Atomic layer deposition of energy band tunable tin germanium oxide electron transport layer for the SnS-based solar cells with 400 mV open-circuit voltage
Tin germanium oxide, (Sn,Ge)O 2 , films were prepared using atomic layer deposition and tailored to a SnS absorber layer by incorporating various amounts of germanium into tin oxide to adjust band alignments at the interfaces of SnS/(Sn,Ge)O 2 photovoltaic devices. Carrier concentrations of (Sn,Ge)O 2 were suppressed from 10 20 to 10 18 cm -3 with germanium incorporation, with nitrogen doping further reducing carrier concentrations by another order of magnitude. Excellent tunability of both band energy levels and carrier concentrations of (Sn,Ge)O 2 allowed optimizing SnS-based solar cells. SnS/(Sn,Ge)O 2 :N devices were demonstrated, with an open-circuit voltage as high as 400 mV, due to the effective mitigation of interfacial recombination of photogenerated carriers at the SnS/(Sn,Ge)O 2 :N absorber-buffer heterojunction interface.