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At least 55 records · Page 3

Spatial and Spatial Frequency Spreads of Masking: Measurements and A Contrast-Gain-Control Model

Masked pattern detection is affected by the mask's proximity to the target in both the spatial and the spatial frequency domains. We measured contrast thresholds for detection of a Gabor patch centered in a sample of static band-pass noise with a central noise-free aperture. To examine spatial spread, target and mask frequency were identical, at either 2, 4, or 8 cycles/degree (cpd), and the radius of the aperture was 0, 1/2 or 1 cycle of the noise band's center frequency. The results suggest that the spatial spread of masking is scale invariant, with the largest radius producing little masking. To examine spatial frequency spread, a radius of 0 (no aperture) was used with all pairings of 2, 4, and 8 cpd for target and mask. The results suggest that masking is asymmetrical over log frequency: 8 z 0 cpd noise masks a 2 cpd target, but 2 cpd noise does not mask an 8 cpd target. We have used these results to calibrate a model of contrast-gain-control.

Solomon, Joshua A.↗

Spatial and Spatial Frequency Spreads Of Masking: Measurements and a Contrast-Gain-Control Model

Masked pattern detection is affected by the mask's proximity to the target in both the spatial and the spatial frequency domains. We measured contrast thresholds for detection of a Gabor patch centered in a sample of static band-pass noise with a central noise-free aperture. To examine spatial spread, target and mask frequency were identical, at either 2, 4, or 8 cycles/degree (cpd), and the radius of the aperture was 0, 1/2 or 1 cycle of the noise band's center frequency. The results suggest that the spatial spread of masking is scale invariant, with the largest radius producing little masking. To examine spatial frequency spread, a radius of 0 (no aperture) was used with all pairings of 2,4, and 8 cpd for target and mask. The results suggest that masking is asymmetrical over log frequency: 8 cpd noise masks a 2 cpd target, but 2 cpd noise does not mask an 8 cpd target. We have used these results to calibrate a model of contrast-gain-control.

Solomon, J. A.↗

Improved Phase-Mask Fabrication of Fiber Bragg Gratings

An improved method of fabrication of Bragg gratings in optical fibers combines the best features of two prior methods: one that involves the use of a phase mask and one that involves interference between the two coherent laser beams. The improved method affords flexibility for tailoring Bragg wavelengths and bandwidths over wide ranges. A Bragg grating in an optical fiber is a periodic longitudinal variation in the index of refraction of the fiber core. The spatial period (Bragg wavelength) is chosen to obtain enhanced reflection of light of a given wavelength that would otherwise propagate relatively unimpeded along the core. Optionally, the spatial period of the index modulation can be made to vary gradually along the grating (such a grating is said to be chirped ) in order to obtain enhanced reflection across a wavelength band, the width of which is determined by the difference between the maximum and minimum Bragg wavelengths. In the present method as in both prior methods, a Bragg grating is formed by exposing an optical fiber to an ultraviolet-light interference field. The Bragg grating coincides with the pattern of exposure of the fiber core to ultraviolet light; in other words, the Bragg grating coincides with the interference fringes. Hence, the problem of tailoring the Bragg wavelength and bandwidth is largely one of tailoring the interference pattern and the placement of the fiber in the interference pattern. In the prior two-beam interferometric method, a single laser beam is split into two beams, which are subsequently recombined to produce an interference pattern at the location of an optical fiber. In the prior phase-mask method, a phase mask is used to diffract a laser beam mainly into two first orders, the interference between which creates the pattern to which an optical fiber is exposed. The prior two-beam interferometric method offers the advantage that the period of the interference pattern can be adjusted to produce gratings over a wide range of Bragg wavelengths, but offers the disadvantage that success depends on precise alignment and high mechanical stability. The prior phase-mask method affords the advantages of compactness of equipment and relative insensitivity to both misalignment and vibration, but does not afford adjustability of the Bragg wavelength. The present method affords both the flexibility of the prior two-beam interferometric method and the compactness and stability of the prior phase-mask method. In this method (see figure), a laser beam propagating along the x axis is normally incident on a phase mask that lies in the (y,z) plane. The phase of light propagating through the mask is modulated with a spatial periodicity, p, along the y axis chosen to diffract the laser light primarily to first order at the angle . (The zero-order laser light propagating along the x axis can be used for alignment and thereafter suppressed during exposure of the fiber.) The diffracted light passes through a concave cylindrical lens, which converts the flat diffracted wave fronts to cylindrical ones, as though the light emanated from a line source. Then two parallel flat mirrors recombine the diffracted beams to form an interference field equivalent to that of two coherent line sources at positions A and B (virtual sources). The interference pattern is a known function of the parameters of the apparatus and of position (x,y) in the interference field. Hence, the tilt, wavelength, and chirp of the Bragg grating can be chosen through suitable adjustments of the apparatus and/or of the position and orientation of the optical fiber. In particular, the Bragg wavelength can be adjusted by moving the fiber along the x axis, and the bandwidth can be modified over a wide range by changing the fiber tilt angle or by moving the phase mask and/or the fiber. Alignment is easy because the zero-order beam defines the x axis. The interference is relatively stable and insensitive to the mechanical vibration because of the gh symmetry and compactness of the apparatus, the fixed positions of the mirrors and lens, and the consequent fixed positions of the two virtual line sources, which are independent of the translations of the phase mask and the laser relative to the lens.

Grant, Joseph↗

Coronagraph Focal-Plane Phase Masks Based on Photonic Crystal Technology: Recent Progress and Observational Strategy

Photonic crystal, an artificial periodic nanostructure of refractive indices, is one of the attractive technologies for coronagraph focal-plane masks aiming at direct imaging and characterization of terrestrial extrasolar planets. We manufactured the eight-octant phase mask (8OPM) and the vector vortex mask (VVM) very precisely using the photonic crystal technology. Fully achromatic phase-mask coronagraphs can be realized by applying appropriate polarization filters to the masks. We carried out laboratory experiments of the polarization-filtered 8OPM coronagraph using the High-Contrast Imaging Testbed (HCIT), a state-of-the-art coronagraph simulator at the Jet Propulsion Laboratory (JPL). We report the experimental results of 10-8-level contrast across several wavelengths over 10% bandwidth around 800nm. In addition, we present future prospects and observational strategy for the photonic-crystal mask coronagraphs combined with differential imaging techniques to reach higher contrast. We proposed to apply a polarization-differential imaging (PDI) technique to the VVM coronagraph, in which we built a two-channel coronagraph using polarizing beam splitters to avoid a loss of intensity due to the polarization filters. We also proposed to apply an angular-differential imaging (ADI) technique to the 8OPM coronagraph. The 8OPM/ADI mode avoids an intensity loss due to a phase transition of the mask and provides a full field of view around central stars. We present results of preliminary laboratory demonstrations of the PDI and ADI observational modes with the phase-mask coronagraphs.

coronagraphy↗

Durability of Disposable N95 Mask Material When Exposed to Improvised Ozone Gas Disinfection

The principle finding of this report is that both commercial and a novel material used for N95 mask filters can endure many cycles of disinfection by ozone gas (20 ppm for 30 minutes) without detectable degradation or loss of filtration efficiency. N95 masks and surgical masks (hereafter referred to as masks) typically use a filtration material fabricated from meltblown polypropylene. To achieve maximum filtration efficiency while maintaining a reasonable pressure drop, these nonwoven fabrics are also electrostatically charged (corona discharge is the most common method used), to maximize attraction and capture of aerosols and solid particulates. Under normal circumstances, the reuse of masks is generally discouraged, but in times of crisis has become a necessity, making disinfection after each use a necessity. To be acceptable, any disinfection procedure must cause minimal degradation to the performance of the filter material. Possible performance degradation mechanisms include mechanical damage, loss of electrostatic charge, or both. One of the most practical and direct ways to measure combined mechanical and electrostatic integrity, and the subsequent ability to reuse mask filter material, is by the direct measurement of filtration efficiency. In this paper, we report that small numbers of disinfection cycles at reasonable virucidal doses of ozone do not significantly degrade the filtration efficiency of meltblown polypropylene filter material. By comparison, laundering quickly results in a significant loss of filtration efficiency and requires subsequent recharging to restore the electrostatic charge and filtration efficiency. A common assumption among biomedical scientists that ozone is far too destructive for this application. However, these direct measurements show that mask materials, specifically the filtration material, can withstand dozens of ozone disinfection cycles without any measurable degradation of filtration efficiency, nor any visible discoloration or loss of fiber integrity. The data are clear: when subjected to a virucidal dose of ozone for a much longer duration than is required for viral inactivation, there was no degradation of N95 filtration efficiency. The specific dosages of ozone needed for ~99% viral inactivation are thought to be at least 10 ppm for up to 30 minutes based upon an extensive literature review, but to standardize our testing, we consider a dose of 20 ppm for 30 minutes to be a reasonable and conservatively high ozone disinfection cycle. Finally, the material tested in this study withstood dosages of up to 200 ppm for 90 minutes, or alternatively 20 ppm for up to 36 hours, without detectable degradation, and further testing suggests that up to 30 or more disinfection cycles (at 20 ppm for 30 minutes) would result in less than a 5% loss of filtration efficiency. This report does not address the effect of ozone cycling on other mask components, such as elastics.

60 APPLIED LIFE SCIENCES↗

Modeling high-efficiency extreme ultraviolet etched multilayer phase-shift masks

Achieving high-throughput extreme ultraviolet (EUV) patterning remains a major challenge due to low source power; phase-shift masks can help solve this challenge for dense features near the resolution limit by creating brighter images than traditional absorber masks when illuminated with the same source power. We explore applications of etched multilayer phase-shift masks for EUV lithography, both in the current-generation 0.33 NA and next-generation 0.55 NA systems. We derive analytic formulas for the thin-mask throughput gains, which are 2.42× for lines and spaces and 5.86× for contacts compared with an absorber mask with dipole and quadrupole illumination, respectively. Using rigorous finite-difference time-domain simulations, we quantify variations in these gains by pitch and orientation, finding 87% to 113% of the thin-mask value for lines and spaces and a 91% to 99% for contacts. We introduce an edge placement error metric, which accounts for CD errors, relative feature motion, and telecentricity errors, and use this metric both to optimize mask designs for individual features and to explore which features can be printed on the same mask. Furthermore, we find that although partial coherence shrinks the process window, at an achievable sigma of 0.2 we obtain a depth of focus of 340 nm and an exposure latitude of 39.2%, suggesting that partial coherence will not limit the feasibility of this technology. Finally, we show that many problems such as sensitivity to etch uniformity can be greatly mitigated using a central obscuration in the imaging pupil.

42 ENGINEERING↗

SU-E-T-541: Bolus Effect of Thermoplastic Masks in IMRT and VMAT Head and Neck Treatments

Purpose: To quantitatively evaluate the bolus effect of thermoplalstic mask on patient skin dose during multi-field IMRT and VMAT treatment. Methods: The clinically approved target contours for five head and neck patients were deformably registered to an anthropomorphic Rando phantom. Two plans: Multifield IMRT plan with 7-9 beams and VMAT plan with 2-4 arcs were created for each patient following same dose constraints. 3mm skin was excluded from PTVs but not constrained during optimization. The prescription dose was 200-220 cGy/fraction. A thermoplastic head and shoulder mask was customized for the Rando phantom. Each plan was delivered to the phantom twice with and without mask. During each delivery, two rectangular strips of EBT3 films (1cm x 6.8cm) were placed across the anterior upper and lower neck near PTVs to measure the surface dose. For consistency films were positioned at same locations for same patient. A total of 8 film strips were obtained for each patient. Film dose was calibrated in the range of 0-400cGy on the day of plan delivery. For dose comparison 3 regions of interests (ROIs) of 1×1 cm{sup 2} were selected at left, right and middle part of each film, resulting in 6 point doses at each plan delivery. Results: The films without mask show relatively uniform dose distribution while those with mask clearly show mesh pattern of mask, usually indicating an increase in skin dose. On average the increase in skin dose over all ROIs with mask was 31.9%(±14.8%) with a range of 11.4%- 58.4%. There is no statistically significant difference (p=0.44) between skin dose increase in VMAT (30.8%±15.3%) and IMRT delivery (33.0%±14.9%). Conclusion: Thermoplastic immobilization masks increase surface dose for HN patient by around 30%. The magnitude is comparable between multi-field IMRT and VMAT. Radiochromic EBT3 film serves as an effective tool to quantify bolus effect.

60 APPLIED LIFE SCIENCES↗

SU-E-T-65: A Prospective Trial of Open Face Masks for Head and Neck Radiotherapy

Purpose: Open face head and neck masks allow for active patient monitoring during treatment and may reduced claustrophobia and anxiety compared to closed masks. The ability of open masks to limit intrafraction motion and to preserve the patient shape/position from simulation over protracted treatments should be considered. Methods: Thirty-two head and neck patients were prospectively randomized to treatment in a closed mask or a novel open face mask. All patients received daily volumetric imaging. The daily images were automatically rigidly registered to the planning CT’s offline using a commercial image processing tool. The shifts needed to optimize the registration, the mutual information coefficient (MI), and the Pearson correlation (PC) coefficients were recorded to evaluate shape preservation. The open group was set-up and monitored with surface imaging at treatment. The real time surface imaging information was recorded to evaluate intrafraction motion. Results: Sixteen patients were included in each group. Evaluations were made over a total of 984 fractions. The mean MI and PC showed significantly higher shape preservation for the open group than for the closed group (p = 0). The mean rotations for the open group were smaller or < 0.15° larger versus the closed group. The mean intrafraction motion for the open group was 0.93 +/−0.99 mm (2 SD). The maximum single fraction displacement was 3.2 mm. Fourteen of 16 patients showed no significant correlation of motion with fraction number (p > 0.05). Conclusion: The open masks preserved shape as well as the closed masks, and they limited motion to < 2 mm for 95% of the treated fractions. These results are consistent over treatment courses of up to 35 fractions. The open mask is suitable for treatment with or without active monitoring. This work was partially supported by Qfix.

60 APPLIED LIFE SCIENCES↗

Masking of a High-Reflectivity Sphere by a Layer with a Random Quasi-Zero Refractive Index

The method of masking of a large-radius sphere made of an arbitrary material by a masking coating with a random quasi-zero refractive index is substantiated theoretically and experimentally. In this method of masking, the sphere is first coated with a mirror layer (e.g., high-reflectivity silver) and then with a masking layer with a thickness much smaller than the radius of the sphere. The fraction of the external radiation intensity bending around the sphere at the points of observation near the surface of the sphere and the extinction cross section of the sphere with the masking coating for points of observation far away from the sphere are calculated. It is shown that extinction cross section Q of the sphere with a masking coating is much smaller than 2D, where D is the geometrical cross section of the sphere; this corresponds to the masking effect for the sphere in the wavelength range of at least 450–1200 nm in the transparency region of the masking coating.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

Computing Challenges in Coded Mask Imaging

This slide presaentation reviews the complications and challenges in developing computer systems for Coded Mask Imaging telescopes. The coded mask technique is used when there is no other way to create the telescope, (i.e., when there are wide fields of view, high energies for focusing or low energies for the Compton/Tracker Techniques and very good angular resolution.) The coded mask telescope is described, and the mask is reviewed. The coded Masks for the INTErnational Gamma-Ray Astrophysics Laboratory (INTEGRAL) instruments are shown, and a chart showing the types of position sensitive detectors used for the coded mask telescopes is also reviewed. Slides describe the mechanism of recovering an image from the masked pattern. The correlation with the mask pattern is described. The Matrix approach is reviewed, and other approaches to image reconstruction are described. Included in the presentation is a review of the Energetic X-ray Imaging Survey Telescope (EXIST) / High Energy Telescope (HET), with information about the mission, the operation of the telescope, comparison of the EXIST/HET with the SWIFT/BAT and details of the design of the EXIST/HET.

Skinner, Gerald↗

Reflective Occultation Mask for Evaluation of Occulter Designs for Planet Finding

Advanced formation flying occulter designs utilize a large occulter mask flying in formation with an imaging telescope to block and null starlight to allow imaging of faint planets in exosolar systems. A paper describes the utilization of subscale reflective occultation masks to evaluate formation flying occulter designs. The use of a reflective mask allows mounting of the occulter by conventional means and simplifies the test configuration. The innovation alters the test set-up to allow mounting of the mask using standard techniques to eliminate the problems associated with a standard configuration. The modified configuration uses a reflective set-up whereby the star simulator reflects off of a reflective occulting mask and into an evaluation telescope. Since the mask is sized to capture all rays required for the imaging test, it can be mounted directly to a supporting fixture without interfering with the beam. Functionally, the reflective occultation mask reflects light from the star simulator instead of transmitting it, with a highly absorptive carbon nanotube layer simulating the occulter blocking mask. A subscale telescope images the star source and companion dim source that represents a planet. The primary advantage of this is that the occulter can be mounted conventionally instead of using diffractive wires or magnetic levitation.

Hagopian, John↗

Development of an Operational Land Water Mask for MODIS Collection 6, and Influence on Downstream Data Products

Data from the Moderate Resolution Imaging Spectro-radiometer (MODIS)on-board the Earth Observing System Terra and Aqua satellites are processed using a land water mask to determine when an algorithm no longer needs to be run or when an algorithm needs to follow a different pathway. Entering the fourth reprocessing (Collection 6 (C6)) the MODIS team replaced the 1 km water mask with a 500 m water mask for improved representation of the continental surfaces. The new water mask represents more small water bodies for an overall increase in water surface from 1 to 2 of the continental surface. While this is still a small fraction of the overall global surface area the increase is more dramatic in certain areas such as the Arctic and Boreal regions where there are dramatic increases in water surface area in the new mask. MODIS products generated by the on-going C6 reprocessing using the new land water mask show significant impact in areas with high concentrations of change in the land water mask. Here differences between the Collection 5 (C5) and C6 water masks and the impact of these differences on the MOD04 aerosol product and the MOD11 land surface temperature product are shown.

Carroll, M. L.↗

Multi-Star Wavefront Control at the Occulting Mask Coronagraph Testbed: Monochromatic Laboratory Demonstration for the Roman Coronagraph Instrument

The Astro2020 decadal survey recommended a direct imaging flagship mission with a goal for mission yield of 25 or more potentially habitable exoplanets. A majority of Sun-like stars have a stellar companion that can introduce additional noise into the field of view of any high-contrast imaging instrument and enabling exoplanet discovery around binary stars represents a path to increased coronagraphic instrument efficiency. This includes both of the Alpha Centauri A and B stars which would represent the top science target for direct imaging if companion leakage can be suppressed. Multi-Star Wavefront Control (MSWC) is a technique that removes stellar leakage from both stellar components, enabling direct imaging of exoplanets in many binary star systems. We present the latest testbed results obtained with MSWC as part of the technology development effort focusing on demonstrations conducted on the Occulting Mask Coronagraph (OMC) testbed at JPL. OMC has a layout similar to the Roman Space Telescope coronagraph instrument (CGI) and is outfitted with a MSWC mask with the same design as the contributed mask for the Roman CGI. Our testbed results represent the first demonstrations of this technique using the recently installed full binary source for a geometry matching potential Alpha Centauri observations. Technical Review Abstract: The Astro2020 decadal survey recommended a direct imaging flagship mission with a goal for mission yield of 25 or more potentially habitable exoplanets. A majority of Sun-like stars have a stellar companion that can introduce additional noise into the field of view of any high-contrast imaging instrument and enabling exoplanet discovery around binary stars represents a path to increased coronagraphic instrument efficiency by increasing the available science target pool of bright nearby stars. This includes both of the Alpha Centauri A and B stars which would represent the top science target for direct imaging if companion leakage can be suppressed. Multi-Star Wavefront Control (MSWC) is a technique that removes stellar leakage from both stellar components, enabling direct imaging of exoplanets in many binary star systems . We present the latest testbed results obtained with MSWC as part of the technology development effort focusing on demonstrations conducted on the Occulting Mask Coronagraph (OMC) testbed at JPL during the completed first vacuum window and recent results from the ongoing second vacuum window. The MSWC mask consists of a shaped pupil mask similar to the one used for the Wide-Field of View mode but also includes a set of superimposed, regularly-spaced dots that serve as a diffraction grating. OMC has a layout similar to the Roman Space Telescope coronagraph instrument (CGI) and is configured with a binary imaging mode with a MSWC mask using same design as the contributed mask for the Roman CGI. Our testbed results represent the first demonstrations of this technique using the recently installed full binary source. We present results obtained in Super-Nyquist regime demonstrating suppression in the Super-Nyquist regime for the 3rd diffraction order reaching 8.7e-9 contrast with the Roman pupil. In addition, we present results obtained with the binary-star regime demonstrating 9.6e-8 contrast for a geometry matching potential Alpha Centauri observations in a monochromatic wavelength similar to Band 1. Planned demonstrations in the 2nd vacuum window will focus on Band 3d and Band 4 using the full MSWC mode for an Alpha Centauri geometry.

High-contrast imaging↗

Electron beam masks for compressive sensors

Transmission microscopy imaging systems include a mask and/or other modulator situated to encode image beams, e.g., by deflecting the image beam with respect to the mask and/or sensor. The beam is modulated/masked either before or after transmission through a sample to induce a spatially and/or temporally encoded signal by modifying any of the beam/image components including the phase/coherence, intensity, or position of the beam at the sensor. For example, a mask can be placed/translated through the beam so that several masked beams are received by a sensor during a single sensor integration time. Images associated with multiple mask displacements are then used to reconstruct a video sequence using a compressive sensing method. Another example of masked modulation involves a mechanism for phase-retrieval, whereby the beam is modulated by a set of different masks in the image plane and each masked image is recorded in the diffraction plane.

36 MATERIALS SCIENCE↗

Aerosol Filtration Efficiency of Common Fabrics Used in Respiratory Cloth Masks

The emergence of a pandemic affecting the respiratory system can result in a significant demand for face masks. This includes the use of cloth masks by large sections of the public, as can be seen during the current global spread of COVID-19. However, there is limited knowledge available on the performance of various commonly available fabrics used in cloth masks. Importantly, there is a need to evaluate filtration efficiencies as a function of aerosol particulate sizes in the 10 nm – 10 µm range, which is particularly relevant for respiratory virus transmission. We have carried out these studies for several common fabrics including cotton, silk, chiffon, flannel, various synthetics, and their combinations. While the filtration efficiencies for various fabrics when a single layer was used ranged from 5-80% and 15-95% for particle sizes <300 nm and >300 nm respectively, the efficiencies improved when multiple layers were used, and when using a specific combination of different fabrics. Filtration efficiencies of the hybrids (such as cotton-silk, cotton-chiffon, cotton-flannel) was >80 % (for particles <300 nm) and >90 % (for particles >300 nm). We speculate that the enhanced performance of the hybrids is likely due to the combined effect of mechanical and electrostatic-based filtration. Cotton, the most widely used material for cloth masks performs better at higher weave densities (i.e., threads per inch) and can make a significant difference in filtration efficiencies. Our studies also imply that gaps (as caused by an improper fit of the mask) can result in over a 60% decrease in the filtration efficiency, implying the need for future cloth mask design studies to take into account issues of “fit” and leakage, while allowing the exhaled air to vent efficiently. Overall, we find that combinations of various commonly available fabrics used in cloth masks can potentially provide significant protection against the transmission of aerosol particles.

36 MATERIALS SCIENCE↗

Stress engineering in GaN structures grown on Si(111) substrates by SiN masking layer application

GaN layers without and with an in-situ SiN mask were grown by using metal organic vapor phase epitaxy for three different approaches used in GaN on silicon(111) growth, and the physical and optical properties of the GaN layers were studied. For each approach applied, GaN layers of 1.4 μm total thickness were grown, using silan SiH{sub 4} as Si source in order to grow Si{sub x}N{sub x} masking layer. The optical micrographs, scanning electron microscope images, and atomic force microscope images of the grown samples revealed cracks for samples without SiN mask, and micropits, which were characteristic for the samples grown with SiN mask. In situ reflectance signal traces were studied showing a decrease of layer coalescence time and higher degree of 3D growth mode for samples with SiN masking layer. Stress measurements were conducted by two methods—by recording micro-Raman spectra and ex-situ curvature radius measurement—additionally PLs spectra were obtained revealing blueshift of PL peak positions with increasing stress. The authors have shown that a SiN mask significantly improves physical and optical properties of GaN multilayer systems reducing stress in comparison to samples grown applying the same approaches but without SiN masking layer.

42 ENGINEERING↗

Evaluating Printability of Buried Native EUV Mask Phase Defects through a Modeling and Simulation Approach

The availability of defect-free masks is considered to be a critical issue for enabling extreme ultraviolet lithography (EUVL) as the next generation technology. Since completely defect-free masks will be hard to achieve, it is essential to have a good understanding of the printability of the native EUV mask defects. In this work, we performed a systematic study of native mask defects to understand the defect printability caused by them. The multilayer growth over native substrate mask blank defects was correlated to the multilayer growth over regular-shaped defects having similar profiles in terms of their width and height. To model the multilayer growth over the defects, a novel level-set multilayer growth model was used that took into account the tool deposition conditions of the Veeco Nexus ion beam deposition tool. The same tool was used for performing the actual deposition of the multilayer stack over the characterized native defects, thus ensuring a fair comparison between the actual multilayer growth over native defects, and modeled multilayer growth over regular-shaped defects. Further, the printability of the characterized native defects was studied with the SEMATECH-Berkeley Actinic Inspection Tool (AIT), an EUV mask-imaging microscope at Lawrence Berkeley National Laboratory (LBNL). Printability of the modeled regular-shaped defects, which were propagated up the multilayer stack using level-set growth model was studied using defect printability simulations implementing the waveguide algorithm. Good comparison was observed between AIT and the simulation results, thus demonstrating that multilayer growth over a defect is primarily a function of a defect’s width and height, irrespective of its shape. This would allow us to predict printability of the arbitrarily-shaped native EUV mask defects in a systematic and robust manner.

36 MATERIALS SCIENCE↗

TU-CD-304-09: Feasibility Study for Thermoplastic Mask Set Up Monitoring Using Force Sensing Resistor (FSR) Sensor

Purpose: To improve the setup accuracy of thermoplastic mask, we developed a new monitoring method based on force sensing technology and evaluated its feasibility. Methods: The thermoplastic mask setup monitoring system consists of a force sensing resistor sensor unit, a signal transport device, a control PC and an in-house software. The system is designed to monitor pressure variation between the mask and patient in real time. It also provides a warning to the user when there is a possibility of movement. A preliminary study was performed to evaluate the reliability of the sensor unit and developed monitoring system with a head phantom. Then, a simulation study with volunteers was conducted to evaluate the feasibility of the monitoring system. Note that the sensor unit can have multiple end-sensors and every end-sensor was confirmed to be within 2% reliability in pressure reading through a screening test. Results: To evaluate the reproducibility of the proposed monitoring system in practice, we simulated a mask setup with the head phantom. FRS sensors were attached on the face of the head phantom and pressure was monitored. For 3 repeated mask setups on the phantom, the variation of the pressure was less than 3% (only 1% larger than 2% potential uncertainty confirmed in the screening test). In the volunteer study, we intended to verify that the system could detect patient movements within the mask. Thus, volunteers were asked to turn their head or lift their chin. The system was able to detect movements effectively, confirming the clinical feasibility of the monitoring system developed. Conclusion: Through the proposed setup monitoring method, it is possible to monitor patient motion inside a mask in real time, which has never been possible with most commonly used systems using non-radiographic technology such as infrared camera system and surface imaging system. This work was supported by the Radiation Technology R&D program (No. 2013M2A2A7043498) and the Mid-career Researcher Program (2014R1A2A1A10050270) through the National Research Foundation of Korea funded by the Ministry of Science, ICT&Future Planning.

60 APPLIED LIFE SCIENCES↗