, and oxygen system safety. The report also explores novel cleaning approaches, including aqueous, supercritical CO₂, cryogenic aerosol, plasma, UV-ozone, magnetically optimized fluids, and induced charge active filtration, highlighting their merits, limitations, and readiness for NASA adoption. The NESC provides recommendations for solvent selection, facility adaptation, and continued technology maturation to ensure mission continuity and regulatory compliance.

Alternative Cleaning Technologies↗
NASA NTRS1982

Performance degradation and cleaning of photovoltaic arrays

NASA tests results from an 18 mo program of cleaning silicone-encapsulated and glass fronted solar cell panels in urban and desert environments to examine the effects of cleaning on module performance are reported. The panels were cleaned on weekly, monthly, quarterly, or semi-annual basis, while other panels of the same construction were not cleaned and served as controls. Commercially-available detergents and city water were employed for the tests, and the measurements were maintained of the modules' continuing short-circuit current output. The decay of the output was determined by least square regression analyses. Performance degradation was noticeably less in glass covered, rather than silicone-encapsulated modules which decayed faster in urban than in desert environments. Lower frequency cleanings are recommended where labor costs are high.

Sheskin, T. J.↗
NASA NTRS1986

Hose- and Tube-Cleaning Module

Self-contained, single-use module enables hose or tube to be cleaned thoroughly in field, in one operation, using water of unknown or questionable quality. Previously, chemicals for flow cleaning had to be mixed, diluted and pumped through tubes and hoses in many successive steps; deionizers, water-treatment facilities, and chemical storage required. With proposed device cleaning performed safely, without special training. Ready to use, device packaged as cleaning kit with tube to be cleaned.

Rollins, F. P.↗