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At least 37 records · Page 2
All sourcesNASA NTRSDOE OSTI
NASA NTRS2004

Clean then Assemble Versus Assemble then Clean: Several Comparisons

Cleanliness of manufactured parts and assemblies is a significant issue in many industries including disk drives, semiconductors, aerospace, and medical devices. Clean manufacturing requires cleanroom floor space and cleaning technology that are both expensive to own and expensive to operate. Strategies to reduce these costs are an important consideration. One strategy shown to be effective at reducing costs is to assemble parts into subassemblies and then clean the subassembly, rather than clean the individual parts first and then assemble them. One advantage is that assembly outside of the cleanroom reduces the amount of cleanroom floor space and its associated operating cost premium. A second advantage is that this strategy reduces the number of individual parts that must be cleaned prior to assembly, reducing the number of cleaning baskets, handling and, possibly, reducing the number of cleaners. The assemble then clean strategy also results in a part that is significantly cleaner because contamination generated during the assembly steps are more effectively removed that normally can be achieved by hand wiping after assembly in the cleanroom.

contamination↗
NASA NTRS2017

Cleaning and Cleanliness Measurement of Additive Manufactured Parts

Additive Manufacturing processes allow for the manufacture of complex three dimensional components that otherwise could not be manufactured. Post treatment processes require the removal of any remnant bulk powder that may become entrapped within small cavities and channels within a component. This project focuses on several gross cleaning methods and the verification metrics associated with additive manufactured parts for oxygen propulsion usage.

Mitchell, Mark A.↗
NASA NTRS2015

Cleaning and Cleanliness Measurement of Additive Manufactured Parts

The successful acquisition and utilization of piece parts and assemblies for contamination sensitive applications requires application of cleanliness acceptance criteria. Contamination can be classified using many different schemes. One common scheme is classification as organic, ionic and particulate contaminants. These may be present in and on the surface of solid components and assemblies or may be dispersed in various gaseous or liquid media. This discussion will focus on insoluble particle contamination on the surface of piece parts and assemblies. Cleanliness of parts can be controlled using two strategies, referred to as gross cleanliness and precision cleanliness. Under a gross cleanliness strategy acceptance is based on visual cleanliness. This approach introduces a number of concerns that render it unsuitable for controlling cleanliness of high technology products. Under the precision cleanliness strategy, subjective, visual assessment of cleanliness is replaced by objective measurement of cleanliness. When a precision cleanliness strategy is adopted there naturally arises the question: How clean is clean enough? The six commonly used methods for establishing objective cleanliness acceptance limits will be discussed. Special emphasis shall focus on the use of multiple extraction, a technique that has been demonstrated for additively manufactured parts.

Welker, Roger W.↗
NASA NTRS2016

Cleaning and Cleanliness Measurement of Additive Manufactured Parts

The successful acquisition and utilization of piece parts and assemblies for contamination sensitive applications requires application of cleanliness acceptance criteria. Contamination can be classified using many different schemes. One common scheme is classification as organic, ionic and particulate contaminants. These may be present in and on the surface of solid components and assemblies or may be dispersed in various gaseous or liquid media. This discussion will focus on insoluble particle contamination on the surfaces of piece parts and assemblies. Cleanliness of parts can be controlled using two strategies, referred to as gross cleanliness and precision cleanliness. Under a gross cleanliness strategy acceptance is based on visual cleanliness. This approach introduces a number of concerns that render it unsuitable for controlling cleanliness of high technology products. Under the precision cleanliness strategy, subjective, visual assessment of cleanliness is replaced by objective measurement of cleanliness. When a precision cleanliness strategy is adopted there naturally arises the question: How clean is clean enough? The methods for establishing objective cleanliness acceptance limits will be discussed.

Mitchell, Mark A.↗
NASA NTRS1997

Surfactant/Supercritical Fluid Cleaning of Contaminated Substrates

CFC's and halogenated hydrocarbon solvents have been the solvents of choice to degrease and otherwise clean precision metal parts to allow proper function. Recent regulations have, however, rendered most of these solvents unacceptable for these purposes. New processes which are being used or which have been proposed to replace these solvents usually either fail to remove water soluble contaminants or produce significant aqueous wastes which must then be disposed of. In this work, a new method for cleaning surfaces will be investigated. Solubility of typical contaminants such as lubricating greases and phosphatizing bath residues will be studied in several surfactant/supercritical fluid solutions. The effect of temperature, pressure, and the composition of the cleaning mixture on the solubility of oily, polar, and ionic contaminants will be investigated. A reverse micellar solution in a supercritical light hydrocarbon solvent will be used to clean samples of industrial wastes. A reverse micellar solution is one where water is dissolved into a non-polar solvent with the aid of a surfactant. The solution will be capable of dissolving both water-soluble contaminants and oil soluble contaminants. Once the contaminants have been dissolved into the solution they will be separated from the light hydrocarbon and precipitated by a relatively small pressure drop and the supercritical solvent will be available for recycle for reuse. The process will be compared to the efficacy of supercritical CO2 cleaning by attempting to clean the same types of substrates and machining wastes with the same contaminants using supercritical CO2. It is anticipated that the supercritical CO2 process will not be capable of removing ionic residues.

White, Gary L.↗
NASA NTRS2005

Bonding-Compatible Corrosion Inhibitor for Rinsing Metals

A corrosion-inhibiting mixture of compounds has been developed for addition to the water used to rinse metal parts that have been cleaned with aqueous solutions in preparation for adhesive bonding of the metals to rubber and rubber-like materials. Prior to the development of this corrosion inhibitor, the parts (made, variously, of D6AC steel and 7075-T73 aluminum) were rinsed by deionized water, which caused corrosion in some places on the steel parts especially in such occluded places as sealing surfaces and threaded blind holes. An integral part of the particular cleaning process is the deposition of a thin layer of silicates and silane primers that increase the strength of the adhesive bond. The corrosion inhibitor is formulated, not only to inhibit corrosion of both D6AC steel and 7075- T73 aluminum, but also to either increase or at least not reduce the strength of the adhesive bond to be formed subsequently. The corrosion inhibitor is a mixture of sodium silicate and sodium tetraborate. The sodium silicate functions as both a corrosion inhibitor and a bond-strength promoter in association with the silane primers. The sodium tetraborate buffers the rinse solution at the optimum pH and functions as a secondary corrosion inhibitor for the steel. For a given application, the concentrations of sodium silicate and sodium tetraborate must be chosen in a compromise among the needs to inhibit corrosion of steel, inhibit corrosion of aluminum, and minimize cosmetic staining of both steel and aluminum. Concentrations of sodium silicate in excess of 150 parts of silicon per million parts of solution (ppm Si) have been determined to enhance inhibition of corrosion; unfortunately, because of the alkalinity of sodium silicate, even a small concentration can raise the pH of the rinse solution to such a level that aluminum becomes corroded despite the inhibiting effect. The pH of a solution that contains a high concentration of sodium silicate can be decreased by adding sodium tetraborate. On the other hand, the addition of sodium tetraborate increases the concentration of dissolved solids to such a high level that cosmetic staining becomes an issue.

Saunders, C. R.↗
NASA NTRS2005

True Cost of Amateur Clean rooms

This viewgraph document reviews the cost factors for clean rooms that are not professionally built, monitored or maintained. These amateur clean rooms are built because scientist and engineers desire to create a clean room to build a part of an experiment that requires a clean room, and the program manager is looking to save money. However, in the long run these clean rooms may not save money, as the cost of maintenance may be higher due to the cost of transporting the crews, and if the materials were of lesser quality, the cost of modifications may diminish any savings, and the product may not be of the same quality. Several examples are shown of the clean rooms that show some of the problems that can arise from amateur clean rooms.

Ramsey, W. Lawrence↗
NASA NTRS2002

Super Clean, Super Safe

The Supersonic Gas/Liquid Cleaning System (SS-GLCS) has applications ranging from cleaning circuit boards to scouring building exteriors. The system does not abrade the surface of the hardware being cleaned, and it requires much lower levels of pressure while using very little water. An alternative to CFC-based solvents, the system mixes air and water from separate pressurized tanks, ejecting the gas- liquid mixture at supersonic speeds from a series of nozzles at the end of a hand-held wand. The water droplets have the kinetic energy to forcibly remove the contaminant material. The system leaves very little fluid that must be handled as contaminated waste. It can be applied in the aerospace, automotive, and medical industries, as well as to circuit boards, electronics, machinery, metals, plastics, and optics. With a nozzle that can be oriented in any direction, the system is adjustable to allow all sides of a part to be cleaned without reorientation. It requires minimal training and is easily moved on built-in casters

Source record↗
NASA NTRS1982

Automatic Flushing Unit With Cleanliness Monitor

Liquid-level probe kept clean, therefore at peak accuracy, by unit that flushes probe with solvent, monitors effluent for contamination, and determines probe is particle-free. Approach may be adaptable to industrial cleaning such as flushing filters and pipes, and ensuring that manufactured parts have been adequately cleaned.

Hildebrandt, N. E.↗
NASA NTRS1977

Method of forming shrink-fit compression seal

A method for making a glass-to-metal seal is described. A domed metal enclosure having a machined seal ring is fitted to a glass post machined to a slight taper and to a desired surface finish. The metal part is then heated by induction in a vacuum. As the metal part heats and expands relative to the glass post, the metal seal ring, possessing a higher coefficient of expansion than the glass post, slides down the tapered post. Upon cooling, the seal ring crushes against the glass post forming the seal. The method results in a glass-to-metal seal possessing extremely good leak resistance, while the parts are kept clean and free of the contaminants.

Podgorski, T. J.↗
NASA NTRS2014

Alternative Solvents through Green Chemistry Project

Components in the aerospace industry must perform with accuracy and precision under extreme conditions, and surface contamination can be detrimental to the desired performance, especially in cases when the components come into contact with strong oxidizers such as liquid oxygen. Therefore, precision cleaning is an important part of a components preparation prior to utilization in aerospace applications. Current cleaning technologies employ a variety of cleaning agents, many of which are halogenated solvents that are either toxic or cause environmental damage. Thus, this project seeks to identify alternative precision cleaning solvents and technologies, including use of less harmful cleaning solvents, ultrasonic and megasonic agitation, low-pressure plasma cleaning techniques, and supercritical carbon dioxide extraction. Please review all data content found in the Public Data tab located at: https:techport.nasa.govview11697public

Technology Portfolio System↗
NASA NTRS2014

Alternative, Green Processes for the Precision Cleaning of Aerospace Hardware

Precision cleaning is necessary to ensure the proper functioning of aerospace hardware, particularly those systems that come in contact with liquid oxygen or hypergolic fuels. Components that have not been cleaned to the appropriate levels may experience problems ranging from impaired performance to catastrophic failure. Traditionally, this has been achieved using various halogenated solvents. However, as information on the toxicological and/or environmental impacts of each came to light, they were subsequently regulated out of use. The solvent currently used in Kennedy Space Center (KSC) precision cleaning operations is Vertrel MCA. Environmental sampling at KSC indicates that continued use of this or similar solvents may lead to high remediation costs that must be borne by the Program for years to come. In response to this problem, the Green Solvents Project seeks to develop state-of-the-art, green technologies designed to meet KSCs precision cleaning needs.Initially, 23 solvents were identified as potential replacements for the current Vertrel MCA-based process. Highly halogenated solvents were deliberately omitted since historical precedents indicate that as the long-term consequences of these solvents become known, they will eventually be regulated out of practical use, often with significant financial burdens for the user. Three solvent-less cleaning processes (plasma, supercritical carbon dioxide, and carbon dioxide snow) were also chosen since they produce essentially no waste stream. Next, experimental and analytical procedures were developed to compare the relative effectiveness of these solvents and technologies to the current KSC standard of Vertrel MCA. Individually numbered Swagelok fittings were used to represent the hardware in the cleaning process. First, the fittings were cleaned using Vertrel MCA in order to determine their true cleaned mass. Next, the fittings were dipped into stock solutions of five commonly encountered contaminants and were weighed again showing typical contaminant deposition levels of approximately 0.00300g per part. They were then cleaned by the solvent or process being tested and then weighed a third time which allowed for the calculation of the cleaning efficiency of the test solvent or process.Based on preliminary experiments, five solvents (ethanol, isopropanol, acetone, ethyl acetate, and tert-butyl acetate) were down selected for further testing. When coupled with ultrasonic agitation, these solvents removed hydrocarbon contaminants as well as Vertrel MCA and showed improved removal of perfluorinated greases. Supercritical carbon dioxide did an excellent job dissolving each of the five contaminants but did a poor job of removing Teflon particles found in the perfluorinated greases. Plasma cleaning efficiency was found to be dependent on which supply gas was used, exposure time, and gas pressure. Under optimized conditions it was found that breathing air, energized to the plasma phase, was able to remove nearly 100% of the contamination.These findings indicate that alternative cleaning methods are indeed able to achieve precision levels of cleanliness. Currently, our team is working with a commercial cleaning company to get independent verification of our results. We are also evaluating the technical and financial aspects of scaling these processes to a size capable of supporting the future cleaning needs of KSC.

Vertrel MCA↗
NASA NTRS2009

Gas-Liquid Supersonic Cleaning and Cleaning Verification Spray System

NASA Kennedy Space Center (KSC) recently entered into a nonexclusive license agreement with Applied Cryogenic Solutions (ACS), Inc. (Galveston, TX) to commercialize its Gas-Liquid Supersonic Cleaning and Cleaning Verification Spray System technology. This technology, developed by KSC, is a critical component of processes being developed and commercialized by ACS to replace current mechanical and chemical cleaning and descaling methods used by numerous industries. Pilot trials on heat exchanger tubing components have shown that the ACS technology provides for: Superior cleaning in a much shorter period of time. Lower energy and labor requirements for cleaning and de-scaling uper.ninih. Significant reductions in waste volumes by not using water, acidic or basic solutions, organic solvents, or nonvolatile solid abrasives as components in the cleaning process. Improved energy efficiency in post-cleaning heat exchanger operations. The ACS process consists of a spray head containing supersonic converging/diverging nozzles, a source of liquid gas; a novel, proprietary pumping system that permits pumping liquid nitrogen, liquid air, or supercritical carbon dioxide to pressures in the range of 20,000 to 60,000 psi; and various hoses, fittings, valves, and gauges. The size and number of nozzles can be varied so the system can be built in configurations ranging from small hand-held spray heads to large multinozzle cleaners. The system also can be used to verify if a part has been adequately cleaned.

Parrish, Lewis M.↗
NASA NTRS2017

One Step Plasma Passivation and Precision Cleaning

Over the past several years, Kennedy Space Center (KSC) researchers developed two solvent-free techniques for precision cleaning of ground support equipment (GSE) that possess low commodity requirements and produce small or no waste streams. During testing of low-pressure air plasma as one of these cleaning techniques, physical changes in the surface of stainless steel test pieces were observed; cursory testing revealed that the test part had developed a thick oxide layer on the surface compared to untreated parts. This result indicated that the plasma process might not only serve as a green technology for precision cleaning of parts, but it may also passivate the surface at the same time. Current methodology in use at KSC’s Components Refurbishment & Chemical Analysis (CRCA) Facility for passivation of corrosion-resistant steels for aerospace applications follows an SAE International Standard, AMS2700, where parts are submerged in either a nitric acid or nitric acid/sodium dichromate bath at predetermined temperatures and contact times. These baths require constant testing to ensure effective treatment, use corrosive and carcinogenic chemicals, and produce hazardous waste. The passivation bath is one of the multiple steps employed at the facility, while cleaning with multiple environmentally-unfriendly solvents comprise several more steps before parts are recertified to a specific cleanliness level in their clean room. Based on the behavior of the stainless steel surface during cleaning optimization studies, it was believed that the plasma technology could be extended to passivation, combining what is currently many steps into a single, solvent- and waste-free system.

Paul Hintze↗
NASA NTRS2013

Examples of Optical Assessment of Surface Cleanliness of Genesis Samples

Optical microscope assessment of Genesis solar wind collector surfaces is a coordinated part of the effort to obtain an assessed clean subset of flown wafer material for the scientific community. Microscopic survey is typically done at 50X magnification at selected approximately 1 square millimeter areas on the fragment surface. This survey is performed each time a principle investigator (PI) returns a sample to JSC for documentation as part of the established cleaning plan. The cleaning plan encompasses sample handling and analysis by Genesis science team members, and optical survey is done at each step in the process. Sample surface cleaning is performed at JSC (ultrapure water [1] and UV ozone cleaning [2]) and experimentally by other science team members (acid etch [3], acetate replica peels [4], CO2 snow [5], etc.). The documentation of each cleaning method can potentially be assessed with optical observation utilizing Image Pro Plus software [6]. Differences in particle counts can be studied and discussed within analysis groups. Approximately 25 samples have been identified as part of the cleaning matrix effort to date.

Rodriquez, Melissa C.↗