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At least 631 records · Page 35

The electron beam instability revisited: Growth above and below f sub p

The growth of electrostatic waves near the plasma frequency (fp) due to an unstable electron beam is investigated by solving the unmagnetized electrostatic dispersion equation numerically. The numerical solutions are compared with analytic theories for reactive (or fluid-type) and kinetic versions of the beam instability, and for the O'Neil/Malmberg connection of the beam and Langmuir modes. Conditions for growth significantly above or below fp are given. Three general results are found: (1) The unstable waves do not grow on a mode with Langmuir dispersion except in the limit of a very dilute beam with growth on O'Neil/Malmberg's connected mode; (2) The properties of the unstable mode depend strongly on beam parameters such as beam density, speed and temperature; and (3) The frequency of maximum growth frequently lies significantly above or below fp, and differs significantly from that predicted by the Langmuir dispersion relation. Results imply important consequences for theories of strong turbulence and nonlinear wave-wave processes, and observational identification of fp from observed wave frequencies.

Cairns, I. H.↗

Electrostatic wave generation above and below the plasma frequency by electron beams

The unmagnetized electrostatic dispersion equation is solved numerically to study the growth of electrostatic waves near the plasma frequency resulting from a unstable electron beam. An attempt is made to find the dispersion relations, frequencies of maximum growth, and the resonant or nonresonant character of the waves for particular beam parameters. It is found that the unstable waves do not have the Langmuir dispersion relation except in the limit of a very dilute beam with growth on the connected mode of O'Neil and Malmberg. The properties of the unstable mode depend strongly on beam parameters such as beam density, speed, and temperature.

Cairns, Iver H.↗

Electron-Beam Deposition of Superconducting Molybdenum Thin Films for the Development of Mo/Au TES X-Ray Microcalorimeter

We are exploring the properties of electron-beam evaporated molybdenum thin films on silicon nitride coated silicon wafers at substrate temperatures between room temperature and 650 C. The temperature dependence of film stress, transition temperature, and electrical properties are presented. X-ray diffraction measurements are performed to gain information on molybdenum crystallite size and growth. Results show the dominant influence of the crystallite size on the intrinsic properties of our films. Wafer-scale uniformity, wafer yield, and optimal thermal bias regime for TES fabrication are discussed.

Microcalorimeter↗

Additive Manufacturing of Pure Mo and Mo + TiC MMC Alloy by Electron Beam Powder Bed Fusion

A metal matrix composite powder of molybdenum (Mo) + TiC was produced by mechanical alloying (MA) and used in additive manufacturing by electron beam powder bed fusion along with pure Mo powder to form sandwich structures. The Mo + TiC solid layers formed mixed structures of Mo with discrete TiC particles, eutectic Mo + TiC, and Mo dendrites. Thermodynamic modeling showed that the system contained an invariant eutectic reaction in the composition range used and indicated that the system was highly sensitive to changes in composition and temperature.

36 MATERIALS SCIENCE↗

Production of warm ions in electron beam generated E × B plasma

Several recent experiments have demonstrated low-damage processing of 2D materials, such as graphene and single crystal diamond, using electron beam (e-beam) generated plasmas with applied crossed electric and magnetic (E × B) fields. Here, the low damage of these sensitive materials is commonly attributed to the low energy of ions incident to the substrate surface and the ion confinement in E x B fields. In this work, measurements of atom and ion velocity distribution functions in an e-beam E × B plasma at sub-mTorr argon pressures using a laser-induced fluorescence diagnostic revealed the presence of a warm population of ions with temperatures of ~ 1 eV that are sufficient to destroy the ion confinement in E × B fields and drive the ion flux by cross field diffusion in the direction opposite to the applied electric field, toward the plasma-bounded walls or substrate. Thus, it is this nearly ambipolar diffusion process that is responsible for the flux of charged particles impinging on the wall/substrate surface.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

On Possibilities of Using Edge Radiation for X-ray and Electron Beam Diagnostics at Bending Magnet Beamlines of NSLS-II

Spectral flux density distributions of long-wavelength Edge Radiation, i.e. radiation generated by relativistic electrons at edges of bending magnets in a storage ring are described, both analytically and numerically. Possibilities of using this radiation for the alignment of optical components of bending magnet beamlines at NSLS-II and for non-destructive X-ray and electron beam diagnostics at these beamlines are discussed.

43 PARTICLE ACCELERATORS↗

Electron-beam studies of Schottky-barrier detector surfaces

Review of the surface anomalies occurring in Schottky-barrier particle detectors identifiable by means of an electron beam technique employed by Czaja (1965) for analyzing defects in diode structures. The technique is shown to make possible the detection and identification of the following anomalies: (1) chemical contamination of the detector surface; (2) mechanical damage of the wafer substrates; (3) damage introduced in semiconductor surface preparation; (4) radiation damage; and (5) defective surface metallization.

Peckerar, M. C.↗

Electron beam charging of Space Shuttle thermal protection system tiles

Six space shuttle reusable surface insulation tiles were tested in the NASA Lewis Research Center's electron bombardment test facility. The 30-cm-square specimens were assembled by using the same materials and techniques used to apply the tiles to the space shuttle and were composed to 15-cm- and 20-cm-square tiles and pieces on 0.6-cm-thick aluminum substrates. There were two specimens of each of three thicknesses. One specimen of each thickness had gaps of less than 0.1 cm between tiles, and the other had gaps of approximately 0.15 cm. The specimens were exposed to monoenergetic electron beams (2 to 25 keV) with nominal fluxes of 0.1 and 1 nA/sq. cm. Tests were conducted with both grounded and floating substrates. The data presented include charging rates, equilibrium potentials, and substrate currents. There is evidence that discharging occurred.

Staskus, J. V.↗

Waves generated during electron beam emissions from the Space Shuttle

Observations from the SEPAC (Space Experiments with Particle Accelerators) experiment on Spacelab 1 Shuttle mission of waves generated during electron beam emissions are presented. The dependence of the wave intensity on the beam parameters and the Shuttle attitude is outlined, and the shape of the wave spectra are discussed. It is found that the noise in the 0.75- to 10 kHz band has a spectral shape that can be characterized by an f exp -n law, and that the VLF signal level depends on the beam angle to the magnetic field, the strongest emissions being observed for parallel beams. These features are found to be consistent with a drift wave instability.

Neubert, T.↗

Preventing Contamination In Electron-Beam Welds

Simple expedient eliminates time-consuming, expensive manual hand grinding. Use of groove and backup tube greatly reduces postweld cleanup in some electron-beam welding operations. Tube-backup method developed for titanium parts, configurations of which prevents use of solid-block backup. In new welding configuration, tube inserted in groove to prevent contact between alumina beads and molten weld root. When welding complete and beads and tube removed, only minor spatter remains and is ground away easily.

Goodin, Wesley D.↗

Analog Phase Holograms by Electron Beam Lithography

Phase holograms have been created on the surface of a thin film of poly-methyl methacrylate (PMMA, Plexiglas) by direct-write electron beam (E-Beam) lithography. The process involves delivering a patterned exposure dose followed by partial development with a strong developer. The patterned dose derives from arbitrary computer-calculated holograms, which must be corrected for the sensitivity characteristic of the PMMA and for the effective point-spread function of the E-Beam.

phase↗

Improved calibration of rf cavities for relativistic electron beams: Effects of secondary corrections and experimental verification

In the aspect of longitudinal beam bunching, the bunching strength can be controlled by the rf cavity phase and voltage. However, these machine parameters are different from those that interact with the beam itself. In order to gain control of the beam-cavity interaction, cavity calibration must be performed. Furthermore, it relies on fitting the beam energy gain versus cavity phase to a calibration function. Under the conventional assumption of relativistic beam conditions, the calibration function is a first harmonic sinusoidal function (a sinusoidal function with a period of 2π). However, this expression is insufficient for a high-voltage bunching cavity. Due to beam acceleration inside the cavity, an energy bias and a second harmonic function should be included to modify the conventional calibration function, even for a relativistic electron beam. In this paper, we will derive this modification and provide a comparison to both the Coherent Electron Cooling Experiment and the IMPACT T simulation, respectively.

43 PARTICLE ACCELERATORS↗

Objectives and design of the Echo 6 electron beam experiment - Large ionospheric perturbations and energetic particle patterns

The data from the March 30, 1983 launching of Echo 6 are presented. Echo 6 contained duplex accelerators and a system of four throw away detectors to detect and analyze conjugate electron echoes. The model used to calculate the proper trajectory of the rocket and the reason for not detecting echoes are discussed. The components of the plasma diagnostic package which was used to study the electron beam interactions with the ionospheric plasma, and the functions of the two controllable electron guns and the two sets of orthogonal electric probes are described. The signal-mode potentials between each probe and the plasma diagnostic payload are investigated. The signals produced by the gun pulses are analyzed and the interpretation of the electric field probe response is examined.

Winckler, J. R.↗

Generation mechanism of whistler waves produced by electron beam injection in space

Electromagnetic particle simulations are used to determine the generation mechanism of the whistler waves observed in connection with the artificial injection of electron beams in the ionosphere. The production of the waves is shown to be closely connected with the beam-plasma interaction, which leads to the formation of a current structure which acts like an antenna and emits the whistler waves in a coherent manner. This process, in contrast to a mechanism involving amplification of radiation by a whistler mode plasma instability within the beam, allows the whistlers to be generated even though the beam width is less than one wavelength.

Pritchett, P. L.↗

Electron Beam Freeform Fabrication: A Fabrication Process that Revolutionizes Aircraft Structural Designs and Spacecraft Supportability

The technological inception and challenges, as well as current applications of the electron beam freeform fabrication (EBF3) process are outlined. The process was motivated by the need for a new metals technology that would be cost-effective, enable the production of new alloys and that would could be used for efficient, lightweight structures. EBF3 is a rapid metal fabrication, layer-additive process that uses no molds or tools and which yields properties equivalent to wrought. The benefits of EBF3 include it near-net shape which minimizes scrap and reduces part count; efficiency in design which allows for lighter weight and enhanced performance; and, its "green" manufacturing process which yields minimal waste products. EBF3 also has a high tensile strength, while a structural test comparison found that EBF3 panels performed 5% lower than machined panels. Technical challenges in the EBF3 process include a need for process control monitoring and an improvement in localized heat response. Currently, the EBF3 process can be used to add details onto forgings and to construct and form complex shapes. However, it has potential uses in a variety of industries including aerospace, automotive, sporting goods and medical implant devices. The novel structural design capabilities of EBF3 have the ability to yield curved stiffeners which may be optimized for performance, low weight, low noise and damage tolerance applications. EBF3 has also demonstrated its usefulness in 0-gravity environments for supportability in space applications.

Taminger, Karen M.↗

Two-dimensional electron beam charging model for polymer films

A two-dimensional model is developed to describe the charging of strips of thin polymer films above a grounded substrate exposed to a uniform mono-energetic electron beam. The study is motivated by the observed anomalous behavior of geosynchronous satellites, which has been attributed to differential charging of the satellite surfaces exposed to magnetospheric electrons. Surface and bulk electric fields are calcuated at steady state in order to identify regions of high electrical stress, with emphasis on behavior near the material's edge. The model is used to study the effects of some of the experimental parameters, notably beam energy, beam angle of incidence, beam current density, material thickness and material width. Also examined are the consequences of a central gap in the material and a discontinuity in the material thickness.

Reeves, R. D.↗

Nanoscale control of LaAlO 3 /SrTiO 3 metal–insulator transition using ultra-low-voltage electron-beam lithography

In this work, we describe a method to control the insulator–metal transition at the LaAlO 3 /SrTiO 3 interface using ultra-low-voltage electron beam lithography. Compared to previous reports that utilize conductive atomic force microscope (c-AFM) lithography, this approach can provide comparable resolution (~10 nm) at write speeds (10 mm/s) that are up to 10 000× faster than c-AFM. The writing technique is nondestructive, and the conductive state is reversible via prolonged exposure to air. Transport properties of representative devices are measured at milli-Kelvin temperatures, where superconducting behavior is observed. We also demonstrate the ability to create conducting devices on graphene/LaAlO 3 /SrTiO 3 heterostructures. The underlying mechanism is believed to be closely related to the same mechanism regulating c-AFM-based methods.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗