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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.
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Graphene processing using electron beam assisted metal deposition and masked chemical vapor deposition growth
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Commissioning an EUV mask microscope for lithography generations reaching 8 nm
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The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope
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Pupil shaping and coherence control in an EUV mask-imaging microscope
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Recovering effective amplitude and phase roughness of EUV masks
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Alignment Mask Design and Image Processing for the Advanced Radiographic Capability (ARC) at the National Facility
Abstract not provided
Upgrade to the SHARP EUV mask microscope
© 2019 SPIE. The Sharp High-NA Actinic Reticle review Project (SHARP) is a synchrotron-based, extreme ultraviolet (EUV) microscope dedicated to photomask research. A potential upgrade to the SHARP microscope is presented. The upgrade includes changing the light path in the instrument from its current off-Axis configuration to an on-Axis configuration. This change allows for an increased working distance of 2.5 mm or more. A central obscuration, added to the zoneplate aperture, blocks stray light from reaching the central part of the image, thus improving the image contrast. The imaging performance of the two configurations is evaluated by means of ray tracing.
Acoustic effects of medical, cloth, and transparent face masks on speech signals
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Local Recovery and Failure Masking for Stencil-based Applications at Extreme Scales.
Abstract not provided.
Xanthohumol microbiome and signature in healthy adults (the XMaS trial): a phase I triple-masked, placebo-controlled clinical trial
Natural products may provide a source for the discovery and development of adjunctive pharmacological interventions to modulate the inflammatory pathways contributing to chronic disease. Xanthohumol, a flavonoid from the hops plant (Humulus lupulus), has antioxidant and anti-inflammatory properties and may act as a prebiotic to the intestinal microbiota. Xanthohumol is not currently approved as a drug by the US Food and Drug Administration (FDA), but is available as a dietary supplement and ingredient in medical foods. To formally test the safety of xanthohumol, a phase I clinical trial (“XMaS”) was designed and approved under an Investigational New Drug application to the US FDA. The main objective is to examine the clinical safety and subjective tolerability of xanthohumol in healthy adults compared to placebo. Additional aims are to monitor biomarkers related to inflammation, gut permeability, bile acid metabolism, routes, and in vivo products of xanthohumol metabolism, and to evaluate xanthohumol’s impact on gut microbial composition.
Mask Projection Stereolithography for Manufacturing Ceramic Parts for CO 2 Capture and Sequestration
With increased CO 2 in the atmosphere and climate change becoming central in today’s political climate, it is important to make attempts to alleviate climate change. CO 2 capture is possible at the source of some of the larges CO 2 producers – industrial firms – where it can be collected via separation membranes. While current state-of-the-art technology is amine gas treatment or polymer membranes, ceramic membranes infilled with hydroxide offer a more energetically efficient solution. Stereolithography offers a unique manufacturing technique to create uniquely-shaped ceramic parts that will maximize carbon capture while maintaining low energy needs and low cost. High-loading ceramic slurries can be more difficult to manufacture using stereolithography due to high viscosity and opacity, but produce stronger pieces when sintered. The current challenge is optimizing high-load ceramic slurries for stereolithography to print pieces with large surface areas and parts on the micrometer-scale.
Detecting Low Surface Brightness Galaxies with Mask R-CNN
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Sample Selection and Bright Star Masking in DELVE
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Mask design and fabrication for higher energy speckle-based XPCI.
Abstract not provided.
Asynchrony and Failure Masking via Pseudo-Local Process Recovery in MPI Stencil Applications.
Abstract not provided.
Ex-Situ, Surface and Bulk Investigations of Defluxing Chemistry Effects on Solder Mask .
Abstract not provided.