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At least 487 records · Page 27

All sources NASA NTRS DOE OSTI

DOE OSTI2021

Method and system for in situ cross-linking of materials to produce three-dimensional features via electron beams from mobile accelerators

A method and system for in situ cross-linking of polymers, Bitumen, and other materials to produce arbitrary functional or ornamental three-dimensional features using electron beams provided by mobile accelerators comprises defining a desired pattern for imparting on a target area, mapping the target area, defining at least one discrete voxel in the target area according to the desired pattern to be imparted on the target area, assigning an irradiation value to each of the at least one discrete voxels, and delivering a dose of irradiation to each of the at least one discrete voxels according to the assigned irradiation value.

43 PARTICLE ACCELERATORS↗

DOE OSTI2021

Method and system for in situ cross-linking of materials to produce three-dimensional features via electron beams from mobile accelerators

Sauers, Aaron↗

DOE OSTI2024

Infrastructure-scale additive manufacturing using mobile electron accelerators

Sauers, Aaron↗

NASA NTRS1991

A numerical procedure for recovering true scattering coefficients from measurements with wide-beam antennas

A numerical procedure for estimating the true scattering coefficient, sigma(sup 0), from measurements made using wide-beam antennas. The use of wide-beam antennas results in an inaccurate estimate of sigma(sup 0) if the narrow-beam approximation is used in the retrieval process for sigma(sup 0). To reduce this error, a correction procedure was proposed that estimates the error resulting from the narrow-beam approximation and uses the error to obtain a more accurate estimate of sigma(sup 0). An exponential model was assumed to take into account the variation of sigma(sup 0) with incidence angles, and the model parameters are estimated from measured data. Based on the model and knowledge of the antenna pattern, the procedure calculates the error due to the narrow-beam approximation. The procedure is shown to provide a significant improvement in estimation of sigma(sup 0) obtained with wide-beam antennas. The proposed procedure is also shown insensitive to the assumed sigma(sup 0) model.

Wang, Qinglin↗

NASA NTRS1989

The source location and beaming of broadband bursty radio emissions from Uranus

A rotationally-dependent occurrence pattern is identified for the b-bursty emissions observed with Voyager 2 during its 1986 encounter with Uranus. Certain features of this pattern, such as its extension to the highest frequencies and a 40-min signal gap, were sometimes recognizable on individual rotations despite the bursty character of the signals. This pattern is interpreted in terms of Voyager's passing from the inside of a broad, hollow emission cone coming from the southern hemisphere to the outside, and then back in, as a result of planetary rotation. The emission gap then corresponds to the times when Voyager was outside the cone.

Farrell, W. M.↗

NASA NTRS1993

Phase holograms in PMMA with proximity effect correction

Complex computer generated phase holograms (CGPH's) have been fabricated in PMMA by partial e-beam exposure and subsequent partial development. The CGPH was encoded as a sequence of phase delay pixels and written by the JEOL JBX-5D2 E-beam lithography system, a different dose being assigned to each value of phase delay. Following carefully controlled partial development, the pattern appeared rendered in relief in the PMMA, which then acts as the phase-delay medium. The exposure dose was in the range 20-200 micro-C/sq cm, and very aggressive development in pure acetone led to low contrast. This enabled etch depth control to better than plus or minus lambda(sub vis)/60. That result was obtained by exposing isolated 50 micron square patches and measuring resist removal over the central area where the proximity effect dose was uniform and related only to the local exposure. For complex CGPH's with pixel size of the order of the e-beam proximity effect radius, the patterns must be corrected for the extra exposure caused by electrons scattered back up out of the substrate. This has been accomplished by deconvolving the two-dimensional dose deposition function with the desired dose pattern. The deposition function, which plays much the same role as an instrument response function, was carefully measured under the exact conditions used to expose the samples. The devices fabricated were designed with 16 equal phase steps per retardation cycle, were up to 1 cm square, and consisted of up to 100 million 0.3-2.0 micron square pixels. Data files were up to 500 MB long and exposure times ranged to tens of hours. A Fresnel phase lens was fabricated that had diffraction limited optical performance with better than 85 percent efficiency.

Maker, Paul D.↗

DOE OSTI2020

A thin-walled composite beam model for light-weighted structures interacting with fluids

A thin-walled beam model is proposed for structures of variable cross-section, which can be either open or closed and includes multicellular cross-sections with either isotropic or orthotropic materials. The proposed model does not require any priori definition of cross-sectional warping which instead results from the solution of the problem. To achieve that a special deformation pattern is superimposed on the bending deformation described by Euler–Bernoulli beam theory. All sectional properties are automatically incorporated in the analysis as a result of the usual variational formulation of the system of equations. The proposed model is specifically designed to simulate the dynamics of wind/hydrokinetic turbine blade with low computational cost, especially in fluid–structure interaction (FSI) simulation. A number of test cases have been carried out to validate the proposed structural model which show good agreement between the results obtained her e and the solutions available in literature. Finally, FSI simulation of a hydrokinetic blade under field condition is carried out to illustrate the capability of the current thin-walled beam model in practice.

42 ENGINEERING↗

DOE OSTI2023

Speckle contrast of interfering fluorescence X-rays

With the development of X-ray free-electron lasers (XFELs), producing pulses of femtosecond durations comparable with the coherence times of X-ray fluorescence, it has become possible to observe intensity–intensity correlations due to the interference of emission from independent atoms. This has been used to compare durations of X-ray pulses and to measure the size of a focused X-ray beam, for example. Here it is shown that it is also possible to observe the interference of fluorescence photons through the measurement of the speckle contrast of angle-resolved fluorescence patterns. Speckle contrast is often used as a measure of the degree of coherence of the incident beam or the fluctuations of the illuminated sample as determined from X-ray diffraction patterns formed by elastic scattering, rather than from fluorescence patterns as addressed here. Commonly used approaches to estimate speckle contrast were found to suffer when applied to XFEL-generated fluorescence patterns due to low photon counts and a significant variation of the excitation pulse energy from shot to shot. A new method to reliably estimate speckle contrast under such conditions, using a weighting scheme, is introduced. The method is demonstrated by comparing the speckle contrast of fluorescence observed with pulses of 3 fs to 15 fs duration.

73 NUCLEAR PHYSICS AND RADIATION PHYSICS↗

NASA NTRS1993

Selective formation of porous silicon

A pattern of porous silicon is produced in the surface of a silicon substrate by forming a pattern of crystal defects in said surface, preferably by applying an ion milling beam through openings in a photoresist layer to the surface, and then exposing said surface to a stain etchant, such as HF:HNO3:H20. The defected crystal will preferentially etch to form a pattern of porous silicon. When the amorphous content of the porous silicon exceeds 70 percent, the porous silicon pattern emits visible light at room temperature.

Fathauer, Jones↗

NASA NTRS1993

Selective formation of porous silicon

A pattern of porous silicon is produced in the surface of a silicon substrate by forming a pattern of crystal defects in said surface, preferably by applying an ion milling beam through openings in a photoresist layer to the surface, and then exposing said surface to a stain etchant, such as HF:HNO3:H2O. The defected crystal will preferentially etch to form a pattern of porous silicon. When the amorphous content of the porous silicon exceeds 70 percent, the porous silicon pattern emits visible light at room temperature.

Fathauer, Robert W.↗

NASA NTRS1943

Least-work analysis of the problem of shear lag in box beams

The distribution of stress in the cover sheets of thin-wall box beams is analyzed, with regard to the effect of shear deformation in the cover sheets, by the method of least work. Explicit results are obtained for a number of representative cases that show the influence of the following factors on the stress patterns. (1) Variation of stress in spanwise direction as given by elementary beam theory. (2) Value of a parameter called shear-lag aspect ratio which designates the product of span-width ratio of the beam and of the square root of the ratio of effective shear modulus and tensing modulus of the cover sheets. (3) Value of ratio of cover-sheet stiffness to side-web stiffness. (4) Variation of beam height in span direction. (5) Variation of beam width in span direction. (6) Variation of cover-sheet thickness in span direction. General conclusions are drawn from the results obtained. Among them the most important one appears to be the fact that the shear-lag effect depends primarily on the following tow quantities: (1) the value of the shear-lag aspect ratio. (2) the shape of the curve representing the product of the stress of elementary beam theory and of the cover-sheet thickness.

STRESS CALCULATIONS, LEAST-WORK↗

NASA NTRS2004

Sizing Up the Situation

Hailstorm damage to the Space Shuttle's External Tank inspired a NASA innovation with extensive photography applications. In order to measure the defects caused by the storm, Kennedy Space Center used telephoto lenses to zoom in on the tank and view the damage clearly. However, since there was no reference object in the image, the engineers could not determine the scale of the damage. In photographic situations similar to this, an object, such as a ruler, is placed within the field of view. This allows a person to look at a photograph and have a visual indication of the scale of the objects in it. In the External Tank situation, however, this procedure was not possible. As a solution, Kennedy developed the Scaling and Measurement Device for Photographic Images, which provides a non-intrusive means of adding a scale to a photograph. In addition to meeting Kennedy's needs, scaling images is extremely important in crime and accident scene investigations, oil and chemical tank monitoring, and aerial photography. The innovation consists of a tool that attaches directly to a camera or charge coupled device using a standard screw. Two lasers fitted to the device provide parallel beams that are set 1 inch apart. These lasers enable the device to project a pattern into the field of view. When a photograph is taken, the image of the laser pattern appears, along with the image of the object under investigation, allowing the viewer quantifiable information as to the size of the object. The laser beams are accurate to approximately 200 feet. Windows-based software was developed to work with the scaling device tool. The software provides further techniques to measure objects in photographs and digital images. By using the software, any object in the image can be measured diagonally, vertically, and horizontally. The device and its software enable the user to determine two-dimensional measurements within a photograph.

Source record↗

NASA NTRS1982

Synchronized voltage contrast display analysis system

An apparatus and method for comparing internal voltage potentials of first and second operating electronic components such as large scale integrated circuits (LSI's) in which voltage differentials are visually identified via an appropriate display means are described. More particularly, in a first embodiment of the invention a first and second scanning electron microscope (SEM) are configured to scan a first and second operating electronic component respectively. The scan pattern of the second SEM is synchronized to that of the first SEM so that both simultaneously scan corresponding portions of the two operating electronic components. Video signals from each SEM corresponding to secondary electron signals generated as a result of a primary electron beam intersecting each operating electronic component in accordance with a predetermined scan pattern are provided to a video mixer and color encoder.

Johnston, M. F.↗

DOE OSTI2024

Selective CW Laser Synthesis of MoS2 and Mixture of MoS2 and MoO2 from (NH4)2MoS4 Film

Very recently, the synthesis of 2D MoS2 and WS2 through pulsed laser-directed thermolysis can achieve wafer-scale and large-area structures, in ambient conditions. In this paper, we report the synthesis of MoS2 and MoS2 oxides from (NH4)2MoS4 film using a visible continuous-wave (CW) laser at 532 nm, instead of the infrared pulsed laser for the laser-directed thermolysis. The (NH4)2MoS4 film is prepared by dissolving its crystal powder in DI water, sonicating the solution, and dip-coating onto a glass slide. We observed a laser intensity threshold for the laser synthesis of MoS2, however, it occurred in a narrow laser intensity range. Above that range, a mixture of MoS2 and MoO2 is formed, which can be used for a memristor device, as demonstrated by other research groups. We did not observe a mixture of MoS2 and MoO3 in the laser thermolysis of (NH4)2MoS4. The laser synthesis of MoS2 in a line pattern is also achieved through laser scanning. Due to of the ease of CW beam steering and the fine control of laser intensities, this study can lead toward the CW laser-directed thermolysis of (NH4)2MoS4 film for the fast, non-vacuum, patternable, and wafer-scale synthesis of 2D MoS2.

(NH4)2MoS4↗

DOE OSTI2024

High energy electron diffraction instrument with tunable camera length

Ultrafast electron diffraction (UED) stands as a powerful technique for real-time observation of structural dynamics at the atomic level. In recent years, the use of MeV electrons from radio frequency guns has been widely adopted to take advantage of the relativistic suppression of the space charge effects that otherwise limit the temporal resolution of the technique. Nevertheless, there is not a clear choice for the optimal energy for a UED instrument. Scaling to beam energies higher than a few MeV does pose significant technical challenges, mainly related to the inherent increase in diffraction camera length associated with the smaller Bragg angles. In this study, we report a solution by using a compact post-sample magnetic optical system to magnify the diffraction pattern from a crystal Au sample illuminated by an 8.2 MeV electron beam. Our method employs, as one of the lenses of the optical system, a triplet of compact, high field gradients (>500 T/m), small-gap (3.5 mm) Halbach permanent magnet quadrupoles. Shifting the relative position of the quadrupoles, we demonstrate tuning the magnification by more than a factor of two, a 6× improvement in camera length, and reciprocal space resolution better than 0.1 Å –1 in agreement with beam transport simulations.

47 OTHER INSTRUMENTATION↗

NASA NTRS2016

Scattering of Gaussian Beams by Disordered Particulate Media

A frequently observed characteristic of electromagnetic scattering by a disordered particulate medium is the absence of pronounced speckles in angular patterns of the scattered light. It is known that such diffuse speckle-free scattering patterns can be caused by averaging over randomly changing particle positions and/or over a finite spectral range. To get further insight into the possible physical causes of the absence of speckles, we use the numerically exact superposition T-matrix solver of the Maxwell equations and analyze the scattering of plane-wave and Gaussian beams by representative multi-sphere groups. We show that phase and amplitude variations across an incident Gaussian beam do not serve to extinguish the pronounced speckle pattern typical of plane-wave illumination of a fixed multi-particle group. Averaging over random particle positions and/or over a finite spectral range is still required to generate the classical diffuse speckle-free regime.

radiative transfer theory↗

DOE OSTI2020

Multi-beam X-ray ptychography for high-throughput coherent diffraction imaging

X-ray ptychography is a rapidly developing coherent diffraction imaging technique that provides nanoscale resolution on extended field-of-view. However, the requirement of coherence and the scanning mechanism limit the throughput of ptychographic imaging. Herein, we propose X-ray ptychography using multiple illuminations instead of single illumination in conventional ptychography. Multiple locations of the sample are simultaneously imaged by spatially separated X-ray beams, therefore, the obtained field-of-view in one scan can be enlarged by a factor equal to the number of illuminations. We have demonstrated this technique experimentally using two X-ray beams focused by a house-made Fresnel zone plate array. Two areas of the object and corresponding double illuminations were successfully reconstructed from diffraction patterns acquired in one scan, with image quality similar with those obtained by conventional single-beam ptychography in sequence. Multi-beam ptychography approach increases the imaging speed, providing an efficient way for high-resolution imaging of large extended specimens.

47 OTHER INSTRUMENTATION↗

DOE OSTI2024

Pathways to IEC Standards for Heliostat Design Qualification and Site Acceptance in Central Receiver CSP Applications

This paper surveys the existing landscape of standards relevant to heliostats, identifies their gaps, and proposes a path forward to a comprehensive set of heliostat guidelines, technical specifications, and standards under the framework of International Electrotechnical Commission (IEC) TC 117. Gaps in existing guidelines and standards are surveyed using a three-tiered taxonomy: component-level, heliostat-level, and field-level. At each level, the gap analysis is followed by a proposal for a coordinated path forward on the development of standards. At the component level, advances in the understanding of wind loading should inform a technical specification for drives and structures. Reflectors require consolidation of measurement guidelines into existing standards documents. Communications & controls require technical standards to inform their selection and secure implementation. At the heliostat level, IEC 62817 (solar trackers) adequately characterizes drive systems, structures, and electronics, but requires adaptation to heliostats' use patterns, operating modes, and expected life cycles. IEC 62817 does not address heliostat beam quality and pointing accuracy, but the process for determining both is elaborated in the SolarPACES Guideline for Heliostat Performance Testing. This SolarPACES document requires two main modifications: adaptation to IEC language and inclusion of testing after heliostats which have undergone accelerated weathering and mechanical cycling (to understand performance degradation). At the field level, IEC 62862-4-2 addresses the function and control of heliostat fields but does not cover the statistically rigorous testing of heliostat groups, or field performance factors like security and soiling. The addition of documents under IEC-62862-4 is proposed to address this gap.

beam↗