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At least 307 records · Page 17
All sourcesNASA NTRSDOE OSTI
DOE OSTI2015

Hierarchical ZnO Nanowire Growth with Tunable Orientations on Versatile Substrates Using Atomic Layer Deposition Seeding

The ability to synthesize semiconductor nanowires with deterministic and tunable control of orientation and morphology on a wide range of substrates, while high precision and repeatability are maintained, is a challenge currently faced for the development of many nanoscale material systems. Here we show that atomic layer deposition (ALD) presents a reliable method of surface and interfacial modification to guide nanowire orientation on a variety of substrate materials and geometries, including high-aspect-ratio, three-dimensional templates. We demonstrate control of the orientation and geometric properties of hydrothermally grown single crystalline ZnO nanowires via the deposition of a ZnO seed layer by ALD. The crystallographic texture and roughness of the seed layer result in tunable preferred nanowire orientations and densities for identical hydrothermal growth conditions. The structural and chemical relationship between the ALD layers and nanowires was investigated with synchrotron X-ray diffraction, high-resolution transmission electron microscopy, and X-ray photoelectron spectroscopy to elucidate the underlying mechanisms of orientation and morphology control. The resulting control parameters were utilized to produce hierarchical nanostructures with tunable properties on a wide range of substrates, including vertical micropillars, paper fibers, porous polymer membranes, and biological substrates. This illustrates the power of ALD for interfacial engineering of heterogeneous material systems at the nanoscale, to provide a highly controlled and scalable seeding method for bottom-up synthesis of integrated nanosystems.

ALD↗
DOE OSTI2021

Modulating Interactions between Molten Polystyrene and Porous Solids Using Atomic Layer Deposition

Understanding and modulating the interactions between molten polymers and porous solids is important for numerous processes and phenomena including catalytic conversion of polymers and fabrication of nanocomposites and nanostructured materials. Although changing the surface composition of pores would enable modulation of interactions between polymer and nanoporous solids, it is challenging to achieve such a control without inducing significant changes to the size and structure of nanopores. In this work, we demonstrate that the interactions between molten polystyrene (PS) and disordered packings of SiO 2 nanoparticles (NPs) can be modulated by changing the surface composition of the NPs using atomic layer deposition (ALD). A disordered packing of silica NPs is modified with varying surface coverages of TiO 2 , WO 3 and CaCO 3 , with coverages estimated by the mass gain and the refractive index change of NP packings. Based on the time required to fully infiltrate these ALD-modified NP packings via capillarity, the contact angles for PS on different surfaces prepared via ALD are determined. The contact angle gradually changes from that of pure SiO 2 to that of the fully covered surfaces. The contact angles for PS on SiO 2 , TiO 2 , WO 3 and CaCO 3 are found to be 20°, 62°, 70° and 10°, respectively. Interestingly, the contact angles and interfacial energies between PS and the ALD-modified surfaces do not correlate strongly with the water contact angle of these surfaces; thus, caution must be exercised in predicting how a polymer would wet or interact with porous solids solely based on their hydrophilicity. Furthermore, the method presented in this work can be extended to study the interactions between a wide range of polymers and surfaces in porous media, which will have important implications for designing new catalytic materials for polymer upcycling reactions as well as novel NP-polymer composite films and membranes with enhanced mechanical and transport properties.

36 MATERIALS SCIENCE↗
DOE OSTI2019

Unveiling the Role of Al 2 O 3 in Preventing Surface Reconstruction During High-Voltage Cycling of Lithium-Ion Batteries

Recent achievements in high-energy batteries have been made by using Ni-rich NMC cathodes (LiNi x Mn y Co 1–x–y O 2 with x > 0.5) in conjunction with higher cell voltages. However, these gains have come at a cost of fast capacity fade and poor rate performace. In our previous study, we showed that Al 2 O 3 ALD coatings on LiNi 0.8 Mn 0.1 Co 0.1 O 2 (NMC811) and LiNi 0.8 Co 0.15 Al 0.05 O 2 (NCA) cathodes prevented surface phase transitions, reduced impedance, and extended cycle life in high voltage cells. In this work, neutron diffraction (ND), X-ray photoelectron spectroscopy (XPS), and electron energy loss spectroscopy (EELS) are used to fully investigate the mechanism by which ALD surface coatings mitigate NMC811 cathode degredation. Refinement of ND patterns indicated no changes in the bulk crystal structure of cycled cathodes with or without the Al 2 O 3 coating. Rather, the improved performance of ALD-coated cathodes is clearly due to surface stabilization. EELS established that all three transition metal oxidation states were reduced at the surface of the uncoated cathode after cycling, whereas the coated cathode showed no changes in surface oxidation states relative to the bulk. The surface coatings also prevented transition metal dissolution and crossover. XPS analysis of the anode harvested from cycled cells with uncoated cathodes showed significant amounts of Mn deposited within the SEI. In contrast, no Mn could be detected on the anodes cycled with coated cathodes. These results affirm that ALD coatings can effectively reduce the reactivity of the NMC surface and prevent detrimental side reactions that shorten battery cycle life.

25 ENERGY STORAGE↗
DOE OSTI2022

Selective Hydration of Rutile TiO 2 as a Strategy for Site-Selective Atomic Layer Deposition

In this report the feasibility of a site-selective hydration strategy that enables site-selective atomic layer deposition (ALD) is investigated among four rutile TiO 2 facets [(110), (100), (101) and (001)] and their most prevalent step edges. First-principles simulations of asymmetric slab models were utilized to create accurate representations of pristine terrace and step edge sites. The adsorption free energies for molecular and dissociative adsorption of H 2 O were calculated to evaluate this strategy as a viable route to step edge selectivity. We predict that selective hydroxylation is possible on the 110 and 001 step edges and further computationally evaluate three metalorganic ALD precursors for their compatibility with the selective hydration strategy. Experimental evidence for delayed nucleation of ALD on rutile (001), (110), and (100) TiO2 single crystals corroborates predictions of the dehydration of the surface and suggests the possibility of site-selective ALD.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗
DOE OSTI2017

Enhanced Kinetics of Electrochemical Hydrogen Uptake and Release by Palladium Powders Modified by Electrochemical Atomic Layer Deposition

One method for the formation of nanofilms of materials, is Electrochemical atomic layer deposition (E-ALD), one atomic layer at a time. It uses the galvanic exchange of a less noble metal, deposited using underpotential deposition (UPD), to produce an atomic layer of a more noble element by reduction of its ions. This process is referred to as surface limited redox replacement and can be repeated in a cycle to grow thicker deposits. Previously, we performed it on nanoparticles and planar substrates. In the present report, E-ALD is applied for coating a submicron-sized powder substrate, making use of a new flow cell design. E-ALD is used to coat a Pd powder substrate with different thicknesses of Rh by exchanging it for Cu UPD. Furthermore, cyclic voltammetry and X-ray photoelectron spectroscopy indicate an increasing Rh coverage with increasing numbers of deposition cycles performed, in a manner consistent with the atomic layer deposition (ALD) mechanism. Cyclic voltammetry also indicated increased kinetics of H sorption and desorption in and out of the Pd powder with Rh present, relative to unmodified Pd.

36 MATERIALS SCIENCE↗
DOE OSTI2021

Communication—Reduction of DC Resistance of Ni-Rich Lithium Transition Metal Oxide Cathode by Atomic Layer Deposition

A coating using Atomic layer deposition (ALD) of Al 2 O 3 was applied to Ni-rich lithium transition metal oxide cathode material. This ALD coating reduces the DC resistance (DCR) and increases the cycling performance of the Ni-rich cathode. Additionally, the reduced DCR comes from decreased solid electrolyte interphase (SEI) resistance on the anode, which is attributed to reduced transition metal deposition. This is due to the ALD coating preventing the direct contact between the cathode and the electrolyte, and therefore inhibits transition metal dissolution. This study suggests the promise of using ALD coating to reduce the DCR of Ni-rich cathode materials.

25 ENERGY STORAGE↗
DOE OSTI2020

Spatial Atomic Layer Deposition to Scale Manufacturing of Robust Catalysts for Biomass Conversion Applications: Cooperative Research and Development Final Report, CRADA Number CRD-17-715

This CRADA will facilitate technology maturation for NREL-developed ALD-coated catalyst materials that are tailored for durability during harsh biomass conversion chemistries. This project will address optimizing process parameters for scale-up of Al2O3 ALD-coated catalysts, demonstrating ALD-coated catalyst performance for muconic acid hydrogenation, and validating economic models that project significant cost benefits for ALD-enhanced catalytic processes. This work will strengthen private-public partnerships in the area of advanced catalyst manufacturing for energy-related technology. Critical information will be collected to elevate the Technology Readiness Level and increase our competitiveness for cooperative R&D agreements and licensing. Success of this work will be crosscutting as it can facilitate advanced catalyst development for both renewable and conventional processes.

09 BIOMASS FUELS↗
DOE OSTI2018

Janus Membranes via Diffusion-Controlled Atomic Layer Deposition

The first use of atomic layer deposition (ALD) to produce Janus membranes is reported, with an example system consisting of a compositional gradient ranging from hydrophilic Al 2 O 3 on one face to hydrophobic poly(propylene) on the opposite face. Alternating pulses of trimethyl aluminum and water vapor lead to the growth of covalently bonded Al 2 O 3 conforming to the membrane pore surfaces. Precise control of ALD parameters significantly affects the surface wetting of the modified membrane face and the depth of Al 2 O 3 infiltration into the porosity. This depth control derives from slow precursor diffusion through the 200 nm membrane pores compared to much faster ALD surface reactions. For a given precursor exposure and purge time, increasing the number of ALD cycles decreases the water contact angle at the modified surface from hydrophobic to hydrophilic, until the water droplet is completely imbibed by the membrane. To demonstrate the utility of these Janus membranes, a hydrophilic/superaerophobic Janus treatment is shown to greatly reduce the size of air bubbles generated through the membrane, enabling faster mixing. This technique represents the first application of vapor-deposited covalently bonded metal oxides to form Janus membranes. Further opportunities are afforded by the ability to laterally pattern Al 2 O 3 across the membrane surface via physical masking.

36 MATERIALS SCIENCE↗
DOE OSTI2015

Enhanced Dry Reforming of Methane on Ni and Ni-Pt Catalysts Synthesized by Atomic Layer Deposition

Atomic layer deposition (ALD) was used to deposit Ni and Pt on alumina supports to form monometallic and bimetallic catalysts with initial particle sizes of 1–2.4 nm. The ALD catalysts were more active (per mass of metal) than catalysts prepared by incipient wetness (IW) for dry reforming of methane (DRM), and they did not form carbon whiskers during reaction due to their sufficiently small size. Catalysts modified by Pt ALD had higher rates of reaction per mass of metal and inhibited coking, whereas NiPt catalysts synthesized by IW still formed carbon whiskers. Temperature-programmed reduction of Ni catalysts modified by Pt ALD indicated the presence of bimetallic interaction. Density functional theory calculations suggested that under reaction conditions, the NiPt surfaces form Ni-terminated surfaces that are associated with higher DRM rates (due to their C and O adsorption energies, as well as the CO formation and CH4 dissociation energies).

Environmental Molecular Sciences Laboratory↗
DOE OSTI2022

Modification of LiMn 2 O 4 surfaces by controlling the Acid–Base surface chemistry of atomic layer deposition

In this combined theoretical and experimental study, we report the effects of Al precursor selection on the growth chemistry, interfacial structure, and electrochemistry of Al 2 O 3 coatings on spinel LiMn 2 O 4 (LMO) surfaces by atomic layer deposition (ALD). Five Al precursors, exhibiting a range of Lewis acid-base properties, were used to establish trends in the ALD Al 2 O 3 growth chemistry on LMO powders in comparison to redox-inactive planar silicon substrates. We show that the Lewis acid-base properties of the Al precursor ligands can be used to tune both the Mn oxidation states and the Al 2 O 3 coverage on the LMO surface. Density functional theory calculations are used to examine the reaction mechanism of each precursor on LMO surfaces, elucidating a correlation between the Lewis acidity of the ligands and the decomposition thermochemistry. In-depth X-ray photoelectron spectroscopy and in situ Fourier transform infrared spectroscopy measurements support these theoretical predictions and further reveal how different Al precursors modify the atomic and electronic structure near the LMO surface during ALD. While the Mn oxidation state is strongly influenced by the Lewis acidity of the precursor ligand, the surface coverage and thickness of the Al 2 O 3 coating are a more representative descriptor of the electrochemical performance measured in coin cell experiments. Finally, we show how the ligand acid-base properties of ALD precursors can be used to rationally tailor atomic layer growth mechanisms, which may enable atomic level control over the structure of functionalized interfaces for various applications related to catalysis, semiconductors, and energy storage.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗
DOE OSTI2023

Nucleation dependence of atomic layer deposition on diamond surface termination

Surface termination and interfacial interactions are critical for advanced solid-state quantum applications. Here, in this paper, we demonstrate that atomic layer deposition (ALD) can both provide valuable insight on the chemical environment of the surface, having sufficient sensitivity to distinguish between the common diamond (001) surface termination types and passivate these interfaces as desired. We selected diamond substrates exhibiting both smooth and anomalously rough surfaces to probe the effect of morphology on ALD nucleation. We use high resolution in situ spectroscopic ellipsometry to monitor the surface reaction with sub-angstrom resolution, to evaluate the nucleation of an ALD Al 2 O 3 process as a function of different ex and in situ treatments to the diamond surface. In situ water dosing and high vacuum annealing provided the most favorable environment for nucleation of dimethylaluminum isopropoxide and water ALD. Hydrogen termination passivated both smooth and rough surfaces while triacid cleaning passivated the smooth surface only, with striking effectiveness.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗
DOE OSTI2023

Few-cycle atomic layer deposition to nanoengineer polybenzimidazole for H 2 /CO 2 separation

Atomic layer deposition (ALD) creates uniform sub-nanometer films on a variety of surfaces and nanopore walls and has been used to modify polymers to improve surface affinity towards specific molecules, solvent resistance, and barrier properties to gases and vapors. Here, for the first time, we demonstrate that few-cycle ALD can be used to engineer functional polymers at a sub-nanometer scale to improve both molecular size-sieving ability and counterintuitively, gas permeability. Particularly, 1-cycle ALD treatment of polybenzimidazole (PBI) by sequential exposure to trimethylaluminum (TMA) and water vapor remarkably increases H 2 permeability by 120% - 270% and H 2 /CO 2 selectivity by 30% at 35–200 °C. The ALD not only deposits an AlOx layer on the surface but also enables the TMA to infiltrate and react with the bulk PBI to form an AlO x network, disrupting polymer chain packing and increasing chain rigidity. The membrane exhibits excellent stability when challenged with simulated syngas, overcoming the permeability/selectivity tradeoff for H 2 /CO 2 separation. In conclusion, this study showcases a facile and scalable way of engineering polymeric membranes at a sub-nanometer level to improve molecular separation performance.

36 MATERIALS SCIENCE↗
DOE OSTI2020

Rates of levoglucosanol hydrogenolysis over Brønsted and Lewis acid sites on platinum silica-alumina catalysts synthesized by atomic layer deposition

Nanoscale coatings of AlO x were deposited onto SiO 2 using atomic layer deposition (ALD) to synthesize amorphous silica-alumina (SiAl) catalysts, and these catalysts were investigated for levoglucosanol (Lgol) hydrogenolysis. With decreasing Al 2 O 3 loading, the ratio of Brønsted to Lewis acid sites, measured by NH 3 -TPD and pyridine-FTIR, systematically increases, while the Al coordination, measured by solid state 27 Al NMR, decreases. These structural changes correspond to an increasing mass-normalized rate of Lgol hydrogenolysis. We model the mass-normalized reaction rate as the sum of independent contributions from Brønsted and Lewis sites, showing that Brønsted acid sites on ALD-AlO x /SiO 2 catalysts have a 6-times higher turnover frequency (TOF) than Lewis acid sites on these catalysts. Additionally, Lewis acid sites on ALD-AlO x /SiO 2 catalysts (potentially related to Al(V) species) have a 4-times higher TOF than Lewis acid sites on bulk γ-Al 2 O 3 . The overall mass-normalized reactivity of ALD-AlO x /SiO 2 catalysts is due to Lewis acid sites at the highest Al 2 O 3 loading, while it is predominantly due to Brønsted acid sites at the lowest Al 2 O 3 loadings. In conclusion, this work provides a new approach to synthesize amorphous SiAls with tunable Brønsted/Lewis acid site ratio and reveals differences in the reactivity of Brønsted and Lewis acid sites on these materials.

36 MATERIALS SCIENCE↗
DOE OSTI2023

Improving the barrier properties of tin oxide in metal halide perovskite solar cells using ozone to enhance nucleation

Here we investigate tin oxide growth on fullerene (C 60 ) by atomic layer deposition (ALD) for C 60 /oxide bilayer electron selective contacts in P-I-N metal halide perovskite (MHP) solar cells. An in situ ozone functionalization step is incorporated in an ALD SnO x process to suppress sub-surface growth, leading to improved internal barrier performance of ALD SnO x thin films grown on fullerene surfaces. We show that this approach decreases the water-vapor transmission rate of C 60 /ALD SnO x barriers by an order of magnitude and improves the barrier properties against gas, solvent, and halide migration. Furthermore, ozone-treated SnO x barriers can narrow photovoltaic performance distribution without compromising efficiency. We demonstrate the universality of this approach in wide-, intermediate-, and low-gap perovskite systems and further show that enhancement of the ALD barrier layer is critical toward improving the yield of all-perovskite tandem solar cells. Two-terminal all-perovskite tandem solar cells incorporating ozone nucleation are reported at over 24% photovoltaic conversion efficiency.

14 SOLAR ENERGY↗
DOE OSTI2018

Mesopore differences between pillared lamellar MFI and MWW zeolites probed by atomic layer deposition of titania and consequences on photocatalysis

The pillared MWW (PMWW or MCM-36) and pillared MFI (PMFI) are two prominent representatives of meso-/microporous lamellar zeolites, which are made by pillaring of layered MCM-22(P) and multilamellar MFI precursors, respectively. They both consist of a 10-membered ring sinusoidal micropore channel within each zeolitic layer and mesopore voids created by pillars between two adjacent zeolitic layers. Although catalytic activities of PMWW and PMFI have been compared, identification of mesopore differences between these two pillared lamellar zeolites has not been attempted. In this work, we report the differences in mesopore characteristics between PMWW and PMFI zeolites probed by atomic layer deposition (ALD) of titania (ALD-TiO2) species and a combination of structural, textural, composition and catalytic property analyses of the samples before and after ALD treatment, respectively. The results suggest PMFI has cylindrical mesopores with uniform sizes from pore entrance to main body, while PMWW has ink-bottle mesopores with the neck size much smaller than pore body. The communication between micropore and mesopore in PMFI is direct, but no communication exists in PMWW zeolites. Here, the ALD-TiO 2 process considerably modified external surface composition of PMFI and PMWW zeolites, which consequently led to a new application of the pillared lamellar zeolite materials, i.e., photo-catalytically active meso-/microporous zeolites for environmental remedy reactions.

36 MATERIALS SCIENCE↗
DOE OSTI2016

Epitaxial Atomic Layer Deposition of Sn-Doped Indium Oxide

Coherently strained, epitaxial Sn-doped In2O3 (ITO) thin films were fabricated at temperatures as low as 250 degrees C using atomic layer deposition (ALD) on (001)-, (011)-, and (111)-oriented single-crystal Y-stabilized ZrO2 (YSZ) substrates. Resultant films possess cube-on-cube epitaxial relationships with the underlying YSZ substrates and are smooth, highly conductive, and optically transparent. This epitaxial ALD approach is favorable compared to many conventional growth techniques as it is a large-scale synthesis method that does not necessitate the use of high temperatures or ultrahigh vacuum. These films may prove valuable as a conductive growth template in areas where high-quality crystalline thin film substrates are important, such as solar energy materials, light-emitting diodes, or wide bandgap semiconductors. Furthermore, we discuss the applicability of this ALD system as an excellent model system for the study of ALD surface chemistry, nucleation, and film growth.

Emery, Jonathan D.↗
DOE OSTI2021

Resolving the Evolution of Atomic Layer-Deposited Thin-Film Growth by Continuous In Situ X-Ray Absorption Spectroscopy

In situ synchrotron X-ray absorption near-edge structure characterization of thin-film titania growth by atomic layer deposition (ALD) over ZnO nanowires reveals persistent low-coordinated Ti motifs leading to a new picture of ALD growth. Through the design of growth and measurement cycles, Ti K-edge spectral data are continuously recorded so as to characterize the film evolution as a function of ALD cycle number and the surface changes within the time scale of the ALD cycle. A unified set of analysis tools is developed to interpret the time-series of spectral data. A prenucleation stage of growth, a transition region, and then a steady-state growth stage are observed with distinguishable features. Multivariate curve resolution analysis, that is physically constrained, demonstrates two specific spectral components with associated, time-dependent concentrations. The bulk-film component tracks the stages of growth. The surface and interface components, present throughout the stages of growth, reveal a significant coverage of relatively isolated or loosely networked tetrahedrally coordinated Ti atomic motifs. Lastly, spectral signatures for the intra-cycle growth kinetics are reconstructed at a time resolution of ~1 s and demonstrate that the transient Ti motifs on the growing surface stabilize within a few seconds of the Ti precursor pulse.

36 MATERIALS SCIENCE↗