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At least 523 records · Page 29
All sourcesNASA NTRSDOE OSTI
DOE OSTI2024

R ( 3780 ) Resonance Interpreted as the 1 D 1 3 -Wave Dominant State of Charmonium from Precise Measurements of the Cross Section of e + e − → Hadrons

We report the precise measurements of the cross section of e + e − → hadrons at center-of-mass energies from 3.645 to 3.871 GeV. We thereby perform the most precise study of the cross sections and find a complex system composed of three resonances of R ( 3760 ) , R ( 3780 ) , and R ( 3810 ) . For the first time, we measure the R ( 3810 ) electronic width to be ( 19.4 ± 7.4 ± 12.1 ) eV . For the R ( 3760 ) resonance, we measure the mass to be ( 3751.9 ± 3.8 ± 2.8 ) MeV / c 2 , the total width to be ( 32.8 ± 5.8 ± 8.7 ) MeV , and the electronic width to be ( 184 ± 75 ± 86 ) eV . For the R ( 3780 ) resonance, we measure its mass to be ( 3778.7 ± 0.5 ± 0.3 ) MeV / c 2 , total width to be ( 20.3 ± 0.8 ± 1.7 ) MeV , and electronic width to be ( 265 ± 67 ± 83 ) eV . Forty-seven years ago, the ψ ( 3770 ) resonance was discovered, and was subsequently interpreted as the 1 D 1 3 -wave dominant state of charmonium. However, our analysis of the total-hadron cross sections indicates that the ψ ( 3770 ) is not a single state, but a complex system composed of the R ( 3760 ) , R ( 3780 ) , and R ( 3810 ) resonances. Among these, we interpret the R ( 3780 ) is a resonance dominated by the 1 D 1 3 charmonium state. Published by the American Physical Society 2024

Ablikim, M.↗
DOE OSTI2025

Precision measurement of the longitudinal double-spin asymmetry for dijet production at intermediate pseudorapidity in polarized 𝑝⁢𝑝 collisions at $\sqrt{s}$ = 200 GeV

The STAR Collaboration reports precise measurements of the longitudinal double-spin asymmetry, 𝐴 𝐿⁢𝐿 , for dijet production with at least one jet at intermediate pseudorapidity 0.8 < 𝜂 jet < 1.8 in polarized proton-proton collisions at a center-of-mass energy of 200 GeV. This study explores partons scattered with a longitudinal momentum fraction (𝑥) from 0.01 to 0.5, which are predominantly characterized by interactions between high-𝑥 valence quarks and low-𝑥 gluons. The results are in good agreement with previous measurements at 200 GeV with improved precision and are found to be consistent with the predictions of global analyses that find the gluon polarization to be positive. In contrast, the negative gluon polarization solution from the JAM Collaboration is found to be strongly disfavored.

73 NUCLEAR PHYSICS AND RADIATION PHYSICS↗
DOE OSTI2025

Lattice QCD constraints on the critical point from an improved precision equation of state

In this paper we employ lattice simulations to search for the critical point of QCD. We search for the onset of a first-order QCD transition on the phase diagram by following contours of constant entropy density from imaginary to real chemical potentials under conditions of strangeness neutrality. We scan the phase diagram and investigate whether these contours meet to determine the probability that the critical point is located in a certain region on the 𝑇−𝜇 𝐵 plane. To achieve this we introduce a new, continuum extrapolated equation of state at zero density with improved precision using lattices with 𝑁 𝜏 =8, 10, 12, 16 time slices, and supplement it with new data at imaginary chemical potential. The current precision allows us to exclude, at the 2⁢𝜎 level, the existence of a critical point at 𝜇 𝐵 <450 MeV.

73 NUCLEAR PHYSICS AND RADIATION PHYSICS↗
DOE OSTI2025

New physics contamination to precision luminosity measurements at future 𝑒 +⁢ 𝑒 − colliders

Several key observables of the high-precision physics program at future lepton colliders will critically depend on the knowledge of the absolute machine luminosity. The determination of the luminosity relies on the precise knowledge of some reference process, which is, in principle, not affected by unknown physics, so that its cross section can be computed within a well-established theory, like the Standard Model. Quantifying the uncertainties induced by possible new physics effects on such processes is, therefore, crucial. We present an investigation of light and heavy new physics contributions to the small-angle Bhabha process at future 𝑒 + ⁢𝑒 − colliders, and we discuss possible strategies to remove the contamination due to heavy degrees of freedom by relying on observables that are independent of the absolute luminosity.

73 NUCLEAR PHYSICS AND RADIATION PHYSICS↗
DOE OSTI2019

Precision lattice parameter determination from transmission diffraction of thick specimens with irregular cross sections

Accurate determination of lattice parameters from X-ray diffraction requires that the diffraction angles be measured very precisely, and significant errors result if the sample–detector separation differs from that assumed. Transmission diffraction from bones, which have a complex cross section and must be left intact, is a situation where this separation is difficult to measure and it may differ from position to position across the specimen. Here, this article describes a method for eliminating the effect of variable sample cross section. Diffraction patterns for each position on the specimen are collected before and after 180° rotation about an axis normal to the cross section of interest. This places the centroid of the diffracting mass at the center of rotation and provides the absolute lattice parameters from the average apparent lattice parameters at the two rotation angles. Diffraction patterns were collected across the cross section of three specimens: a 3D-printed elliptical cylinder of Hyperelastic Bone (HB), which is composed primarily of synthetic hydroxyapatite (hAp), a 3D-printed HB model of the second metacarpal bone (Mc2), and a modern human Mc2 containing nanocrystalline carbonated apatite (cAp). Rietveld refinement was used to determine precise unit-cell parameters a apparent and c apparent for each pattern of each scan, and these values determined the actual average < a > and < c > for each sample. In conclusion, the results indicate that the 0°/180° rotation method works well enough to uncover variations approaching 1 × 10 -3 Å in cAp unit-cell parameters in intact bones with irregular cross sections.

36 MATERIALS SCIENCE↗
DOE OSTI2015

A modular and compact portable mini-endstation for high-precision, high-speed fixed target serial crystallography at FEL and synchrotron sources

The design and implementation of a compact and portable sample alignment system suitable for use at both synchrotron and free-electron laser (FEL) sources and its performance are described. The system provides the ability to quickly and reliably deliver large numbers of samples using the minimum amount of sample possible, through positioning of fixed target arrays into the X-ray beam. The combination of high-precision stages, high-quality sample viewing, a fast controller and a software layer overcome many of the challenges associated with sample alignment. A straightforward interface that minimizes setup and sample changeover time as well as simplifying communication with the stages during the experiment is also described, together with an intuitive naming convention for defining, tracking and locating sample positions. Lastly, the setup allows the precise delivery of samples in predefined locations to a specific position in space and time, reliably and simply.

07 ISOTOPE AND RADIATION SOURCES↗
DOE OSTI2019

X-ray mirror surface figure correction with nanometre precision controlled by layer stresses simulated by FEA

Hard X-rays with energies higher than several kiloelectronvolts can be focused to spot sizes below 10 nm with the present synchrotron beamlines, offering unique advantages for the chemical, elemental and structure analysis of matter. Nevertheless, a surface precision on the nanometre scale for the focusing optics is required and remains the main hurdle limiting X-ray analytical techniques with single-nanometre spatial resolution. On the other hand, to preserve the wavefront properties of coherent X-ray beams, precise control of the reflective mirror surface quality at the nanometre scale is demanded for X-ray free-electron laser applications. In this work, the surface shape of a multilayer-coated X-ray mirror is controlled by layer stresses. The desired surface profile of the mirror is differentiated to its second order to obtain its corresponding curvature profile. With a step size of 1 mm along the mirror length, different coating thicknesses are applied to create different layer thermal stresses from uniform temperature change. The mirror surface profile can be obtained by integrating the curvature profile to its second order and further corrected by moving constant values for the slope and height. The technical process is simulated by finite element analysis (FEA). A case study showed that the residual slope error and the residual height error between the desired shape and the FEA result are 0.22 µrad (r.m.s.) and 1.42 nm (r.m.s.), respectively.

47 OTHER INSTRUMENTATION↗
DOE OSTI2018

Mixed Precision: A Strategy for New Science Opportunities

Since the days of vector supercomputers, computational scientists have relied on high-precision arithmetic to accurately solve problems. But changes to hardware, spurred by the demand for more computing capability and growth in machine learning, have researchers considering lower precision alternatives.

Computer Science↗
DOE OSTI2012

Creating high-stability high-precision bipolar trim power supply

Thomas Jefferson National Accelerator Facility (TJNAF) is founded by the US Department of Energy (DOE) office of science for the technology advancement and physics research in electron beam accelerator. This facility has the state of the art technology to carry out world-class cutting-edge experiments for the nucleus composition and atomic characteristics identification and exploration for the nature of the matter in the universe. A continuous wave electron beam is featured for such experiments, thus precise and stable trim power supply is required to meet such purpose. This paper demonstrates the challenges and solutions to design, assemble, fabrication and test such high-precision high-stability power supplies. This paper presents the novel design and first article test of the ±20A ±75V bipolar, 100ppm stability level current-regulated high-power trim power supplies for the beam manipulation. This special design can provide valuable documentation and reference values for future designs and special applications in particle accelerator power supply creation.

42 ENGINEERING↗
DOE OSTI2013

Epidermal Impedance Sensing Sheets for Precision Hydration Assessment and Spatial Mapping

This paper presents a class of hydration monitor that uses ultrathin, stretchable sheets with arrays of embedded impedance sensors for precise measurement and spatially multiplexed mapping. The devices contain miniaturized capacitive electrodes arranged in a matrix format, capable of integration with skin in a conformal, intimate manner due to the overall skin-like physical properties. These “epidermal” systems noninvasively quantify regional variations in skin hydration, at uniform or variable skin depths. Experimental results demonstrate that the devices possess excellent uniformity, with favorable precision and accuracy. Theoretical models capture the underlying physics of the measurement and enable quantitative interpretation of the experimental results. Furthermore, these devices are appealing for applications ranging from skin care and dermatology, to cosmetology and health/wellness monitoring, with the additional potential for combined use with other classes of sensors for comprehensive, quantitative physiological assessment via the skin.

42 ENGINEERING↗
DOE OSTI2026

Re-Evaluating Virtual Reality Manipulation Techniques for Precise Alignment of Complex 3D Objects

Prior research has developed a number of manipulation techniques that can achieve precise object placement in virtual reality, but studies of these techniques typically use simple objects. We conducted a study comparing two existing techniques, (AMP-IT and WISDOM), during alignment of objects with complex geometry to evaluate the potential influence of geometric complexity on performance, usability, workload and preference. Our findings indicate that participants had faster completion times and higher trial completion rates with AMP-IT on high-precision alignment tasks, contrary to earlier findings that used simple objects. Yet WISDOM is still preferred and considered more usable, despite increased workload and poorer performance, exposing participants' willingness to trade objective performance for comfort during use.

97 MATHEMATICS AND COMPUTING↗
DOE OSTI2024

Improving precision and accuracy of genetic mapping with genotyping‐by‐sequencing data in outcrossing species

Abstract Genotyping‐by‐sequencing (GBS) is a widely used strategy for obtaining large numbers of genetic markers in model and non‐model organisms. In crop plants, GBS‐derived marker datasets are frequently used to perform quantitative trait locus (QTL) mapping. In some plant species, however, high heterozygosity and complex genome structure mean that researchers must use care in handling GBS data to conduct QTL mapping most effectively. Such outbred crops include most of the perennial grass and tree species used for bioenergy. To identify strategies for increasing accuracy and precision of QTL mapping using GBS data in outbred crops, we conducted an empirical study of SNP‐calling and genetic map‐building pipeline parameters in a Miscanthus sinensis population, and a complementary simulation study to estimate the relationship between genome‐wide error rate, read depth, and marker number. The bioenergy grass Miscanthus is an obligate outcrossing species with a recent (diploidized) whole‐genome duplication. For the study of empirical M. sinensis data, we compared two SNP‐calling methods (one non‐reference‐based and one reference‐based), a series of depth filters (12×, 20×, 30×, and 40×) and two map‐construction methods (i.e., marker ordering: linkage‐only and order‐corrected based on a reference genome). We found that correcting the order of markers on a linkage map by using a high‐quality reference genome improved QTL precision (shorter confidence intervals). For typical GBS datasets of between 1000 and 5000 markers to build a genetic map for biparental populations, a depth filter set at 30× to 40× applied to outbred populations provided a genome‐wide genotype‐calling error rate of less than 1%, improved accuracy of QTL point estimates and minimized type I errors for identifying QTL. Based on these results, we recommend using a reference genome to correct the marker order of genetic maps and a robust genotype depth filter to improve QTL mapping for outbred crops.

59 BASIC BIOLOGICAL SCIENCES↗
DOE OSTI2021

Photothermal alternative to device fabrication using atomic precision advanced manufacturing techniques

The attachment of dopant precursor molecules to depassivated areas of hydrogen-terminated silicon templated with a scanning tunneling microscope (STM) has been used to create electronic devices with subnanometer precision, typically for quantum physics experiments. This process, which we call atomic precision advanced manufacturing (APAM), dopes silicon beyond the solid-solubility limit and produces electrical and optical characteristics that may also be useful for microelectronic and plasmonic applications. However, scanned probe lithography lacks the throughput required to develop more sophisticated applications. In this work, we demonstrate and characterize an APAM device workflow where scanned probe lithography of the atomic layer resist has been replaced by photolithography. An ultraviolet laser is shown to locally and controllably heat silicon above the temperature required for hydrogen depassivation on a nanosecond timescale, a process resistant to under- and overexposure. STM images indicate a narrow range of energy density where the surface is both depassivated and undamaged. Modeling that accounts for photothermal heating and the subsequent hydrogen desorption kinetics suggests that the silicon surface temperatures reached in our patterning process exceed those required for hydrogen removal in temperature-programmed desorption experiments. A phosphorus-doped van der Pauw structure made by sequentially photodepassivating a predefined area and then exposing it to phosphine is found to have a similar mobility and higher carrier density compared with devices patterned by STM. Lastly, it is also demonstrated that photodepassivation and precursor exposure steps may be performed concomitantly, a potential route to enabling APAM outside of ultrahigh vacuum.

nanoscale devices↗
DOE OSTI2025

High-precision monitoring of outgassing species in model extreme ultraviolet photoresists with a cavity ring-down spectrometer

Background Extreme ultraviolet (EUV) photoresists play a pivotal role in advancing nanopatterning technologies by balancing image quality and sensitivity. The outgassing behavior of photoresist thin films under EUV and deep ultraviolet (DUV) exposure reveals chemical details relevant to their performance. Aim Here, we focus on utilizing an analytical technique not previously used in photolithography, the tabletop cavity ring-down spectrometer, to investigate outgassing dynamics in EUV photoresists, enabling precise chemical identification and deeper insights into resist processing. Approach The spectrometer’s enhanced laser path length (∼ 20 km) and broadband absorption capabilities in the C–H overtone region allow for sensitive and temporally resolved detection of mixtures of outgassed species. Using a model resist comprising a polymer matrix with a photoacid generator and quencher, we analyzed the influence of time delays between exposure and post-exposure bake (PEB) as well as storage under varying environmental conditions. Results Suppression of isobutylene outgassing and thickness loss was observed with extended delays between exposure and PEB, potentially linked to water absorption and acid deactivation. The technique proved highly effective in distinguishing subtle chemical differences between processing stages. Conclusions Delay times and their environmental conditions, particularly humidity, reduce outgassing and thickness loss of photoresists during PEB, suggesting decreased acid-driven deprotection. This can potentially impact sensitivity, defectivity, and roughness of resist patterns, necessitating precise monitoring and control.

Extreme ultraviolet photoresists↗
DOE OSTI2025

High precision monitoring of outgassing species in model EUV photoresists with a cavity ring-down spectrometer

Extreme ultraviolet (EUV) photoresists play a pivotal role in advancing nanopatterning technologies by balancing image quality and sensitivity. The outgassing behavior of photoresist thin films under EUV and deep ultraviolet (DUV) exposure reveals chemical details relevant to their performance. This study focuses on utilizing an analytical technique not previously used in photolithography, the tabletop cavity ring-down spectrometer, to investigate outgassing dynamics in EUV photoresists, enabling precise chemical identification and deeper insights into resist processing. The spectrometer’s enhanced laser path length (~20 km) and broadband absorption capabilities in the CH overtone region allow for sensitive and temporally resolved detection of outgassed species. Using a model resist comprising a polymer matrix with a photoacid generator and quencher, we analyzed the influence of time delays between exposure and Post-Exposure Bake (PEB) as well as storage under varying environmental conditions. Suppression of isobutylene outgassing and thickness loss was observed with extended delays between exposure and PEB, potentially linked to water absorption and acid deactivation. The technique proved highly effective in distinguishing subtle chemical differences between processing stages. Delay times and their environmental conditions, particularly humidity, reduce outgassing and thickness loss of photoresists during PEB, suggesting decreased acid-driven deprotection. This can potentially impact sensitivity, defectivity, and roughness of resist patterns, necessitating precise monitoring and control.

Lüttgenau, Bernhard↗
DOE OSTI2011

Design Considerations of a Slit Diaphragm Flexure Used in a Precision Mirror Gimbal

Two precision mirror gimbals were designed using slit diaphragm flexures to provide two-axis precision mirror alignment in space-limited applications. Both gimbals are currently in use in diagnostics at the National Ignition Facility: one design in the Gamma Reaction History (GRH) diagnostic and the other in the Neutron Imaging System (NIS) diagnostic. The GRH gimbal has an adjustment sensitivity of 0.1 mrad about both axes and a total adjustment capability of ±6°; the NIS gimbal has an adjustment sensitivity of 0.8 μrad about both axes and a total adjustment range of ±3°. Both slit diaphragm flexures were electro-discharge machined out of high-strength titanium and utilize stainless steel stiffeners. The stiffener-flexure design results in adjustment axes with excellent orthogonality and centering with respect to the mirror in a single stage; a typical two-axis gimbal flexure requires two stages. Finite element analyses are presented for both flexure designs, and a design optimization of the GRH flexure is discussed.

42 ENGINEERING↗
DOE OSTI2012

Technical Note: Precision and accuracy of a commercially available CT optically stimulated luminescent dosimetry system for the measurement of CT dose index

Purpose: To determine the precision and accuracy of CTDI{sub 100} measurements made using commercially available optically stimulated luminescent (OSL) dosimeters (Landaur, Inc.) as beam width, tube potential, and attenuating material were varied. Methods: One hundred forty OSL dosimeters were individually exposed to a single axial CT scan, either in air, a 16-cm (head), or 32-cm (body) CTDI phantom at both center and peripheral positions. Scans were performed using nominal total beam widths of 3.6, 6, 19.2, and 28.8 mm at 120 kV and 28.8 mm at 80 kV. Five measurements were made for each of 28 parameter combinations. Measurements were made under the same conditions using a 100-mm long CTDI ion chamber. Exposed OSL dosimeters were returned to the manufacturer, who reported dose to air (in mGy) as a function of distance along the probe, integrated dose, and CTDI{sub 100}. Results: The mean precision averaged over 28 datasets containing five measurements each was 1.4%{+-} 0.6%, range = 0.6%-2.7% for OSL and 0.08%{+-} 0.06%, range = 0.02%-0.3% for ion chamber. The root mean square (RMS) percent differences between OSL and ion chamber CTDI{sub 100} values were 13.8%, 6.4%, and 8.7% for in-air, head, and body measurements, respectively, with an overall RMS percent difference of 10.1%. OSL underestimated CTDI{sub 100} relative to the ion chamber 21/28 times (75%). After manual correction of the 80 kV measurements, the RMS percent differences between OSL and ion chamber measurements were 9.9% and 10.0% for 80 and 120 kV, respectively. Conclusions: Measurements of CTDI{sub 100} with commercially available CT OSL dosimeters had a percent standard deviation of 1.4%. After energy-dependent correction factors were applied, the RMS percent difference in the measured CTDI{sub 100} values was about 10%, with a tendency of OSL to underestimate CTDI relative to the ion chamber. Unlike ion chamber methods, however, OSL dosimeters allow measurement of the radiation dose profile.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗
DOE OSTI2015

An investigation into factors affecting the precision of CT radiation dose profile width measurements using radiochromic films

Purpose: To investigate the impact of x-ray beam energy, exposure intensity, and flat-bed scanner uniformity and spatial resolution on the precision of computed tomography (CT) beam width measurements using Gafchromic XR-QA2 film and an off-the-shelf document scanner. Methods: Small strips of Gafchromic film were placed at isocenter in a CT scanner and exposed at various x-ray beam energies (80–140 kVp), exposure levels (50–400 mA s), and nominal beam widths (1.25, 5, and 10 mm). The films were scanned in reflection mode on a Ricoh MP3501 flat-bed document scanner using several spatial resolution settings (100 to 400 dpi) and at different locations on the scanner bed. Reflection measurements were captured in digital image files and radiation dose profiles generated by converting the image pixel values to air kerma through film calibration. Beam widths were characterized by full width at half maximum (FWHM) and full width at tenth maximum (FWTM) of dose profiles. Dependences of these parameters on the above factors were quantified in percentage change from the baselines. Results: The uncertainties in both FWHM and FWTM caused by varying beam energy, exposure level, and scanner uniformity were all within 4.5% and 7.6%, respectively. Increasing scanner spatial resolution significantly increased the uncertainty in both FWHM and FWTM, with FWTM affected by almost 8 times more than FWHM (48.7% vs 6.5%). When uncalibrated dose profiles were used, FWHM and FWTM were over-estimated by 11.6% and 7.6%, respectively. Narrower beam width appeared more sensitive to the film calibration than the wider ones (R{sup 2} = 0.68 and 0.85 for FWHM and FWTM, respectively). The global and maximum local background variations of the document scanner were 1.2%. The intrinsic film nonuniformity for an unexposed film was 0.3%. Conclusions: Measurement of CT beam widths using Gafchromic XR-QA2 films is robust against x-ray energy, exposure level, and scanner uniformity. With proper film calibration and scanner resolution setting, it can provide adequate precision for meeting ACR and manufacturer’s tolerances for the measurement of CT dose profiles.

60 APPLIED LIFE SCIENCES↗