DOE OSTI2014
A study into the optimal deposition temperature for ultra-thin La{sub 2}O{sub 3}/Ge and Y{sub 2}O{sub 3}/Ge gate stacks has been conducted in this paper with the aim to tailor the interfacial layer for effective passivation of the Ge interface. A detailed comparison between the two lanthanide oxides (La{sub 2}O{sub 3} and Y{sub 2}O{sub 3}) in terms of band line-up, interfacial features, and reactivity to Ge using medium energy ion scattering, vacuum ultra-violet variable angle spectroscopic ellipsometry (VUV-VASE), X-ray photoelectron spectroscopy, and X-ray diffraction is shown. La{sub 2}O{sub 3} has been found to be more reactive to Ge than Y{sub 2}O{sub 3}, forming LaGeO{sub x} and a Ge sub-oxide at the interface for all deposition temperature studied, in the range from 44 °C to 400 °C. In contrast, Y{sub 2}O{sub 3}/Ge deposited at 400 °C allows for an ultra-thin GeO{sub 2} layer at the interface, which can be eliminated during annealing at temperatures higher than 525 °C leaving a pristine YGeO{sub x}/Ge interface. The Y{sub 2}O{sub 3}/Ge gate stack deposited at lower temperature shows a sub-band gap absorption feature fitted to an Urbach tail of energy 1.1 eV. The latter correlates to a sub-stoichiometric germanium oxide layer at the interface. The optical band gap for the Y{sub 2}O{sub 3}/Ge stacks has been estimated to be 5.7 ± 0.1 eV from Tauc-Lorentz modelling of VUV-VASE experimental data. For the optimal deposition temperature (400 °C), the Y{sub 2}O{sub 3}/Ge stack exhibits a higher conduction band offset (>2.3 eV) than the La{sub 2}O{sub 3}/Ge (∼2 eV), has a larger band gap (by about 0.3 eV), a germanium sub-oxide free interface, and leakage current (∼10{sup −7} A/cm{sup 2} at 1 V) five orders of magnitude lower than the respective La{sub 2}O{sub 3}/Ge stack. Our study strongly points to the superiority of the Y{sub 2}O{sub 3}/Ge system for germanium interface engineering to achieve high performance Ge Complementary Metal Oxide Semiconductor technology.
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗