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At least 55 records · Page 3

Harmonic suppression gratings for soft X-ray monochromators

We describe an approach to harmonic suppression in soft X-ray monochromators by engineering the reflection grating’s diffraction pattern to approximate a sinusoidal amplitude. At synchrotron and free-electron laser sources, X-ray beamlines powered by insertion devices produce a spectrum containing harmonic photon energies that can couple unwanted light into experiments. Beamlines in the soft X-ray energy range (100 eV to 2 keV) commonly employ energy-filtering elements to suppress these harmonics. Available approaches tend to be inefficient, significantly reducing the transmitted power. We show that with pseudo-grayscale binary halftone patterns, gratings can approximate a sinusoidal amplitude and suppress higher diffraction orders. Prototype demonstrations of lithographically fabricated gratings were conducted on a soft X-ray beamline with photon energies of 110 eV and 330 eV. Relative to a square-wave amplitude grating, the third-harmonic intensity was reduced by a factor of 9.0 with a first-order efficiency reduction of 38%.

Goldberg, Kenneth A. [Lawrence Berkeley National L↗

X-ray verification of sol-gel resist shrinkage in substrate-conformal imprint lithography for a replicated blazed reflection grating

Surface-relief gratings fabricated through nanoimprint lithography (NIL) are prone to topographic distortion induced by resist shrinkage. Characterizing the impact of this effect on blazed diffraction efficiency is particularly important for applications in astrophysical spectroscopy at soft x-ray wavelengths ( λ ≈ 0.5 − 5 nm) that call for the mass-production of large-area grating replicas with sub-micron, sawtooth surface-relief profiles. A variant of NIL that lends itself well for this task is substrate-conformal imprint lithography (SCIL), which uses a flexible, composite stamp formed from a rigid master template to imprint nanoscale features in an inorganic resist that cures thermodynamically through a silica sol-gel process. While SCIL enables the production of several hundred imprints before stamp degradation and avoids many of the detriments associated with large-area imprinting in NIL, the sol-gel resist suffers shrinkage dependent on the post-imprint cure temperature. Through atomic force microscopy and diffraction-efficiency testing at beamline 6.3.2 of the Advanced Light Source, the impact of this effect on blaze response is constrained for a ∼160-nm-period grating replica cured at 90 ° C. Results demonstrate a ∼2 ° reduction in blaze angle relative to the master grating, which was fabricated by anisotropic wet etching in 〈311〉-oriented silicon to yield a facet angle close to 30 ° .

McCoy, Jake A. (ORCID:0000000216057517)↗

Metal-overcoated grating and method

Metallic overcoated diffraction gratings are particularly useful for high average power laser pulse compression. A dielectric oxide layer is attached to an etch-stop layer, where the dielectric oxide layer comprises a grating pattern including grating lines. Sidewalls of the grating lines taper together toward an upper surface of the dielectric oxide layer. A metallic overcoat is attached to the etch-stop layer and the dielectric oxide layer.

Nguyen, Hoang T.↗

Characterization of groove density variation of VLS gratings with ALS XROL LTP-II in different operation modes

The long trace profiler, LTP-II, available at the Advanced Light Source (ALS) X-ray Optics Laboratory (XROL), was recently upgraded by replacing a multimode diode laser light source with a single-mode, wavelength-stabilized, fibercoupled diode laser system. The upgrade enables us to reliably characterize the lateral variation of groove density of variable-line-spacing (VLS) x-ray diffraction gratings. Here, we discuss the LTP-II performance with an example of measurements with a VLS grating with the groove density at the grating center of 300 lines/mm. For the measurements, we use the LTP-II in two different operation arrangements, the single Gaussian beam and the pencil beam interferometer arrangements. For each operation arrangement, we apply two data processing algorithms: with calculating the centroid position and with determining the position of a characteristic features of the detected beam intensity distributions. Additionally, we discuss the observed strong correlation between the LTP-II modes of operation and the resulted (extracted) groove density variations. We also speculate on possible origin of the correlation.

42 ENGINEERING↗

Bragg grating inscription in photosensitive materials by an optical replication process

This paper examines the feasibility of producing multiplexed Bragg gratings for use as diffractive optical elements (DOEs) by coherent optical replication of a surface-relief phase grating into thick-film photosensitive materials. The use of such DOEs in light guide plates (LGPs) for optical imaging systems ensures energy-efficient light input into and output from LGPs and allows one to minimise their weight and size. We present simulation results for the interference structure fabrication process and recording of a series of multiplexed diffraction gratings in photosensitive materials. (paper)

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors

New, high-coherent-flux X-ray beamlines at synchrotron and free-electron laser light sources rely on wavefront sensors to achieve and maintain optimal alignment under dynamic operating conditions. This includes feedback to adaptive X-ray optics. We describe the design and modeling of a new class of binary-amplitude reflective gratings for shearing interferometry and Hartmann wavefront sensing. Compact arrays of deeply etched gratings illuminated at glancing incidence can withstand higher power densities than transmission membranes and can be designed to operate across a broad range of photon energies with a fixed grating-to-detector distance. Coherent wave-propagation is used to study the energy bandwidth of individual elements in an array and to set the design parameters. We observe that shearing operates well over a ±10% bandwidth, while Hartmann can be extended to ±30% or more, in our configuration. We apply this methodology to the design of a wavefront sensor for a soft X-ray beamline operating from 230 eV to 1400 eV and model shearing and Hartmann tests in the presence of varying wavefront aberration types and magnitudes.

47 OTHER INSTRUMENTATION↗

Dispersion Leverage Coronagraph: a nulling coronagraph for use on primary objective grating telescopes

Here, we present the Dispersion Leverage Coronagraph (DLC), a variation of the Achromatic Interfero Coronagraph (AIC) that is designed for optical systems featuring large, dispersive primary objective gratings. DLC was originally designed for the Diffractive Interfero Coronagraph Exoplanet Resolver (DICER), a notional 20 m class infrared space telescope utilizing the enhanced one-dimensional angular resolution of large diffraction gratings to discover and characterize near-Earth exoplanets. Here we develop the theoretical foundation for DLC, and apply it to DICER as an example use case. We derive important properties of the DLC system, including focal plane transmission maps, stellar leakage, residual optical path difference tolerance, and pointing error/jitter considerations. Ultimately, we found that DLC effectively nulls an on-axis target across the entire spectrum in the focal plane, allowing for 2D/λ diffraction-limited imaging. It requires asymmetrical fine-guidance tolerances on pointing error/jitter. We work through a benchmark DICER design, explaining the need for a second disperser to reduce background from Zodiacal light, and showing that it could plausibly find and characterize ∼4 nearby, habitable exoplanets around Sun-like stars in a 7-year mission; about 30% of the habitable exoplanets within 8 pc were found in our simulation. The DLC may be useful for any application requiring extremely high-resolution, close companion spectroscopy.

AIC↗

Neutron Grating Interferometry at the High Flux Isotope Reactor

Neutron imaging is a non-destructive probe that can spatially resolve bulk materials’ internal features/structures. Neutron imaging spatial resolution is driven by detector technology, i.e., pixel size, and is currently on the order of 10–20 µm. This limitation can be alleviated by the use of neutron grating interferometry – an advanced neutron imaging technique – that enables simultaneous access to three contrast mechanisms: attenuation, differential phase, and small-angle neutron scattering. Recently, a Talbot-Lau neutron grating interferometry has been implemented at the Multimodal Advanced Radiography Station at the High Flux Isotope Reactor. In this work, the design, setup and performance of the grating apparatus are presented.

Zhang, Yuxuan [ORNL] (ORCID:0000000200831408)↗

Voltage-induced modulation of interfacial ionic liquids measured using surface plasmon resonant grating nanostructures

We have used surface plasmon resonant metal gratings to induce and probe the dielectric response (i.e., electro-optic modulation) of ionic liquids (ILs) at electrode interfaces. Here, the cross-plane electric field at the electrode surface modulates the refractive index of the IL due to the Pockels effect. This is observed as a shift in the resonant angle of the grating (i.e., Δϕ), which can be related to the change in the local index of refraction of the electrolyte (i.e., Δnlocal). The reflection modulation of the IL is compared against a polar (D2O) and a non-polar solvent (benzene) to confirm the electro-optic origin of resonance shift. The electrostatic accumulation of ions from the IL induces local index changes to the gratings over the extent of electrical double layer (EDL) thickness. Finite difference time domain simulations are used to relate the observed shifts in the plasmon resonance and change in reflection to the change in the local index of refraction of the electrolyte and the thickness of the EDL. Simultaneously using the wavelength and intensity shift of the resonance enables us to determine both the effective thickness and Δn of the double layer. We believe that this technique can be used more broadly, allowing the dynamics associated with the potential-induced ordering and rearrangement of ionic species in electrode–solution interfaces.

Chemistry↗

Triangular cross-section grating couplers for integrated quantum nanophotonic hardware in silicon carbide

We design, fabricate, and characterize fishbone grating couplers for triangular cross-section photonics in silicon carbide compatible with color center integration. The periodic and aperiodic grating coupler designs are optimized to outcouple up to 31% of light in the fundamental TE mode of a triangular waveguide. The devices are fabricated using an ion beam etching process in a 4H–SiC sample implanted with NV center ensembles. The room-temperature transmission and the cryogenic NV center photoluminescence collection measurements indicate experimental grating coupler efficiency of up to 24%. This result provides a scalable method to efficiently extract color center light from SiC quantum nanophotonic devices to free-space optics.

Saha, Pranta↗

Greater than Five-Order-of-Magnitude Postcompression Temporal Contrast Improvement with an Ionization Plasma Grating

High-intensity lasers require suppression of prepulses and other nonideal temporal structure to avoid target disruption before the arrival of the main pulse. Here, to address this, we demonstrate that ionization gratings act as a controllable optical switch for high-power light with a temporal contrast improvement of at least 3 ×10 5 and a switching time less than 500 fs. We also show that a grating system can run for hours at 10 Hz without degradation. The contrast improvement from an ionization grating compares favorably to that achievable with plasma mirrors.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Zero-crosstalk silicon photonic refractive index sensor with subwavelength gratings

Abstract Silicon photonic index sensors have received significant attention for label-free bio and gas-sensing applications, offering cost-effective and scalable solutions. Here, we introduce an ultra-compact silicon photonic refractive index sensor that leverages zero-crosstalk singularity responses enabled by subwavelength gratings. The subwavelength gratings are precisely engineered to achieve an anisotropic perturbation-led zero-crosstalk, resulting in a single transmission dip singularity in the spectrum that is independent of device length. The sensor is optimized for the transverse magnetic mode operation, where the subwavelength gratings are arranged perpendicular to the propagation direction to support a leaky-like mode and maximize the evanescent field interaction with the analyte space. Experimental results demonstrate a high wavelength sensitivity of − 410 nm/RIU and an intensity sensitivity of 395 dB/RIU, with a compact device footprint of approximately 82.8 μm 2 . Distinct from other resonant and interferometric sensors, our approach provides an FSR-free single-dip spectral response on a small device footprint, overcoming common challenges faced by traditional sensors, such as signal/phase ambiguity, sensitivity fading, limited detection range, and the necessity for large device footprints. This makes our sensor ideal for simplified intensity interrogation. The proposed sensor holds promise for a range of on-chip refractive index sensing applications, from gas to biochemical detection, representing a significant step towards efficient and miniaturized photonic sensing solutions. Graphical Abstract

Materials Science↗

Chirped-grating spectrometer-on-a-chip

We demonstrate an on-chip spectrometer readily integrable with CMOS electronics. The structure is comprised of a SiO 2 /Si 3 N 4 /SiO 2 waveguide atop a silicon substrate. A transversely chirped grating is fabricated, in a single-step optical lithography process, on a portion of the waveguide to provide angle and wavelength dependent coupling to the guided mode. The spectral and angular information is encoded in the spatial dependence of the grating period. A uniform pitch grating area, separated from the collection area by an unpatterned propagation region, provides the out-coupling to a CMOS detector array. A resolution of 0.3 nm at 633 nm with a spectral coverage tunable across the visible and NIR (to ∼ 1 µm limited by the Si photodetector) by changing the angle of incidence, is demonstrated without the need for any signal processing deconvolution. This on-chip spectrometer concept will cost effectively enable a broad range of applications that are beyond the reach of current integrated spectroscopic technologies.

Nezhadbadeh, Shima↗

Three-dimensional modeling of electric-field enhancement in multilayer dielectric gratings arising from inadvertent flaws

Pulse-compression gratings for high-power, short-pulse laser systems are exposed to high electric fields that are further enhanced locally due to their 2D nanostructured surface. This makes them vulnerable to laser-induced damage. The present work considers the effect on electric-field modulation caused by an array of commonly found inadvertent flaws in gratings including fabrication defects, contamination particles, and laser-induced–damage initiation. These defects affect the laser-damage performance characteristics of the grating. To understand the local field-enhancement distribution due these imperfections, 3D modeling of the electric-field distribution is performed with a sufficiently high resolution of 1/74 of the laser wavelength ( λ ) while considering a volume of ≈489 λ 3 . The results provide estimates for the ensuing electric-field intensification and projected reduction of the laser-damage thresholds, as well as the anticipated pattern of damage growth initiation.

47 OTHER INSTRUMENTATION↗

Investigation of the distribution of laser-induced damage precursors in etched grating sidewalls fabricated using inductively coupled plasma reactive-ion etching

Inductively coupled plasma reactive-ion etching for grating fabrication is explored with emphasis on the type and distribution of process-induced defects that can act as precursors to laser-induced damage initiation. To provide flexibility in the ability to perform a variety of material characterization methods, grating-like features with large pitch were fabricated in silica monolayers. The results indicate that the etch process introduces surface fluorine and subsurface carbon-containing contamination, which reduces the laser-induced damage threshold. The local relative concentrations of the laser-damage precursors introduced during the etch step of the manufacturing process were investigated using angle-resolved damage testing, taking advantage of the shift of the location of the peak electric-field intensity incident on the grating sidewall. The results suggest an increased level of etch-related defects near the base of the sidewall, with directly fluorinated silicon identified as the primary defect.

Dent, R. [Univ. of Rochester, NY (United States). ↗

Reflective binary amplitude grating for soft x-ray shearing and Hartmann wavefront sensing

Here, we demonstrate a reflective wavefront sensor grating suitable for the characterization of high-quality x-ray beamlines and optical systems with high power densities. Operating at glancing incidence angles, the optical element is deeply etched with a two-level pattern of shearing interferometry gratings and Hartmann wavefront sensor grids. Transverse features block unwanted light, enabling binary amplitude in reflection with high pattern contrast. We present surface characterization and soft x-ray reflectometry of a prototype grating array to demonstrate function prior to wavefront measurement applications. A simulation of device performance is shown.

47 OTHER INSTRUMENTATION↗

Point-by-point inscribed sapphire parallel fiber Bragg gratings in a fully multimode system for multiplexed high-temperature sensing

In this work, we study the point-by-point inscription of sapphire parallel fiber Bragg gratings (sapphire pFBGs) in a fully multimode system. A parallel FBG is shown to be critical in enabling detectable and reliable high-order grating signals. The impacts of modal volume, spatial coherence, and grating location on reflectivity are examined. Three cascaded seventh-order pFBGs are fabricated in one sapphire fiber for wavelength multiplexed temperature sensing. Using a low-cost, fully multimode 850-nm interrogator, reliable measurement up to 1500°C is demonstrated.

42 ENGINEERING↗

Feasibility of Realizing a Universal Identifier Based on Fiber Bragg Grating Technology

Over the past year we have collected data on different fiber Bragg gratings (FBG) with the end goal of understanding their suitability for use in a new type of unique identifier (UID) that could be used in both tags and seals for high-value, high-risk assets. The ideal UID will have a complex signature that allows items to be uniquely identified by that signature. Tamper indication must be an integral part of the tag/seal process with measurable changes to the device signature indicative of any attempt to tamper with the monitored item. Further, the signature must be so difficult to reproduce that even state-actors with significant resources at their disposal will be discouraged from attempting it. Finally, readout verification of the product must be simple and secure, while providing red-light/green-light results in real time. To evaluate how well an FBG-based UID could meet these goals, we collected data on a large number of FBG samples from different vendors. Measurements included the response of the devices to uniform tension, tension when wrapped on a mandrel, and the response to changes in temperature and humidity, as well as the effect of simple potting in expanding and nonexpanding potting materials. We tested FBG samples written into single-mode fibers that were coated with the two commonly used materials, polyimide and acrylate and gratings that were both uniform and those with an apodized response (i.e., the intensity of the grating was varied to minimize sidelobes). The result of the work to date did not find any significant issues with the design concept for a UID based on this technology. Specific findings include a baseline design comprising five FBGs with distinct spectral returns analyzed using a difference-correlation approach. To realize this device, careful attention must be given to the impact of environmental factors on the UID response, limiting the properties of the potting compounds and FBG coating materials that can be used.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗