Electrophoretic Deposition on Porous Non-Conductors
A method of electrophoretic deposition (EPD) on substrates that are porous and electrically non-conductive has been invented. Heretofore, in order to perform an EPD, it has been necessary to either (1) use a substrate material that is inherently electrically conductive or (2) subject a non-conductive substrate to a thermal and/or chemical treatment to render it conductive. In the present method, instead of relying on the electrical conductivity of the substrate, one ensures that the substrate is porous enough that when it is immersed in an EPD bath, the solvent penetrates throughout the thickness, thereby forming quasi-conductive paths through the substrate. By making it unnecessary to use a conductive substrate, this method simplifies the overall EPD process and makes new applications possible. The method is expected to be especially beneficial in enabling deposition of layers of ceramic and/or metal for chemical and electrochemical devices, notably including solid oxide fuel cells.