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At least 55 records · Page 3

Ion source design for industrial applications

The design of broad-beam industrial ion sources is described. The approach used emphasizes refractory metal cathodes and permanent-magnet multipole discharge chambers. Design procedures and sample calculations are given for the discharge chamber, ion optics, cathodes, and magnetic circuit. Hardware designs are included for the isolator, cathode supports, anode supports, pole-piece assembly, and ion-optics supports. There are other ways of designing most ion source components, but the designs presented are representative of current technology and adaptable to a wide range of configurations.

Kaufman, H. R.↗

Field evaporation ion source with possible application to electrostatic propulsion

Field evaporation of solid metal electrodes has been proposed as an ion source for an electrostatic propulsion device. The chief advantage over existing ion sources is the prospect of 100 percent fuel utilization efficiency. This advantage arises as a result of the elimination of the need for a gaseous precursor state for propellant ionization. The attainment of required high surface field strengths is achieved through field-induced extrusion of the electrode geometry at elevated temperatures. Contributions of both surface and bulk transport mechanisms are taken into account.

Weizer, V. G.↗

Improved Multiple-Species Cyclotron Ion Source

Use of pure isotope 86Kr instead of natural krypton in multiple-species ion source enables source to produce krypton ions separated from argon ions by tuning cylcotron with which source used. Addition of capability to produce and separate krypton ions at kinetic energies of 150 to 400 MeV necessary for simulation of worst-case ions occurring in outer space.

Soli, George A.↗

Recent work on a microwave ion source

The performance of a microwave (2.45 GHz) plasma-disk ion source using a cylindrical microwave cavity is described. The operating characteristics in argon and xenon gases with 50-200 W of input power and gas flow rates from 10-80 sccm are presented. In particular, extracted beam current versus accelerating voltage, and specific energy vs. mass utilization efficiency and extracted beam current are presented. Double Langmuir probe measurements indicate that electron densities in excess of 10 to the 12th per cu cm can be readily achieved in the microwave generated plasma.

Asmussen, J.↗

Industrial ion source technology

Plasma probe surveys were conducted in a 30-cm source to verify that the uniformity in the ion beam is the result of a corresponding uniformity in the discharge-chamber plasma. A 15 cm permanent magnet multipole ion source was designed, fabricated, and demonstrated. Procedures were investigated for texturing a variety of seed and surface materials for controlling secondary electron emission, increasing electron absorption of light, and improved attachment of biological tissue for medical implants using argon and tetrafluoromethane as the working gases. The cross section for argon-argon elastic collisions in the ion-beam energy range was calculated from interaction potentials and permits calculation of beam interaction effects that can determine system pumping requirements. The data also indicate that different optimizations of ion-beam machines will be advantageous for long and short runs, with 1 mA-hr/cm being the rough dividing line for run length. The capacity to simultaneously optimize components in an ion-beam machine for a single application, a capacity that is not evident in competitive approaches such as diode sputtering is emphasized.

Kaufman, H. R.↗