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At least 235 records · Page 13
All sourcesNASA NTRSDOE OSTI
DOE OSTI2022

EASTERN NORTH ATLANTIC (ENA) CONDENSATION PARTICLE COUNTER (CPC) with the AEROSOL MASK (ENA-AM) for the YEAR 2018

The Eastern North Atlantic (ENA) central facility is periodically affected by episodes of local aerosols. High-concentration aerosol events associated with potential local aerosol sources are sampled by the Concentration Particle Counter (CPC) and can be observed in the high-time-resolution data. In an effort to remove aerosol data that is not regionally representative from the CPC data, an aerosol mask (ENA-AM) has been previously developed and validated during the ACE-ENA campaing (Gallo et al., 2020). The ENA-AM is a standard deviation algorithm based on the statistically different behavior of adjacent data points used to determine periods when the measurements are impacted by local aerosols. This file contain one-minute time resolution submicron aerosol particle concentration datasets from the CPC for the year 2018, and the corresponding ENA-AM datasets to remove datapoints affected by local aerosol sources.

54 ENVIRONMENTAL SCIENCES↗
DOE OSTI2022

EASTERN NORTH ATLANTIC (ENA) CONDENSATION PARTICLE COUNTER (CPC) with the AEROSOL MASK (ENA-AM) for the YEAR 2016

The Eastern North Atlantic (ENA) central facility is periodically affected by episodes of local aerosols. High-concentration aerosol events associated with potential local aerosol sources are sampled by the concentration particle counter (CPC) and can be observed in the high-time-resolution data. In an effort to remove aerosol data that is not regionally representative from the CPC data, an aerosol mask (ENA-AM) has been previously developed and validated during the ACE-ENA campaign (Gallo et al. 2020). The ENA-AM is a standard deviation algorithm based on the statistically different behavior of adjacent data points used to determine periods when the measurements are impacted by local aerosols. This file contains one-minute-time-resolution submicron aerosol particle concentration data sets from the CPC for the year 2016, and the corresponding ENA-AM data sets to remove data points affected by local aerosol sources.

54 ENVIRONMENTAL SCIENCES↗
NASA NTRS1967

Process facilitates photoresist mask alignment on SiC crystals

Growth of silicon dioxide on a silicon carbide crystal ensures proper orientation of photoresist masks on the crystals used for semiconductor devices. The crystal is heated in a water vapor-saturated gas to delineate p-n junctions that intersect the crystal surface.

Formigoni, N. P.↗
NASA NTRS1969

Multiple-mask chemical etching

Multiple masking techniques use lateral etching to reduce the total area of the high etch-rate oxide exposed to the chemical etchant. One method uses a short-term etch to remove the top layer from the silicon oxide surface, another acts before the top layer is grown.

Cannon, D. L.↗
NASA NTRS1969

Masking of aluminum surface against anodizing

Masking material and a thickening agent preserve limited unanodized areas when aluminum surfaces are anodized with chromic acid. For protection of large areas it combines well with a certain self-adhesive plastic tape.

Crawford, G. B.↗