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All sourcesNASA NTRSDOE OSTI
NASA NTRS2008

Nanotip Carpets as Antireflection Surfaces

Carpet-like random arrays of metal-coated silicon nanotips have been shown to be effective as antireflection surfaces. Now undergoing development for incorporation into Sun sensors that would provide guidance for robotic exploratory vehicles on Mars, nanotip carpets of this type could also have many uses on Earth as antireflection surfaces in instruments that handle or detect ultraviolet, visible, or infrared light. In the original Sun-sensor application, what is required is an array of 50-micron-diameter apertures on what is otherwise an opaque, minimally reflective surface, as needed to implement a miniature multiple-pinhole camera. The process for fabrication of an antireflection nanotip carpet for this application (see Figure 1) includes, and goes somewhat beyond, the process described in A New Process for Fabricating Random Silicon Nanotips (NPO-40123), NASA Tech Briefs, Vol. 28, No. 1 (November 2004), page 62. In the first step, which is not part of the previously reported process, photolithography is performed to deposit etch masks to define the 50-micron apertures on a silicon substrate. In the second step, which is part of the previously reported process, the non-masked silicon area between the apertures is subjected to reactive ion etching (RIE) under a special combination of conditions that results in the growth of fluorine-based compounds in randomly distributed formations, known in the art as "polymer RIE grass," that have dimensions of the order of microns. The polymer RIE grass formations serve as microscopic etch masks during the next step, in which deep reactive ion etching (DRIE) is performed. What remains after DRIE is the carpet of nano - tips, which are high-aspect-ratio peaks, the tips of which have radii of the order of nanometers. Next, the nanotip array is evaporatively coated with Cr/Au to enhance the absorption of light (more specifically, infrared light in the Sun-sensor application). The photoresist etch masks protecting the apertures are then removed by dipping the substrate into acetone. Finally, for the Sun-sensor application, the back surface of the substrate is coated with a 57-nm-thick layer of Cr for attenuation of sunlight.

Bae, Youngsam↗
NASA NTRS2010

Algorithm That Synthesizes Other Algorithms for Hashing

An algorithm that includes a collection of several subalgorithms has been devised as a means of synthesizing still other algorithms (which could include computer code) that utilize hashing to determine whether an element (typically, a number or other datum) is a member of a set (typically, a list of numbers). Each subalgorithm synthesizes an algorithm (e.g., a block of code) that maps a static set of key hashes to a somewhat linear monotonically increasing sequence of integers. The goal in formulating this mapping is to cause the length of the sequence thus generated to be as close as practicable to the original length of the set and thus to minimize gaps between the elements. The advantage of the approach embodied in this algorithm is that it completely avoids the traditional approach of hash-key look-ups that involve either secondary hash generation and look-up or further searching of a hash table for a desired key in the event of collisions. This algorithm guarantees that it will never be necessary to perform a search or to generate a secondary key in order to determine whether an element is a member of a set. This algorithm further guarantees that any algorithm that it synthesizes can be executed in constant time. To enforce these guarantees, the subalgorithms are formulated to employ a set of techniques, each of which works very effectively covering a certain class of hash-key values. These subalgorithms are of two types, summarized as follows: Given a list of numbers, try to find one or more solutions in which, if each number is shifted to the right by a constant number of bits and then masked with a rotating mask that isolates a set of bits, a unique number is thereby generated. In a variant of the foregoing procedure, omit the masking. Try various combinations of shifting, masking, and/or offsets until the solutions are found. From the set of solutions, select the one that provides the greatest compression for the representation and is executable in the minimum amount of time. Given a list of numbers, try to find one or more solutions in which, if each number is compressed by use of the modulo function by some value, then a unique value is generated.

James, Mark↗
NASA NTRS2008

Large-Scale Structure of the Molecular Gas in Taurus Revealed by High Spatial Dynamic Range Spectral Line Mapping

Viewgraph topics include: optical image of Taurus; dust extinction in IR has provided a new tool for probing cloud morphology; observations of the gas can contribute critical information on gas temperature, gas column density and distribution, mass, and kinematics; the Taurus molecular cloud complex; average spectra in each mask region; mas 2 data; dealing with mask 1 data; behavior of mask 1 pixels; distribution of CO column densities; conversion to H2 column density; variable CO/H2 ratio with values much less than 10(exp -4) at low N indicated by UV results; histogram of N(H2) distribution; H2 column density distribution in Taurus; cumulative distribution of mass and area; lower CO fractional abundance in mask 0 and 1 regions greatly increases mass determined in the analysis; masses determined with variable X(CO) and including diffuse regions agrees well with the found from L(CO); distribution of young stars as a function of molecular column density; star formation efficiency; star formation rate and gas depletion; and enlarged images of some of the regions with numerous young stars. Additional slides examine the origin of the Taurus molecular cloud, evolution from HI gas, kinematics as a clue to its origin, and its relationship to star formation.

molecular clouds↗
NASA NTRS2011

Apparatus and method for a light direction sensor

The present invention provides a light direction sensor for determining the direction of a light source. The system includes an image sensor; a spacer attached to the image sensor, and a pattern mask attached to said spacer. The pattern mask has a slit pattern that as light passes through the slit pattern it casts a diffraction pattern onto the image sensor. The method operates by receiving a beam of light onto a patterned mask, wherein the patterned mask as a plurality of a slit segments. Then, diffusing the beam of light onto an image sensor and determining the direction of the light source.

Leviton, Douglas B.↗
NASA NTRS2005

Improved Method of Manufacturing SiC Devices

The phrase, "common-layered architecture for semiconductor silicon carbide" ("CLASSiC") denotes a method of batch fabrication of microelectromechanical and semiconductor devices from bulk silicon carbide. CLASSiC is the latest in a series of related methods developed in recent years in continuing efforts to standardize SiC-fabrication processes. CLASSiC encompasses both institutional and technological innovations that can be exploited separately or in combination to make the manufacture of SiC devices more economical. Examples of such devices are piezoresistive pressure sensors, strain gauges, vibration sensors, and turbulence-intensity sensors for use in harsh environments (e.g., high-temperature, high-pressure, corrosive atmospheres). The institutional innovation is to manufacture devices for different customers (individuals, companies, and/or other entities) simultaneously in the same batch. This innovation is based on utilization of the capability for fabrication, on the same substrate, of multiple SiC devices having different functionalities (see figure). Multiple customers can purchase shares of the area on the same substrate, each customer s share being apportioned according to the customer s production-volume requirement. This makes it possible for multiple customers to share costs in a common foundry, so that the capital equipment cost per customer in the inherently low-volume SiC-product market can be reduced significantly. One of the technological innovations is a five-mask process that is based on an established set of process design rules. The rules provide for standardization of the fabrication process, yet are flexible enough to enable multiple customers to lay out masks for their portions of the SiC substrate to provide for simultaneous batch fabrication of their various devices. In a related prior method, denoted multi-user fabrication in silicon carbide (MUSiC), the fabrication process is based largely on surface micromachining of poly SiC. However, in MUSiC one cannot exploit the superior sensing, thermomechanical, and electrical properties of single-crystal 6H-SiC or 4H-SiC. As a complement to MUSiC, the CLASSiC five-mask process can be utilized to fabricate multiple devices in bulk single-crystal SiC of any polytype. The five-mask process makes fabrication less complex because it eliminates the need for large-area deposition and removal of sacrificial material. Other innovations in CLASSiC pertain to selective etching of indium tin oxide and aluminum in connection with multilayer metallization. One major characteristic of bulk micromachined microelectromechanical devices is the presence of three-dimensional (3D) structures. Any 3D recesses that already exist at a given step in a fabrication process usually make it difficult to apply a planar coat of photoresist for metallization and other subsequent process steps. To overcome this difficulty, the CLASSiC process includes a reversal of part of the conventional flow: Metallization is performed before the recesses are etched.

Okojie, Robert S.↗
NASA NTRS2004

Fabricating Blazed Diffraction Gratings by X-Ray Lithography

Gray-scale x-ray lithography is undergoing development as a technique for fabricating blazed diffraction gratings. As such, gray-scale x-ray lithography now complements such other grating-fabrication techniques as mechanical ruling, holography, ion etching, laser ablation, laser writing, and electron-beam lithography. Each of these techniques offers advantages and disadvantages for implementing specific grating designs; no single one of these techniques can satisfy the design requirements for all applications. Gray-scale x-ray lithography is expected to be advantageous for making gratings on steeper substrates than those that can be made by electron-beam lithography. This technique is not limited to sawtooth groove profiles and flat substrates: various groove profiles can be generated on arbitrarily shaped (including highly curved) substrates with the same ease as sawtooth profiles can be generated on flat substrates. Moreover, the gratings fabricated by this technique can be made free of ghosts (spurious diffraction components attributable to small spurious periodicities in the locations of grooves). The first step in gray-scale x-ray lithography is to conformally coat a substrate with a suitable photoresist. An x-ray mask (see Figure 1) is generated, placed between the substrate and a source of collimated x-rays, and scanned over the substrate so as to create a spatial modulation in the exposure of the photoresist. Development of the exposed photoresist results in a surface corrugation that corresponds to the spatial modulation and that defines the grating surface. The grating pattern is generated by scanning an appropriately shaped x-ray area mask along the substrate. The mask example of Figure 1 would generate a blazed grating profile when scanned in the perpendicular direction at constant speed, assuming the photoresist responds linearly to incident radiation. If the resist response is nonlinear, then the mask shape can be modified to account for the nonlinearity and produce a desired groove profile. An example of grating grooves generated by this technique is shown in Figure 2. A maximum relative efficiency of 88 percent has been demonstrated.

Mouroulis, Pantazis↗
NASA NTRS2004

A New Process for Fabricating Random Silicon Nanotips

An improved process for the fabrication of random arrays of silicon nanotips has been demonstrated to be feasible. Relative to other such processes, this process offers advantages of low cost and simplicity. Moreover, this process can readily be combined with other processes used to fabricate integrated circuits and other monolithic silicon structures. Arrays of silicon nanotips are subjects of research and development efforts directed toward utilizing them as field emitters in flat-panel displays, vacuum microelectronics, and microwave devices. Other silicon-nanotip-fabrication processes developed thus far predominantly include lithography, etching, and/or elaborate deposition steps followed by oxide sharpening steps and are both process intensive as well as expensive. In addition to being cheaper and simpler, the present process can efficiently produce silicon nanotips that range in height from a few microns to several tens of microns and are distributed over large areas. The process mentioned here can be summarized as consisting of (1) the growth of micro-etch masks on a silicon substrate, followed by (2) etching away of the masks, along with some of the substrate, to make an array of sharp tips. In the first step of the process, a cleaned silicon substrate is subjected to reactive ion etching (RIE) in a certain mixture of oxygen and carbon tetrafluoride under radio-frequency excitation. This process step results in the growth of fluorine based compounds in the form of stumps randomly distributed on the substrate. These stumps are known in the art as polymer RIE grass. The dimensions of these stumps are of the order of hundreds of nanometers, the exact values depending on process time and gas composition. The areal density of the stumps decreases with increasing process time as they grow and merge with neighboring stumps. These stumps constitute the micro-etch masks for the next step of the process. In the second step of the process, the substrate covered with the microetch masks is subjected to deep reactive ion etching (DRIE) process, which consists of cycles of reactive ion etching alternating with passivation (the Bosch process). The gas used in the etching substeps is sulfur hexafluoride (SF6); the gas used in the passivation substeps is octafluorocyclobutane (C4F8). The portions of the substrate directly under the RIE grass stubs are etched more slowly than are the portions between the stubs. Hence, what remains at the end of the process, after the stubs and parts of the substrate have been etched away, are silicon spikes where the stubs were (see figure). In a variation of the process, one starts with a silicon or silicon-on-insulator substrate with the intent to etch through the full thickness of the substrate. That is to say, one chooses the thickness so that the DRIE step releases individual nanotips. Such individual silicon nanotips may have utility as microscopic probes in biomedical applications.

Manohara, Harish↗
NASA NTRS2021

A Dark Target research aerosol algorithm for MODIS observations over eastern China: increasing coverage while maintaining accuracy at high aerosol loading

Satellite aerosol products such as the Dark Target (DT) produced from the MODerate resolution Imaging Spectroradiometer (MODIS) are useful for monitoring the progress of air pollution. Unfortunately, the DT often fails to retrieve during the heaviest aerosol events as well as the more moderate events in winter. Some of the literature at-tributes this lack of retrieval to the cloud mask. However, we found this lack of retrieval is mainly traced to thresholds used for masking of inland water and snow. Modifications to these two masks greatly increase 50 % of the retrievals of aerosol optical depth at 0.55 μm (AOD) greater than 1.0. The “extra”-high-AOD retrievals tend to be biased when com-pared with a ground-based sun photometer (AErosol RObotic NETwork, AERONET). Reducing bias in new retrievals re-quires two additional steps. One is an update to the assumed aerosol optical properties (aerosol model); the haze in this region is both less absorbing and lower in altitude than what is assumed in the global algorithm. The second is account-ing for the scale height of the aerosol, specifically that the heavy-aerosol events in the region are much closer to the surface than what is assumed by the global DT algorithm. The resulting combination of modified masking thresholds, new aerosol model, and lower aerosol layer scale height was applied to 3 months of MODIS observations (January–March2013) over eastern China. After these two additional steps are implemented, the significant increase in new retrievals introduces no overall bias at a high-AOD regime but does degrade other overall validation statistics. We also find that the research algorithm is able to identify additional pollution events that AERONET instruments may not due to different spatial sampling. Mean AOD retrieved from the re-search algorithm increases from 0.11 to 0.18 compared to values calculated from the operational DT algorithm during January to March of 2013 over the study area. But near Beijing, where the severe pollution occurs, the new algorithm increases AOD by as much as 3.0 for each 0.5°grid box over the previous operational-algorithm values.

Dark Target↗
NASA NTRSDate not supplied

Investigating the Effects of Exposure to Blue-Enriched Light or Peppermint Odor on Alertness, Mood, and Performance Upon Awakening from Deep Sleep at Night

Introduction: Sleep inertia refers the transient neurobehavioral impairments experienced immediately after waking from sleep. This period of reduced alertness and performance poses a significant safety risk to on-call workers who may be required to perform a safety-critical task immediately after waking (e.g., emergency services, health care, and military). In these operations, the need for a rapid return to full alertness is critical to mission safety and success. Several factors may exacerbate sleep inertia, resulting in greater impairment upon waking, including: waking from deep sleep, (i.e., slow wave sleep, SWS), waking at night, and waking following prior sleep loss. Awakenings under these conditions are common for on-call and extended shift workers who may need to perform safety-critical tasks soon after waking from unprotected sleep opportunities. Therefore, there is a need for evidence-based reactive countermeasures (i.e., used upon waking) to the cognitive consequences sleep inertia. Specifically, countermeasures that can rapidly restore alertness and performance immediately following sleep. A recent review of the literature on reactive countermeasures highlighted several research gaps and promising candidates for further investigation. The review also emphasized the need for countermeasures that are operationally viable and readily deployed in occupational settings. This study aims to address the identified gaps and limitations by assessing the efficacy of exposure to two known acute alerting stimuli - blue-enriched light and peppermint odor - to improve cognitive performance, alertness, and mood immediately after waking from SWS at night. Materials and Methods: Twelve participants completed a two-week within-subject, randomized, cross-over intervention study including two in-laboratory overnight visits. During each experimental week, the subjects experienced one intervention (light or peppermint) and a control condition upon awakening from SWS at night. The presentation order of the two conditions (intervention or control) at wake-up and the order of intervention (light or peppermint) by week was randomized by sex. Prior to each in-laboratory visit, participants maintained a sleep schedule of 8.5 h for 5 nights and 5 h for one night. Compliance with this sleep schedule was confirmed by actigraphy. In the laboratory, participants went to bed at their habitual bedtime and were monitored by standard polysomnography. After at least five minutes of continuous SWS, participants were awoken and exposed, in a randomized order, to either the control or intervention condition. During the hour after awakening from SWS (at 2, 17, 32, and 47 minutes after waking), participants completed a battery of tasks including a 5-minute psychomotor vigilance task (PVT), a subjective scale of alertness (Karolinska Sleepiness Scale, KSS), and visual analogue scales (VAS) of mood. Following this sleep inertia measurement period, all lights were turned off and participants were allowed to return to sleep. They were then awoken again from their subsequent SWS period and exposed to the alternative condition (control or intervention). Following this second awakening, participants were allowed to sleep until their habitual wake time and were then released from the laboratory. Participants then followed the at-home sleep schedule and returned to the laboratory for the second intervention (light or peppermint) following the procedures described above. The light intervention involved exposure to a blue-enriched light canvas illuminated for 1 hour at a distance of ~56 cm from the participant (~200 lux and ~60 melanopic lux at angle of gaze). For the peppermint intervention, peppermint oil was pipetted onto a mask, and participants inhaled the odor with the mask covering the nose and mouth for 1 minute. The control condition for both weeks involved a dim, red ambient light (<1 lux). An odorless mask, without any oil pipetted onto the mask, was also worn in the peppermint control condition. Results: Compared to the control condition, participants exposed to blue-enriched light had fewer PVT lapses (χ2 = 5.285, p = .022), reported feeling more alert (KSS: F1,77 = 4.955, p = .029; VASalert: F1,77 = 8.226, p = .005), and had improved mood (VAScheerful: F1,77 = 8.615, p = .004; VASdepressed: F1,77 = 4.649, p = .034; VASlethargic: F1,77 = 5.652, p = .020). Exposure to peppermint oil did not improve any outcome measures on any of the tasks compared to control condition (p > .05). Conclusions: We found that participants had fewer lapses of attention upon awakening when exposed to blue-enriched light compared to dim, red light. In addition, participants reported feeling more alert, more cheerful, less depressed, and less lethargic in the blue-enriched light condition. Brief exposure to a peppermint odor, however, did not appear to improve performance, alertness, or mood under the experimental conditions. Our null results in the peppermint condition may have been due to methodological limitations such as the duration and method of administration. Given the need to mitigate the potential impact of sleep inertia on safety-critical tasks in on-call operations, our findings suggest that blue-enriched light exposure upon awakening may help to improve performance and alertness during the sleep inertia period following awakening from deep, nocturnal sleep. We are currently exploring the potential mechanisms for the effect of light on cognitive performance upon awakening as well as investigating its application in real-world settings to explore the translational efficacy of this countermeasure to occupational environments. Continued exploration into light and other reactive countermeasures, and potentially their combination, is needed in order to provide evidence-based guidance on effective sleep inertia countermeasures to improve the alertness and performance of those required to perform safety-critical tasks soon after waking.

sleep inertia↗
NASA NTRSDate not supplied

Snow Depth from AMSR-2 Using Multispectral Satellite Data in an Artificial Neural Network

By using diffusion theory and Monte Carlo lidar radiative transfer simulations, Hu et al. (2022b) has derived snow depth from the first-, second- and third-order moments of the lidar backscattering pathlength distribution. Lu et al. (2022) calculated the snow depth by applying the methods to the satellite ICESat-2 lidar measurements over the Arctic sea ice, as well as land surfaces of Northern Hemisphere. In this paper, an artificial neural network (ANN) algorithm, employing several channels from Advanced Microwave Scanning Radiometer 2 (AMSR-2) and the humidity vertical profiles from Global Modeling and Assimilation Office (GMAO) Goddard Earth Observing System for Instrument Teams (GEOS-IT) product, is trained to determine snow depth identified by time and geolocation matched 2019 ICESat-2 snow-depth data during winter months over the Arctic sea ice. The trained ANN snow-depth was applied to 2018 AMSR-2 clear pixel data, although the algorithms perform reasonably well in thinner clouds. The validation data (different from the training set) of ANN snow depth from AMSR-2 showed a good agreement with time matched and co-located snow-depth values from ICESat-2. The bias was near zero, with mean absolute error (MAE) 0.05 cm and a root-mean-square-error (RMSE) 0.08 cm. Prior applying the trained ANN snow depth to AMSR-2 data, a cloud screening algorithm was developed with a similar approach. A separate ANN cloud mask was trained to determine an AMSR-2 pixel is clear or cloudy with time and geolocation matched 2015 CALIOP Vertical Feature Mask (VFM) over Arctic sea ice. The ANN cloud mask from AMSR-2 under-estimated cloud fraction by 3-6% compared to CALIOP . The additional research is needed to conclusively evaluate the ANN cloud mask accuracy. Finally, this paper will lay the foundation for a sustained long-term snowfall and snow-storm monitoring system. The future Cloud Aerosol LIdar for Global scale Observations of the ocean-Land Atmosphere system (CALIGOLA) mission will provide a means to calculate snow depth from the lidar backscattering pathlength distribution, benefiting from the UV, visible and infrared pulses. With the calculated snow depth as the truth one could develop a machine learning algorithm, as it was done in this paper, using a passive microwave instrument available at that time to generate a wide range of snow depth data, covering extensive spatial areas in the cross-orbit direction.

Neural Network↗
NASA NTRS2009

Lunar Pole Illumination and Communications Maps Computed from GSSR Elevation Data

A Digital Elevation Model of the lunar south pole was produced using Goldstone Solar System RADAR (GSSR) data obtained in 2006.12 This model has 40-meter horizontal resolution and about 5-meter relative vertical accuracy. This Digital Elevation Model was used to compute average solar illumination and Earth visibility with 100 kilometers of the lunar south pole. The elevation data were converted into local terrain horizon masks, then converted into lunar-centric latitude and longitude coordinates. The horizon masks were compared to latitude, longitude regions bounding the maximum Sun and Earth motions relative to the moon. Estimates of Earth visibility were computed by integrating the area of the region bounding the Earth's motion that was below the horizon mask. Solar illumination and other metrics were computed similarly. Proposed lunar south pole base sites were examined in detail, with the best site showing yearly solar power availability of 92 percent and Direct-To-Earth (DTE) communication availability of about 50 percent. Similar analysis of the lunar south pole used an older GSSR Digital Elevation Model with 600-meter horizontal resolution. The paper also explores using a heliostat to reduce the photovoltaic power system mass and complexity.

lunar base↗
NASA NTRSDate not supplied

Development of a Consistent MODIS and VIIRS Cloud Detection Approach for CERES

A consistent cloud fraction record across various satellite platforms is essential for maintaining a long-term and stable climate data record of Earth's energy budget. With the Aqua satellite nearing the end of its operational lifetime, the continuation of this record relies on utilizing VIIRS observations from NOAA20 for cloud detection in NASA’s Clouds and Earth’s Radiant Energy System (CERES) project. However, integrating data from VIIRS and MODIS instruments poses challenges due to their distinct characteristics, such as varying spatial resolutions and different spectral channels. As a result, deriving consistent cloud properties from these two sensors without introducing artificial discontinuities in the time series remains a complex and challenging task. This paper will present progress toward developing a unified MODIS and VIIRS cloud mask using common channels to produce consistent cloud properties for CERES next edition (Ed5) Earth radiation budget data products. The fundamental approach taken in the CERES cloud mask is to compare the observed radiances to the expected background clear sky radiances. Therefore, one vital step is to compute clear sky radiances with a radiative transfer model that accurately accounts for satellite-specific, spectrally dependent surface reflectance, surface emission, and atmospheric absorption. Refined radiative transfer models and updated ancillary data inputs including surface emissivity maps, IGBP, snow and ice maps are incorporated into the processing framework to improve cloud detection consistency and accuracy. Pixel level cloud mask results and monthly global cloud fraction comparisons between MODIS and VIIRS will be presented to evaluate their consistency. Remaining challenges will be discussed. It is expected that this work will contribute consistent cloud properties for CERES that adequately bridges the MODIS and VIIRS imager data records.

CERES↗
NASA NTRS1966

Optical device enables small detector to see large field of view

Optical device images the sun on a mask that transmits it or prevents its transmission to a photodetector behind the mask depending on image position on the mask. The device uses a pinhole as the image former to provide a large field of view and diffraction-limited resolution.

Arndt, J. H.↗
NASA NTRS1972

GPEDIT

GPEDIT compares each character in data record to corresponding character in mask provided by user. Mask indicates that alphabetic or numeric character is allowed or that blank or punctuation mark is anticipated. Mask can also indicate that any data character other than some invalid character is allowed.

Dash, J. B.↗
NASA NTRS1971

Sequential control chart methodology

A modification of the V mask sequential control chart is proposed. In this modified scheme, a parabolic section is included in the mask to provide better performance when the process undergoes a large change in the mean from goal conditions. It is shown that the modified V mask can be implemented either in conventional graphic form, or in an algorithmic form suitable for a digital computer. Average run lengths are given for a typical range of circumstances. It also is shown that the conventional Shewhart chart is better than a sequential chart for the specific purpose of promptly detecting very large shifts of the mean from goal conditions.

Source record↗
NASA NTRS1977

Procedures for dealing with certain types of noise and systematic errors common to many Hadamard transform optical systems

Sources of noise and error correcting procedures characteristic of Hadamard transform optical systems were investigated. Reduction of spectral noise due to noise spikes in the data, the effect of random errors, the relative performance of Fourier and Hadamard transform spectrometers operated under identical detector-noise-limited conditions, and systematic means for dealing with mask defects are among the topics discussed. The distortion in Hadamard transform optical instruments caused by moving Masks, incorrect mask alignment, missing measurements, and diffraction is analyzed and techniques for reducing or eliminating this distortion are described.

Harwit, M.↗
NASA NTRS1978

Systematic errors in Hadamard transform optics

Error sources encountered in Hadamard transform optical instruments are discussed. Such errors are caused by factors including moving masks, incorrect mask alignment, defects in mask fabrication, missing data, drifts in background level, and diffraction. Techniques for error reduction and/or elimination are described for each of the cases considered. It is noted that the errors described occur in singly encoded spectrometers and imagers.

Sloane, N. J. A.↗
NASA NTRS1979

Array Automated Assembly Task for the Low Cost Solar Array Project, Phase 2

Using silk screened evaporated and sputtered Al as the metal source, the formation of Al back surface fields was studied. The most satisfactory results were those obtained with the sputtered A1 and in which open circuit voltages (V sub oc) of 0.585 v (12 ohm cm FZ silicon) were achieved. The ultrasonic interconnect process is discussed. The process is shown to be satisfactory, but increased pull-strength may be obtained if some form of sintering is carried out on the metallized contacts. Plasma etching is shown to be feasible as a replacement for wet chemical cleaning prior to diffusion. Initial results on cells prepared by using electroless Pd/Ni plus either electroplated Ag or Cu show slightly poor performance than cells with the baseline evaporated Ti/Pd/Ag system. A mask designed for the 1.6 x 7.0 cm and 2.0 x 7.0 cm cells is described. This mask has a lower area coverage and total lower resistive loss than the previous mask design. It is also shown that the cell width should not exceed 2.0 - 3.0 cm for optimum efficiency.

Campbell, R. B.↗