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At least 55 records · Page 3

Development of a versatile plate spectrometer for electron beam characterization

A new instrument for electron beam characterization has been developed, based on measuring the range of beam electrons in different thicknesses of aluminum, to determine both the current and energy of an electron beam traveling in open air. This instrument is referred to as a ‘plate spectrometer’ as the thickness of the spectrometer is adjusted by adding or removing aluminum plates. This spectrometer was assembled and then characterized at the Idaho Accelerator Center (IAC) with three different beam energies and with one beam energy at the University of Maryland Radiation Facilities. The plate spectrometer was able to match the median energies and provide a reasonable constraint to the beam distributions seen in the IAC magnetic spectrometer. Finally, in a separate experiment, the plate spectrometer was also seen to agree with a dosimetry characterization of the beam at the University of Maryland Radiation Facilities and improved upon the uncertainties of this measurement.

43 PARTICLE ACCELERATORS↗

Stimulated Raman up-conversion of electromagnetic waves by a gyrating electron beam

A gyrating electron beam supports negative energy modes near the harmonics of electron-cyclotron frequency. An electromagnetic wave passing through such a beam parametrically up-converts into high-frequency electromagnetic modes separated from the pump frequency by the electron-cyclotron harmonics. The growth rate for this process varies directly as the oscillatory velocity of beam electrons caused by the pump and as square root of the beam density. It has a maximum at values of scattering angle close to 180 deg and is also implicitly dependent on the beam veocity and the cyclotron frequency of electrons. The effect of a cold electron component is to reduce the growth rate.

Sharma, O. P.↗

Observations of electron beam structure in space experiments

Observations of a 100-mA, 1-keV electron beam were made with a low light level TV system and other instruments aboard the space shuttle STS 3 in March 1982. When fired at a moderate pitch angle with respect to the magnetic field, the beam electrons initially moved outward along a classical helical trajectory. Within a short distance, however, the beam electrons were deflected away from the helical trajectory into paths parallel to magnetic field lines threading the primary helix. This resulted in the formation of a thin-walled, cylindrical electron beam structure having a radius equal to the primary beam gyroradius. This structure, which is consistent with earlier laboratory vacuum chamber observations and recent two-dimensional computer electrostatic plasma simulations, has important implications for determining the extent to which pulsed electron beams can radiate electromagnetic energy in the ionosphere.

Banks, Peter M.↗

The effect of space charge fields due to finite length electron beams in the free-electron laser

The space charge electric field of a finite length electron beam in the free electron laser amplifier with a tapered wiggler is analyzed. In the free drift region between the accelerator and laser, expressions for the increase of energy spread due to the self field are presented. In the FEL interaction region, the general conditions on the importance of the self electric field in the equations of motion is obtained. A numerical example of the FEL experiment at 10.6 microns is given.

Tang, C.-M.↗

Electron beam pumped semiconductor laser

Electron-beam-pumped semiconductor ultra-violet optical sources (ESUVOSs) are disclosed that use ballistic electron pumped wide bandgap semiconductor materials. The sources may produce incoherent radiation and take the form of electron-beam-pumped light emitting triodes (ELETs). The sources may produce coherent radiation and take the form of electron-beam-pumped laser triodes (ELTs). The ELTs may take the form of electron-beam-pumped vertical cavity surface emitting lasers (EVCSEL) or edge emitting electron-beam-pumped lasers (EEELs). The semiconductor medium may take the form of an aluminum gallium nitride alloy that has a mole fraction of aluminum selected to give a desired emission wavelength, diamond, or diamond-like carbon (DLC). The sources may be produced from discrete components that are assembled after their individual formation or they may be produced using batch MEMS-type or semiconductor-type processing techniques to build them up in a whole or partial monolithic manner, or combination thereof.

Hug, William F.↗

Silicon nitride films deposited with an electron beam created plasma

The electron beam assisted chemical vapor deposition (EBCVD) of silicon nitride films using NH3, N2, and SiH4 as the reactant gases is reported. The films have been deposited on aluminum, SiO2, and polysilicon film substrates as well as on crystalline silicon substrates. The range of experimental conditions under which silicon nitrides have been deposited includes substrate temperatures from 50 to 400 C, electron beam currents of 2-40 mA, electron beam energies of 1-5 keV, total ambient pressures of 0.1-0.4 Torr, and NH3/SiH4 mass flow ratios of 1-80. The physical, electrical, and chemical properties of the EBCVD films are discussed.

Bishop, D. C.↗

Metallurgical Mechanisms Controlling Mechanical Properties of Aluminum Alloy 2219 Produced by Electron Beam Freeform Fabrication

The electron beam freeform fabrication (EBF3) layer-additive manufacturing process has been developed to directly fabricate complex geometry components. EBF3 introduces metal wire into a molten pool created on the surface of a substrate by a focused electron beam. Part geometry is achieved by translating the substrate with respect to the beam to build the part one layer at a time. Tensile properties demonstrated for electron beam deposited aluminum and titanium alloys are comparable to wrought products, although the microstructures of the deposits exhibit cast features. Understanding the metallurgical mechanisms controlling mechanical properties is essential to maximizing application of the EBF3 process. Tensile mechanical properties and microstructures were examined for aluminum alloy 2219 fabricated over a range of EBF3 process variables. Unique microstructures were observed within the deposited layers and at interlayer boundaries, which varied within the deposit height due to microstructural evolution associated with the complex thermal history experienced during subsequent layer deposition. Microstructures exhibited irregularly shaped grains with interior dendritic structures, described based on overall grain size, morphology, distribution, and dendrite spacing, and were correlated with deposition parameters. Fracture features were compared with microstructural elements to define fracture paths and aid in definition of basic processing-microstructure-property correlations.

Domack, Marcia S.↗

Transverse Mode Electron Beam Microwave Generator

An electron beam microwave device having an evacuated interaction chamber to which are coupled a resonant cavity which has an opening between the resonant cavity and the evacuated interaction chamber and an electron gun which causes a narrow beam of electrons to traverse the evacuated interaction chamber. The device also contains a mechanism for feeding back a microwave electromagnetic field from the resonant cavity to the evacuated interaction chamber in such a way as to modulate the direction of propagation of the electron beam, thereby further amplifyjng the microwave electromagnetic field. Furthermore, provision is made for coupling the electromagnetic field out of the electron beam microwave device.

Wharton, Lawrence E.↗

Metallurgical Mechanisms Controlling Mechanical Properties of Aluminum Alloy 2219 Produced By Electron Beam Freeform Fabrication

The electron beam freeform fabrication (EBF3) layer-additive manufacturing process has been developed to directly fabricate complex geometry components. EBF3 introduces metal wire into a molten pool created on the surface of a substrate by a focused electron beam. Part geometry is achieved by translating the substrate with respect to the beam to build the part one layer at a time. Tensile properties have been demonstrated for electron beam deposited aluminum and titanium alloys that are comparable to wrought products, although the microstructures of the deposits exhibit features more typical of cast material. Understanding the metallurgical mechanisms controlling mechanical properties is essential to maximizing application of the EBF3 process. In the current study, mechanical properties and resulting microstructures were examined for aluminum alloy 2219 fabricated over a range of EBF3 process variables. Material performance was evaluated based on tensile properties and results were compared with properties of Al 2219 wrought products. Unique microstructures were observed within the deposited layers and at interlayer boundaries, which varied within the deposit height due to microstructural evolution associated with the complex thermal history experienced during subsequent layer deposition. Microstructures exhibited irregularly shaped grains, typically with interior dendritic structures, which were described based on overall grain size, morphology, distribution, and dendrite spacing, and were correlated with deposition parameters. Fracture features were compared with microstructural elements to define fracture paths and aid in definition of basic processing-microstructure-property correlations.

Domack, Marcia S.↗

Three-axis electron-beam test facility

An electron beam test facility, which consists of a precision multidimensional manipulator built into an ultra-high-vacuum bell jar, was designed, fabricated, and operated at Lewis Research Center. The position within the bell jar of a Faraday cup which samples current in the electron beam under test, is controlled by the manipulator. Three orthogonal axes of motion are controlled by stepping motors driven by digital indexers, and the positions are displayed on electronic totalizers. In the transverse directions, the limits of travel are approximately + or - 2.5 cm from the center with a precision of 2.54 micron (0.0001 in.); in the axial direction, approximately 15.0 cm of travel are permitted with an accuracy of 12.7 micron (0.0005 in.). In addition, two manually operated motions are provided, the pitch and yaw of the Faraday cup with respect to the electron beam can be adjusted to within a few degrees. The current is sensed by pulse transformers and the data are processed by a dual channel box car averager with a digital output. The beam tester can be operated manually or it can be programmed for automated operation. In the automated mode, the beam tester is controlled by a microcomputer (installed at the test site) which communicates with a minicomputer at the central computing facility. The data are recorded and later processed by computer to obtain the desired graphical presentations.

Dayton, J. A., Jr.↗

Electron beam diagnostics.

Spectroscopic electron beam diagnostic technique, examining negligible effect elevated vibrational temperatures have on measured rotational temperatures of molecular nitrogen

ELECTRON BEAM↗

Low energy electron magnetometer using a monoenergetic electron beam

A low energy electron beam magnetometer utilizes near-monoenergetic electrons thereby reducing errors due to electron energy spread and electron nonuniform angular distribution. In a first embodiment, atoms in an atomic beam of an inert gas are excited to a Rydberg state and then electrons of near zero energy are detached from the Rydberg atoms. The near zero energy electrons are then accelerated by an electric field V(acc) to form the electron beam. In a second embodiment, a filament emits electrons into an electrostatic analyzer which selects electrons at a predetermined energy level within a very narrow range. These selected electrons make up the electron beam that is subjected to the magnetic field being measured.

Singh, J. J.↗

Electrostatic ion cyclotron, beam-plasma, and lower hybrid waves excited by an electron beam

It is pointed out that electrostatic ion cyclotron (EIC) waves have been extensively investigated in connection with both space and laboratory plasmas. The present investigation has the objective to study the excitation of low-frequency waves in a multiion plasma by electron beams. The frequencies considered range from below the lowest gyrofrequency of the heaviest ion to about the lower hybrid frequency. It is shown that electron-beam instabilities can produce peaks in the growth rate below the cyclotron frequency of each ion species if nonzero perpendicular wave number effects are included in the ion dynamics. The dispersion relations for neutralized ion Bernstein (NIB) and pure ion Bernstein (PIB) waves are considered along with an instability analysis for a cold plasma and warm electron beam, the electron beam-plasma mode, banded ion cyclotron (EIC) waves with small perpendicular wavelengths, and the growth lengths of the waves.

Singh, N.↗

A kinetic description of electron beam ejection from spacecraft

A model based on the Boltzmann kinetic equation describing electron beam ejection from spacecraft is presented. Results are shown for steady-state, beam-atmosphere interaction (BAI) and for beam-plasma interaction (BPI). The BPI considered is that of elastic scattering of beam electrons with strong, short-scale Langmuir turbulence. This mechanism has been suggested for prompt echoes of beam electrons observed in sounding rocket experiments. It is shown that the interaction is sufficiently strong to account for observations of back-scattered electrons at the beam accelerator energy. However, it is clear from observations that particles undergo diffusion in energy at a rate exceeding levels expected for BAI. Inelastic scattering in BPI must therefore also be important.

Khazanov, George V.↗

Disabling CNT Electronic Devices by Use of Electron Beams

Bombardment with tightly focused electron beams has been suggested as a means of electrically disabling selected individual carbon-nanotubes (CNTs) in electronic devices. Evidence in support of the suggestion was obtained in an experiment in which a CNT field-effect transistor was disabled (see figure) by focusing a 1-keV electron beam on a CNT that served as the active channel of a field-effect transistor (FET). Such bombardment could be useful in the manufacture of nonvolatile-memory circuits containing CNT FETs. Ultimately, in order to obtain the best electronic performances in CNT FETs and other electronic devices, it will be necessary to fabricate the devices such that each one contains only a single CNT as an active element. At present, this is difficult because there is no way to grow a single CNT at a specific location and with a specific orientation. Instead, the common practice is to build CNTs into electronic devices by relying on spatial distribution to bridge contacts. This practice results in some devices containing no CNTs and some devices containing more than one CNT. Thus, CNT FETs have statistically distributed electronic characteristics (including switching voltages, gains, and mixtures of metallic and semiconducting CNTs). According to the suggestion, by using a 1-keV electron beam (e.g., a beam from a scanning electron microscope), a particular nanotube could be rendered electrically dysfunctional. This procedure could be repeated as many times as necessary on different CNTs in a device until all of the excess CNTs in the device had been disabled, leaving only one CNT as an active element (e.g., as FET channel). The physical mechanism through which a CNT becomes electrically disabled is not yet understood. On one hand, data in the literature show that electron kinetic energy >86 keV is needed to cause displacement damage in a CNT. On the other hand, inasmuch as a 1-keV beam focused on a small spot (typically a few tens of nanometers wide) deposits a significant amount of energy in a small volume, the energy density may suffice to thermally induce structural and/or electronic changes that disable the CNT. Research may be warranted to investigate this effect in detail.

Petkov, Mihail↗

Erosion of an electron-beam front in a long beam-plasma system

The front of an electron beam injected into a uniform, magnetized plasma is observed to erode rapidly because of scattering of the beam electrons via collective beam-plasma interactions. The propagation of the beam front is measured with temporal and axial resolution via beam excitation light. A broadened light front can result that propagates much slower than the injected beam particle speed.

Chan, L. Y.↗