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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 379 records · Page 21
All sourcesNASA NTRSDOE OSTI
NASA NTRS2023

Sensitivity of the MAR Regional Climate Model Snowpack to the Parameterization of the Assimilation of Satellite-Derived Wet-Snow Masks on the Antarctic Peninsula

Both regional climate models (RCMs) and remote sensing (RS) data are essential tools in understanding the response of polar regions to climate change. RCMs can simulate how certain climate variables, such as surface melt, runoff and snowfall, are likely to change in response to different climate scenarios but are subject to biases and errors. RS data can assist in reducing and quantifying model uncertainties by providing indirect observations of the modeled variables on the present climate. In this work, we improve on an existing scheme to assimilate RS wet snow occurrence data with the “Modèle Atmosphérique Régional” (MAR) RCM and investigate the sensitivity of the RCM to the parameters of the scheme. The assimilation is performed by nudging the MAR snowpack temperature to match the presence of liquid water observed by satellites. The sensitivity of the assimilation method is tested by modifying parameters such as the depth to which the MAR snowpack is warmed or cooled, the quantity of water required to qualify a MAR pixel as “wet” (0.1 % or 0.2 % of the snowpack mass being water), and assimilating different RS datasets. Data assimilation is carried out on the Antarctic Peninsula for the 2019–2021 period. The results show an increase in meltwater production (+66.7 % on average, or +95 Gt), along with a small decrease in surface mass balance (SMB) (−4.5 % on average, or −20 Gt) for the 2019–2020 melt season after assimilation. The model is sensitive to the tested parameters, albeit with varying orders of magnitude. The prescribed warming depth has a larger impact on the resulting surface melt production than the liquid water content (LWC) threshold due to strong refreezing occurring within the top layers of the snowpack. The values tested for the LWC threshold are lower than the LWC for typical melt days (approximately 1.2 %) and impact results mainly at the beginning and end of the melting period. The assimilation method will allow for the estimation of uncertainty in MAR meltwater production and will enable the identification of potential issues in modeling near-surface snowpack processes, paving the way for more accurate simulations of snow processes in model projections.

regional climate models↗
DOE OSTI2022

Conductive strip based mask for metallization of semiconductor devices

Methods of manufacturing a semiconductor device, and resulting semiconductor device are described. In an example, the method for manufacturing a semiconductor device include forming a semiconductor region and forming a metal seed region over the semiconductor region. The method can include placing a conductive strip over a first portion of the metal region, where the conductive strip is formed over the semiconductor region. The method can include bonding a contacting portion of the conductive strip to the first portion the metal region. The method can include etching a second portion of the metal region and where the conductive strip inhibits etching of the first portion of the metal region. In an example, the conductive strip can have a coating. In one example, the semiconductor device can be a solar cell.

14 SOLAR ENERGY↗
DOE OSTI2026

FastrSHWFS Analysis

This code analyzes the reflection geometry of modified Shack-Hartmann Wavefront Sensor (SHWFS) masks, with a focus on the fastrSHWFS designs. It takes a height map of a reflective mask, divides it into sub apertures, removes the global focus term by referencing a central block, and fits local surface planes to each sub aperture. From these fits it computes reflection angles and propagates the corresponding rays downstream to determine spot positions and the overall reflected beam footprint as a function of distance. The implementation is parameterized in sub aperture size, number of sub apertures, focal length, and mask dimensions, so it can be adapted to different mask designs beyond the two current fastrSHWFS masks. The code: Converts mask bitmaps into physical height in microns and reconstructs a focus subtracted mask, divides the mask into a grid of sub apertures and assigns pixel and micron coordinates to each block, excludes user specified unused sub apertures from the analysis, fits a plane to each sub aperture to obtain local surface normals, propagates reflected rays to a range of z positions to compute ray spots and the full reflected beam width, computes the effective mask tilt angle with respect to the incoming beam as a function of propagation distance, and provides helper routines for plotting the grid over the mask and for visualizing the beam geometry. These tools are intended for iterating on fastrSHWFS mask designs and for planning downstream optical layouts, for example choosing lens positions and apertures that capture the reflected beam given known focal plane distances and beam widths.

Gerard, BenjaminL [Lawrence Livermore National Lab↗