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High-frequency instability of the sheath-plasma resonance

Coherent high-frequency oscillations near the electron plasma frequency are generated by electrodes with positive dc bias immersed in a uniform Maxwellian afterglow plasma. The instability occurs at the sheath-plasma resonance and is driven by a negative RF sheath resistance associated with the electron inertia in the diodelike electron-rich sheath. With increasing dc bias, i.e., electron transit time, the instability exhibits a hard threshold, downward frequency pulling, line broadening, and copious harmonics. The fundamental instability is a bounded oscillation caused by wave evanescence, but the harmonics are radiated as electromagnetic waves from the electrodes acting like antennas. Wavelength and polarization measurements confirm the emission process. Electromagnetic waves are excited by electrodes of various geometries (planes, cylinders, spheres), which excludes other radiation mechanisms such as orbitrons or beam-plasma instabilities. The line-broadening mechanism has been identified as a frequency modulation via the electron transit time by dynamic ions. Ion oscillations at the sheath edge give rise to burstlike RF emissions. These laboratory observations of a new instability are important for antennas in space plasmas, generation of coherent beams with diodes, and plasma diagnostics.

Stenzel, R. L.

Coupling of radiation into thin film modes by means of localized plasma resonances

The interaction between the surface plasmon mode that propagates at a metal dielectric interface and the localized plasma resonances (LPR) is investigated experimentally in Ag-island films. A stair-stepped sample geometry comprising a glass substrate, a continuous 50-nm Ag film, an LiF spacer film of thickness d = 5-60 nm, and an Ag-island film of mass thickness 3 nm is used in near-normal-reflectivity and plasmon-propagation-constant (k) determinations. The results are presented graphically and discussed. The overall shape of the reflectivity curves is found to be characteristic of Ag films, but with a dip at about 400 nm (corresponding to the absorption resonance of the island film) which is most pronounced with d = 25 nm. It is inferred that the island resonances are strongly coupled to a continuous-film dissipative mechanism at this d value. This inference is supported by the fact that the variation in k, correctd for LiF effects and plotted as a function of d, is greatest at around d = 25 nm. The implications of this finding for broad-band coupling into a thin-film mode, LPR enhancement of waveguide nonlinear effects, and new surface-enhanced-Raman-scattering geometries are indicated.

Holland, W. R.

The lower subsidiary diffuse plasma resonances and the classification of radio emissions below the plasma frequency

Using previusly published data and newly scaled ionograms from the Alouette 2 and ISIS 1 experiments, the diffuse ionospheric resonances Dn, stimulated by topside sounders Dn, are classified. The classification also includes the lower subsidiary resonances Dn(-) (n = 1, 2, 3, and 4). It is shown that the Dn(-) frequencies are related to f(Dn) and f(H) by the expression f(Dn)- = sq rt of (f(Dn)-squared - f(H)-squared).

Osherovich, Vladimir A.

Plasma resonance radiation

Qualitative determination of charged particle cloud motion through corona and excitation of electron plasma oscillations through analysis of test particle electromagnetic field in plasma

CORONA

Characteristics of an Electron Cyclotron Resonance Plasma Source for the Production of Active Nitrogen Species in III-V Nitride Epitaxy

A simple analysis is provided to determine the characteristics of an electron cyclotron resonance (ECR) plasma source for the generation of active nitrogen species in the molecular beam epitaxy of III-V nitrides. The effects of reactor geometry, pressure, power, and flow rate on the dissociation efficiency and ion flux are presented. Pulsing the input power is proposed to reduce the ion flux.

Meyyappan, Meyya