A numerical and experimental analysis of reactor performance and deposition rates for CVD on monofilaments
The computational fluid dynamics (CFD) code FLUENT is adopted to simulate a cylindrical upflow reactor designed for chemical vapor deposition (CVD) on monofilaments. Equilibrium temperature profiles along the fiber and quartz reactor wall are experimentally measured and used as boundary conditions in numerical simulations. Two-dimensional axisymmetric flow and temperature fields are calculated for hydrogen and argon; the effect of free convection is assessed. The gas and surface chemistry is included for predicting silicon deposition from silane. The model predictions are compared with experimentally measured silicon CVD rates. Inferences are made for optimum conditions to obtain uniformity.