Influence of the SiO{sub 2} interlayer thickness on the density and polarity of charges in Si/SiO{sub 2}/Al{sub 2}O{sub 3} stacks as studied by optical second-harmonic generation
By accurately tuning the SiO{sub 2} interlayer thickness the density and polarity of charges in Si/SiO{sub 2}/Al{sub 2}O{sub 3} stacks can be controlled. We report on the number density, polarity, and physical location of charges present in the stacks as studied by optical second-harmonic generation (SHG). Depending on the SiO{sub 2} interlayer thickness (1–150 nm) the effective charge density in the Si/SiO{sub 2}/Al{sub 2}O{sub 3} stacks ranges from 10{sup 13} to 10{sup 11} cm{sup −2} for both n- and p-type silicon. The polarity of the charges switches from negative to positive around a SiO{sub 2} interlayer thickness of 5–10 nm at which point the effective charge density in the stacks is negligible. This switch in polarity is apparent from spectroscopic, time-dependent, and azimuthal SHG measurements. The observed trends in charge density and polarity can be explained by tunneling of electrons into defect states at the SiO{sub 2}/Al{sub 2}O{sub 3} interface as well as the presence of fixed and bulk charges at the Si/SiO{sub 2} interface and in the SiO{sub 2}, respectively. This charge mechanism appears to hold generally for Si/SiO{sub 2}/Al{sub 2}O{sub 3} stacks as similar results were observed for SiO{sub 2} films prepared by various techniques.