Three-dimensional measurements of fundamental plasma parameters in pulsed ICP operation
Radio frequency inductively coupled plasma sources are widely used in low temperature industrial processing. Recent computer simulations and experiments indicate significant improvement in processing results with the use of pulsed plasmas. We report three dimensional spatial and temporal measurements of fundamental plasma parameters in a pulsed Argon plasma in an industrial etch tool modified for diagnostic access. The pulse repetition rate is 1 kHz with 50% duty cycle. The density does not decay to zero at the end of the afterglow period, and this affects the initial conditions for the beginning of the next powered phase. At 5 mTorr, the plasma starts in the E-mode for each pulse and grows into a “ring” shape density profile. Subsequently, the profile evolves to peak in the middle of the chamber as it reaches a steady state toward the end of the active-glow. At 25 mTorr, the plasma density profile always peaks at the center of the chamber throughout the entire pulse.