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At least 307 records · Page 17

Reduced Cu(InGa)Se 2 Thickness in Solar Cells Using a Superstrate Configuration

This project by the Institute of Energy Conversion (IEC) and the Department of Electrical and Computer Engineering at the University of Delaware sought to develop the technology and underlying science to enable reduced cost of Cu(InGa)Se 2 manufacturing by reducing the thickness of the Cu(InGa)Se 2 absorber layer by half compared to typical production. The approach to achieve this was to use the superstrate cell configuration in which light is incident on the cell through the glass. This structure facilitates optical enhancement approaches needed to achieve high efficiency with Cu(InGa)Se 2 thicknesses less than 1 µm. The primary objective was to demonstrate a Cu(InGa)Se 2 cell with absorber thickness 0.5 - 0.7 µm and 17% efficiency, along with a quantitative loss analysis to define a pathway to 20% efficiency. Additional objectives were the development of stable TCO and buffer layers or contact layers to withstand the Cu(InGa)Se 2 deposition temperature and of advanced optical enhancement methods. The underlying fundamental science needed to effectively transition these outcomes to large scale was addressed by extensive materials and device characterization and by development of comprehensive optical models. Two different superstrate configurations have been investigated. A frontwall cell is illuminated through the glass to the primary front junction of the device. This configuration has been used for previous efforts on superstrate Cu(InGa)Se 2 but performance has been limited by interdiffusion or reaction with CdS or other buffer layers. In this project, several approaches to overcome these limitations were explored using CdS, ZnO and ZnSe buffer layers. In each case, mechanisms that limit device performance were identified using detailed characterization of the materials and junctions. Due to the junction formation difficulties, efforts were concentrated on a new backwall configuration in which light is incident through the substrate into the back of the absorber layer. The primary junction is then formed after Cu(InGa)Se 2 deposition. This allows the potential benefits of superstrate cells for optical enhancement while maintaining processing advantages of the substrate configuration and avoiding the harmful effects of high temperature deposition on p-n junction formation. Backwall devices have outperformed substrate cells at absorber thicknesses of 0.1-0.5 µm through enhanced JSC due to easy incorporation of a Ag reflector and, with light incident on the absorber, the elimination of parasitic absorption in the CdS buffer. An efficiency of 9.7% has been achieved for a backwall Cu(InGa)Se 2 device with absorber thickness ~0.4 μm. A critical achievement that enabled implementation of the backwall cell was the development of a transparent back contact using MoO 3 or WO 3 . Processes for controlled deposition of each material by reactive rf sputtering from metal targets were developed. These contacts have wide bandgaps making them well-suited for application as contacts for backwall devices as well as potential use in bifacial cells and as the top cell of tandem CuInSe 2 -based devices. Optical enhancement will be critical for further improvements. Wet chemical texturing of ZnO films has been developed for a simple, low cost light-trapping scheme for backwall superstrate devices to enhance long wavelength quantum efficiency. An aqueous oxalic acid etch was developed and found to strongly texture sputtered ZnO with high haze ≈ 0.9 observed across the whole spectrum. And finally, advanced optical models have been developed to assist the characterization and optimization of Cu(InGa)Se 2 cells with thin absorbers

14 SOLAR ENERGY↗

Quantitative Modeling of High-Energy Electron Scattering in Thick Samples Using Monte Carlo Techniques

Cryo-electron microscopy (cryo-EM) is a powerful tool for imaging biological samples but is typically limited by sample thickness, which is restricted to a few hundred nanometers depending on the electron energy. However, there is a growing need for imaging techniques capable of studying biological samples up to 10 µm in thickness while maintaining nanoscale resolution. This need motivates the use of mega-electron-volt scanning transmission electron microscopy (MeV-STEM), which leverages the high penetration power of MeV electrons to generate high-resolution images of thicker samples. In this study, we employ Monte Carlo simulations to model electron–sample interactions and explore the signal decay of imaging electrons through thick specimens. By incorporating material properties, interaction cross-sections for energy loss, and experimental parameters, we investigate the relationship between the incident and transmitted beam intensities. Key factors such as detector collection angle, convergence semi-angle, and the material properties of samples were analyzed. Our results demonstrate that the relationship between incident and transmitted beam intensities follows the Beer–Lambert law over thicknesses ranging from a few microns to several tens of microns, depending on material composition, electron energy, and collection angles. The linear depth of silicon dioxide reaches 3.9 µm at 3 MeV, about 6 times higher than that at 300 keV. Meanwhile, the linear depth of amorphous ice reaches 17.9 µm at 3 MeV, approximately 11.5 times higher than that at 300 keV. These findings are crucial for advancing the study of thick biological and semiconductor samples using MeV-STEM.

36 MATERIALS SCIENCE↗

FEM Modeling of In-Plane Stress Distribution in Thick Brittle Coatings/Films on Ductile Substrates Subjected to Tensile Stress to Determine Interfacial Strength

The ceramic-metal interface is present in various material structures and devices that are vulnerable to failures, like cracking, which are typically due to their incompatible properties, e.g., thermal expansion mismatch. In failure of these multilayer systems, interfacial shear strength is a good measure of the robustness of interfaces, especially for planar films. There is a widely-used shear lag model and method by Agrawal and Raj to analyse and measure the interfacial shear strength of thin brittle film on ductile substrates. The use of this classical model for a type of polymer derived ceramic coatings (thickness ~18 μm) on steel substrate leads to high values of interfacial shear strength. Here, we present finite element simulations for such a coating system when it is subjected to in-plane tension. Results show that the in-plane stresses in the coating are non-uniform, i.e., varying across the thickness of the film. Therefore, they do not meet one of the basic assumptions of the classical model: uniform in-plane stress. Furthermore, effects of three significant parameters, film thickness, crack spacing, and Young’s modulus, on the in-plane stress distribution have also been investigated. ‘Thickness-averaged In-plane Stress’ (TIS), a new failure criterion, is proposed for estimating the interfacial shear strength, which leads to a more realistic estimation of the tensile strength and interfacial shear strength of thick brittle films/coatings on ductile substrates.

36 MATERIALS SCIENCE↗

Some effects of blade trailing-edge thickness on performance of a single-stage axial-flow compressor

A set of modified NACA 65-series blower blades designed for axial inlet velocity, high inlet Mach number, and high blade loading was investigated for trailing-edge thickness of 0.015, 0.030, and 0.045 inch to determine the effect of trailing-edge thickness on single-stage axial-flow-compressor performance. Trailing-edge thickness effects were small except at the highest tip speed investigated (915 ft/sec). Trailing-edge thickness up to 30 percent of maximum blade thickness were used without sacrifice of performance of NACA 65-series blades.

AIRFOILS - THICKNESS↗

Analyzing the Impact of CryoSat-2 Ice Thickness Initialization on Seasonal Arctic Sea Ice Prediction

Twin 5-month seasonal forecast experiments are performed to predict the September 2018 minimum ice extent using the fully coupled Navy Earth System Prediction Capability (ESPC). In the control run, ensemble forecasts are initialized from the operational US Navy Global Ocean Forecasting System (GOFS) 3.1 for the ocean and sea ice but do not assimilate ice thickness data. Another set of forecasts are initialized from the same GOFS 3.1 fields but with sea ice thickness derived from CryoSat-2 (CS2). The Navy ESPC ensemble mean September 2018 minimum sea ice extent initialized with GOFS 3.1 ice thickness was over-predicted by 0.68 M sq.km (5.27 M sq.km) versus the ensemble set of forecasts initialized with CS2 ice thickness that had an error of 0.40 M sq.km (4.99 M sq.km), a 56% reduction in error. The September mean Integrated Ice Edge Error (IIEE) shows a 19% improvement for the entire Arctic with the CS2 data versus the control run. Comparison against Upward Looking Sonar (ULS) ice thickness in the Beaufort Sea reveals a lower bias and RMSE with the CS2 forecasts at all three moorings. Ice concentration at these locations is also improved, but neither set of experiments show ice free conditions as observed at moorings A and D.

time-lagged ensembles↗

Effects of wall thickness on the flow instability of supercritical pressure water in a tube - 18568

The subcritical steam generators in the current high-temperature-reactor pebble-bed module, HTR-PM, in China can be replaced by supercritical steam generators to better coordinate the reactors and the supercritical steam turbines to improve thermal efficiencies with no phase change at supercritical pressures. This study numerically studied the heat transfer and flow instability of supercritical pressure water in a vertical tube with zero- and finite-thickness walls. The effect of the wall thickness on the heat transfer of supercritical pressure water at steady state was negligible. In the transient calculations, the fluid flow rate oscillated intensely beyond a certain heat flux with zero-thickness wall, while the flows in the tube with the finite-thickness walls acted totally different. The wall properties including the density and specific heat were varied to analyze why the oscillations were suppressed when the finite-thickness wall was considered in the calculation. (authors)

21 SPECIFIC NUCLEAR REACTORS AND ASSOCIATED PLANTS↗

3D Quantum Anomalous Hall Effect in Magnetic Topological Insulator Trilayers of Hundred‐Nanometer Thickness

Magnetic topological states refer to a class of exotic phases in magnetic materials with the non-trivial topological property determined by magnetic spin configurations. An example of such states is the quantum anomalous Hall (QAH) state, which is a zero magnetic field manifestation of the quantum Hall effect. Current research in this direction focuses on QAH insulators with a thickness of less than 10 nm. Here, molecular beam epitaxy (MBE) is employed to synthesize magnetic TI trilayers with a thickness of up to ≈106 nm. It is found that these samples exhibit well-quantized Hall resistance and vanishing longitudinal resistance at zero magnetic field. By varying the magnetic dopants, gate voltages, temperature, and external magnetic fields, the properties of these thick QAH insulators are examined and the robustness of the 3D QAH effect is demonstrated. The realization of the well-quantized 3D QAH effect indicates that the nonchiral side surface states of the thick magnetic TI trilayers are gapped and thus do not affect the QAH quantization. The 3D QAH insulators of hundred-nanometer thickness provide a promising platform for the exploration of fundamental physics, including axion physics and image magnetic monopole, and the advancement of electronic and spintronic devices to circumvent Moore's law.

36 MATERIALS SCIENCE↗

Rational Regulation of Layer‐by‐Layer Processed Active Layer via Trimer‐Induced Pre‐Swelling Strategy for Efficient and Robust Thick‐Film Organic Solar Cells

Thick-film (>300 nm) organic solar cells (OSCs) have garnered intensifying attention due to their compatibility with commercial roll-to-roll printing technology for the large-scale continuous fabrication process. However, due to the uncontrollable donor/acceptor (D/A) arrangement in thick-film condition, the restricted exciton splitting and severe carrier traps significantly impede the photovoltaic performance and operability. For this work, combined with layer-by-layer deposition technology, a twisted 3D star-shaped trimer (BTT-Out) is synthesized to develop a trimer-induced pre-swelling (TIP) strategy, where the BTT-Out is incorporated into the buried D18 donor layer to enable the fabrication of thick-film OSCs. The integrated approach characterizations reveal that the exceptional configuration and spontaneous self-organization behavior of BTT-Out trimer could pre-swell the D18 network to facilitate the acceptor's infiltration and accelerate the formation of D/A interfaces. This enhancement triggers the elevated polarons formation with amplified hole-transfer kinetics, which is essential for the augmented exciton splitting efficiency. Furthermore, the regulated swelling process can initiate the favorable self-assembly of L8-BO acceptors, which would ameliorate carrier transport channels and mitigate carrier traps. As a result, the TIP-modified thin-film OSC devices achieve the champion performance of 20.3% (thin-film) and 18.8% (thick-film) with upgraded stability, among one of the highest performances reported of thick-film OSCs.

36 MATERIALS SCIENCE↗

Interfacial Thermal Conductance between Mechanically Exfoliated Black Phosphorus and SiO x : Effect of Thickness and Temperature

Black phosphorus (BP) is one of new 2D materials that have attracted wide attention. This work reports the interfacial thermal conductance between BP flake and SiO x using Raman spectroscopy. From 293 K down to the 223 K, eight BP flakes in a thickness range of 16.6–113.7 nm are characterized. At 293 K, the largest interfacial thermal conductance is 1.14 × 10 8 W m −2 K −1 for a 82.1 nm thick BP flake, and the smallest one is 2.17 × 10 7 W m −2 K −1 for a 26.6 nm thick BP flake. Such large interfacial thermal conductance can be attributed to the excellent interface contact and strong phonon coupling between BP and SiO x . Furthermore, the measured interfacial thermal conductance has a one‐fold up to around four‐fold increase with decreased temperature from 293 to 223 K, which is a result of thermal‐expansion‐mismatch induced variation in the morphology of BP flakes. Additionally, it demonstrates no thickness‐dependent behavior. It is speculated the intrinsic thickness dependence is weak and is overshadowed by the large variation in the interface contact of different samples. As a new 2D material, BP shows great potential to be a thermal interface material for heat dissipation in electronics.

36 MATERIALS SCIENCE↗

Shear-band thickness and shear-band cavities in a Zr-based metallic glass

Strain localization into shear bands in metallic glasses is typically described as a mechanism that occurs at the nano-scale, leaving behind a shear defect with a thickness of 10–20 nm. Here we sample the structure of a single system-spanning shear band that has carried all plastic flow with high-angle annular dark field scanning transmission electron microscopy (HAADF-STEM) and high-energy x-ray tomography (XRT). It is found that the shear-band thickness and the density change relative to the matrix sensitively depend on position along the shear band. A wide distribution of shear-band thickness (10 nm–210 nm) and density change (–1% to –12%) is revealed. There is no obvious correlation between shear-band thickness and density change, but larger thicknesses correspond typically to higher density changes. More than 100 micron-size shear-band cavities were identified on the shear-band plane, and their three-dimensional arrangement suggests a strongly fluctuating local curvature of the shear plane. As a result, these findings urge for a more complex view of a shear band than a simple nano-scale planar defect.

36 MATERIALS SCIENCE↗

Enhanced through-thickness electrical conductivity and lightning strike damage response of interleaved vertically aligned short carbon fiber composites

Through-thickness electrical conductivity of carbon fiber reinforced polymers (CFRPs) is a key characteristic that determines the severity of lighting strike-induced damage. Carbon Fibers (CFs) are inherently electrically conductive and therefore provide high conductivity in the direction of the fiber orientation. However, electrical conductivities through the thickness and orthogonal to the CF orientation in CFRPs are governed by the insulating polymer matrix present between CFs. Here, in this work, through the thickness alignment of short CFs in between layers of CFRP laminates is demonstrated to improve the through-thickness electrical conductivity. Composites with interleaved vertically aligned short CF fibers (<150 μm) will be referred as V-fiber composites hereafter. The effect of the V-fiber on the lightning strike damage is evaluated against an artificial lightning strike of 100 kA (modified waveform A of SAE ARP-5412B standard). The improved through-thickness electrical conductivity of CFRP laminates (1.15 S/cm) through vertical alignment of short CFs was compared to reference CFRP laminates (0.13 S/cm) and was found to dissipate the artificial lightning strike current more efficiently. The surface damage after the artificial lightning strike in the V-fiber composites was reduced to 12.69 cm 2 compared to the reference CFRP surface damage of 57.67 cm 2 , a 78% reduction. It was also demonstrated that Joule heat generated due to lightning strike on the composites was significantly less than the reference sample using infrared (IR) thermography. A high retention (up to 78%) of flexural properties (modulus and strength) was observed in V-fiber composites post lightning strike impact as compared to only 47% retention in the reference panel.

42 ENGINEERING↗

Pulsed laminar falling films in vertical tubes: Maintaining a continuous liquid film with reduced film thickness

Falling-liquid-film heat transfer is important to a wide variety of industrial applications, including two-phase thermosyphons, falling-film evaporators in the food industry, heat exchangers in fuel-ethanol processing, and the chemical service industry. Particularly for laminar falling films, the heat transfer increases as the film thickness decreases, hence it is desirable to keep the films as thin as possible. This article presents a periodically-pulsed flow concept to reduce the average mass flow inside a vertical tube. The technique provides thinner films than can be achieved with continuous flow. A drainage model is adopted to predict the film thickness as a function of flow rate and location along the tube. The concept is confirmed experimentally by measuring the film thickness in real time in a circular tube using a laser-based absorption technique. A new heat-transfer-based film continuity measurement is also integrated into the optical film measurement setup. Water at ambient temperature and pressure is used for this work. Film thickness reductions of up to 60%, and liquid-film volume-flow reductions of up to 80% compared to the minimum continuous-flow film have been obtained. The time-varying film thickness profile can also be controlled to a limited extent, which may be of interest for process industries.

42 ENGINEERING↗

Thickness and UV irradiation effects on the gas sensing properties of Te thin films

Highlights: • Tellurium thin films were prepared by thermal evaporation technique. • Tellurium thin films showed excellent gas-sensing properties to H{sub 2}S at room temperature. • Tellurium showed a remarkably enhanced response to H{sub 2}S gas under UV irradiation. • The reason of the enhanced response by UV irradiation was discussed. - Abstract: In this research, tellurium thin films were investigated for use as hydrogen sulfide gas sensors. To this end, a tellurium thin film has been deposited on Al{sub 2}O{sub 3} substrates by thermal evaporation, and the influence of thickness on the sensitivity of the tellurium thin film for measuring H{sub 2}S gas is studied. XRD patterns indicate that as the thickness increases, the crystallization improves. Observing the images obtained by SEM, it is seen that the grain size increases as the thickness increases. Studying the effect of thickness on H{sub 2}S gas measurement, it became obvious that as the thickness increases, the sensitivity decreases and the response and recovery times increase. To improve the response and recovery times of the tellurium thin film for measuring H{sub 2}S gas, the influence of UV radiation while measuring H{sub 2}S gas was also investigated. The results indicate that the response and recovery times strongly decrease using UV radiation.

36 MATERIALS SCIENCE↗

Effects of channel thickness on structure and transport properties of AlGaN/InGaN heterostructures grown by pulsed metal organic chemical vapor deposition

Highlights: • High quality AlGaN/InGaN heterostructures are grown and the effects of InGaN channel thickness on the structural and transport properties are investigated in detailed. • A high electron mobility of 1712 cm{sup 2}/Vis achieved for the heterostructures with an optimum channel thickness of 21 nm, indicating the huge potential of InGaN channel heterostructures in high frequency and high power applications. • The analyze method in this work can be generalized to both the studies of InGaN channel heterostructures with arbitrary component and all the heterostructures with inserted channel. - Abstract: High-quality AlGaN/InGaN heterostructures are grown and the effects of InGaN channel thickness on the structure and transport properties are investigated. With the increase of InGaN channel thickness from 7 nm to 28 nm, the two-dimensional electron gas density decreases continuously, while the mobility shows a trend of increasing at first, and then decreasing. The optimum thickness of 21 nm is obtained for the In{sub 0.05}Ga{sub 0.95}N channel, achieving a high electron mobility of 1712 cm{sup 2}/V, which indicates the huge potential for InGaN channel heterostructures in high-frequency and high-power applications. The variation in transport properties is studied by analyzing the structure formation, material quality, and interface characteristic in detail. The results are not only beneficial for the further study of the InGaN channel heterostructures, but also instructive for the other inserted channel system.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

Impact of ferromagnetic electrode length and thickness on Magnetic Tunnel Junction-Based Molecular Spintronic Devices (MTJMSD)

A knowledge gap exists about the impact of variation in length and thickness of ferromagnetic(FM) electrodes on molecular spintronics devices’ ability to manifest molecular coupling impact. Magnetic Tunnel Junction-Based Molecular Spintronic Devices (MTJMSDs) are potential candidates for inventing highly correlated materials and devices and investigating the fundamental science of organic spintronics. This paper reports our experi- mental observations providing the dramatic impact of variation in ferromagnetic electrode length and thickness on paramagnetic molecule-based MTJMSD. Room temperature transport studies were performed to investigate the effect of FM electrode thickness. On the other hand, magnetic force microscopy measurements were con- ducted to understand the effect of FM electrode length extending beyond the molecular junction area, i.e., the site where paramagnetic molecules bridged between two FM. In the strong molecular coupling regime, transport study suggested thickness variation caused ~1000 to million-fold differences in junction conductivity. MFM study revealed near-zero magnetic contrast for pillar-shaped MTJMSD without any extended FM electrode. However, MFM images showed a multitude of microscopic magnetic phases on cross junction shaped MTJMSD where FM electrodes extended beyond the junction area. To understand the intriguing experimental results, we conducted an in-depth theoretical study using Monte Carlo Simulation (MCS) approach. MCS study utilized a Heisenberg atomic model of cross junction shaped MTJMSD to gain insights about room temperature transport and MFM experimental observations of microscopic MTJMSD. To make this study applicable for a wide variety of MTJMSDs, we systematically studied the effect of variation in molecular coupling strength between magnetic molecules and ferromagnetic (FM) electrodes of various dimensions. Here, our theoretical results suggest 25 atoms thick FM electrode show very weak molecular coupling impact and of the same order of experimentally studied FM electrode dimensions showing weak effect. Also, MCS results agree with experimentally observed multiple magnetic phases on lengthy FM electrodes of an MTJMSD.

42 ENGINEERING↗

Scanning angle Raman spectroscopy: A nondestructive method for simultaneously determining mixed polymer fractional composition and film thickness

A scanning angle (SA) Raman spectroscopy method was developed to simultaneously measure the chemical composition and thickness of waveguide mixed polymer films with varying fractional compositions. In order to test the method, six films of polystyrene-block-poly(methyl methacrylate), some mixed with poly(methyl methacrylate) homopolymer (PS-b-PMMA:PMMA), and two films of poly(2-vinylnapthalene)-block-poly(methyl methacrylate) (P2VN-b-PMMA) were prepared. The film thickness ranged from 495 to 971 nm. The chemical composition and thickness of PS-b-PMMA:PMMA films was varied by the addition of the PMMA homopolymer and annealing the films in toluene. SA Raman peak amplitude ratios (1001 cm -1 for PS, 812 cm -1 for PMMA, and 1388 cm -1 for P2VN) were used to calculate the refractive index of the polymer film, an input parameter in calculations of the sum square electric field (SSEF). The film thickness was determined by SSEF models of the experimental Raman amplitudes versus the incident angle of light. The average film thickness determined by the developed SA Raman spectroscopy method was within 5% of the value determined by optical profilometry. In conclusion, SA Raman spectroscopy will be useful for in situ label-free analyses of mixed polymer waveguide films.

36 MATERIALS SCIENCE↗

Effect of silicon oxide thickness on polysilicon based passivated contacts for high-efficiency crystalline silicon solar cells

In this paper, we have investigated the effect of SiO x thickness (1-3 nm) on the performance of polycrystalline (poly) Si/SiO x /monocrystalline Si ( c -Si) passivated contacts. Our results show that for both n- and p-type contacts, there is an optimum SiO x thickness of 1.4-1.6 nm for obtaining the highest implied open-circuit voltage ( i-V oc ) values of ~739 and ~700 mV, respectively. For contacts with SiO x thicker than 1.6 nm, the i-V oc drops due to reduced field-effect passivation. We attribute this to the fact that a thicker SiO x layer hinders the diffusion of both n- and p-type dopants into the c-Si wafer resulting in a junction that is very close to the c -Si/SiO x interface, which increases carrier recombination most likely due to the presence of defects at this interface. The resistivity measured through the metal/poly-Si/SiO x / c -Si stack is independent of SiO x thickness up to 1.6 nm, and increases exponentially by several orders of magnitude with further increase in SiO x thickness due to inefficient tunneling transport. Finally, the extent of metallization-induced degradation of the poly-Si/SiO x / c -Si contacts is worst for the thinnest SiO x investigated (~1 nm), and interestingly it is not completely mitigated even for a ~3 nm thick SiO x .

14 SOLAR ENERGY↗

Measurement of Poly-Si Film Thickness on Textured Surfaces by X-Ray Diffraction in Poly-Si/SiOx Passivating Contacts for Monocrystalline Si Solar Cells

Polycrystalline Silicon on tunneling silicon oxide (poly-Si/SiOx) passivating contacts have shown great potential for the next-generation monocrystalline Si (c-Si) industrial photovoltaic technology. However, these cells typically suffer from strong parasitic absorption in the thick front poly-Si layer, which is designed to reduce metal-induced recombination. In previous work, we demonstrated an improved short-circuit current density, Jsc, by thinning the front poly-Si film in an SF6 plasma using the front metal grids as a self-aligned mask, but the sub - 100 nm thick poly-Si film is difficult to measure on an alkaline textured surface. Conventional optical techniques such as spectroscopic ellipsometry cannot be used due to the high scattering nature of the random pyramids. At poly-Si thicknesses below 50 nm, secondary electron microscopy (SEM) has difficulty distinguishing the poly-Si from the underlying c-Si substrate. Here, we demonstrate X-ray diffraction as an effective method to quantitatively measure the front poly-Si thickness. The thickness calculated from the diffraction peak height of the Si(111) crystallographic plane agrees well with the cross-section SEM analysis and simulations using SunSolve. We show that by thinning the front poly-Si from 200 to 60 nm, Jsc increased by 2.4 mA/cm2, while maintaining the same Voc. This led to an absolute efficiency gain of 1.73%. In addition, we also discuss possible reasons for the premature loss of passivation before the removal of all poly-Si, which prevented an even higher gain in Jsc.

light/electron beam induced current↗