Improving Ion Source Antenna Lifetime for the Spallation Neutron Source
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high-performance numerical modeling↗
SEARCH · Engineering Papers
Results for “plasma processing”
Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.
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Metal-based passivation-assisted plasma etching of III-v semiconductors
According to one embodiment, a method includes performing a plasma etching process on a masked III-V semiconductor, and forming a passivation layer on etched portions of the III-V semiconductor. The passivation layer includes at least one of a group III element and/or a metal from the following: Ni, Cr, W, Mo, Pt, Pd, Mg, Ti, Zr, Hf, Y, Ta, and Sc.
Harrison, Sara Elizabeth↗
Development of a Laser Ultrasonics-based Approach for Rapid Screening of High Entropy Alloys
This project utilized a laser ultrasonic technique to systematically study temperature-induced evolution of material properties in a set of interrelated binary alloys and a high entropy alloy (HEA) fabricated using arc-melting and spark plasma sintering processes. This technique involved the use of a nanosecond duration, high-intensity pulsed laser to thermo-elastically generate ultrasonic waves that propagate in the bulk of the metal alloy. Sub-nanometer-scale displacements associated with the propagating bulk ultrasonic waves were detected along the epicenter on the opposite surface of the sample using a 1 GHz bandwidth photorefractive interferometer. Phase transformations and microstructural changes were inferred from the temperature-dependent trends in the bulk acoustic velocities and features in the ultrasonic epicentral waveforms measured in the binary alloys. These inferences were then correlated with electron/optical microscopy observations and predictions using calculations of phase diagrams (CALPHAD). The results showed that the laser-generated ultrasonic pulses were strongly influenced by changes in material microstructure and could accurately track thermally driven phase transformations and detect the presence of microscale heterogeneities (grain boundaries, dendritic structures, etc.) in the set of binary alloy samples. The measurement approach was then applied to a quinary HEA sample for estimating phase transition temperature and determining microstructural heterogeneity. The rapid, non-contact and non-destructive ultrasonic testing approach demonstrated here is amenable to high throughput combinatorial investigations that can be applied to graded composition HEAs produced using advanced manufacturing methods. When paired with atomistic simulations and CALPHAD modeling, this approach can overcome the bottlenecks faced by current material characterization methods in efficiently screening the vast discovery space of HEAs that spans over a hundred million unique quinary alloy compositions.
36 MATERIALS SCIENCE↗
A laser ultrasonics-based approach for rapid screening of high entropy alloys
This project demonstrates a laser ultrasonics-based characterization methodology for rapid metallic materials design and discovery via in situ determination of phases, microstructures and elastic properties with respect to temperature. Ultrasonic waves are strongly affected by material microstructure, and therefore serve as a facile means to probe elastic properties, phase content and their size distributions and volume fractions. In this study, a laser ultrasonic technique is used to systematically study the evolution of properties in a set of interrelated simple binary alloys and high entropy alloys (HEA). Phase transformations and microstructural changes inferred from the ultrasonic signals will be correlated with electron microscopy data and predictions using calculations of phase diagrams (CALPHAD). The non-contact and non-destructive ultrasonic testing approach developed in this study could overcome several limitations associated with current material characterization methods for materials discovery. It is expected that laser ultrasonics-based methodology developed in this work will be utilized to evaluate novel graded composition HEAs currently being developed at the Idaho National Laboratory (INL) using advanced manufacturing methods based on direct energy deposition and spark plasma sintering processes, and contribute to accelerate the discovery of HEAs.
36 MATERIALS SCIENCE↗
A laser ultrasonics-based approach for rapid screening of high entropy alloys
The primary objective of this seed project is to develop a laser ultrasonics-based characterization methodology for rapid metallic materials design and discovery via in situ determination of phases, microstructures and elastic properties with respect to temperature. Ultrasonic waves are strongly affected by material microstructure, and therefore, serve as a facile means to probe elastic properties, phase content and their size distributions and volume fractions. In this study, a laser ultrasonic technique will be used to systematically study the evolution of properties in a set of interrelated simple binary alloys and high entropy alloys (HEA). Phase transformations and microstructural changes inferred from the ultrasonic signals will be correlated with electron microscopy data and predictions using calculations of phase diagrams (CALPHAD). The non-contact and non-destructive ultrasonic testing approach developed in this study could overcome several limitations associated with current material characterization methods for materials discovery. It is expected that the products of the proposed work will be utilized to evaluate novel graded composition HEAs currently being developed at the Idaho National Laboratory (INL) using advanced manufacturing methods based on direct energy deposition and spark plasma sintering processes, and contribute to accelerate the discovery of HEAs.
36 MATERIALS SCIENCE↗
A Cloud Modeling Capability for Low Temperature Plasmas for Microelectronics
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cloud computing↗
Evaluating the carbon footprint of the integrated DBD‐plasma bi‐reforming unit via laboratory scale experiments and scaled‐up process modeling
Catalytic dielectric barrier discharge (DBD) plasma reactor experiments were performed in a tubular glass reactor with a 2 mm gap at 550°C to facilitate the reaction kinetics of steam added dry reforming or bireforming. The best specific energy input obtained was 11.2 eV/molecule feed at CO 2 :CH 4 :H 2 O of 4.5:1:4.5 ratio and gas hour space velocity (GHSV) = 432 h −1 . This value was used to design a conceptual process and assess the environmental impact of methane steam reforming-based H 2 production 18.4 kmol/h CO 2 emission processing into H 2 :CO = 2 syngas, with an emphasis on the carbon footprint.
70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
Magnetized laser–plasma interactions in high-energy-density systems: Parallel propagation
In this study, we investigate parametric processes in magnetized plasmas, driven by a large-amplitude pump light wave. Our focus is on laser–plasma interactions relevant to high-energy-density (HED) systems, such as the National Ignition Facility and the Sandia MagLIF concept. We present a self-contained derivation of a “parametric” dispersion relation for magnetized three-wave interactions, meaning the pump wave is included in the equilibrium, similar to the unmagnetized work of Drake et al., Phys. Fluids 17, 778 (1974). For this, we use a multi-species plasma fluid model and Maxwell's equations. The application of an external B field causes right- and left-polarized light waves to propagate with differing phase velocities. This leads to Faraday rotation of the polarization, which can be significant in HED conditions. Phase-matching and linear wave dispersion relations show that Raman and Brillouin scattering have modified spectra due to the background B field, though this effect is usually small in systems of current practical interest. We study a scattering process we call stimulated whistler scattering, where a light wave decays to an electromagnetic whistler wave (ω≲ω ce ) and a Langmuir wave. This only occurs in the presence of an external B field, which is required for the whistler wave to exist.
70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
On the Importance of Using Event-Specific Wave Diffusion Rates in Modeling Diffuse Electron Precipitation
A few to tens of keV electron precipitation that carries substantial energy source down to the upper atmosphere to create aurora is manifested as an important magnetosphere-ionosphere coupling process. The precipitation is usually caused by scattering processes associated with plasma waves in the magnetosphere. The scattering process is often quantified by wave diffusion rates that indicate how fast an electron is scattered. Global models commonly use diffusion coefficients that are derived from statistical wave models. However, due to the statistical nature, many localized, transient features could be smeared out. In this study, we investigate electron precipitation using event-specific diffusion coefficients that are obtained based on simultaneous in-situ measured/inferred, rather than statistical, chorus wave dynamics. We find that the application of the event-specific diffusion coefficients associated with a more dynamic and intense chorus wave model leads more electrons, particularly at several to tens of keV in the dawn-to-noon sector at L > 3, to precipitate than using statistical coefficients. Here, the new simulation roughly captures both the intensity and variability of the precipitating flux as detected by the NOAA/POES satellites. Ionospheric electron density in the lower E region (100–120 km) observed by the mid-latitude Millstone Hill radar is also much better reproduced, while the case using statistical diffusion coefficients underestimates the ionization rate. This study implies the importance of using event-specific diffusion rates in simulating the diffuse electron precipitation and understanding the magnetosphere-ionosphere coupling.
79 ASTRONOMY AND ASTROPHYSICS↗
Advanced nanoscale characterization of aluminum nanoparticles with modified surface morphology via atmospheric helium and carbon monoxide plasmas
Aluminum nanoparticles (nAl) have the potential as energetic additives in explosive/propellant formulations. Scalable methodologies must be pursued to mitigate the inactive amorphous alumina shell surrounding the active aluminum (Al) core with modified surface morphology and chemistry for increased combustion effects. This work explores the feasibility of making reactive core/shell nAl with thinned oxide shells and modified surface coatings via a two-step atmospheric plasma surface treatment process in a custom dielectric barrier discharge plasma reactor. The commercial nAl of nominal average size similar to 40-60nm was first treated with helium (He) followed by He/carbon monoxide (CO) plasmas for different durations. The resultant samples were characterized via high-resolution transmission electron microscopy (HRTEM) and Fourier transform IR (FTIR) spectra. HRTEM images revealed sporadic patchy gamma -alumina deposits on particle surfaces and in gaps among particles for all samples, suggesting the non-uniform plasma effects of the He/CO glow. Nanoscale chemical analyses via scanning transmission electron microscopy elemental mapping and x-ray energy dispersive spectroscopy were further performed. Although no carbon-associated structure appeared in electron energy loss spectroscopy (EELS) spectra, the presence of carbonaceous materials was confirmed as a thin dispersive layer evenly distributed on the nAl surface suggesting either its amorphous nature or is present at a level insufficient to generate satisfactory EELS spectra. The trend of intensity profiles for key elements acquired by drawing lines across a single particle on the elemental maps confirmed that carbonaceous materials only existed on the surface and they were most likely carboxylates that increased with increased He/CO treatment duration, as evident by FTIR results. Finally, this work demonstrated the success of atmospheric plasma-treated reactive nAl with comprehensively characterized surface features via advanced microscopy and spectroscopy.
36 MATERIALS SCIENCE↗
1D EDIPIC
EDIPIC codes were developed for simulation of kinetic effects in low-temperature plasmas. They can be used for simulation of plasmas in electrostatic approximation and include many atomistic and plasma-surface interaction processes needed for simulations of low temperature plasmas. These codes include a detailed model of secondary electron emission induced by electrons and ions. The Monte-Carlo model of electron-neutral collisions and the Langevin model of Coulomb collisions for electrons are also implemented.
Sydorenko, Dmytro↗
EDIPIC-2D
EDIPIC codes were developed for simulation of kinetic effects in low-temperature plasmas. They can be used for simulation of plasmas in electrostatic approximation and include many atomistic and plasma-surface interaction processes needed for simulations of low temperature plasmas. These codes include a detailed model of secondary electron emission induced by electrons and ions. The Monte-Carlo model of electron-neutral collisions and the Langevin model of Coulomb collisions for electrons are also implemented.
Sydorenko, Dmytro↗
Collisionless Larmor coupling and blob formation in a laser-plasma expanding into a magnetized ambient plasma
Collisionless Larmor coupling is a fundamental process in space and astrophysical plasmas that enables momentum transfer between an expanding plasma and a magnetized ambient medium. Here, in this paper, we report on the laboratory experimental study of Larmor coupling leading to the formation of a plasma blob associated with a laser-driven, super-Alfvénic plasma flow on the Large Plasma Device at the University of California, Los Angeles. The high-repetition rate enables systematic spatial and temporal scans of the plasma evolution using Doppler spectroscopy, as well as measurements of the magnetic field, electrostatic field, and self-emission of both debris and ambient ions using filtered imaging. We observe the self-focusing of the laser-produced plasma and the formation of a secondary diamagnetic cavity associated with a blob composed of background ions. Doppler spectroscopy reveals the transverse velocity distribution of the background ions, providing direct evidence of ion energization via Larmor coupling. The systematic spatial and temporal scans enabled by the high-repetition-rate experiment allow for a detailed characterization of the ion dynamics. These experimental observations are supported by numerical simulations that provide more insight into the kinetic-scale physics associated with blob formation as well as the role of the ambient plasma density.
70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
Science challenges and research opportunities for plasma applications in microelectronics
Low-temperature plasmas (LTPs) are essential to manufacturing devices in the semiconductor industry, from creating extreme ultraviolet photons used in the most advanced lithography to thin film etching, deposition, and surface modifications. It is estimated that 40%–45% of all process steps needed to manufacture semiconductor devices use LTPs in one form or another. LTPs have been an enabling technology in the multidecade progression of the shrinking of device dimensions, often referred to as Moore’s law. New challenges in circuit and device design, novel materials, and increasing demands to achieve environmentally benign processing technologies require advances in plasma technology beyond the current state-of-the-art. The Department of Energy Office of Science Fusion Energy Sciences held a workshop titled Plasma Science for Microelectronics Nanofabrication in August 2022 to discuss the plasma science challenges and technical barriers that need to be overcome to continue to develop the innovative plasma technologies required to support and advance the semiconductor industry. One of the key outcomes of the workshop was identifying a set of priority research opportunities (PROs) to focus attention on the most strategic plasma science challenges to address to benefit the semiconductor industry. For each PRO, scientific challenges and recommended strategies to address those challenges were identified. Furthermore, this article summarizes the PROs identified by the workshop participants.
36 MATERIALS SCIENCE↗
Particle trapping, size-filtering, and focusing in the nonthermal plasma synthesis of sub-10 nanometer particles
Low-pressure nonthermal flowing plasmas are widely used for the gas-phase synthesis of nanoparticles and quantum dots of materials that are difficult or impractical to synthesize using other techniques. To date, the impact of temporary electrostatic particle trapping in these plasmas has not been recognized, a process that may be leveraged to control particle properties. Furthermore, we present experimental and computational evidence that, during their growth in the plasma, sub-10 nm silicon particles become temporarily confined in an electrostatic trap in radio-frequency excited plasmas until they grow to a size at which the increasing drag force imparted by the flowing gas entrains the particles, carrying them out of the trap. We demonstrate that this trapping enables the size filtering of the synthesized particles, leading to highly monodisperse particle sizes, as well as the electrostatic focusing of the particles onto the reactor centerline. Understanding of the mechanisms and utilization of such particle trapping will enable the design of plasma processes with improved size control and the ability to grow heterostructured nanoparticles.
70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
Multimodal azimuthal oscillations in electron beam generated E×B plasma
Electron beam (e-beam) generated plasmas with applied crossed electric and magnetic (E×B) fields are promising for low-damage material processing. However, these plasmas can be subject to the formation of azimuthally propagating structures that enhance the radial transport of energetic charged species, which can harm the gentle processing capability of the plasma. In this work, we investigate the azimuthal structure formation in an e-beam generated E×B plasma using experimental diagnostics and 2D3V particle-in-cell simulations. Our findings demonstrate the formation of multiple simultaneously occurring azimuthally propagating modes that exhibit nontrivial radial dependence. It is suggested that the multimodal azimuthal spectrum is caused in part by the radial outflow of ions in the plasma.
electron beams↗
Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si 3 N 4 and Si etching
A material etching system was developed by combining beam electron injection from a direct current (DC) hollow-cathode (HC) electron source with the downstream reactive environment of a remote CF 4 /O 2 low temperature plasma. The energy of the injected beam electrons is controlled using an acceleration electrode biased positively relative to the HC Argon discharge. For an acceleration voltage greater than the ionization potential of Ar, the extracted primary electrons can produce a secondary plasma in the process chamber. We characterized the properties of the secondary plasma by performing Langmuir probe measurements of the electron energy probability function (EEPF) 2.5 cm below the extraction ring. The data indicate the existence of two major groups of electrons, including electrons with a primary beam electron energy which varies as the acceleration voltage is varied, along with low energy electrons produced by ionization of the Ar gas atoms in the process chamber by the injected beam electrons. When combining the HC Ar beam electron with a remote CF 4 /O 2 electron cyclotron wave resonance (ECWR) plasma, the EEPF of both the low energy plasma electron and beam electron components decreases. Additionally, we studied surface etching of Si3N4 and poly-crystalline Si (poly-Si) thin films as a function of process parameters, including the acceleration voltage (0-70 V), discharge current of the HC discharge (1-2 A), pressure (2- 100 mTorr), source to substrate distance (2.5 to 5 cm), and feed gas composition (with or without CF 4 /O 2 ). The direction of the incident beam electrons was perpendicular to the surface. Si 3 N 4 and poly-crystalline silicon etching are seen and indicate an electronneutral synergy effect. No/little remote plasma spontaneous etching was observed for the conditions used in this study, and the etching is confined to the substrate area irradiated by the injected beam electrons. The electron etched Si 3 N 4 surface etching rate profile distribution is confined within a ~30 mm diameter circle, which is slightly broader than the area for which poly-Si etching is seen, and coincides closely with the spatial profile of beam electrons as determined by the Langmuir probe measurements. The magnitude of poly-Si etching rate is by a factor of two times smaller than the Si 3 N 4 etching rate. In this paper, we discuss possible explanations of the data and the role of surface charging.
70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗