Stability and Viability of Off-Axis Photoemission Geometries in 4D Ultrafast Electron Microscopy
Femtosecond (fs) laser-based 4D ultrafast electron microscopy (UEM) commonly makes use of photoelectron emission from a source material in the electron gun region of an otherwise conventional TEM. For TEMs equipped with thermionic guns, the source material is often LaB 6 , the same as used for thermionic operation. Here, such thermionic-based UEMs have proven useful for applications requiring large electron fluxes (i.e., high beam currents) often at the expense of beam coherence and brightness, which is especially important for single-shot nanosecond applications. Importantly, for fs-based UEMs, beam currents can be controlled over a broad range of parameter space through the properties of the fs laser and the photon pulses produced therefrom.