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At least 613 records · Page 34
All sourcesNASA NTRSDOE OSTI
NASA NTRS2007

Helicon Wave Physics Impacts on Electrodeless Thruster Design

Effective generation of helicon waves for high density plasma sources is determined by the dispersion relation and plasma power balance. Helicon wave plasma sources inherently require an applied magnetic field of .01-0.1 T, an antenna properly designed to couple to the helicon wave in the plasma, and an rf power source in the 10-100 s of MHz, depending on propellant choice. For a plasma thruster, particularly one with a high specific impulse (>2000 s), the physics of the discharge would also have to address the use of electron cyclotron resonance (ECR) heating and magnetic expansion. In all cases the system design includes an optimized magnetic field coil, plasma source chamber, and antenna. A preliminary analysis of such a system, calling on experimental data where applicable and calculations where required, has been initiated at Glenn Research Center. Analysis results showing the mass scaling of various components as well as thruster performance projections and their impact on thruster size are discussed.

Gilland, James H.↗
NASA NTRS2003

Method of synthesizing metal doped diamond-like carbon films

A method of synthesizing metal doped carbon films by placing a substrate in a chamber with a selected amount of a metalorganic compound. An electron cyclotron resonance is applied to the chamber in order to vaporize the metalorganic compound. The resonance is applied to the chamber until a metal doped carbon film is formed. The metalorganic compound is preferably selected from the group consisting of an organic salt of ruthenium, palladium, gold or platinum.

Ueno, Mayumi↗
NASA NTRS2007

Slotted antenna waveguide plasma source

A high density plasma generated by microwave injection using a windowless electrodeless rectangular slotted antenna waveguide plasma source has been demonstrated. Plasma probe measurements indicate that the source could be applicable for low power ion thruster applications, ion implantation, and related applications. This slotted antenna plasma source invention operates on the principle of electron cyclotron resonance (ECR). It employs no window and it is completely electrodeless and therefore its operation lifetime is long, being limited only by either the microwave generator itself or charged particle extraction grids if used. The high density plasma source can also be used to extract an electron beam that can be used as a plasma cathode neutralizer for ion source beam neutralization applications.

Foster, John↗
NASA NTRS2008

Multiwavelength Emission From Pulsar Slot Gaps

We present results of a 3D model of optical to gamma-ray emission from the slot gap accelerator of a rotation-powered pulsar. Primary electrons accelerating to high altitude in the pulsar magnetosphere at the outer edge of the open field volume, as well as electron-positron pairs on field line interior to the slot gap, radiate curvature, inverse Compton and synchrotron radiation. Both primaries and pairs undergo cyclotron resonant absorption of radio photons, allowing them to maintain significant pitch angles and to produce a broad spectrum of emission from infra-red to GeV energies. Synchrotron radiation from pairs with a power-law energy spectrum dominate the spectrum up to 10 MeV. Synchrotron and curvature radiation of primaries dominates from 10 MeV up to a few GeV. The high-energy pulse profiles are dominated by caustics on trailing field lines. In the case of the Crab pulsar, the radio conal emission may also form caustics in phase with the high-energy peaks. If resonant absorption of radio emission produces high-energy synchroti-on radiation, emission below 200 Mev is expected to exhibit correlations in time and phase with the radio emission.

Harding, Alice K.↗
NASA NTRS2008

High-Altitude Emission from Pulsar Slot Gaps: The Crab Pulsar

We present results of a 3D model of optical to gamma-ray emission from the slot gap accelerator of a rotation-powered pulsar. Primary electrons accelerating to high-altitudes in the unscreened electric field of the slot gap reach radiation-reaction limited Lorentz factors of approx. 2 x 10(exp 7), while electron-positron pairs from lower-altitude cascades flow along field lines interior to the slot gap. The curvature, synchrotron and inverse Compton radiation of both primary electrons and pairs produce a broad spectrum of emission from infra-red to GeV energies. Both primaries and pairs undergo cyclotron resonant absorption of radio photons, allowing them to maintain significant pitch angles. Synchrotron radiation from pairs with a power-law energy spectrum from gamma = 10(exp 2) - 10(exp 5), dominate the spectrum up to approx. 10 MeV. Synchrotron and curvature radiation of primaries dominates from 10 MeV up to a few GeV. We examine the energy-dependent pulse profiles and phase-resolved spectra for parameters of the Crab pulsar as a function of magnetic inclination alpha and viewing angle zeta, comparing to broad-band data. In most cases, the pulse profiles are dominated by caustics on trailing field lines. We also explore the relation of the high-energy and the radio profiles, as well as the possibility of caustic formation in the radio cone emission. We find that the Crab pulsar profiles and spectrum can be reasonably well reproduced by a model with alpha = 45deg and zeta approx. 100deg or 80deg. This model predicts that the slot gap emission below 200 MeV will exhibit correlations in time and phase with the radio emission.

Harding, Alice K.↗
NASA NTRS2008

Group-III Nitride Field Emitters

Field-emission devices (cold cathodes) having low electron affinities can be fabricated through lattice-mismatched epitaxial growth of nitrides of elements from group III of the periodic table. Field emission of electrons from solid surfaces is typically utilized in vacuum microelectronic devices, including some display devices. The present field-emission devices and the method of fabricating them were developed to satisfy needs to reduce the cost of fabricating field emitters, make them compatible with established techniques for deposition of and on silicon, and enable monolithic integration of field emitters with silicon-based driving circuitry. In fabricating a device of this type, one deposits a nitride of one or more group-III elements on a substrate of (111) silicon or other suitable material. One example of a suitable deposition process is chemical vapor deposition in a reactor that contains plasma generated by use of electron cyclotron resonance. Under properly chosen growth conditions, the large mismatch between the crystal lattices of the substrate and the nitride causes strains to accumulate in the growing nitride film, such that the associated stresses cause the film to crack. The cracks lie in planes parallel to the direction of growth, so that the growing nitride film becomes divided into microscopic growing single-crystal columns. The outer ends of the fully-grown columns can serve as field-emission tips. By virtue of their chemical compositions and crystalline structures, the columns have low work functions and high electrical conductivities, both of which are desirable for field emission of electrons. From examination of transmission electron micrographs of a prototype device, the average column width was determined to be about 100 nm and the sharpness of the tips was determined to be characterized by a dimension somewhat less than 100 nm. The areal density of the columns was found to about 5 x 10(exp 9)/sq cm . about 4 to 5 orders of magnitude greater than the areal density of tips in prior field-emission devices. The electric field necessary to turn on the emission current and the current per tip in this device are both lower than in prior field-emission devices, such that it becomes possible to achieve longer operational lifetime. Moreover, notwithstanding the lower current per tip, because of the greater areal density of tips, it becomes possible to achieve greater current density averaged over the cathode area. The thickness of the grown nitride film (equivalently, the length of the columns) could lie between about 0.5 microns and a few microns; in any event, a thickness of about 1 micron is sufficient and costs less than do greater thicknesses. It may be possible to grow nitride emitter columns on glass or other substrate materials that cost less than silicon does. What is important in the choice of substrate material is the difference between the substrate and nitride crystalline structures. Inasmuch as the deposition process is nondestructive, an ability to grow emitter columns on a variety of materials would be advantageous in that it would facilitate the integration of field-emitter structures onto previously processed integrated circuits.

Bensaoula, Abdelhak↗
NASA NTRS2008

Large area plasma source

An all permanent magnet Electron Cyclotron Resonance, large diameter (e.g., 40 cm) plasma source suitable for ion/plasma processing or electric propulsion, is capable of producing uniform ion current densities at its exit plane at very low power (e.g., below 200 W), and is electrodeless to avoid sputtering or contamination issues. Microwave input power is efficiently coupled with an ionizing gas without using a dielectric microwave window and without developing a throat plasma by providing a ferromagnetic cylindrical chamber wall with a conical end narrowing to an axial entrance hole for microwaves supplied on-axis from an open-ended waveguide. Permanent magnet rings are attached inside the wall with alternating polarities against the wall. An entrance magnet ring surrounding the entrance hole has a ferromagnetic pole piece that extends into the chamber from the entrance hole to a continuing second face that extends radially across an inner pole of the entrance magnet ring.

Foster, John↗
NASA NTRS2009

Very Large Area/Volume Microwave ECR Plasma and Ion Source

The present invention is an apparatus and method for producing very large area and large volume plasmas. The invention utilizes electron cyclotron resonances in conjunction with permanent magnets to produce dense, uniform plasmas for long life ion thruster applications or for plasma processing applications such as etching, deposition, ion milling and ion implantation. The large area source is at least five times larger than the 12-inch wafers being processed to date. Its rectangular shape makes it easier to accommodate to materials processing than sources that are circular in shape. The source itself represents the largest ECR ion source built to date. It is electrodeless and does not utilize electromagnets to generate the ECR magnetic circuit, nor does it make use of windows.

Foster, John E.↗
NASA NTRS2009

Coronal Holes

This paper reviews measurements of the plasma properties in coronal holes and how these measurements are used to reveal details about the physical processes that heat the solar corona and accelerate the solar wind. Evidence is presented for both heating and acceleration of the solar wind by open flux tubes energized by footpoint-driven wave-like fluctuations, and for intermittent energy deposition from closed loops into the open-field regions. Special emphasis is given to spectroscopic and coronagraphic measurements that allow the highly dynamic nonequilibrium evolution of the plasma to be followed as the asymptotic conditions in interplanetary space are established in the extended corona. For example, the importance of kinetic plasma physics and turbulence in coronal holes has been affirmed by surprising measurements from the UVCS instrument on SOHO that heavy ions are heated to hundreds of times the temperatures of protons and electrons. These observations point to specific kinds of collisionless Alfven wave damping (i.e., ion cyclotron resonance). Despite our incomplete knowledge of the complex multi-scale plasma physics, much progress has been made toward the goal of understanding the physical processes ultimately responsible for producing the observed properties of coronal holes.

Cranmer, Steven R.↗
NASA NTRS2007

Large-Area Permanent-Magnet ECR Plasma Source

A 40-cm-diameter plasma device has been developed as a source of ions for material-processing and ion-thruster applications. Like the device described in the immediately preceding article, this device utilizes electron cyclotron resonance (ECR) excited by microwave power in a magnetic field to generate a plasma in an electrodeless (noncontact) manner and without need for an electrically insulating, microwave-transmissive window at the source. Hence, this device offers the same advantages of electrodeless, windowless design - low contamination and long operational life. The device generates a uniform, high-density plasma capable of sustaining uniform ion-current densities at its exit plane while operating at low pressure [<10(exp -4) torr (less than about 1.3 10(exp -2) Pa)] and input power <200 W at a frequency of 2.45 GHz. Though the prototype model operates at 2.45 GHz, operation at higher frequencies can be achieved by straightforward modification to the input microwave waveguide. Higher frequency operation may be desirable in those applications that require even higher background plasma densities. In the design of this ECR plasma source, there are no cumbersome, power-hungry electromagnets. The magnetic field in this device is generated by a permanent-magnet circuit that is optimized to generate resonance surfaces. The microwave power is injected on the centerline of the device. The resulting discharge plasma jumps into a "high mode" when the input power rises above 150 W. This mode is associated with elevated plasma density and high uniformity. The large area and uniformity of the plasma and the low operating pressure are well suited for such material-processing applications as etching and deposition on large silicon wafers. The high exit-plane ion-current density makes it possible to attain a high rate of etching or deposition. The plasma potential is <3 V low enough that there is little likelihood of sputtering, which, in plasma processing, is undesired because it is associated with erosion and contamination. The electron temperature is low and does not vary appreciably with power.

Foster, John E.↗
NASA NTRS2007

Slot-Antenna/Permanent-Magnet Device for Generating Plasma

A device that includes a rectangular-waveguide/slot-antenna structure and permanent magnets has been devised as a means of generating a substantially uniform plasma over a relatively large area, using relatively low input power and a low gas flow rate. The device utilizes electron cyclotron resonance (ECR) excited by microwave power to efficiently generate plasma in a manner that is completely electrodeless in the sense that, in principle, there is no electrical contact between the plasma and the antenna. Plasmas generated by devices like this one are suitable for use as sources of ions and/or electrons for diverse material-processing applications (e.g., etching or deposition) and for ion thrusters. The absence of plasma/electrode contact essentially prevents plasma-induced erosion of the antenna, thereby also helping to minimize contamination of the plasma and of objects exposed to the plasma. Consequently, the operational lifetime of the rectangular-waveguide/ slot-antenna structure is long and the lifetime of the plasma source is limited by the lifetime of the associated charged-particle-extraction grid (if used) or the lifetime of the microwave power source. The device includes a series of matched radiating slot pairs that are distributed along the length of a plasma-source discharge chamber (see figure). This arrangement enables the production of plasma in a distributed fashion, thereby giving rise to a uniform plasma profile. A uniform plasma profile is necessary for uniformity in any electron- or ion-extraction electrostatic optics. The slotted configuration of the waveguide/ antenna structure makes the device scalable to larger areas and higher powers. All that is needed for scaling up is the attachment of additional matched radiating slots along the length of the discharge chamber. If it is desired to make the power per slot remain constant in scaling up, then the input microwave power must be increased accordingly. Unlike in prior ECR microwave plasma-generating devices, there is no need for an insulating window on the antenna. Such windows are sources of contamination and gradually become ineffective as they become coated with erosion products over time. These characteristics relegate prior ECR microwave plasma-generating devices to non-ion beam, non-deposition plasma applications. In contrast, the lack of need for an insulating window in the present device makes it possible to use the device in both ion-beam (including deposition) and electron-beam applications. The device is designed so that ECR takes place above each slot and the gradient of the magnetic field at each slot is enough to prevent backflow of plasma.

Foster, John E.↗
NASA NTRS2009

A Comprehensive Spectral Analysis of the X-Ray Pulsar 4U 1907+09 from Two Observations with the Suzaku X-Ray Observatory

We present results from two observations of the wind-accreting X-ray pulsar 4U 1907+09 using the Suzaku observatory, The broadband time-averaged spectrum allows us to examine the continuum emission of the source and the cyclotron resonance scattering feature at approx. 19 keV. Additionally, using the narrow CCD response of Suzaku near 6 ke V allows us to study in detail the Fe K bandpass and to quantify the Fe Kp line for this source for the first time. The source is absorbed by fully-covering material along the line of sight with a column density of N(sub H) approx. 2 x 10(exp 22)/sq cm, consistent with a wind accreting geometry, and a high Fe abundance (approx. 3 - 4 x solar). Time and phase-resolved analyses allow us to study variations in the source spectrum. In particular, dips found in the 2006 observation which are consistent with earlier observations occur in the hard X-ray bandpass, implying a variation of the whole continuum rather than occultation by intervening material, while a dip near the end of the 2007 observation occurs mainly in the lower energies implying an increase in NH along the line of sight, perhaps indicating clumpiness in the stellar wind

Rivers, Elizabeth↗
NASA NTRS2010

RXTE Observations of the 1A 1118-61 in an Outburst, and the Discovery of a Cyclotron Line

We present the analysis of RXTE monitoring data obtained during the January 2009 outburst of the hard X-ray transient IA 1118-61. Using these observations the broadband (3.5-120 keV) spectrum of the source was measured for the first time ever. We have found that the broadband continuum spectrum of the source is similar to other accreting pulsars and is well described by several conventionally used phenomenological models. We have discovered that regardless of the applied continuum model, a prominent broad absorption feature at approx. 55 keV is observed. We interpret this feature as a Cyclotron Resonance Scattering Feature (CRSF). The observed CRSF energy is one of the highest known and corresponds to a magnetic field of B approx. 4.8 x 10(exp 12) G in the scattering region. Furthermore, our data suggests an iron emission line presence, which was not reported previously for lA 1118-61 as well. Timing properties of the source, including a strong spin-up, were found to be similar to those observed by CGRO/BATSE during the previous outburst, however the broadband capabilities of RXTE reveal a more complicated energy dependency of the pulse-profile.

Doroshenko, V.↗
NASA NTRS2000

Helicon Plasma Injector and Ion Cyclotron Acceleration Development in the VASIMR Experiment

In the Variable Specific Impulse Magnetoplasma Rocket (VASIMR) radio frequency (rf) waves both produce the plasma and then accelerate the ions. The plasma production is done by action of helicon waves. These waves are circular polarized waves in the direction of the electron gyromotion. The ion acceleration is performed by ion cyclotron resonant frequency (ICRF) acceleration. The Advanced Space Propulsion Laboratory (ASPL) is actively developing efficient helicon plasma production and ICRF acceleration. The VASIMR experimental device at the ASPL is called VX-10. It is configured to demonstrate the plasma production and acceleration at the 10kW level to support a space flight demonstration design. The VX-10 consists of three electromagnets integrated into a vacuum chamber that produce magnetic fields up to 0.5 Tesla. Magnetic field shaping is achieved by independent magnet current control and placement of the magnets. We have generated both helium and hydrogen high density (>10(exp 18) cu m) discharges with the helicon source. ICRF experiments are underway. This paper describes the VX-10 device, presents recent results and discusses future plans.

Squire, Jared P.↗
NASA NTRS2003

Electromagnetic Interactions GenERalized (EIGER): Applications at Johnson Space Center

This slide presentation reviews the software framework for the analysis and design of complex electromagnetic systems. The system called Electromagnetic Interactions GenERalized (EIGER) is a hybrid finite element solution for wave equations and deru=ives boundary element solutions for integral equation formulations. Written in Fortran 90 Eiger uses object-oriented design methods to abstract key analysis components. EIGER has been applied to higher order modeling for analysis of antennas to assist in the design of the antennas of a mini-AERCam. EIGER might also be used to model the Ion Cyclotron Resonant heating stage for the VAriable Specific Impulse Magnetoplasma Rocket (VASIMR).

Dobbins, Justin A.↗
NASA NTRS2003

Investigation of a Light Gas Helicon Plasma Source for the VASIMR Space Propulsion System

An efficient plasma source producing a high-density (approx.10(exp 19/cu m) light gas (e.g. H, D, or He) flowing plasma with a high degree of ionization is a critical component of the Variable Specific Impulse Magnetoplasma Rocket (VASIMR) concept. We are developing an antenna to apply ICRF power near the fundamental ion cyclotron resonance to further accelerate the plasma ions to velocities appropriate for space propulsion applications. The high degree of ionization and a low vacuum background pressure are important to eliminate the problem of radial losses due to charge exchange. We have performed parametric (e.g. gas flow, power (0.5 - 3 kW), magnetic field , frequency (25 and 50 MHz)) studies of a helicon operating with gas (H2 D2, He, N2 and Ar) injected at one end with a high magnetic mirror downstream of the antenna. We have explored operation with a cusp and a mirror field upstream. Plasma flows into a low background vacuum (<10(exp -4) torr) at velocities higher than the ion sound speed. High densities (approx. 10(exp 19/cu m) have been achieved at the location where ICRF will be applied, just downstream of the magnetic mirror.

Squire, J. P.↗
NASA NTRS2003

A Collimated Retarding Potential Analyzer for the Study of Magnetoplasma Rocket Plumes

A gridded retarding potential analyzer (RPA) has been developed to characterize the magnetized plasma exhaust of the 10 kW Variable Specific Impulse Magnetoplasma Rocket (VX-10) experiment at NASA's Advanced Space Propulsion Laboratory. In this system, plasma is energized through coupling of radio frequency waves at the ion cyclotron resonance (ICR). The particles are subsequently accelerated in a magnetic nozzle to provide thrust. Downstream of the nozzle, the RPA's mounting assembly enables the detector to make complete axial and radial scans of the plasma. A multichannel collimator can be inserted into the RPA to remove ions with pitch angles greater than approximately 1 deg. A calculation of the general collimator transmission as a function over velocity space is presented, which shows the instrument's sensitivity in detecting changes in both the parallel and perpendicular components of the ion energy. Data from initial VX-10 ICRH experiments show evidence of ion heating.

Glover, T. W.↗
NASA NTRS2011

Thrust Stand Measurements of the Microwave Assisted Discharge Inductive Plasma Accelerator

Pulsed inductive plasma thrusters [1-3] are spacecraft propulsion devices in which electrical energy is capacitively stored and then discharged through an inductive coil. This type of pulsed thruster is electrodeless, with a time-varying current in the coil interacting with a plasma covering the face of the coil to induce a plasma current. Propellant is accelerated and expelled at a high exhaust velocity (O(10-100 km/s)) by the Lorentz body force arising from the interaction of the magnetic field and the induced plasma current. While this class of thruster mitigates the life-limiting issues associated with electrode erosion, pulsed inductive plasma thrusters require high pulse energies to inductively ionize propellant. The Microwave Assisted Dis- charge Inductive Plasma Accelerator (MAD-IPA), shown in Fig. 1, is a pulsed inductive plasma thruster that addressees this issue by partially ionizing propellant inside a conical inductive coil before the main current pulse via an electron cyclotron resonance (ECR) discharge. The ECR plasma is produced using microwaves and a static magnetic field from a set of permanent magnets arranged to create a thin resonance region along the inner surface of the coil, restricting plasma formation, and in turn current sheet formation, to a region where the magnetic coupling between the plasma and the theta-pinch coil is high. The use of a conical theta-pinch coil also serves to provide neutral propellant containment and plasma plume focusing that is improved relative to the more common planar geometry of the Pulsed Inductive Thruster (PIT) [1, 2]. In this paper, we describe thrust stand measurements performed to characterize the performance (specific impulse, thrust efficiency) of the MAD-IPA thruster. Impulse data are obtained at various pulse energies, mass flow rates and inductive coil geometries. Dependencies on these experimental parameters are discussed in the context of the current sheet formation and electromagnetic plasma acceleration processes.

Hallock, Ashley K.↗