The Readout Electronics for Silicon Tracker of the GLAST Beam Test Engineering Model
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Abstract not provided.
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Scalable electron amplifier devices and methods of fabricating the devices an atomic layer deposition ("ALD") fabrication process are described. The ALD fabrication process allows for large area (e.g., eight inches by eight inches) electron amplifier devices to be produced at reduced costs compared to current fabrication processes. The ALD fabrication process allows for nanostructure functional coatings, to impart a desired electrical conductivity and electron emissivity onto low cost borosilicate glass micro-capillary arrays to form the electron amplifier devices.
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Scalable electron amplifier devices and methods of fabricating the devices an atomic layer deposition ("ALD") fabrication process are described. The ALD fabrication process allows for large area (e.g., eight inches by eight inches) electron amplifier devices to be produced at reduced costs compared to current fabrication processes. The ALD fabrication process allows for nanostructure functional coatings, to impart a desired electrical conductivity and electron emissivity onto low cost borosilicate glass micro-capillary arrays to form the electron amplifier devices.
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Abstract not provided.
Abstract not provided.
MicroBooNE is a 90 tonnes active liquid argon time projection chamber (LArTPC). • Located along the Booster Neutrino Beamline ~470m away from the proton target. • High spatial and calorimetric resolution. • Collecting data since 2015.
Abstract not provided.
Abstract not provided.