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At least 55 records · Page 3
All sourcesNASA NTRSDOE OSTI
NASA NTRS1995

Solar wind double ions beams and the heliospheric current sheet

Double ion beams are often observed in the solar wind, but little work has been done in relating these beams to structures within the solar wind. Double ion beams are observed as beams of a given ion species and charge state occurring at two different energies. We use the three-dimensional ion plasma instrument on board the Ulysses spacecraft to look for evidence of such beams associated with the heliospheric current sheet. In a subset chosen independently of plasma parameters consisting of 8 of cover 47 crossings of the current sheet made during the inecliptic phase of the Ulysses mission we find that these double ion beams are always present on either side of the current sheet. The double beams are present in both the proton and helium species. The secondary beam typically has a higher helium abundance, which suggests that these beams are formed in the helium-rich corona rather than in interplanetary space. The double beams are not present in the interior of the current sheet. Neither collisions nor effects of plasma beta can account for the disappearance of the double beams inside the current sheet in all eight cases. We postulate that these beams are formed by reconnection occurring near the Sun in the boundary region between the open field lines of the coronal holes and the closed field line region of the heliospheric current sheet. Such a scenario would be consistent with previous X ray measurements which suggect that reconnection is occurring in this region.

Hammond, C. M.↗
NASA NTRS1977

A heavy ion beam probe system for investigation of a modified Penning discharge

An ion beam probe diagnostic system can measure time- and space-resolved profiles of plasma space potential and electron density. In combination with a computer iterative technique, the ion beam probe can determine both the space potential profile in plasmas containing strong electric fields and potentials comparable in magnitude to the energy of the probing ion beam. During ion beam probing of a modified Penning discharge, several groups of secondary ions were observed coming from the plasma with a fixed primary beam energy and momentum. The energies of these ions were within 10 percent of the values predicted by a computer-generated model of the potential profile in the plasma. The mechanical and electronic components of the system are described, with particular emphasis on those features required to probe plasma potentials comparable in magnitude to the ion beam energy.

Kambic, G. X.↗
NASA NTRS1975

Experimental observation of the ion-ion beam instability in a cylindrical geometry

The ion-ion beam instability is investigated in a cylindrical geometry. In the presence of a cylindrically symmetric ion beam a coherent ion-ion beam instability is observed for a well-defined range of beam velocity. This instability gives rise to cylindrical standing waves whose frequency depends upon beam velocity. The beam distribution function is measured to be a ring in velocity space. The dispersion relation appropriate for the cylindrical standing waves is solved numerically and is shown to be in good agreement with the experimentally observed instability.

Romesser, T.↗
NASA NTRS1981

High efficiency ion beam accelerator system

An ion accelerator system that successfully combines geometrical and electrostatic focusing principles is presented. This accelerator system uses thin, concave, multiple-hole, closely spaced graphite screen and focusing grids which are coupled to single slot accelerator and decelerator grids to provide high ion extraction efficiency and good focusing. Tests with the system showed a substantial improvement in ion beam current density and collimation as compared with a Pierce electrode configuration. Durability of the thin graphite screen and focusing grids has been proven, and tests are being performed to determine the minimum screen and focusing grid spacing and thickness required to extract the maximum reliable beam current density. Compared with present neutral beam injector accelerator systems, this one has more efficient ion extraction, easier grid alignment, easier fabrication, a less cumbersome design, and the capacity to be constructed in a modular fashion. Conceptual neutral beam injector designs using this modular approach have electrostatic beam deflection plates downstream of each module.

Aston, G.↗
DOE OSTI2025

Plasma Focused Ion Beam Milling of High-Aspect-Ratio Holes in Diamond

Plasma focused ion beam (PFIB) technology has a great potential for applications requiring rapid micro-machining of high-aspect-ratio features. Here, we use 30-keV Ar, Xe, and O 2 ion beams to study PFIB milling of high-aspect-ratio circular holes in polycrystalline diamond. Our results show that Xe and O 2 ion beams have the highest milling efficiency for low-aspect-ratio and high-aspect-ratio hole milling, respectively. Each ion beam species produces holes with its characteristic shape and wall surface morphology. In conclusion, based on these results, we demonstrate a “hybrid” hole milled in a two-step process with Xe and O 2 ion beams with the geometry and wall morphology attractive for the attachment of a fuel fill tube to the inertial confinement fusion capsule.

ICF targets↗
NASA NTRS1979

Homogeneous alignment of nematic liquid crystals by ion beam etched surfaces

A wide range of ion beam etch parameters capable of producing uniform homogeneous alignment of nematic liquid crystals on SiO2 films are discussed. The alignment surfaces were generated by obliquely incident (angles of 5 to 25 deg) argon ions with energies in the range of 0.5 to 2.0 KeV, ion current densities of 0.1 to 0.6 mA sq cm and etch times of 1 to 9 min. A smaller range of ion beam parameters (2.0 KeV, 0.2 mA sq cm, 5 to 10 deg and 1 to 5 min.) were also investigated with ZrO2 films and found suitable for homogeneous alignment. Extinction ratios were very high (1000), twist angles were small ( or = 3 deg) and tilt-bias angles very small ( or = 1 deg). Preliminary scanning electron microscopy results indicate a parallel oriented surface structure on the ion beam etched surfaces which may determine alignment.

Wintucky, E. G.↗
NASA NTRS1976

Nonpropulsive applications of ion beams

This paper describes the results of an investigation of the nonpropulsive applications of electric propulsion technology. Eight centimeter ion beam sources utilizing xenon and argon have been developed that operate over a wide range of beam energies and currents. Three types of processes have been studied - sputter deposition, ion beam machining, and ion beam surface texturing. The broad range of source operating conditions allows optimum sputter deposition of various materials. An ion beam source has also been used to ion mill laser reflection holograms using photoresist patterns on silicon. Ion beam texturing has been tried with many materials and has a multitude of potential applications.

Hudson, W. R.↗
NASA NTRS1976

Ion beam thruster shield

An ion thruster beam shield is provided that comprises a cylindrical housing that extends downstream from the ion thruster and a plurality of annular vanes which are spaced along the length of the housing, and extend inwardly from the interior wall of the housing. The shield intercepts and stops all charge exchange and beam ions, neutral propellant, and sputter products formed due to the interaction of beam and shield emanating from the ion thruster outside of a fixed conical angle from the thruster axis. Further, the shield prevents the sputter products formed during the operation of the engine from escaping the interior volume of the shield.

Power, J. L.↗
NASA NTRS1979

Ion beam probing of electrostatic fields

The determination of a cylindrically symmetric, time-independent electrostatic potential V in a magnetic field B with the same symmetry by measurements of the deflection of a primary beam of ions is analyzed and substantiated by examples. Special attention is given to the requirements on canonical angular momentum and total energy set by an arbitrary, nonmonotone V, to scaling laws obtained by normalization, and to the analogy with ionospheric sounding. The inversion procedure with the Abel analysis of an equivalent problem with a one-dimensional fictitious potential is used in a numerical experiment with application to the NASA Lewis Modified Penning Discharge. The determination of V from a study of secondary beams of ions with increased charge produced by hot plasma electrons is also analyzed, both from a general point of view and with application to the NASA Lewis SUMMA experiment. Simple formulas and geometrical constructions are given for the minimum energy necessary to reach the axis, the whole plasma, and any point in the magnetic field. The common, simplifying assumption that V is a small perturbation is critically and constructively analyzed; an iteration scheme for successively correcting the orbits and points of ionization for the electrostatic potential is suggested.

Persson, H.↗
NASA NTRS1992

Plasma effects of active ion beam injections in the ionosphere at rocket altitudes

Data from ARCS rocket ion beam injection experiments are primarily discussed. There are three results from this series of active experiments that are of particular interest in space plasma physics. These are the transverse acceleration of ambient ions in the large beam volume, the scattering of beam ions near the release payload, and the possible acceleration of electrons very close to the plasma generator which produce intense high frequency waves. The ability of 100 ma ion beam injections into the upper E and F regions of the ionosphere to produce these phenomena appear to be related solely to the process by which the plasma release payload and the ion beam are neutralized. Since the electrons in the plasma release do not convect with the plasma ions, the neutralization of both the payload and beam must be accomplished by large field-aligned currents (milliamperes/square meter) which are very unstable to wave growth of various modes.

Arnoldy, R. L.↗
NASA NTRS1989

Trochoidal analysis of scattered electrons in a merged electron-ion beam geometry

The method and apparatus of this invention provides a plurality of measurements indicative of the absolute cross section for excitation of an ion beam. The ion beam is merged for excitation by specific energies of electrons in an electron beam. Both beams are merged in an evacuated enclosure having a longitudinal magnetic field and a crossed uniform electric field. The ions and electrons interact over a known merged longitudinal length in a merged beam area. After collision, the electron and ion beams are demerged. Forward and backward-scattered electrons are collected and position-detected by a pair of microchannel plate arrays located at opposite ends of said longitudinal beam-merging area. A series of electron and ion primary current measurements are taken at full ion and electron beam strength. Measurements are also taken at greatly reduced beam strength to obtain a beam overlap profile.

Ara Chutjian↗
NASA NTRS1972

Spacecraft ion beam noise effects

An estimate of the antenna noise temperature and the uplink signal-to-noise ratio has been made for Bremsstrahlung radiation emitted by a spacecraft ion beam; a worst-case situation in which the spacecraft antenna is located in the exit plane of the ion beam and directed at varying angles into the ion beam is assumed. Numerical results of the antenna noise temperature versus antenna pointing angle are given for a typical set of ion beam and antenna pattern parameters. The uplink signal-to-noise ratio due to the ion beam noise alone is given in terms of a critical range in AU at which a typical ranging transmission is received with S/N = 0 db. The effects of the ion beam divergence angle and antenna distance on the ion beam are also presented. Results of the study show typical increases in the antenna noise temperature of about 0.2 K and critical ranges of the order of 3-5 AU. An ion engine thus generally introduces an undetectable level of noise into a spacecraft receiver.

Anenberg, G. L.↗
NASA NTRS1979

Homogeneous alignment of nematic liquid crystals by ion beam etched surfaces

A wide range of the ion beam etch parameters are capable of producing uniform homogeneous alignment of nematic liquid crystals on SiO2 films. The alignment surfaces were generated by obliquely incident argon ions; a smaller range of ion beam parameters was also investigated with ZrO2 films and found suitable for homogeneous alignment. Extinction ratios were very high, and twist and tilt-bias angles were very small. The SEM results indicate a parallel oriented surface structure on the ion beam etched surfaces which may determine alignment.

Wintucky, E. G.↗
NASA NTRS1986

Ion beam sputter etching

An ion beam etching process which forms extremely high aspect ratio surface microstructures using thin sputter masks is utilized in the fabrication of integrated circuits. A carbon rich sputter mask together with unmasked portions of a substrate is bombarded with inert gas ions while simultaneous carbon deposition occurs. The arrival of the carbon deposit is adjusted to enable the sputter mask to have a near zero or even slightly positive increase in thickness with time while the unmasked portions have a high net sputter etch rate.

Banks, Bruce A.↗
NASA NTRS1980

Adherence of ion beam sputter deposited metal films on H-13 steel

An electron bombardment argon ion source was used to sputter deposit 17 different metal and metal oxide films ranging in thickness from 1 to 8 micrometers on H-13 steel substrates. The film adherence to the substrate surface was measured using a tensile test apparatus. Comparisons in bond strength were made between ion beam, ion plating, and RF deposited films. A protective coating to prevent heat checking in H-13 steel dies used for aluminum die casting was studied. The results of exposing the coated substrates to temperatures up to 700 degrees are presented.

Mirtich, M. J.↗
NASA NTRS1982

Ion beam microtexturing and enhanced surface diffusion

Ion beam interactions with solid surfaces are discussed with particular emphasis on microtexturing induced by the deliberate deposition of controllable amounts of an impurity material onto a solid surface while simultaneously sputtering the surface with an ion beam. Experimental study of the optical properties of microtextured surfaces is described. Measurements of both absorptance as a function of wavelength and emissivity are presented. A computer code is described that models the sputtering and ion reflection processes involved in microtexture formation.

Robinson, R. S.↗
NASA NTRS1983

A perpendicular ion beam instability - Solutions to the linear dispersion relation

A 200-eV Xe(+) ion beam directed perpendicular to the terrestrial magnetic field in the F region ionosphere produced very narrow band electrostatic emissions just above multiples of the hydrogen cyclotron frequency. Although the plasma conditions associated with the ion beam were undoubtedly very complex, a simple ion beam in a background ionosphere is considered first. The dispersion relation for flute mode waves and an unmagnetized perpendicular ion beam is solved for a diffuse H(+) plasma and then for a combination of dense O(+) and diffuse H(+). These solutions account for most of the wave properties, including the observation of narrow spectral peaks separated by the hydrogen cyclotron frequency and the observation of no spectral peaks below 2000 Hz. We cannot dismiss field-aligned currents associated with the Xe(+) beam as an alternate source of free energy for the narrow band emissions. However, our intention here is to examine closely the Xe(+) beam as a source for directly exciting the plasma waves.

Kintner, P. M.↗
NASA NTRS1982

Deposition of reactively ion beam sputtered silicon nitride coatings

An ion beam source was used to deposit silicon nitride films by reactively sputtering a silicon target with beams of Ar + N2 mixtures. The nitrogen fraction in the sputtering gas was 0.05 to 0.80 at a total pressure of 6 to 2 millionth torr. The ion beam current was 50 mA at 500 V. The composition of the deposited films was investigated by auger electron spectroscopy and the rate of deposition was determined by interferometry. A relatively low rate of deposition of about 2 nm. one-tenth min. was found. AES spectra of films obtained with nitrogen fractions higher than 0.50 were consistent with a silicon to nitrogen ratio corresponding to Si3N4. However the AES spectra also indicated that the sputtered silicon nitride films were contaminated with oxygen and carbon and contained significant amounts of iron, nickel, and chromium, most probably sputtered from the holder of the substrate and target.

Grill, A.↗