Publisher's Note: ''Fluid and drift-kinetic description of a magnetized plasma with low collisionality and slow dynamics orderings. II. Ion theory'' [Phys. Plasmas. 18, 102506 (2011)]
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Continued investigation of hafnia-titania nanolaminates on silica substrates after long term annealing shows that hafnon (HfSiO{sub 4}) is formed, in addition to the previously reported phases. Here, a 293 nm-thick stack of 5 nm HfO{sub 2}-4 nm TiO{sub 2} bilayers (0.51 mole fraction HfO{sub 2}) is sputter deposited on fused SiO{sub 2} and annealed in air at 1173 K for up to 192 h and then at 1273 K for up to 96 h. X-ray diffraction shows that hafnon crystallizes after 24 h at 1273 K. Micro-Raman spectroscopy/microscopy shows that hafnon crystallization is heterogeneous. No film-substrate reaction is observed for single layer HfO{sub 2} on SiO{sub 2} annealed under similar conditions. We suggest the nanolaminate's complex annealed microstructure provides fast diffusion paths that enable hafnon formation.
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