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At least 289 records · Page 16

A 32-GHz phased array transmit feed for spacecraft telecommunications

A 21-element phased array transmit feed was demonstrated as part of an effort to develop and evaluate state-of-the-art transmitter and receiver components at 32 and 34 GHz for future deep-space missions. Antenna pattern measurements demonstrating electronic beam steering of the two-dimensional array are reported and compared with predictions based on measured performance of MMIC-based phase shifter and amplifier modules and Vivaldi slotline radiating elements.

Lee, K. A.↗

Growing Aligned Carbon Nanotubes for Interconnections in ICs

A process for growing multiwalled carbon nanotubes anchored at specified locations and aligned along specified directions has been invented. Typically, one would grow a number of the nanotubes oriented perpendicularly to a silicon integrated-circuit (IC) substrate, starting from (and anchored on) patterned catalytic spots on the substrate. Such arrays of perpendicular carbon nanotubes could be used as electrical interconnections between levels of multilevel ICs. The process (see Figure 1) begins with the formation of a layer, a few hundred nanometers thick, of a compatible electrically insulating material (e.g., SiO(x) or Si(y)N(z) on the silicon substrate. A patterned film of a suitable electrical conductor (Al, Mo, Cr, Ti, Ta, Pt, Ir, or doped Si), having a thickness between 1 nm and 2 m, is deposited on the insulating layer to form the IC conductor pattern. Next, a catalytic material (usually, Ni, Fe, or Co) is deposited to a thickness between 1 and 30 nm on the spots from which it is desired to grow carbon nanotubes. The carbon nanotubes are grown by plasma-enhanced chemical vapor deposition (PECVD). Unlike the matted and tangled carbon nanotubes grown by thermal CVD, the carbon nanotubes grown by PECVD are perpendicular and freestanding because an electric field perpendicular to the substrate is used in PECVD. Next, the free space between the carbon nanotubes is filled with SiO2 by means of CVD from tetraethylorthosilicate (TEOS), thereby forming an array of carbon nanotubes embedded in SiO2. Chemical mechanical polishing (CMP) is then performed to remove excess SiO2 and form a flat-top surface in which the outer ends of the carbon nanotubes are exposed. Optionally, depending on the application, metal lines to connect selected ends of carbon nanotubes may be deposited on the top surface. The top part of Figure 2 is a scanning electron micrograph (SEM) of carbon nanotubes grown, as described above, on catalytic spots of about 100 nm diameter patterned by electron-beam lithography. These and other nanotubes were found to have lengths ranging from 2 to 10 m and diameters ranging from 30 to 200 nm, the exact values of length depending on growth times and conditions and the exact values of diameter depending on the diameters and thicknesses of the catalyst spots. The bottom part of Figure 2 is an SEM of an embedded array of carbon nanotubes after CMP.

Li, Jun↗

Lock-In Imaging System for Detecting Disturbances in Fluid

A lock-in imaging system is configured for detecting a disturbance in air. The system includes an airplane, an interferometer, and a telescopic imaging camera. The airplane includes a fuselage and a pair of wings. The airplane is configured for flight in air. The interferometer is operatively disposed on the airplane and configured for producing an interference pattern by splitting a beam of light into two beams along two paths and recombining the two beams at a junction point in a front flight path of the airplane during flight. The telescopic imaging camera is configured for capturing an image of the beams at the junction point. The telescopic imaging camera is configured for detecting the disturbance in air in an optical path, based on an index of refraction of the image, as detected at the junction point.

Park, Yeonjoon↗

Method for nanoscale spatial registration of scanning probes with substrates and surfaces

Embodiments in accordance with the present invention relate to methods and apparatuses for aligning a scanning probe used to pattern a substrate, by comparing the position of the probe to a reference location or spot on the substrate. A first light beam is focused on a surface of the substrate as a spatial reference point. A second light beam then illuminates the scanning probe being used for patterning. An optical microscope images both the focused light beam, and a diffraction pattern, shadow, or light backscattered by the illuminated scanning probe tip of a scanning probe microscope (SPM), which is typically the tip of the scanning probe on an atomic force microscope (AFM). Alignment of the scanning probe tip relative to the mark is then determined by visual observation of the microscope image. This alignment process may be repeated to allow for modification or changing of the scanning probe microscope tip.

Wade, Lawrence A.↗

Improved Phase-Mask Fabrication of Fiber Bragg Gratings

An improved method of fabrication of Bragg gratings in optical fibers combines the best features of two prior methods: one that involves the use of a phase mask and one that involves interference between the two coherent laser beams. The improved method affords flexibility for tailoring Bragg wavelengths and bandwidths over wide ranges. A Bragg grating in an optical fiber is a periodic longitudinal variation in the index of refraction of the fiber core. The spatial period (Bragg wavelength) is chosen to obtain enhanced reflection of light of a given wavelength that would otherwise propagate relatively unimpeded along the core. Optionally, the spatial period of the index modulation can be made to vary gradually along the grating (such a grating is said to be chirped ) in order to obtain enhanced reflection across a wavelength band, the width of which is determined by the difference between the maximum and minimum Bragg wavelengths. In the present method as in both prior methods, a Bragg grating is formed by exposing an optical fiber to an ultraviolet-light interference field. The Bragg grating coincides with the pattern of exposure of the fiber core to ultraviolet light; in other words, the Bragg grating coincides with the interference fringes. Hence, the problem of tailoring the Bragg wavelength and bandwidth is largely one of tailoring the interference pattern and the placement of the fiber in the interference pattern. In the prior two-beam interferometric method, a single laser beam is split into two beams, which are subsequently recombined to produce an interference pattern at the location of an optical fiber. In the prior phase-mask method, a phase mask is used to diffract a laser beam mainly into two first orders, the interference between which creates the pattern to which an optical fiber is exposed. The prior two-beam interferometric method offers the advantage that the period of the interference pattern can be adjusted to produce gratings over a wide range of Bragg wavelengths, but offers the disadvantage that success depends on precise alignment and high mechanical stability. The prior phase-mask method affords the advantages of compactness of equipment and relative insensitivity to both misalignment and vibration, but does not afford adjustability of the Bragg wavelength. The present method affords both the flexibility of the prior two-beam interferometric method and the compactness and stability of the prior phase-mask method. In this method (see figure), a laser beam propagating along the x axis is normally incident on a phase mask that lies in the (y,z) plane. The phase of light propagating through the mask is modulated with a spatial periodicity, p, along the y axis chosen to diffract the laser light primarily to first order at the angle . (The zero-order laser light propagating along the x axis can be used for alignment and thereafter suppressed during exposure of the fiber.) The diffracted light passes through a concave cylindrical lens, which converts the flat diffracted wave fronts to cylindrical ones, as though the light emanated from a line source. Then two parallel flat mirrors recombine the diffracted beams to form an interference field equivalent to that of two coherent line sources at positions A and B (virtual sources). The interference pattern is a known function of the parameters of the apparatus and of position (x,y) in the interference field. Hence, the tilt, wavelength, and chirp of the Bragg grating can be chosen through suitable adjustments of the apparatus and/or of the position and orientation of the optical fiber. In particular, the Bragg wavelength can be adjusted by moving the fiber along the x axis, and the bandwidth can be modified over a wide range by changing the fiber tilt angle or by moving the phase mask and/or the fiber. Alignment is easy because the zero-order beam defines the x axis. The interference is relatively stable and insensitive to the mechanical vibration because of the gh symmetry and compactness of the apparatus, the fixed positions of the mirrors and lens, and the consequent fixed positions of the two virtual line sources, which are independent of the translations of the phase mask and the laser relative to the lens.

Grant, Joseph↗

Applications of a General Finite-Difference Method for Calculating Bending Deformations of Solid Plates

This paper reports the findings of an investigation of a finite - difference method directly applicable to calculating static or simple harmonic flexures of solid plates and potentially useful in other problems of structural analysis. The method, which was proposed in doctoral thesis by John C. Houbolt, is based on linear theory and incorporates the principle of minimum potential energy. Full realization of its advantages requires use of high-speed computing equipment. After a review of Houbolt's method, results of some applications are presented and discussed. The applications consisted of calculations of the natural modes and frequencies of several uniform-thickness cantilever plates and, as a special case of interest, calculations of the modes and frequencies of the uniform free-free beam. Computed frequencies and nodal patterns for the first five or six modes of each plate are compared with existing experiments, and those for one plate are compared with another approximate theory. Beam computations are compared with exact theory. On the basis of the comparisons it is concluded that the method is accurate and general in predicting plate flexures, and additional applications are suggested. An appendix is devoted t o computing procedures which evolved in the progress of the applications and which facilitate use of the method in conjunction with high-speed computing equipment.

Walton, William C., Jr.↗

Laser pulse shaping for additive manufacturing

The present disclosure relates to an apparatus for additively manufacturing a product in a layer-by-layer sequence, wherein the product is formed using powder particles deposited on an interface layer of a substrate. A laser generates first and second beam components. The second beam component has a higher power level and a shorter duration than the first beam component. A mask creates a 2D optical pattern in which only select portions of the second beam components can irradiate the powder particles. The first beam component heats the powder particles close to a melting point, where the particles experience surface tension forces relative to the interface layer. While the particles are heated, the second beam component further heats the particles and also melts the interface layer before the surface tension forces can act on and distort the particles, enabling the particles and the interface layer are able to bond together.

DeMuth, James A.↗

Laser pulse shaping for additive manufacturing

The present disclosure relates to an apparatus for additively manufacturing a product in a layer-by-layer sequence, wherein the product is formed using powder particles deposited on an interface layer of a substrate. A laser generates first and second beam components. The second beam component has a higher power level and a shorter duration than the first beam component. A mask creates a 2D optical pattern in which only select portions of the second beam components can irradiate the powder particles. The first beam component heats the powder particles close to a melting point, where the particles experience surface tension forces relative to the interface layer. While the particles are heated, the second beam component further heats the particles and also melts the interface layer before the surface tension forces can act on and distort the particles, enabling the particles and the interface layer are able to bond together.

DeMuth, James A.↗

Microwave system performance for a solar power satellite during startup/shutdown operations

The paper investigates the system performance and antenna characteristics under startup/shutdown conditions for the high power beam from a solar power satellite. Attention is given to the present microwave system reference configuration together with the dc power distribution system in the solar array and in the antenna. The pattern characteristics for the main beam, sidelobes, and grating lobes are examined for eight types of energizing configurations which include: random sequences, two types of concentric circles, and three types of line strips. In conclusion, it is noted that a proper choice of sequences should not cause environmental problems due to increased microwave radiation levels during the short time periods of energizing and de-energizing the antenna.

Arndt, G. D.↗

The use of artificial electron beams as probes of the distant magnetosphere

Experiments are reported in which electron beams were injected into the magnetosphere (with up to 40 kev energy and at current up to 0.8 A) to diagnose the plasma processes at great distance by measurements made in the ionosphere. In some of the experiments, the conjugate region atmosphere was used to detect the electron beam; in others, conjugate echoes were detected near the injection region. The echoes were found to respond to changes in the convection fields and to reflect auroral zone activity. Theoretical and experimental echo patterns are discussed. Evidence for beam pitch angle scattering and altered mirror heights is presented. The use of the atmospheric response to electron beams in the loss cone as a detector has been achieved using optical, X-ray, and radar techniques.

Winckler, J. R.↗

Position determination systems

A system for an orbital antenna, operated at a synchronous altitude, to scan an area of a celestial body is disclosed. The antenna means comprises modules which are operated by a steering signal in a repetitive function for providing a scanning beam over the area. The scanning covers the entire area in a pattern and the azimuth of the scanning beam is transmitted to a control station on the celestial body simultaneous with signals from an activated ground beacon on the celestial body. The azimuth of the control station relative to the antenna is known and the location of the ground beacon is readily determined from the azimuth determinations.

Shores, P. W.↗

Heat treatment to anneal residual stresses during additive manufacturing

The present disclosure relates to a method of producing a product through additive manufacturing with heat treatment. The method involves using a fusing beam to melt powder particles disposed on a substrate, where the fusing beam is impressed with a two dimensional pattern containing image information from a first layer to be printed. The fused powder particles are then heat treated with a beam impressed with an additional two dimensional pattern. The additional two dimensional pattern has image information from the first layer to achieve heat treatment of the product. The heat treatment is completed prior to laying down additional new layers of material. The heat treatment is an annealing operation. The method may further involve providing a new layer of powdered material on top of the layer of fused powder particles subsequent to the heat treatment, and repeating the melting and heat treating operations in a layer-by-layer fashion using the two dimensional pattern and the additional two dimensional pattern, until the part is completed.

DeMuth, James A.↗

Unsupervised anomaly detection in MeV ultrafast electron diffraction

MeV ultrafast electron diffraction (MUED) is a pump-probe technique used to study the dynamic structural evolution of materials. An ultrashort laser pulse triggers structural changes, which are then probed by an ultrashort relativistic electron beam. To overcome low signal-to-noise ratios, diffraction patterns are averaged over thousands of shots. However, shot-to-shot instabilities in the electron beam can distort individual patterns, introducing uncertainty. Improving MUED accuracy requires detecting and removing these anomalous patterns from large datasets. In this work, we developed a fully unsupervised methodology for the detection of anomalous diffraction patterns. Using a convolutional autoencoder, we calculate the reconstruction mean squared error of the diffraction patterns. Based on the statistical analysis of this error, we provide the user an estimation of the probability that the pattern is normal, which also allows a posterior visual inspection of the images that are difficult to classify. This method has been trained with only 100 diffraction patterns and tested on 1521 patterns, resulting in a false positive rate between 0.2% and 0.4%, with a training time of 10 s per image and a test time of about 1 s per image. Here, the proposed methodology can also be applied to other diffraction techniques in which large datasets are collected that include faulty images due to instrumental instabilities.

43 PARTICLE ACCELERATORS↗

Selected Area Manipulation of MoS 2 via Focused Electron Beam-Induced Etching for Nanoscale Device Editing

Here we demonstrate direct-write patterning of single and multilayer MoS 2 via a focused electron beam-induced etching (FEBIE) process mediated with the XeF 2 precursor. MoS 2 etching is performed at various currents, areal doses, on different substrates, and characterized using scanning electron and atomic force microscopies as well as Raman and photoluminescence spectroscopies. Scanning transmission electron microscopy reveals a sub-40 nm etching resolution and the progression of point defects and lateral etching of the consequent unsaturated bonds. The results confirm that the electron beam-induced etching process is minimally invasive to the underlying material in comparison to ion beam techniques, which damage the subsurface material. Single-layer MoS 2 field-effect transistors are fabricated, and device characteristics are compared for channels that are edited via the selected area etching process. The source–drain current at constant gate and source–drain voltage scale linearly with the edited channel width. Moreover, the mobility of the narrowest channel width decreases, suggesting that backscattered and secondary electrons collaterally affect the periphery of the removed area. Focused electron beam doses on single-layer transistors below the etching threshold were also explored as a means to modify/thin the channel layer. The FEBIE exposures showed demonstrative effects via the transistor transfer characteristics, photoluminescence spectroscopy, and Raman spectroscopy. While strategies to minimize backscattered and secondary electron interactions outside of the scanned regions require further investigation, here, we show that FEBIE is a viable approach for selective nanoscale editing of MoS 2 devices.

36 MATERIALS SCIENCE↗

Statistical Study of the Nonthermal Continuum Radiation Beaming Angle Measured by the High Frequency Receiver on Van Allen Probes-A

The nonthermal continuum (NTC) radiation beaming angle is computed over the entire Van Allen Probes-A mission when the spacecraft was in the dawn sector. The conditions in the dawn sector are favorable for the wave vector to lie near/in the spacecraft's spin plane allowing a favorable estimate of the beaming angle, and the dawn sector is also advantageous in that previous studies show NTC occurrence to peak in this sector. We found that scatter plots, over the entire mission, of beaming angle versus magnetic latitude form a distinct inverted-V pattern, with the apex at/near the magnetic equator. This pattern was sharpest for frequencies ( f ) ≲ 100 kHz. Using the NTC beaming formula from the linear mode conversion theory (LMCT), we show that such an inverted-V pattern is expected due to the large variation in the plasmapause location over the entire mission. The theoretical derived pattern qualitatively reproduces the observed pattern but not quantitatively. The lack of quantitative agreement is discussed and is attributed to several factors, one factor is off-centered emissions from the radio window. The qualitative agreement strongly supports LMCT as being the dominant mechanism generating NTC for f ≲ 100 kHz. For f ≳ 100 kHz, the inverted-V pattern becomes less distinct, and strong near-equatorial beaming is observed. Finally, after considering contamination of our selections by left-handed polarized AKR, our study suggests that besides LMCT another unidentified NTC generation mechanism becomes important for f ≳ 100 kHz.

79 ASTRONOMY AND ASTROPHYSICS↗

Statistical Study of the Non-Thermal Continuum Radiation Beaming Angle Measured By the High Frequency Receiver on Van Allen Probes-A

The nonthermal continuum (NTC) radiation beaming angle is computed over the entire Van Allen Probes-A mission when the spacecraft was in the dawn sector. The conditions in the dawn sector are favorable for the wave vector to lie near/in the spacecraft's spin plane allowing a favorable estimate of the beaming angle, and the dawn sector is also advantageous in that previous studies show NTC occurrence to peak in this sector. We found that scatter plots, over the entire mission, of beaming angle versus magnetic latitude form a distinct inverted-V pattern, with the apex at/near the magnetic equator. This pattern was sharpest for frequencies (f) ≲ 100 kHz. Using the NTC beaming formula from the linear mode conversion theory (LMCT), we show that such an inverted-V pattern is expected due to the large variation in the plasmapause location over the entire mission. The theoretical derived pattern qualitatively reproduces the observed pattern but not quantitatively. The lack of quantitative agreement is discussed and is attributed to several factors, one factor is off-centered emissions from the radio window. The qualitative agreement strongly supports LMCT as being the dominant mechanism generating NTC for f ≲ 100 kHz. For f ≳ 100 kHz, the inverted-V pattern becomes less distinct, and strong near-equatorial beaming is observed. After considering contamination of our selections by left-handed polarized AKR, our study suggests that besides LMCT another unidentified NTC generation mechanism becomes important for f ≳ 100 kHz.

Linear Mode Conversion Theory↗

Fabrication of Buried Nanochannels From Nanowire Patterns

A method of fabricating channels having widths of tens of nanometers in silicon substrates and burying the channels under overlying layers of dielectric materials has been demonstrated. With further refinement, the method might be useful for fabricating nanochannels for manipulation and analysis of large biomolecules at single-molecule resolution. Unlike in prior methods, burying the channels does not involve bonding of flat wafers to the silicon substrates to cover exposed channels in the substrates. Instead, the formation and burying of the channels are accomplished in a more sophisticated process that is less vulnerable to defects in the substrates and less likely to result in clogging of, or leakage from, the channels. In this method, the first step is to establish the channel pattern by forming an array of sacrificial metal nanowires on an SiO2-on-Si substrate. In particular, the wire pattern is made by use of focused-ion-beam (FIB) lithography and a subsequent metallization/lift-off process. The pattern of metal nanowires is then transferred onto the SiO2 layer by reactive-ion etching, which yields sacrificial SiO2 nanowires covered by metal. After removal of the metal covering the SiO2 nanowires, what remains are SiO2 nanowires on an Si substrate. Plasma-enhanced chemical vapor deposition (PECVD) is used to form a layer of a dielectric material over the Si substrate and over the SiO2 wires on the surface of the substrate. FIB milling is then performed to form trenches at both ends of each SiO2 wire. The trenches serve as openings for the entry of chemicals that etch SiO2 much faster than they etch Si. Provided that the nanowires are not so long that the diffusion of the etching chemicals is blocked, the sacrificial SiO2 nanowires become etched out from between the dielectric material and the Si substrate, leaving buried channels. At the time of reporting the information for this article, channels 3 m long, 20 nm deep, and 80 nm wide (see figure) had been fabricated by this method.

Choi, Daniel↗