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At least 361 records · Page 20
All sourcesNASA NTRSDOE OSTI
NASA NTRS2018

E-Beam Generated Plasma Etching for Developing High-Reflectance Mirrors for Far-Ultraviolet Astronomical Instrument Applications

Astronomical space telescopes to study astrophysical phenomena from the far-ultraviolet (FUV) to the near infrared (NIR) will require mirror coatings with high reflectance over this entire spectral region. While coatings for the optical and NIR part of the spectrum are fairly well developed with proven performance, the FUV presents significant challenges. The U.S. Naval Research Laboratory (NRL) has developed a processing system based on an electron beam-generated plasma that provides for controlled fluorination and/or etching of surfaces with near monolayer precision and minimal changes to surface morphology. In this paper, we report recent results of samples treated in the NRL Large Area Plasma Processing System (LAPPS) where restoration of the high intrinsic reflectance in the FUV spectral range have been observed of aluminum (Al) mirrors protected with a magnesium di-fluoride (MgF2) overcoat. This paper will also extend these studies to other Al mirrors protected with aluminum tri-fluoride (AlF3) in order to realize the high intrinsic reflectance Al down to FUV wavelengths (100−200 nm), while still maintaining the high reflectance in the optical and NIR spectral regions. Laboratory test data and optical diagnostic techniques used to verify surface scattering and durability of selected coatings will be presented. Finally, we will discuss the scalability of the LAPPS etching process in order to realize these high-reflectivity coatings on mirror segments as large as those proposed for the Large Ultraviolet, Optical, and Infrared (LUVOIR) astronomical telescope system (1+meter class).

LUVOIR↗
NASA NTRS2019

ZERODUR Substrates for Application of High-Temperature Protected-Aluminum Far Ultraviolet Coatings

Recent development in coating deposition processes for aluminum mirrors that are protected with a metal-fluoride overcoat (such as LiF, MgF2, or LiF) have improved reflectance performance particularly in the far-ultraviolet (FUV) part of the optical spectrum. The active research in this area is motivated by the fact that these gains in reflectance are expected to significantly increase the throughput of any future FUV-sensitive NASA missions into the Lyman Ultraviolet. These reflectance improvements are attributed, in part, by performing the metal-fluoride overcoat depositions with the substrates at an elevated temperature as high as 220-250 degrees Celsius. ZERODUR® is a widely used material as a mirror substrate because, among other things, it exhibits a low coefficient of thermal expansion (CTE) over a wide range of temperatures. Moreover, ZERODUR® has recently been proposed for several future NASA concept missions where this improved FUV mirror coating may be used. Given the elevated temperature at which these improved FUV coatings are produced, it is imperative to make sure that heating of the substrate will not significantly impact the final figure of the coated mirror. In this paper, we will study and report the effects of heating ZERODUR® up to the highest temperature mentioned above (250 degrees Celsius) during a simulated coating process. These studies are relevant since it has been reported the CTE will change slightly if ZERODUR® is cooled down from application temperatures between 130 degrees Celsius and 320 degrees Celsius with rates that differ from the initial production annealing rate of 3 degrees Celsius per hour.

Engineering↗
NASA NTRSDate not supplied

Influence of evaporation rate and chamber pressure on the FUV reflectance and physical characteristics of aluminum films

Space telescopes for studying astrophysical phenomena from the far ultraviolet (FUV) to the near infrared (NIR) require durable mirror coatings with high and uniform reflectance over a very broad spectral region. While coatings for the optical and NIR region are well developed with proven performance, the FUV band presents significant challenges, particularly below 115 nm. Recent developments in physical vapor deposition (PVD) coating processes of aluminum mirrors that are protected with a metal-fluoride overcoat to prevent oxidation (such as LiF, MgF2, or AlF3) have improved reflectance in the FUV. While the emphasis in these studies has been placed on improving the deposition conditions of the metal-fluoride overcoats, less attention has been devoted to how deposition parameters (such as vacuum conditions or deposition rates) may affect the quality of the aluminum mirrors. This paper presents characterization of Al+MgF2 coupons made by flash evaporation of aluminum followed by resistive evaporation of MgF2. Samples were manufactured under a variety of processing conditions and the relationship between processing variables and mirror FUV reflectivity is analyzed. Performance characterization was based on the measured near-normal reflectance in the FUV (90-180 nm), and normal-incidence transmittance in the visible was done to analyze the possible presence of pinholes in the mirror. We demonstrated pinhole-free Al/MgF2 mirrors deposited at room temperature with a reflectivity of 0.91 at 122 nm wavelength. This reflectivity enhancement was achieved solely through parameter optimization.

Manuel A. Quijada↗
NASA NTRSDate not supplied

Cryolite Overcoated Aluminum Reflectors for Far-Ultraviolet Spectroscopy

Aluminum (Al) mirrors are conventionally protected with metal-fluoride coatings (e.g., MgF 2 , LiF, or AlF 3 ) immediately after deposition to prevent oxidation and preserve its far-ultraviolet (FUV) spectral efficiency. However, the resulting FUV reflectance of the aluminum reflector is limited by the metal-fluoride overcoat film index of refraction, morphology, stoichiometry, and its absorption cut-off in the lower end of the FUV spectra. Cryolite (sodium hexafluoroaluminate, Na 3 AlF 6 ) emerges as a potential candidate to preserve the aluminum FUV reflectance due to its relatively lower index of refraction in the visible to ultraviolet; therefore, allowing for the thin-film design of highly spectral efficient reflectors over a wide spectral range. We investigate the use of cryolite in aluminum reflector FUV coating design. The deposited aluminum reflector overcoated with cryolite will be examined in terms of spectral efficiency and environmental durability. The deposited cryolite overcoat will be evaluated in terms of optical constants and structural properties. Preliminary results have shown that the use of cryolite as an overcoat to protect aluminum would yield unprecedented results as an optimal Hydrogen Lyman-alpha (HLyα) spectral line reflector, with experimental reflectance values >96%.

optical coating↗
NASA NTRS2023

Cryolite Overcoated Aluminum Reflectors for Far-Ultraviolet Spectroscopy

Aluminum (Al) mirrors are conventionally protected with metal-fluoride coatings (e.g., MgF2, LiF, or AlF3) immediately after deposition to prevent oxidation and preserve its far-ultraviolet (FUV) spectral efficiency. However, the resulting FUV reflectance of the aluminum reflector is limited by the metal-fluoride overcoat film index of refraction, morphology, stoichiometry, and its absorption cut-off in the lower end of the FUV spectra. Cryolite (sodium hexafluoroaluminate, Na3AlF6) emerges as a potential candidate to preserve the aluminum FUV reflectance due to its relatively lower index of refraction in the visible to ultraviolet; therefore, allowing for the thin-film design of highly spectral efficient reflectors over a wide spectral range. We investigate the use of cryolite in aluminum reflector FUV coating design. The deposited aluminum reflector overcoated with cryolite will be examined in terms of spectral efficiency and environmental durability. The deposited cryolite overcoat will be evaluated in terms of optical constants and structural properties. Preliminary results have shown that the use of cryolite as an overcoat to protect aluminum would yield unprecedented results as an optimal Hydrogen Lyman-alpha (HLyα) spectral line reflector, with experimental reflectance values >96%.

optical coatings↗
NASA NTRSDate not supplied

Enhanced Far Ultra-Violet Optical Properties of Physical Vapor Deposited Aluminum Mirrors Through Fluorination

Astronomical instrumentation for measurements in the Far Ultra-Violet (FUV, 90-200 nm) typically use aluminum (Al) thin films due to their high reflectance over this wavelength range. However, the native aluminum oxide layer that forms on Al upon exposure to the atmosphere is strongly absorbing in this wavelength range, requiring that the films be protected with a dielectric that inhibits oxidation. Typically, magnesium fluoride (MgF 2 ) or lithium fluoride (LiF) coatings are used as protective layers, but each has shortcomings. For example, MgF 2 has an absorption cutoff at 115 nm reducing performance in a critical part of the FUV spectrum of observational interest. A viable option to access these lower wavelengths could be the use of the LiF overcoat as it has a lower absorption cutoff at 102.5 nm, but it is hygroscopic and thus susceptible to degradation in humid conditions. An approach to reduce the hygroscopic nature of LiF would be to implement a passivation process during the deposition of both Al+LiF coatings. Our team at GSFC has developed a new reactive Physical Vapor Deposition (rPVD) process that consists of a fluorination process with XeF 2 gas combined with our traditional PVD process. We have found that this new rPVD coating process offers a protected version of Al+LiF with a more environmentally stable and more transparent LiF layer, along with unprecedent reflectivity. The process starts with a bare optically smooth substrate that is coated with Al in an ultra-high vacuum (UHV) chamber by the conventional PVD process. Then, the bare Al mirror is immediately exposed to a reactive XeF 2 gas before and after the application of the flash PVD evaporated LiF layer. We have also been investigating the use of this rPVD coating process for potential efficiency enhancements of Si-based gratings. Since it is known that the XeF 2 vapor is a strong Si etchant, we are investigating if the native SiO 2 layer on Si is sufficient to protect the groove profile of e-beam-ruled Si gratings from degradation. We will report on the characterization of various Al+LiF witness mirror coatings (both on borosilicate and Si) performed under various deposition conditions using the XeF 2 passivation process. These tests include XPS to determine film stoichiometry and AFM/SEM to measure surface roughness and any etching on the Si substrate. We will also report on FUV reflectance and spectroscopic ellipsometry to characterize optical constants of these passivated films in the UV/Visible/NIR spectral ranges.

Engineering (General)↗
NASA NTRSDate not supplied

Enhanced Far Ultra-Violet Optical Properties of Physical Vapor Deposited Aluminum Mirrors Through Fluorination

Astronomical instrumentation for measurements in the Far Ultra-Violet (FUV, 90-200 nm) typically use aluminum (Al) thin films due to their high reflectance over this wavelength range. However, the native aluminum oxide layer that forms on Al upon exposure to the atmosphere is strongly absorbing in this wavelength range, requiring that the films be protected with a dielectric that inhibits oxidation. Typically, magnesium fluoride (MgF 2 ) or lithium fluoride (LiF) coatings are used as protective layers, but each has shortcomings. For example, MgF 2 has an absorption cutoff at 115 nm reducing performance in a critical part of the FUV spectrum of observational interest. A viable option to access these lower wavelengths could be the use of the LiF overcoat as it has a lower absorption cutoff at 102.5 nm, but it is hygroscopic and thus susceptible to degradation in humid conditions. An approach to reduce the hygroscopic nature of LiF would be to implement a passivation process during the deposition of both Al+LiF coatings. Our team at GSFC has developed a new reactive Physical Vapor Deposition (rPVD) process that consists of a fluorination process with XeF 2 gas combined with our traditional PVD process. We have found that this new rPVD coating process offers a protected version of Al+LiF with a more environmentally stable and more transparent LiF layer, along with unprecedent reflectivity. The process starts with a bare optically smooth substrate that is coated with Al in an ultra-high vacuum (UHV) chamber by the conventional PVD process. Then, the bare Al mirror is immediately exposed to a reactive XeF 2 gas before and after the application of the flash PVD evaporated LiF layer. We have also been investigating the use of this rPVD coating process for potential efficiency enhancements of Si-based gratings. Since it is known that the XeF 2 vapor is a strong Si etchant, we are investigating if the native SiO 2 layer on Si is sufficient to protect the groove profile of e-beam-ruled Si gratings from degradation. We will report on the characterization of various Al+LiF witness mirror coatings (both on borosilicate and Si) performed under various deposition conditions using the XeF 2 passivation process. These tests include XPS to determine film stoichiometry and AFM/SEM to measure surface roughness and any etching on the Si substrate. We will also report on FUV reflectance and spectroscopic ellipsometry to characterize optical constants of these passivated films in the UV/Visible/NIR spectral ranges.

Engineering (General)↗
NASA NTRSDate not supplied

Enhanced Far Ultra-Violet Optical Properties of Physical Vapor Deposited Aluminum Mirrors Through Fluorination

Astronomical instrumentation for measurements in the Far Ultra-Violet (FUV, 90-200 nm) typically use aluminum (Al) thin films due to their high reflectance over this wavelength range. However, the native aluminum oxide layer that forms on Al upon exposure to the atmosphere is strongly absorbing in this wavelength range, requiring that the films be protected with a dielectric that inhibits oxidation. Typically, magnesium fluoride (MgF 2 ) or lithium fluoride (LiF) coatings are used as protective layers, but each has shortcomings. For example, MgF 2 has an absorption cutoff at 115 nm reducing performance in a critical part of the FUV spectrum of observational interest. A viable option to access these lower wavelengths could be the use of the LiF overcoat as it has a lower absorption cutoff at 102.5 nm, but it is hygroscopic and thus susceptible to degradation in humid conditions. An approach to reduce the hygroscopic nature of LiF would be to implement a passivation process during the deposition of both Al+LiF coatings. Our team at GSFC has developed a new reactive Physical Vapor Deposition (rPVD) process that consists of a fluorination process with XeF 2 gas combined with our traditional PVD process. We have found that this new rPVD coating process offers a protected version of Al+LiF with a more environmentally stable and more transparent LiF layer, along with unprecedent reflectivity. The process starts with a bare optically smooth substrate that is coated with Al in an ultra-high vacuum (UHV) chamber by the conventional PVD process. Then, the bare Al mirror is immediately exposed to a reactive XeF 2 gas before and after the application of the flash PVD evaporated LiF layer. We have also been investigating the use of this rPVD coating process for potential efficiency enhancements of Si-based gratings. Since it is known that the XeF 2 vapor is a strong Si etchant, we are investigating if the native SiO 2 layer on Si is sufficient to protect the groove profile of e-beam-ruled Si gratings from degradation. We will report on the characterization of various Al+LiF witness mirror coatings (both on borosilicate and Si) performed under various deposition conditions using the XeF 2 passivation process. These tests include XPS to determine film stoichiometry and AFM/SEM to measure surface roughness and any etching on the Si substrate. We will also report on FUV reflectance and spectroscopic ellipsometry to characterize optical constants of these passivated films in the UV/Visible/NIR spectral ranges.

Engineering (General)↗