Optimizing the UED beam line design via ImpactT simulation
The high charge low energy compressor system developed at NSLS-II can generate 5MeV electron bunches with 50pC charge (10 -8 electrons) focusing to 30 micron beam size and bunch length of order of 100 fs. NSLS-II plans to build it as part of the existing instrument for the ultra-fast electron diffraction (UED) and ultra-fast electron microscope (UEM) experiments to be installed at ATF-II, BNL. The expected intensity will be several orders of magnitudes higher than achieved previously using current technology (~10 -4 -10 -5 electrons). This type of accelerator based MeV electron microscopes, taking advantage of strong interaction of electrons with matter and overcoming space charge problem, are complementary to XFEL, such as LCLS.