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Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects
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Evaluating Automated Face Identity-Masking Methods with Human Perception and a Deep Convolutional Neural Network
Face de-identification (or “masking”) algorithms have been developed in response to the prevalent use of video recordings in public places. Here, we evaluated the success of face identity masking for human perceivers and a deep convolutional neural network (DCNN). Eight de-identification algorithms were applied to videos of drivers’ faces, while they actively operated a motor vehicle. These masks were pre-selected to be applicable to low-quality video and to maintain coarse information about facial actions. Humans studied high-resolution images to learn driver identities and were tested on their recognition of active drivers in low-resolution videos. Faces in the videos were either unmasked or were masked by one of the eight algorithms. When participants were tested immediately after learning (Experiment 1), all masks reduced identification, with six of eight masks reducing identification to extremely poor performance. In a second experiment, two of the most effective masks were tested after a delay of 7 or 28 days. The delay did not further reduce identification of the masked faces. In all masked conditions, participants maintained stringent decision criteria, with low confidence in recognition, further indicating the effectiveness of the masks. Next, the DCNN performed an identity-matching task between high-resolution images and masked videos—a task analogous to that done by humans. The pattern of accuracy for the DCNN mirrored some, but not all, aspects of human performance, highlighting the need to test the effectiveness of identity masking for both humans and machines. The DCNN was also tested on its ability to match identity between masked and unmasked versions of the same video, based only on the face. DCNN performance for the eight masks offers insight into the nature of the information in faces that is coded in these networks.
Designs and Materials for Better Coronagraph Occulting Masks
New designs, and materials appropriate for such designs, are under investigation in an effort to develop coronagraph occulting masks having broad-band spectral characteristics superior to those currently employed. These designs and materials are applicable to all coronagraphs, both ground-based and spaceborne. This effort also offers potential benefits for the development of other optical masks and filters that are required (1) for precisely tailored spatial transmission profiles, (2) to be characterized by optical-density neutrality and phase neutrality (that is, to be characterized by constant optical density and constant phase over broad wavelength ranges), and/or (3) not to exhibit optical- density-dependent phase shifts. The need for this effort arises for the following reasons: Coronagraph occulting masks are required to impose, on beams of light transmitted through them, extremely precise control of amplitude and phase according to carefully designed transmission profiles. In the original application that gave rise to this effort, the concern has been to develop broad-band occulting masks for NASA s Terrestrial Planet Finder coronagraph. Until now, experimental samples of these masks have been made from high-energy-beam-sensitive (HEBS) glass, which becomes locally dark where irradiated with a high-energy electron beam, the amount of darkening depending on the electron-beam energy and dose. Precise mask profiles have been written on HEBS glass blanks by use of electron beams, and the masks have performed satisfactorily in monochromatic light. However, the optical-density and phase profiles of the HEBS masks vary significantly with wavelength; consequently, the HEBS masks perform unsatisfactorily in broad-band light. The key properties of materials to be used in coronagraph occulting masks are their extinction coefficients, their indices of refraction, and the variations of these parameters with wavelength. The effort thus far has included theoretical predictions of performances of masks that would be made from alternative materials chosen because the wavelength dependences of their extinction coefficients and their indices of refraction are such that that the optical-density and phase profiles of masks made from these materials can be expected to vary much less with wavelength than do those of masks made from HEBS glass. The alternative materials considered thus far include some elemental metals such as Pt and Ni, metal alloys such as Inconel, metal nitrides such as TiN, and dielectrics such as SiO2. A mask as now envisioned would include thin metal and dielectric films having stepped or smoothly varying thicknesses (see figure). The thicknesses would be chosen, taking account of the indices of refraction and extinction coefficients, to obtain an acceptably close approximation of the desired spatial transmittance profile with a flat phase profile
Mask alignment system for semiconductor processing
A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.
SU-E-T-71: A Radiochromic Film Based Quantitative Assessment of Thermoplastic Mask Bolus Effect in Head and Neck IMRT/VMAT
Purpose: To quantify the factors leading to thermoplastic mask bolus-associated-increased skin dose in head and neck IMRT/VMAT using EBT2 film. Methods: EBT2 film placed beneath a dual layer 3-point ORFIT head, neck and shoulder mask was used to test the effect of mask thickness, beam modulation, air gap, and beam obliquity on bolus effect. Mask thickness was varied based on the distribution of 1.6mm Orfilight layer on top of 2 mm Efficast layer. Beam modulation was varied by irradiating the film with an open field (no beam modulation) and a step and shoot field (beam modulation). Air gap between mask and film was varied from 0 to 5mm. Beam obliquity was varied by irradiating the film at gantry angles of 0°, 35°, and 70°.Finally, film strips placed on a Rando phantom under an Orfit mask, in regions of expected high dose, were irradiated using 5 IMRT and 5 VMAT plans with various modulation levels (modulation factor 2 to 5) and the results were compared with those obtained placing OSLDs at the same locations. Results: An 18–34% increase in mask bolus effect was observed for three factors where the effect of beam obliquity ≥ beam modulation > mask thickness. No increase in mask bolus effect was observed for change in air gap. A 6–13% increase in dose due to mask bolus effect was observed on film strips. Conclusion: This work underlines the role of beam obliquity and beam modulation combined with thermoplastic mask thickness in increasing mask bolus-associated skin dose in head and neck IMRT/VMAT. One possible method of dose reduction, based on knowledge gained from this work, is inclusion of skin as an avoidance structure in treatment planning. Another approach is to design a mask with the least amount of thermoplastic material necessary for immobilization.
Mask effects on cosmological studies with weak-lensing peak statistics
With numerical simulations, we analyze in detail how the bad data removal, i.e., the mask effect, can influence the peak statistics of the weak-lensing convergence field reconstructed from the shear measurement of background galaxies. It is found that high peak fractions are systematically enhanced because of the presence of masks; the larger the masked area is, the higher the enhancement is. In the case where the total masked area is about 13% of the survey area, the fraction of peaks with signal-to-noise ratio ν ≥ 3 is ∼11% of the total number of peaks, compared with ∼7% of the mask-free case in our considered cosmological model. This can have significant effects on cosmological studies with weak-lensing convergence peak statistics, inducing a large bias in the parameter constraints if the effects are not taken into account properly. Even for a survey area of 9 deg{sup 2}, the bias in (Ω {sub m}, σ{sub 8}) is already intolerably large and close to 3σ. It is noted that most of the affected peaks are close to the masked regions. Therefore, excluding peaks in those regions in the peak statistics can reduce the bias effect but at the expense of losing usable survey areas. Further investigations find that the enhancement of the number of high peaks around the masked regions can be largely attributed to the smaller number of galaxies usable in the weak-lensing convergence reconstruction, leading to higher noise than that of the areas away from the masks. We thus develop a model in which we exclude only those very large masks with radius larger than 3' but keep all the other masked regions in peak counting statistics. For the remaining part, we treat the areas close to and away from the masked regions separately with different noise levels. It is shown that this two-noise-level model can account for the mask effect on peak statistics very well, and the bias in cosmological parameters is significantly reduced if this model is applied in the parameter fitting.
Calibration of a Spatial-Temporal Discrimination Model from Forward, Simultaneous, and Backward Masking
We have been developing a simplified spatial-temporal discrimination model similar to our simplified spatial model in that masking is assumed to be a function of the local visible contrast energy. The overall spatial-temporal sensitivity of the model is calibrated to predict the detectability of targets on a uniform background. To calibrate the spatial-temporal integration functions that define local visible contrast energy, spatial-temporal masking data are required. Observer thresholds were measured (2IFC) for the detection of a 12 msec target stimulus in the presence of a 700 msec mask. Targets were 1, 3 or 9 c/deg sine wave gratings. Masks were either one of these gratings or two of them combined. The target was presented in 17 temporal positions with respect to the mask, including positions before, during and after the mask. Peak masking was found near mask onset and offset for 1 and 3 c/deg targets, while masking effects were more nearly uniform during the mask for the 9 c/deg target. As in the purely spatial case, the simplified model can not predict all the details of masking as a function of masking component spatial frequencies, but overall the prediction errors are small.
Uncertainty in the visibility mask of a survey and its effects on the clustering of biased tracers
The forecasted accuracy of upcoming surveys of large-scale structure cannot be achieved without a proper quantification of the error induced by foreground removal (or other systematics like 0-point photometry offset). Because these errors are highly correlated on the sky, their influence is expected to be especially important at very large scales, at and beyond the first Baryonic Acoustic Oscillation (BAO). In this work we quantify how the uncertainty in the visibility mask of a survey, that gives the survey depth in a specific sky area, influences the measured power spectrum of a sample of tracers of the density field and its covariance matrix. We start from a very large set of 10,000 catalogs of dark matter (DM) halos in periodic cosmological boxes, produced with the PINOCCHIO approximate method. To make an analytic approach feasible, we assume luminosity-independent halo bias and an idealized geometry for the visibility mask, that is constant in square tiles of physical length l ; this should be interpreted as the projection, at the observation redshift, of the angular correlation scale of the foreground residuals. We find that the power spectrum of these biased tracers can be expressed as the sum of a cosmological term, a mask term and a term involving their convolution. The mask and convolution terms scale like P ∝ l {sup 2}σ {sub A} {sup 2}, where σ {sub A} {sup 2} is the variance of the uncertainty on the visibility mask. With l = 30−100 Mpc/ h and σ {sub A} = 5−20%, the mask term can be significant at k ∼ 0.01−0.1 h /Mpc, and the convolution term can amount to ∼ 1−10% of the total. The influence of mask uncertainty on power spectrum covariance is more complicated: the coupling of the convolution term with the other two gives rise to several mixed terms, that we quantify by difference using the mock catalogs. These are found to be of the same order of the mask covariance, and to introduce non-diagonal terms at large scales. As a consequence, the power spectrum covariance matrix cannot be expressed as the sum of a cosmological and of a mask term. More realistic settings (realistic foregrounds, luminosity-dependent bias) make the analytical approach not feasible, and the problem requires on the one hand usage of extended sets of mock catalogs, on the other hand detailed knowledge of the correlations among errors in the visibility masks. Our results lie down the theoretical bases to quantify the impact that uncertainties in the mask calibration have on the derivation of cosmological constraints from large spectroscopic surveys.
Accurate estimation of angular power spectra for maps with correlated masks
A common procedure when analyzing maps of the cosmic microwave background (CMB) or other cosmological signals is the need to remove ("mask") regions of the maps that are heavily contaminated, e.g., by non-cosmological foreground emission. After applying such a mask, one must account for its effect when inferring statistical properties of interest, such as the angular power spectrum of the field in the original map. A widely used approach to correct for such mask-induced effects was presented by Hivon et al. (2002), now widely known as the "MASTER" formalism. However, it is often the case that the map and mask are correlated in some way, such as point source masks used in CMB analyses, which have nonzero correlation with CMB secondary anisotropy fields and other mm-wave sky signals. In such situations, the MASTER approach gives biased results, as it assumes that the unmasked map and mask have zero correlation. While such effects have been discussed before with regard to specific physical models, here we derive a completely general formalism for any case where the map and mask are correlated. We show that our result ("reMASTERed") reconstructs ensemble-averaged angular power spectra to effectively exact precision, with significant improvements over traditional estimators for cases where the map and mask are correlated. An important consequence of our result is that for maps with correlated masks, it is no longer possible to invert a simple equation to obtain the true power spectrum from the observed (masked) power spectrum. Instead, our result necessitates the use of forward modeling from theory space into the observable domain of the masked power spectrum. We publicly release our software implementation of these results.
Mechanical alignment of substrates to a mask
A plurality of masks is attached to the underside of a mask frame. This attachment is made such that each mask can independently move relative to the mask frame in three directions. This relative movement allows each mask to adjust its position to align with respective alignment pins disposed on a working surface. In one embodiment, each mask is attached to the mask frame using fasteners, where the fasteners have a shaft with a diameter smaller than the diameter of the mounting hole disposed on the mask. A bias element may be used to allow relative movement between the mask and the mask frame in the vertical direction. Each mask may also have kinematic features to mate with the respective alignment pins on the working surface.
Extended use of face masks during the COVID-19 pandemic - Thermal conditioning and spray-on surface disinfection
The current COVID-19 pandemic has resulted in globally constrained supplies for face masks and personal protective equipment (PPE). Production capacity is limited in many countries and the future course of the pandemic will likely continue with shortages for high quality masks and PPE in the foreseeable future. Therefore, expectations are that mask reuse, extended wear and similar approaches will enhance the availability of personal protective measures. Repeated thermal disinfection could be an important option and likely easier implemented in some situations, at least on the small scale, than UV illumination, irradiation or hydrogen peroxide vapor exposure. In this paper, an overview on thermal responses and ongoing filtration performance of multiple face mask types is provided. Most masks have adequate material properties to survive a few cycles (i.e. 30 min disinfection steps) of thermal exposure in the 75°C regime. Some are more easily affected, as seen by the fusing of plastic liner or warping, given that preferred conditioning temperatures are near the softening point for some of the plastics and fibers used in these masks. Hence adequate temperature control is equally important. As guidance, disinfectants sprayed via dilute solutions maintain a surface presence over extended time at 25 and 37°C. Some spray-on alcohol-based solutions containing disinfectants were gently applied to the top surface of masks. Neither moderate thermal aging (less than 24 h at 80 and 95°C) nor gentle application of surface disinfectant sprays resulted in measurable loss of mask filter performance. Subject to bio-medical concurrence (additional checks for virus kill efficiency) and the use of low risk non-toxic disinfectants, such strategies, either individually or combined, by offering additional anti-viral properties or short term refreshing, may complement reuse options of professional masks or the now ubiquitous custom-made face masks with their often unknown filtration effectiveness.
Mask-side Hyper-NA EUV imaging on the SHARP microscope
Hyper-NA, the prospective successor to high-numerical aperture (NA) extreme ultraviolet lithography (EUVL) could be inserted soon after 2030. Hyper-NA poses a number of challenges, including reduced depth of focus, amplified mask three-dimensional effects, and increased mask-side angular range. A Hyper-NA capable extreme ultraviolet (EUV) mask-imaging tool can address these challenges and accelerate research and development toward Hyper-NA. The Sharp High-Numerical Aperture Actinic Reticle Review Project (SHARP) EUV mask microscope is supporting mask-side high-NA imaging since 2015. Implementing mask-side Hyper-NA imaging in 2024 enables research and development toward the corresponding nodes of EUVL. Hyper-NA zoneplates at 0.75 4x/8x NA with a 6.7-deg chief ray angle and 0.85 4x/8x NA with a 7.4-deg chief ray angle are added to the SHARP microscope. Imaging at mask-side Hyper-NA is demonstrated. Imaging of 5-nm half-pitch (wafer scale) horizontal lines and spaces is demonstrated using dipole illumination. Imaging of 5-nm half-pitch (wafer scale) vertical lines and spaces is demonstrated using frequency-doubled imaging of 40-nm hp (mask scale) lines and spaces. Normalized image log slope (NILS) and modulation of Hyper-NA image data match closely to simulations for horizontal lines and spaces. A reduction in NILS of 0.3 or less is observed for vertical lines and spaces in the two-beam imaging regime. Through-focus image data are discussed, comparing different dipole sources and mask-side NAs. Mask-side Hyper-NA photomask imaging has been implemented and demonstrated on the SHARP microscope and is now available to users of the instrument.
Oro-Nasal Mask Versus Two-Way Non-Rebreathing Valves for Maximal Aerobic Capacity Testing in Astronauts
Astronauts complete maximal aerobic capacity (VO2pk) testing as part of their annual fitness assessment (AFA) as well as several times once assigned to an International Space Station mission. Historically, the 2-Way T-Shape Non-Rebreathing valve with a mouthpiece and nose clip (“Mouthpiece”) has been used in these tests. The testing procedure was updated to use the oro-nasal mask (“Mask”) for the AFA starting in June 2017. Astronauts who used the mask during their AFA requested it be certified to be used for all mission associated tests. Considering the criticality of the data and the schedule constraints of astronauts, it is imperative that the requested hardware change provide data with equivalent reliability and repeatability as provided by the mouthpiece. PURPOSE: To assess the reliability and validity of mask vs. mouthpiece by comparing submaximal and VO2pkdata within subjects (approximately 1 year apart). METHODS: Each of 17 active astronauts completed a VO (sub 2pk) test with the mouthpiece (first) and the mask (second) for their AFA. The VO (sub 2pk) test was conducted on a cycle ergometer with a metabolic cart. The nominal protocol started with a 3-minute warm-up at 50 Watts (W) and increased 25W every minute until volitional fatigue (Light: 45W start; 15W increase). The VO (sub 2pk)s were compared between tests and the expected day-to-day variation (plus or minus 5 percent) was used as the threshold for determining agreement between tests. Submaximal values were plotted and evaluated visually for deviations between mask and mouthpiece. RESULTS: VO (sub 2pk) values were more than 5 percent different, despite similar test times, between mouthpiece and mask in 6 of 17 comparisons, 3 of which were higher with the mask (9.0 plus or minus 5.9 percent) while 3 were lower (minus10.8 plus or minus 2.0 percent) with the mask. The submaximal data did not indicate a leak in either apparatus during these tests. An Astronaut Strength & Conditioning Rehabilitation specialist confirmed that the measured differences in VO (sub 2pk) of these 6 astronauts was consistent with observed changes in exercise habits during the year that separated the two tests. CONCLUSION: After being presented with the results of this data mining effort the mask was accepted for use in all tests, excepting that, if a leak is detected without resolve, the test will be repeated (if schedule allows) and remaining tests will be completed with the mouthpiece.
Time-Varying Ice Sheet Mask: Implications on Ice-Sheet Mass Balance and Crustal Uplift
Mass-balance estimates of the polar ice sheets presently rely on static ice masks to identify the area under investigation. However, the vintage of available ice masks can differ by more than a decade and the resolution of the imagery used to delineate ice extent can differ by an order of magnitude, despite evidence of ongoing ice-sheet retreat. We show that using a fine resolution, time-varying ice mask significantly improves mass-balance estimates of the northwestern sector of the Greenland Ice Sheet and affects interpretation of local crustal uplift. Accounting for ice margin retreat using a time-varying ice mask between 2003–2015 results in 1.0–6.8% less ice-sheet mass loss relative to assuming one of several existing static ice masks. This indicates that mass-balance estimates that use a static ice mask will progressively overestimate mass loss where the ice sheet is predominantly retreating, meaning a negative bias on mass-balance. This trend is anticipated to be amplified in a future warming scenario unless updated ice masks are incorporated. For altimetry-derived mass-balance estimates, this ice-mask induced bias approaches the magnitude of the ice-sheet-wide uncertainty presently associated with spatiotemporal variability in modeled firn compaction. Further, at five GNET stations, the ice-mask-induced bias is equivalent to 5–15% of the modeled uplift due to elastic deformation. Given present and projected negative trends in Greenland Ice Sheet mass-balance and areal extent, we conclude that studies of its mass-balance should begin incorporating dynamic, periodically updated, fine-resolution ice masks. This methodological refinement will reduce bias in estimates of both ice-sheet mass-balance and crustal uplift.
ScAIN etch mask for highly selective etching
A fabrication process employing the use of ScAlN as an etch mask is disclosed. The ScAlN etch mask is chemically nonvolatile in fluorine-based etch chemistries and has a low sputter yield, resulting in greater etch mask selectivity and reduced surface roughness for silicon and other semiconductor materials. The ScAlN etch mask has an etch mask selectivity of greater than 200,000:1 relative to silicon compared to an etch mask selectivity of less than 40,000:1 for a prior art AlN etch mask relative to silicon. Further, due to reduced sputtering of the ScAlN etch mask, and thus reduced micromasking, the ScAlN etch mask yielded a surface roughness of 0.6 μm compared to a surface roughness of 2.8 μm for an AlN etch mask.
Mask Free OLED Fabrication Process for Non-Tunable and Tunable White OLED Panels
In this program we demonstrated a method for mask free fabrication of OLEDs. Conventional OLEDs use at least 2 shadowmasks during the fabrication process to define the deposition pattern for the organic layers and for the cathode layer. Although effective, the use of masks requires mask handling and mask change equipment which increases the cost of the OLED deposition system. New sets of masks are required for every new product design, and the mask sets require frequent cleaning as organic material builds up on the masks over time and can be a source of particle defects resulting in yield loss. The method investigated in this program uses laser removal of organic material to pattern the organic layers and define a moisture impermeable seal region. This method is digital and can be applied to any new panel design, avoiding the costs of new masks sets and associated yield loss. In addition, we developed a platform technology for producing white color tunable or dim-to-warm white OLEDs and demonstrated patterning of tunable white OLEDs using the low-cost mask free fabrication process.
Performance of an Achromatic Focal Plane Mask for Exoplanet Imaging Coronagraphy
Coronagraph technology combined with wavefront control is close to achieving the contrast and inner working angle requirements in the lab necessary to observe the faint signal of an Earth-like exoplanet in monochromatic light. An important remaining technological challenge is to achieve high contrast in broadband light. Coronagraph bandwidth is largely limited by chromaticity of the focal plane mask, which is responsible for blocking the stellar PSF. The size of a stellar PSF scales linearly with wavelength; ideally, the size of the focal plane mask would also scale with wavelength. A conventional hard-edge focal plane mask has a fixed size, normally sized for the longest wavelength in the observational band to avoid starlight leakage. The conventional mask is oversized for shorter wavelengths and blocks useful discovery space. Recently we presented a solution to the size chromaticity challenge with a focal plane mask designed to scale its effective size with wavelength. In this paper, we analyze performance of the achromatic size-scaling focal plane mask within a Phase Induced Amplitude Apodization (PIAA) coronagraph. We present results from wavefront control around the achromatic focal plane mask, and demonstrate the size-scaling effect of the mask with wavelength. The edge of the dark zone, and therefore the inner working angle of the coronagraph, scale with wavelength. The achromatic mask enables operation in a wider band of wavelengths compared with a conventional hard-edge occulter.